1. A photomask tracking system used in a photomask handling system, wherein the photomask handling system includes at least one photomask transporting pod for transporting at least one photomask, a photomask storage pod for storing the photomask, and at least one handling apparatus for handling the photomask, and the photomask tracking system comprises:
at least one RFID tag, provided on the photomask transporting pod andor the photomask storage pod for transmitting a first signal through an RFID (Radio Frequency Identification) principle, and being detachable, so that when the photomask is transferred between the photomask transporting pod and the photomask storage pod, the RFID tag can be detached from one of the photomask pods where the photomask leaves and attached to the other photomask pod where the photomask enters;
at least one RFID reader, provided on the handling apparatus for receiving the first signal before, while or after the handling apparatus handles the photomask, and transmitting a second signal; and
a control terminal, receiving the second signal and having a record device for storing data of a handling process of the photomask.
2. The photomask tracking system of claim 1, wherein the data of the handling process of the photomask comprise a cleaning record, a transporting record and a storage time of the photomask.
3. The photomask tracking system of claim 1, wherein each said RFID tag has a unique identification code.
4. The photomask tracking system of claim 1, wherein the handling apparatus is a photomask stocker, a photomask cleaner, a photomask transporter or an exposure apparatus used in an optical lithographic process.
5. The photomask tracking system of claim 1, wherein the RFID tag can be used repeatedly.
6. The photomask tracking system of claim 1, wherein the control terminal comprises at least one computer.
7. The photomask tracking system of claim 1, wherein the reader transmits the second signal to the control terminal by a wired or a wireless manner.
8. The photomask tracking system of claim 1, the RFID tags on the photomask transporting pod and the photomask storage pod comprises identification codes that are at least partially identical and the RFID tags are switchable so that when the photomask is transferred between the photomask transporting pod and photomask storage pod, the RFID tag on the photomask pod where the photomask leaves is turned off and the other RFID tag at the photomask pod where the photomask enters is turned on.
9. A photomask tracking method used in a photomask handling system, wherein the photomask handling system includes at least one photomask pod, and at least one handling apparatus for handling the photomask, and the photomask tracking method comprises steps of:
providing a photomask tracking system, which comprises:
at least one RFID tag, provided on the photomask pod and transmitting a first signal through an RFID (Radio Frequency Identification) principle;
at least one RFID reader, provided on the handling apparatus; and
a control terminal; and
using the RFID tag to transmit a first signal before, while or after the handling apparatus handles the photomask, using the RFID reader to receive the first signal and transmit a second signal, and using the control terminal to receive the second signal and thereby record a handling process of the photomask.
10. The photomask tracking method of claim 9, wherein each said RFID tag has a unique identification code.
11. The photomask tracking method of claim 9, wherein the photomask pod is a photomask transporting pod.
12. The photomask tracking method of claim 9, wherein the photomask pod is a photomask storage pod.
13. The photomask tracking method of claim 9, wherein the control terminal comprises at least one computer.
14. The photomask tracking method of claim 9, wherein the RFID reader transmits the second signal to the control terminal by a wired or a wireless manner.
15. The photomask tracking method of claim 9, wherein the photomask pod of the photomask handling system includes at least one photomask transporting pod for transporting the photomask and one photomask storage pod for storing the photomask, in which the photomask transporting pod and the photomask storage pod have the RFID tags containing identification codes that are at least partially identical and being switchable so that when the photomask is transferred between the photomask transporting pod and photomask storage pod, the photomask tracking method further comprises steps of turning off the RFID tag at the photomask pod where the photomask leaves and turning on the other RFID tag at the photomask pod where the photomask enters.
16. The photomask tracking method of claim 9, wherein the photomask pod of the photomask handling system comprises at least one photomask transporting pod for transporting the photomask and one photomask storage pod for storing the photomask, and the RFID tag is detachable so that when the photomask is transferred between the photomask transporting pod and the photomask storage pod, the photomask tracking method further comprises steps of detaching the RFID tag from one said photomask pod where the photomask leaves and reattaching the RFID tag to the other said photomask pod where the photomask enters.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method for black coating camera cubes at wafer level, the method comprising:
stretching a first tape attached to a wafer of camera cubes to increase a gap between individual camera cubes;
applying a layer of black coating material to the wafer of the camera cubes;
laser trimming a pattern within the layer of black coating, the pattern defining undesired portions of the black coating material to be removed;
lifting off the undesired portions of the black coating material from the wafer prior to singulating each individual camera cube from the wafer;
coating the camera cubes with a masking portion corresponding to portions of the camera cubes where black coating is not desired;
wherein the step of lifting off comprises applying a stripping chemical to remove the masking portion via the laser trimmed pattern.
2. The method of claim 1, wherein the pattern corresponds to the masking portion.
3. The method of claim 1, wherein the step of lifting off is performed with a fixture that holds the wafer and camera cubes while the stripping chemical is agitated.
4. The method of claim 1, further comprising, after the step of stretching, transferring the wafer of camera cubes to a bottom masking layer.
5. A method for black coating camera cubes at wafer level, the method comprising:
stretching a first tape attached to a wafer of the-camera cubes to increase a gap between individual ones of the camera cubes;
applying a layer of black coating material to the wafer of the camera cubes;
laser trimming a pattern within the layer of black coating, the pattern defining undesired portions of the black coating material to be removed;
lifting off the undesired portions of the black coating material from the wafer prior to singulating each individual camera cube from the wafer;
wherein the step of stretching comprises:
stretching the first tape in a first direction to increase the gap to a first distance;
applying ultraviolet (UV) light to the first tape;
attaching a second tape to the wafer of camera cubes on an opposing side of the wafer opposite the first tape;
removing the first tape; and,
stretching the second tape to increase the gap a second distance.
6. The method of claim 5, wherein the step of stretching the second tape comprises stretching the second tape in a second direction different from the first direction.
7. The method of claim 5, further comprising applying UV light to the second tape; and repeating the steps of attaching, removing, stretching and applying UV light for an additional tape until the gap is at a desired threshold.
8. The method of claim 7, wherein for each additional tape, the additional tape is stretched in a different direction.
9. The method of claim 5, wherein the step of applying UV light occurs after the step of attaching a second tape, and wherein the UV light is applied only at a location of the first tape.
10. A method for increasing a gap between individual camera cubes on a single wafer of a plurality of camera cubes, the method comprising:
stretching, in a first direction, a first tape attached to the wafer of camera cubes to increase the gap to a first distance
applying ultraviolet (UV) light to the first tape;
attaching a second tape to the wafer of camera cubes on an opposing side of the wafer opposite of the first tape;
removing the first tape; and
stretching the second tape to increase the gap a second distance.
11. The method of claim 10, wherein the step of stretching the second tape comprises stretching the second tape in a second direction different from the first direction.
12. The method of claim 10, further comprising applying UV light to the second tape; and repeating the steps of attaching, removing, stretching and applying UV light for an additional tape until the gap is at a desired threshold.
13. The method of claim 12, wherein for each additional tape, the additional tape is stretched in a different direction.
14. The method of claim 10, wherein the step of applying UV light occurs after the step of attaching a second tape, and wherein the UV light is applied only at a location of the first tape.