1460750410-5720b0ea-37dc-4fbc-a37c-bf0f933cdc23

1. A keypad mechanism for portable electronic device comprising:
a housing defining a plurality of through holes and a plurality of ribs formed between adjacent through holes of the plurality of through holes, a plurality of posts projecting from each rib of the plurality of ribs;
a button assembly comprising a plurality of buttons arranged in button rows, each button row of the button rows being received in one of the plurality of through holes;
two separate positioning elements, each positioning element of the two separate positioning elements positioned at an opposing side of the housing, a plurality of projections projecting from each of the two separate positioning elements, a plurality of receiving spaces defined between the plurality of projections of the each of the two separate positioning elements, a first end of the each button row received in a respective one of the plurality of receiving spaces of a first one of the two separate positioning elements and a second end of the each button row received in a respective one of the plurality of receiving spaces of a second one of the two separate positioning elements; and
a resisting plate defining a plurality of connecting holes, the plurality of posts received in the plurality of connecting holes to latch the resisting plate and the button assembly to the housing.
2. The keypad mechanism as claimed in claim 1, wherein a plurality of positioning protrusions project from the opposing sides of the housing, the each of the two separate positioning elements defines a plurality of receiving holes, in which the positioning protrusions are respectively received.
3. The keypad mechanism as claimed in claim 2, wherein a plurality of latching blocks extend from the resisting plate, the each of the two separate positioning elements define a plurality of slots, in which the latching blocks are received.
4. The keypad mechanism as claimed in claim 3, wherein the resisting plate comprises a support portion and two tabs projecting from the support portion, the latching blocks extend from the edges of the support portion, the tabs resist the two separate positioning elements, the support portion supports the button assembly.
5. The keypad mechanism as claimed in claim 3, wherein a plurality of positioning blocks extend from the buttons, each of the ribs defines a plurality of cutouts, in which the positioning blocks are received.
6. A portable electronic device comprising:
a housing defining a plurality of through holes and a plurality of ribs formed between adjacent through holes of the plurality of through holes, a plurality of posts projecting from each rib of the plurality of ribs;
a button assembly comprising a plurality of buttons arranged in button rows, each button row of the button rows being received in one of the plurality of through holes;
two separate positioning elements, each positioning element of the two separate positioning elements positioned at an opposing side of the housing, a plurality of projections projecting from the plurality of positioning elements, a plurality of receiving spaces defined between the plurality of projections, a first end of the each button row received in a respective one of the plurality of receiving spaces of a first one of the two separate positioning elements and a second end of the each button row received in a respective one of the plurality of receiving spaces of a second one of the two separate positioning elements; and
a resisting plate defining a plurality of connecting holes, the plurality of posts received in the plurality of connecting holes to latch the button assembly and the two separate positioning elements to the housing.
7. The portable electronic device as claimed in claim 6, wherein a plurality of positioning protrusions project from the opposing sides of the housing, the each of the two separate positioning elements defines a plurality of receiving holes, in which the positioning protrusions are respectively received.
8. The portable electronic device as claimed in claim 7, wherein a plurality of latching blocks extend from the resisting plate, the each of the two separate positioning elements define a plurality of slots, in which the latching blocks are received.
9. The portable electronic device as claimed in claim 6, wherein the resisting plate comprises a support portion and two tabs projecting from the support portion, the latching blocks extend from the edges of the support portion, the tabs resist the two separate positioning elements.
10. The portable electronic device as claimed in claim 6, wherein a plurality of positioning blocks extend from the buttons, each of the ribs defines a plurality of cutouts, in which the positioning blocks are received.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of forming a layer, the method comprising:
providing a substrate having at least one surface adapted for deposition thereon; and
directing a particle beam towards the surface of the substrate, the particle beam comprising moderately charged ions (MCIs), substantially all the MCIs independently have positive or negative charges from 2 to 6 and kinetic energies of not greater than about 200 eV,
wherein the MCIs do not penetrate more than about 30 \u212b into the surface of the substrate to form a layer on the substrate.
2. The method of claim 1, wherein the MCIs are monoatomic species, molecular polyatomic species, cluster species, or combinations thereof.
3. The method of claim 1, wherein substantially all the MCIs have kinetic energies between about 5 eV and 200 eV.
4. The method of claim 1, wherein substantially all the MCIs have kinetic energies between about 5 eV and 100 eV.
5. The method of claim 1, wherein substantially all the MCIs have charges from 3 to 6.
6. The method of claim 1, wherein substantially all the MCIs have charges of positive or negative 3.
7. The method of claim 1, wherein the source of the particle beam is configured to produce multiply charged ions.
8. The method of claim 7, wherein the source is selected from an electron cyclotron resonance (ECR) ion source, a multicusp ion source, or an electron beam ion trap (EBIT) ion source.
9. A method of forming a layer, the method comprising:
providing a substrate having at least one surface adapted for deposition thereon; and
directing a particle beam towards the surface of the substrate, the particle beam comprising moderately charged ions (MCIs), substantially all the MCIs independently have positive or negative charges from 2 to 10 and kinetic energies of not greater than about 2000 eV,
wherein the MCIs do not penetrate more than about 50 \u212b into the surface of the substrate to form a layer on the substrate.
10. The method of claim 9, wherein substantially all the MCIs have kinetic energies between about 5 eV and 2000 eV.
11. The method of claim 9, wherein substantially all the MCIs have charges from 3 to 6.
12. The method of claim 9, wherein the source of the particle beam is configured to produce multiply charged ions.
13. The method of claim 12, wherein the source is selected from an electron cyclotron resonance (ECR) ion source, a multicusp ion source, or an electron beam ion trap (EBIT) ion source.
14. A method of forming a layer, the method comprising:
providing a substrate having at least one surface adapted for deposition thereon; and
directing a particle beam towards the surface of the substrate, the particle beam comprising moderately charged ions (MCIs) wherein substantially all the MCIs independently have positive and negative charges from 2 to 10 and kinetic energies between about 5 eV and 2000 eV, and wherein the particle beam is directed at the surface using at least an accel-decel beam transport technique,
wherein the MCIs do not penetrate more than about 50 \u212b into the surface of the substrate to form a layer on the substrate.
15. The method of claim 14, wherein substantially all the MCIs have a charge from 3 to 6.
16. The method of claim 14, wherein substantially all the MCIs have kinetic energies between about 5 eV and 200 eV.
17. The method of claim 14, wherein the source of the particle beam is configured to produce multiply charged ions.
18. The method of claim 17, wherein the source is selected from an electron cyclotron resonance (ECR) ion source, a multicusp ion source, or an electron beam ion trap (EBIT) ion source.
19. The method of claim 14, wherein the MCIs comprise carbon.
20. The method of claim 19, wherein the MCIs have a charge from 3 to 6.