1. A semiconductor device comprising:
a semiconductor substrate;
two active device regions formed on a principal surface of the semiconductor substrate;
an isolating region formed between the two active device regions;
a plurality of first dummy patterns arranged regularly in rows and columns at a first pitch in the isolating region; and
a plurality of second dummy patterns arranged regularly in rows and columns at a second pitch in the isolating region, wherein
the second pitch is larger than the first pitch,
each of the second dummy patterns has a larger area than each of the first dummy patterns,
the two active device regions are composed of a first active device region and a second active device region,
the first dummy patterns and the second dummy patterns are arranged between the first active device region and the second active device region, and
the first dummy patterns and the second dummy patterns are arranged in the following order along the principal surface of the substrate: the first dummy patterns, the second dummy patterns, and the first dummy patterns, respectively.
2. A semiconductor device comprising:
a semiconductor substrate;
a first active device region and a second active device region formed on a principal surface of the semiconductor substrate;
an isolating region formed between the first active device region and the second device active region;
a plurality of first dummy patterns arranged regularly at a first pitch in the isolating region;
a plurality of second dummy patterns arranged regularly at a second pitch in the isolating region; and
a plurality of third dummy patterns arranged regularly at the first pitch in the isolating region, wherein
each of the second dummy patterns has a larger area than each of the first dummy patterns,
each of the third dummy patterns has a same area as each of the first dummy patterns,
the first dummy patterns, the sec6nd dummy patterns and the third dummy patterns are arranged between the first active device region and the second active device region,
the first dummy patterns, the second dummy patterns and the third dummy patterns are arranged in the following order along the principal surface of the substrate: the first dummy patterns, the second dummy patterns and the third dummy patterns, respectively, and
the second pitch is larger than the first pitch.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of treating drug addiction comprising the administration of a therapeutically effective amount of a compound having structural Formula (1) or a pharmaceutically acceptable salt or ester thereof, to a mammal in need of treatment:
wherein,
R is selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, halogen selected from F, Cl, Br and I, alkoxy of 1 to 3 carbon atoms, nitro group, hydroxy, trifluoromethyl, and thioalkoxy of 1 to 3 carbon atoms;
x is an integer of 1 to 3, with the proviso that R may be the same or different when x is 2 or 3;
R1 and R2 can be the same or different from each other and are independently selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, aryl, arylalkyl cycloalkyl of 3 to 7 carbon atoms;
R1 and R2 can be joined to form a 5 to 7-membered heterocycle substituted with a member selected from the group consisting of hydrogen, alkyl, and aryl groups, wherein the heterocyclic compound comprises 1 to 2 nitrogen atoms and 0 to 1 oxygen atom, and the nitrogen atoms are not directly connected with each other or with the oxygen atom.
2. The method of claim 1, wherein the compound is represented by the following structure:
3. The method of claim 1 wherein R is hydrogen and x=1.
4. The method of claim 1 wherein R, R1 and R2 are hydrogen and x=1.
5. The method of claim 1, wherein the compound having structural Formula (1) is an enantiomer substantially free of other enantiomers or an enantiomeric mixture wherein one enantiomer of the compound having structural Formula (1) predominates.
6. The method of claim 5, wherein one enantiomer predominates to the extent of about 90% or greater.
7. The method of claim 6, wherein one enantiomer predominates to the extent of about 98% or greater.
8. The method of claim 5, wherein the enantiomer is (S) or (L) enantiomer as represented by Structural Formula (1a):
wherein,
R is selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, halogen selected from F, Cl, Br and I, alkoxy of 1 to 3 carbon atoms, nitro group, hydroxy, trifluoromethyl, and thioalkoxy of 1 to 3 carbon atoms;
x is an integer of 1 to 3, with the proviso that R may be the same or different when x is 2 or 3;
R1 and R2 can be the same or different from each other and are independently selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, aryl, arylalkyl cycloalkyl of 3 to 7 carbon atoms;
R1 and R2 can be joined to form a 5 to 7-membered heterocycle substituted with a member selected from the group consisting of hydrogen, alkyl, and aryl groups, wherein the heterocyclic compound comprises 1 to 2 nitrogen atoms and 0 to 1 oxygen atom, and the nitrogen atoms are not directly connected with each other or with the oxygen atom.
9. The method of claim 8, wherein one enantiomer predominates to the extent of about 90% or greater.
10. The method of claim 9, wherein one enantiomer predominates to the extent of about 98% or greater.
11. The method of claim 8, wherein Rx, R1 and R2 are hydrogen and x is 1.
12. The method of claim 5, wherein the enantiomer is (R) or (D) enantiomer, as represented by Structural Formula (1b).
wherein,
R is selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, halogen selected from F, Cl, Br and I, alkoxy of 1 to 3 carbon atoms, nitro group, hydroxy, trifluoromethyl, and thioalkoxy of 1 to 3 carbon atoms;
x is an integer of 1 to 3, with the proviso that R may be the same or different when x is 2 or 3;
R1 and R2 can be the same or different from each other and are independently selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, aryl, arylalkyl cycloalkyl of 3 to 7 carbon atoms;
R1 and R2 can be joined to form a 5 to 7-membered heterocycle substituted with a member selected from the group consisting of hydrogen, alkyl, and aryl groups, wherein the heterocyclic compound comprises 1 to 2 nitrogen atoms and 0 to 1 oxygen atom, and the nitrogen atoms are not directly connected with each other or with the oxygen atom.
13. The method of claim 12, wherein one enantiomer predominates to the extent of about 90% or greater.
14. The method of claim 14, wherein one enantiomer predominates to the extent of about 98% or greater.
15. The method of claim 12, wherein the enantiomer is (R)-(beta-amino-benzenepropyl) carbamate.
16. The method of claim 15, wherein the enantiomer of (R)-(beta-amino-benzenepropyl) carbamate predominates to the extent of about 90% or greater.
17. The method of claim 16, wherein the enantiomer of (R)-(beta-amino-benzenepropyl) carbamate predominates to the extent of about 98% or greater.
18. The method of claim 1, wherein the addicted drug is at least one selected from the group consisting of nicotine, opioid, cocaine, amphetamine, methamphetamine, ethanol, heroin, morphine, phencyclidine (PCP), and methylenedioxymethamphetamine (MDMA).
19. The method of claim 18, wherein the drug is cocaine.
20. The method of claim 18, wherein the therapeutically effective amount of the compound is from about 0.01 mgkgdose to about 300 mgkgdose.
21. A pharmaceutical composition for treating drug addiction comprising the administration of a therapeutically effective amount of a compound having structural Formula (1) or a pharmaceutically acceptable salt or ester thereof, to a mammal suffering from drug addiction:
wherein,
R is selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, halogen selected from F, Cl, Br and I, alkoxy of 1 to 3 carbon atoms, nitro group, hydroxy, trifluoromethyl, and thioalkoxy of 1 to 3 carbon atoms;
x is an integer of 1 to 3, with the proviso that R may be the same or different when x is 2 or 3;
R1 and R2 can be the same or different from each other and are independently selected from the group consisting of hydrogen, lower alkyl of 1 to 8 carbon atoms, aryl, arylalkyl, cycloalkyl of 3 to 7 carbon atoms;
R1 and R2 can be joined to form a 5 to 7-membered heterocycle substituted with a member selected from the group consisting of hydrogen, alkyl, and aryl groups, wherein the heterocyclic compound comprises 1 to 2 nitrogen atoms and 0 to 1 oxygen atom, and the nitrogen atoms are not directly connected with each other or with the oxygen atom.