What is claimed is:
1. A human RUNX3 gene with tumor suppressor activity, composed of a cDNA nucleotide sequence SEQ. ID. NO: 1.
2. A RUNX3 protein, encoded by an open reading frame between the translation initiation codon and the translation termination codon of the RUNX3 gene of claim 1, comprising an amino acid sequence SEQ. ID. NO: 2.
3. An expression plasmid, which has the RUNX3 gene of claim 1 inserted in the sense direction thereto and allows a sense RUNX3 gene to be expressed.
4. An expression plasmid, which has the RUNX3 gene of claim 1 inserted in the antisense direction thereto and allows an antisense RUNX3 gene to be expressed.
5. A cell strain, which harbors the expression plasmid of claim 3 therein and shows the over-expression of the RUNX3 gene of claim 1.
6. A cell strain as set forth in claim 5, wherein the cell strain is MKN28-Rx3 (Deposition No. KCTC0933BP) which is established by transfecting the expression plasmid of claim 3 into the MKN28 strain.
7. A cell strain that harbors the expression vector of claim 4 and selectively inhibits the expression of the RUNX3 gene.
8. The cell strain as set forth in claim 7, wherein the cell strain which selectively inhibits the expression of the RUNX3 gene, is SNU16-Rx3-AS-c11 (Deposition NO: KCTC 0934BP) established by transfecting the expression plasmid of claim 4 into the SNU16 strain.
9. The cell strain as set forth in claim 7, wherein the cell strain which selectively inhibits the expression of the RUNX3 gene, is SNU16-Rx3-AS-c12 (Deposition NO: KCTC 0935BP) established by transfecting the expression plasmid of claim 4 into the SNU16 strain.
10. A pharmaceutical composition as an anticancer agent, comprising the expression plasmid of claim 3.
11. A pharmaceutical composition as an anticancer agent, comprising the RUNX3 gene of claim 1.
12. A pharmaceutical composition as an anticancer agent, comprising the RUNX3 cDNA having the nucleotide sequence SEQ. ID. NO: 1.
13. A pharmaceutical composition as an anticancer agent, comprising the RUNX3 RNA transcribed from the RUNX3 gene of claim 1.
14. A pharmaceutical composition as an anticancer agent, comprising the RUNX3 protein of claim 2.
15. A pharmaceutical composition as an anticancer agent, comprising a material capable of regulating the histone deacethylase activity and methylation of a nucleotide sequence SEQ. ID. NO: 3, containing CpG islands in the vicinity of the exon 1 of an RUNX3 gene.
16. A method for diagnosing cancers, characterized by detecting the methylation of a nucleotide sequence SEQ. ID. NO: 3, containing CpG islands present near exon 1 of the RUNX3 gene, comprising the steps of:
isolating genomic DNA from a tumor tissue of a subject;
digesting the genomic DNA with a restriction enzyme sensitive to DNA methylation;
separating the genomic DNA digests on an agarose gel by electrophoresis and transferring them onto a membrane;
hybridizing the genomic DNA digests with a radiolabeled DNA probe for a RUNX3 gene; and
exposing the membrane to a film to detect the expression of the RUNX3 gene.
17. A method for diagnosing cancers, characterized by detecting the methylation of a nucleotide sequence SEQ. ID. NO: 3, containing CpG islands present near exon 1 of the RUNX3 gene, comprising the steps of:
Isolating genomic DNA from the blood or tumor tissue of a subject;
digesting the genomic DNA with a restriction enzyme sensitive to DNA methylation;
performing a polymerase chain reaction (PCR) with the genomic DNA digests serving as templates and with parts of the nucleotide sequence of SEQ. ID. NO: 3 serving as primers;
separating the PCR products on an agarose gel by electrophoresis to detect the amplification of a DNA sequence of interest.
18. A biological microchip for the diagnosis of cancers, using parts of the RUNX3 cDNA SEQ. ID. NO: 1 or an antibody against a RUNX3 protein produced from the cDNA.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A wavelength division multiplexerdemultiplexer (WDM), comprising:
a support structure coupled to at least one optical component;
a diffraction grating optically coupled to said at least one optical component coupled to said support structure;
a frame, said diffraction grating being supported by said frame; and
a plurality of pins connecting said support structure and said frame, said plurality of pins substantially thermally isolating said frame from said support structure.
2. The WDM according to claim 1, wherein said pins are substantially geometrically equally spaced about said frame.
3. The WDM according to claim 1, wherein said pins are permanently coupled to said frame.
4. The WDM according to claim 3, wherein said permanent coupling includes at least one of the following: press-fit, epoxy bonded, soldered, and welded.
5. The WDM according to claim 1, wherein said pins are permanently coupled to said support structure.
6. The WDM according to claim 5, wherein said permanent coupling includes at least one of the following: press-fit, epoxy bonded, soldered, and welded.
7. The WDM according to claim 1, wherein said pins have approximately the same exposed length extending from said support structure.
8. The WDM according to claim 1, wherein said pins and said support structure have approximately the same coefficient of thermal expansion.
9. The WDM according to claim 1, wherein said diffraction grating includes a substrate.
10. The WDM according to claim 9, wherein said frame has approximately the same coefficient of thermal expansion as the coefficient of thermal expansion of the substrate.
11. The WDM according to claim 9, wherein the coefficient of thermal expansion of said substrate is below about 1.0 PPMC.
12. The WDM according to claim 9, wherein the substrate comprises at least one of the following materials: fused silica, glass, metal, silicon carbide, and ceramic.
13. The WDM according to claim 9, wherein the substrate is coupled to said frame.
14. The WDM according to claim 13, wherein the coupling of the substrate and said frame includes at least one of the following: epoxied, soldered, welded, and metalized and soldered.
15. The WDM according to claim 1, wherein said pins have approximately the same coefficient of thermal expansion as the coefficient of thermal expansion of said frame.
16. The WDM according to claim 1, wherein said frame is substantially thermally isolated from the support structure over a temperature range between about 40 Celsius and about 85 Celsius.
17. The WDM according to claim 1, wherein said frame comprises at least one of the following materials: invar, metal, glass, and ceramic.
18. The WDM according to claim 1, wherein said support structure has a coefficient of thermal expansion between about 9.5 and about 10.5 PPMC.
19. The WDM according to claim 1, wherein the support structure includes at least one of the following materials: 416, 410, and 412 stainless steel.
20. The WDM according to claim 1, wherein said support structure is a lens barrel.
21. The WDM according to claim 1, wherein said support structure includes a base plate.
22. The WDM according to claim 1, wherein a gap is included between said support structure and said frame.
23. An apparatus for stabilizing a position of a diffraction grating in relation to at least one optical component, the apparatus comprising:
a support structure coupled to the at least one optical component;
a frame coupled to said diffraction grating; and
a plurality of pins coupling said frame to said support structure, said plurality of pins substantially thermally isolating said frame from said support structure over temperature variations.
24. The apparatus according to claim 23, wherein said frame is substantially thermally dynamically matched to said substrate.
25. The apparatus according to claim 23, wherein said pins are substantially dynamically thermally matched to said support structure.
26. The apparatus according to claim 23, wherein said pins are substantially dynamically thermally matched to said frame.
27. The apparatus according to claim 23, wherein said pins have substantially the same exposed length extending from said support structure.
28. The apparatus according to claim 23, wherein the temperature variations range from about 40 Celsius to about 85 Celsius.
29. The apparatus according to claim 23, wherein said support structure has a coefficient of thermal expansion of between about 9.5 and about 10.5 PPNC.
30. The apparatus according to claim 23, wherein said pins are substantially equally spaced about said support structure.
31. The apparatus according to claim 23, wherein said pins are extended axially from said support structure.
32. The apparatus according to claim 23, wherein the coefficient of thermal expansion of said substrate is below about 1.0 PPMC.
33. The apparatus according to claim 23, wherein said support structure is a lens barrel.
34. A wavelength division multiplexerdemultiplexer (WDM), comprising:
means for supporting at least one optical component;
means for diffracting an optical signal, said means for diffracting being oriented at a set position relative to at least one optical component; and
means for coupling said means for diffracting to said means for supporting at least one optical component, said means for coupling providing substantially the same relative position between said means for diffracting and the at least one optical component over a temperature range.
35. The WDM according to claim 34, wherein the position is an angle.
36. The WDM according to claim 34, wherein the temperature range comprises at least approximately 120 degrees Celsius.
37. The WDM according to claim 34, wherein said means for coupling is substantially dynamically thermally matched to said means for supporting at least one optical component.
38. The WDM according to claim 34, further comprising means for supporting said means for diffracting.
39. The WDM according to claim 38, wherein said means for supporting said means for diffracting is substantially dynamically thermally matched to at least one component forming said means for diffracting.
40. The WDM according to claim 34, wherein said means for coupling creates a gap between said means for diffracting and said means for supporting.
41. A wavelength division multiplexerdemultiplexer (WDM) comprising:
a support structure for supporting at least one optical component, the diffraction grating optically coupled to the at least one optical component; and
at least one coupling element coupling the diffraction grating to said support structure, the at least one coupling element substantially thermally isolating the diffraction grating from said support structure.
42. The WDM according to claim 41, wherein said at least one coupling element has a coefficient of thermal expansion substantially the same as the coefficient of thermal expansion of said support structure.
43. The WDM according to claim 41, further comprising a frame coupled to the diffraction grating, said at least one coupling element has a coefficient of thermal expansion substantially the same as the coefficient of thermal expansion of said frame.
44. The WDM according to claim 41, wherein said support structure has a coefficient of thermal expansion between about 9.5 and about 10.5 PPMC.
45. The WDM according to claim 41, wherein the diffraction grating includes a substrate, said substrate has a coefficient of thermal expansion below about 1.0 PPMC.
46. The WDM according to claim 41, wherein said at least one coupling element is cylindrically shaped.
47. The WDM according to claim 41, wherein said coupling elements are coupled to said support structure in substantially equal spacings.
48. The WDM according to claim 41, wherein said support structure is a lens barrel.
49. The WDM according to claim 41, wherein said at least one coupling element includes at least one of the following: a pin, a bracket, and a strap.
50. The WDM according to claim 41, wherein said at least one coupling element forms a gap between said support structure and the diffraction grating.
51. A system comprising:
optical components;
a support structure for supporting at least one optical component;
a diffraction grating optically coupled to the at least one optical component; and
at least one coupling element connecting said support structure to said diffraction grating so that an orientation of said diffraction grating relative to said optical components is substantially maintained over a temperature range.
52. The system according to claim 51, wherein the system multiplexes and demultiplexes monochromatic optical signals.
53. The system according to claim 51, wherein said at least one coupling element has a coefficient of thermal expansion substantially the same as the coefficient of thermal expansion of said support structure.
54. The system according to claim 51, wherein said support structure has a coefficient of thermal expansion between about 9.5 and about 10.5 PPMC.
55. The system according to claim 51, wherein said diffraction grating includes a substrate, said substrate has a coefficient of thermal expansion below about 1.0 PPMC.
56. The system according to claim 51, wherein the system is includes at least one of the following: a spectrometer, optical performance monitor, and a wavelength division multiplexer.
57. A method for manufacturing a wavelength division multiplexerdemultiplexer (WDM), comprising:
coupling at least one optical component to a first support structure; and
connecting the support structure to a diffraction grating so as to optically couple the diffraction grating to the at least one optical component, the diffraction grating being substantially thermally isolated from the first support structure.
58. The method according to claim 57, wherein the diffraction grating is connected to a second support structure.