1-46. (canceled)
47. A compound of formula III:
wherein, independently for each occurrence,
L is O, S, or NR;
Het is a heterocyclic group; and
R is H, halide, amino, nitro, hydroxy, alkoxy, or an optionally substituted C1-C6 alkyl, C2-C6 alkenyl, or C2-C10 alkynyl, where the substituents are selected from the group consisting of hydroxy, halide, amino, nitro, and alkoxy.
48. The compound of claim 47, wherein L is O.
49. The compound of claim 47, wherein Het is 1-methyl-2-pyrrolidinyl.
50. The compound of claim 47, wherein Het is 2-azetidinyl.
51. The compound of claim 47, wherein R is H.
52. The compound of claim 47, wherein R is Br.
53. The compound of claim 47, wherein R is an alkynyl group.
54. The compound of claim 47, wherein R is an hydroxy substituted alkynyl group.
55. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is H.
56. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is Br.
57. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is \u2014CCH.
58. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is \u2014CCCH2OH.
59. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is \u2014CC(CH2)4OH.
60. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is \u2014(CH2)6OH.
61. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is \u2014CC(CH2)8OH.
62. The compound of claim 47, wherein L is O, Het is 2-azetidinyl, and R is H.
63. The compound of claim 47, wherein L is O, Het is 2-azetidinyl, and R is \u2014CC(CH2)4OH.
64-70. (canceled)
71. The compound of claim 47, wherein the compound is a single stereoisomer.
72. A pharmaceutical composition, comprising a compound of claim 47; and a pharmaceutically acceptable excipient.
73-74. (canceled)
75. A method of modulating a nicotine ACh receptor in a mammal, comprising administering to the mammal a compound of claim 47.
76. The method of claim 75, wherein the mammal is a primate, equine, canine, or feline.
77. The method of claim 75, wherein the mammal is a human.
78-89. (canceled)
90. A method of treating a mammal suffering from Alzheimer’s disease, Parkinson’s disease, dyskinesias, Tourette’s syndrome, schizophrenia, attention deficit disorder, anxiety, pain, depression, obsessive compulsive disorder, chemical substance abuse, alcoholism, memory deficit, pseudodementia, Ganser’s syndrome, migraine pain, bulimia, obesity, premenstrual syndrome or late luteal phase syndrome, tobacco abuse, post-traumatic syndrome, social phobia, chronic fatigue syndrome, premature ejaculation, erectile difficulty, anorexia nervosa, disorders of sleep, autism, mutism or trichtillomania, comprising administering a compound of claim 47.
91. The method of claim 90, wherein the mammal is a primate, equine, canine, or feline.
92. The method of claim 90, wherein the mammal is a human.
93-105. (canceled)
106. The compound of claim 47, wherein R is a fluorine substituted alkynyl group.
107. The compound of claim 47, wherein R is \u2014CC(CH2)4F.
108. The compound of claim 47, wherein Het is 1-methyl-2-pyrrolidinyl, and R is \u2014CC(CH2)4F.
109. The compound of claim 47, wherein L is O, Het is 1-methyl-2-pyrrolidinyl, and R is \u2014CC(CH2)4F.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1-15. (canceled)
16. An in-plane printing method using a patterning composition, comprising:
forming a thin film on a substrate;
forming a resist layer of the patterning composition on the thin film, wherein the patterning composition consists essentially of:
about 1% to about 10% by weight of a liquid prepolymer, wherein the liquid prepolymer includes one of octafluoropentyl acrylate and octafluoropentyl methacrylate;
about 40% to about 60% by weight of an acrylate having a hydrophilic group, wherein the acrylate having the hydrophilic group includes one of diethylene glycol diacrylate and diethylene glycol dimethacrylate;
about 10% to about 20% by weight of a viscosity modifier, wherein the viscosity modifier includes one of butyl acrylate and butyl methacrylate;
about 1% to about 5% by weight of a photoinitiator;
about 10% to about 20% by weight of a photoreactor, wherein the photoreactor includes one of glycidyl acrylate and glycidyl methacrylate;
about 10% to about 20% by weight of a thermal flow derivative, wherein the thermal flow derivative includes one of polystyrene, polymethyl acrylate and polymethyl methacrylate; and
an additive,
wherein the patterning composition is curable by a UV light;
disposing a mold over the resist layer;
pressing the mold toward the resist layer and irradiating light onto the resist layer through the mold to form a resist pattern;
separating the mold from the resist pattern; and
etching the thin film using the resist pattern as an etch mask to form a thin film pattern.
17. The method according to claim 16, wherein the mold includes one of polydimethylsiloxane (PDMS), polyurethane acrylate and quartz.
18. An in-plane printing method using a patterning composition, comprising:
forming a thin film on a substrate;
forming a resist layer of the patterning composition on the thin film, wherein the patterning composition consists essentially of:
about 10% to about 30% by weight of a liquid prepolymer having a hydrophilic group, wherein the liquid prepolymer having the hydrophilic group includes one of octafluoro-2-hydroxyl-6-trifluoromethylheptylacrylate and octafluoro-2-hydroxyl-6-trifluoromethylheptylmethacrylate;
about 10% to about 20% by weight of a viscosity modifier, wherein the viscosity modifier includes one of butyl acrylate and butyl methacrylate;
about 1% to about 5% by weight of a photoinitiator;
about 10% to about 20% by weight of a photoreactor, wherein the photoreactor includes one of glycidyl acrylate and glycidyl methacrylate;
about 10% to about 20% by weight of a thermal flow derivative, wherein the thermal flow derivative includes one of polystyrene, polymethyl acrylate and polymethyl methacrylate; and
an additive,
wherein the patterning composition is curable by a UV light;
disposing a mold over the resist layer;
pressing the mold toward the resist layer and irradiating a light onto the resist layer through the mold to form a resist pattern;
separating the mold from the resist pattern; and
etching the thin film using the resist pattern as an etch mask to form a thin film pattern.
19. The method according to claim 18, wherein the mold includes one of polydimethylsiloxane (PDMS), polyurethane acrylate and quartz.