1. Process for the production of a trim in the interior of a vehicle having a cover with an A-surface directed towards the interior, wherein the A-surface is treated with a laser-beam to apply a graphic-element andor a pattern to the A-surface.
2. Process according to claim 1, wherein cover is a fabric, leather andor faux-leather.
3. Process according to claim 2, wherein the material of the cover is partially fused or removed under the influence of the laser-beam.
4. Process according to claim 3, wherein the tactile of the cover is locally changed by the laser-beam.
5. Process according to claim 3, wherein the color of the cover is locally changed by the laser-beam.
6. Process according to claim 1, wherein the pattern is a simulated stitch.
7. Process according to claim 1, wherein the graphic-element is safety-element
8. Process according to claim 1, wherein the laser treated part of the cover covers a switch.
9. Process according to claim 1, wherein the material of the cover is positioned by means of at least one out of:
air suction,
air blowing,
pressing the material between at least two plate-like elements,
magnetic positioning,
by means of a holding or fixture frame surrounding the material to be etched.
10. Process according to claim 1, wherein the material of the cover is positioned relative to the laser beam at least partly by means of a conveying means
11. Process according to claim 2, wherein the pattern is a simulated stitch.
12. Process according to claim 2, wherein the graphic-element is safety-element
13. Process according to claim 2, wherein the laser treated part of the cover covers a switch.
14. Process according to claim 2, wherein the material of the cover is positioned by means of at least one out of:
air suction,
air blowing,
pressing the material between at least two plate-like elements,
magnetic positioning,
by means of a holding or fixture frame surrounding the material to be etched.
15. Process according to claim 2, wherein the material of the cover is positioned relative to the laser beam at least partly by means of a conveying means
16. Cover of a trim in the interior of a vehicle with an A-surface directed towards the interior of the vehicle, with graphic-elements or pattern applied to the A-surface by a laser beam.
17. Cover according to claim 16, wherein the graphic element or pattern is a 2-D- or 3-D element.
18. Cover according to claim 11, wherein the graphic-element or pattern is tactile.
19. Cover according to claim 11, wherein a light source is provided to backlit the cover.
20. Cover according to claim 12, wherein the graphic-element or pattern is tactile.
21. Cover according to claim 12, wherein a light source is provided to backlit the cover
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An electrochromic device, comprising a tantalum-nitride ion-blocking layer formed between a transparent conductive layer and an electrochromic layer.
2. The electrochromic device according to claim 1, wherein tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 50 nm.
3. The electrochromic device according to claim 2, wherein tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 15 nm.
4. The electrochromic device according to claim 2, further comprising a type-2 ion-blocking layer formed on the transparent conductive layer on a side of the transparent electrically conductive layer that is remote from the electrochromic layer.
5. The electrochromic device according to claim 2, wherein the transparent conductive layer comprises at least one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO), aluminum doped ZnO (AZO) and zinc indium tin oxide (ZITO).
6. The electrochromic device according to claim 1, further comprising a second transparent conductive layer formed from tantalum nitride.
7. The electrochromic device according to claim 1, further comprising a second tantalum-nitride ion-blocking layer formed between a second transparent conductive layer and a counter electrode.
8. The electrochromic device according to claim 7, wherein the second tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 50 nm.
9. The electrochromic device according to claim 8, wherein the second tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 15 nm.
10. The electrochromic device according to claim 8, further comprising a type-2 ion-blocking layer formed on the second transparent conductive layer on a side of the second transparent electrically conductive layer that is remote from the counter electrode layer of the electrochromic device.
11. The electrochromic device according to claim 8, wherein the second transparent conductive layer comprises at least one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO), aluminum doped ZnO (AZO) and zinc indium tin oxide (ZITO).
12. An electrochromic device, comprising a tantalum-nitride ion-blocking layer formed between a transparent conductive layer and a counter electrode layer.
13. The electrochromic device according to claim 12, wherein tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 50 nm.
14. The electrochromic device according to claim 13, wherein tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 15 nm.
15. The electrochromic device according to claim 13, further comprising a type-2 ion-blocking layer formed on the transparent conductive layer on a side of the transparent electrically conductive layer that is remote from the counter electrode layer.
16. The electrochromic device according to claim 13, wherein the transparent conductive layer comprises at least one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO), aluminum doped ZnO (AZO) and zinc indium tin oxide (ZITO).
17. The electrochromic device according to claim 12, further comprising a second transparent conductive layer formed from tantalum nitride.
18. The electrochromic device according to claim 12, further comprising a second tantalum-nitride ion-blocking layer formed between a second transparent conductive layer and an electrochromic layer.
19. The electrochromic device according to claim 18, wherein the second tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 50 nm.
20. The electrochromic device according to claim 19, wherein the second tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 15 nm.
21. The electrochromic device according to claim 19, further comprising a type-2 ion-blocking layer formed on the second transparent conductive layer on a side of the second transparent electrically conductive layer that is remote from the electrochromic layer.
22. The electrochromic device according to claim 19, wherein the transparent conductive layer comprises at least one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO), aluminum doped ZnO (AZO) and zinc indium tin oxide (ZITO).
23. An electrochromic device comprising a transparent conductive layer formed from-tantalum nitride.
24. The electrochromic device according to claim 23, further comprising a second transparent conductive layer formed tantalum nitride.
25. The electrochromic device according to claim 23, further comprising
a second transparent conductive layer; and
a tantalum-nitride ion-blocking layer formed between the second transparent conductive layer and an electrochromic layer.
26. The electrochromic device according to claim 25, wherein tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 50 nm.
27. The electrochromic device according to claim 25, further comprising a type-2 ion-blocking layer formed on the second transparent conductive layer on a side of the second transparent electrically conductive layer that is remote from the electrochromic layer.
28. The electrochromic device according to claim 25, wherein the second transparent conductive layer comprises at least one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO), aluminum doped ZnO (AZO) and zinc indium tin oxide (ZITO).
29. The electrochromic device according to claim 23, further comprising
a second transparent conductive layer; and
a tantalum-nitride ion-blocking layer formed between the second transparent conductive layer and a counter electrode layer.
30. The electrochromic device according to claim 29, wherein tantalum-nitride ion-blocking layer has a thickness of between about 5 nm to about 50 nm.
31. The electrochromic device according to claim 29, further comprising a type-2 ion-blocking layer formed on the second transparent conductive layer on a side of the second transparent electrically conductive layer that is remote from the counter electrode layer.