1. A module connector, comprising:
an insulated component having four sidewalls that define an inserting space to receive an outside module, each sidewall having a plurality of slots;
a plurality of contacts received in the corresponding slots and electrically connected with the outside module, each said contact having a propping portion and an intermediate portion extending transversely therefrom to terminate at a bottom portion, said propping and bottom portions being disposed to concurrently engage side and bottom surfaces of the outside module; and,
a housing shell including four side containing walls, a pressing pin and an elastic pin being extended from the top of each side containing wall towards the inserting space, the pressing pins propping downwardly the outside module, the elastic pins pressing on the side walls of the outside module.
2. The module connector of claim 1, wherein each sidewall has a cutout going through the corresponding sidewall, each cutout is closed at the bottom and opened at the top.
3. The module connector of claim 1, wherein the insulated component further has error-preventing blocks engaging corresponding error-preventing recesses set on the outside module.
4. The module connector of claim 1, wherein the housing shell is integrally formed and includes four side containing walls.
5. The module connector of claim 1, wherein a propping portion is flexed from the free end of a pressing pin, a contacting portion is flexed from the free end of an elastic pin towards the inserting space.
6. The module connector of claim 1, wherein each pin has a propping portion exposed outside of the slots of the insulated component and extend into the inserting space to engage the outside wall of the outside module.
7. The module connector of claim 6, wherein the elastic pins are disposed in respectively defined quadrants of the housing shell, a plurality of contacts being set in each quadrant, the moment defined at one adjacent pair of quadrants being equal to the moment defined at the other adjacent pair of quadrants.
8. The module connector of claim 6, wherein the contacts each have upright base portions engaging the slots of the insulated component, and a side supporting part is flexed downwardly from the top of each base portion, the side supporting part being received in one of the slots, each intermediate portion extending upwardly from one of the side supporting parts, and the propping portion being formed intermediately on each side supporting part, each bottom portion being formed at the uppermost part of each intermediate portion.
9. The module connector of claim 8, wherein the insulated component further has a bottom board, the sidewalls extend from the bottom board, and the slots are formed in the bottom board and the sidewalls to be parallel L-shaped slots, the propping portion of the side supporting parts and the bottom portions of the intermediate portions are exposed from the parallel L-shaped slots and embedded in the inserting space.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A substrate processing chamber, comprising:
a chamber body containing a substrate support;
a lid assembly comprising an expanding channel extending from a central portion of the lid assembly to a peripheral portion of the lid assembly and positioned to substantially cover the substrate support; and
one or more valves adapted to provide one or more reactants into the chamber body, each valve comprising:
a valve body having at least two ports comprising a purge inlet and an outlet;
a valve seat surrounding one of the ports;
an annular groove formed around the valve seat coupling the purge inlet and the outlet; and
a diaphragm assembly, comprising:
a diaphragm movable to contact the valve seat;
a piston coupled to the diaphragm; and
a cylinder to house the piston.
2. The substrate processing chamber of claim 1, wherein the cylinder forms an actuation chamber having an internal volume of about 3.0 cm3 or less.
3. The substrate processing chamber of claim 2, wherein the internal volume is about 1.0 cm3 or less.
4. The substrate processing chamber of claim 2, further comprising an electronically controlled valve adapted to provide pressurized gas to the actuation chamber from a pressurized gas supply.
5. The substrate processing chamber of claim 4, further comprising a gas line coupling the pressurized gas supply and the electronically controlled valve, wherein the gas lines having a diameter of greater than about 0.32 cm.
6. The substrate processing chamber of claim 5, wherein the diameter is about 0.64 cm or more.
7. The substrate processing chamber of claim 1, wherein the at least two ports of the valve body comprise a reactant inlet, a purge inlet, and an outlet.
8. The substrate processing chamber of claim 5, wherein the diaphragm in a closed position closes the reactant inlet, while the purge inlet and the outlet remain opened.
9. The substrate processing chamber of claim 1, wherein the one or more valves are coupled to separate purge gas supplies.
10. The substrate processing chamber of claim 1, further comprising a controller adapted to move the diaphragm between an open position and a closed position within a time period of about 1 second or less.
11. The substrate processing chamber of claim 10, wherein the time period is about 500 milliseconds or less.
12. The substrate processing chamber of claim 11, wherein the time period is about 200 milliseconds or less.
13. The substrate processing chamber of claim 12, wherein the time period is about 50 milliseconds or less.
14. The substrate processing chamber of claim 13, wherein the time period is about 20 milliseconds or less.
15. The substrate processing chamber of claim 1, further comprising an embedded heating element within the valve body.
16. The substrate processing chamber of claim 15, further comprising an embedded thermocouple within the valve body.
17. The substrate processing chamber of claim 4, wherein the electronically controlled valve is coupled to the cylinder through a gas line having a length of about 2.54 cm or less.
18. The substrate processing chamber of claim 17, further comprising an embedded heating element within the valve body.
19. A substrate processing chamber, comprising:
a chamber body containing a substrate support;
a lid assembly comprising an expanding channel extending from a central portion of the lid assembly to a peripheral portion of the lid assembly and positioned to substantially cover the substrate support; and
one or more valves adapted to provide one or more reactants into the chamber body, each valve comprising:
a valve body having at least three ports comprising a purge inlet, an outlet, and a reactant inlet;
a valve seat surrounding one of the ports;
an annular groove formed around the valve seat coupling the purge inlet and the outlet; and
a diaphragm assembly.
20. The substrate processing chamber of claim 19, wherein the diaphragm assembly further comprises:
a diaphragm movable to contact the valve seat;
a piston coupled to the diaphragm; and
a cylinder to house the piston.
21. The substrate processing chamber of claim 20, wherein the cylinder forms an actuation chamber having an internal volume of about 3.0 cm3 or less.
22. The substrate processing chamber of claim 21, wherein the internal volume is about 1.0 cm3 or less.
23. The substrate processing chamber of claim 21, further comprising an electronically controlled valve adapted to provide pressurized gas to the actuation chamber from a pressurized gas supply.
24. The substrate processing chamber of claim 23, further comprising a gas line coupling the pressurized gas supply and the electronically controlled valve, wherein the gas lines having a diameter of greater than about 0.32 cm.
25. The substrate processing chamber of claim 24, wherein the diameter is about 0.64 cm or more.
26. The substrate processing chamber of claim 20, wherein the diaphragm in a closed position closes the reactant inlet, while the purge inlet and the outlet remain opened.
27. The substrate processing chamber of claim 19, wherein the one or more valves are coupled to separate purge gas supplies.
28. The substrate processing chamber of claim 20, further comprising a controller adapted to move the diaphragm between an open position and a closed position within a time period of about 1 second or less.
29. The substrate processing chamber of claim 28, wherein the time period is about 200 milliseconds or less.
30. The substrate processing chamber of claim 29, wherein the time period is about 20 milliseconds or less.
31. The substrate processing chamber of claim 1, further comprising an embedded heating element, an embedded thermocouple, or a combination thereof within the valve body.
32. The substrate processing chamber of claim 19, wherein the electronically controlled valve is coupled to the cylinder through a gas line having a length of about 2.54 cm or less.
33. A substrate processing chamber, comprising:
a chamber body containing a substrate support;
a lid assembly comprising an expanding channel extending from a central portion of the lid assembly to a peripheral portion of the lid assembly and positioned to substantially cover the substrate support; and
one or more valves adapted to provide one or more reactants into the chamber body, each valve comprising:
a valve body comprises a purge inlet, an outlet, and a reactant inlet;
a valve seat surrounding the purge inlet, the outlet, or the reactant inlet;
an annular groove formed around the valve seat coupling the purge inlet and the outlet; and
a diaphragm assembly, comprising:
a diaphragm movable to contact the valve seat;
a piston coupled to the diaphragm; and
a cylinder to house the piston.
34. The substrate processing chamber of claim 33, wherein the cylinder forms an actuation chamber having an internal volume of about 3.0 cm3 or less.
35. The substrate processing chamber of claim 34, wherein the internal volume is about 1.0 cm3 or less.
36. The substrate processing chamber of claim 34, further comprising an electronically controlled valve adapted to provide pressurized gas to the actuation chamber from a pressurized gas supply.
37. The substrate processing chamber of claim 36, further comprising a gas line coupling the pressurized gas supply and the electronically controlled valve, wherein the gas lines having a diameter of greater than about 0.32 cm.
38. The substrate processing chamber of claim 37, wherein the diameter is about 0.64 cm or more.
39. The substrate processing chamber of claim 33, wherein the diaphragm in a closed position closes the reactant inlet, while the purge inlet and the outlet remain opened.
40. The substrate processing chamber of claim 33, wherein the one or more valves are coupled to separate purge gas supplies.
41. The substrate processing chamber of claim 33, further comprising a controller adapted to move the diaphragm between an open position and a closed position within a time period of about 1 second or less.
42. The substrate processing chamber of claim 33, wherein the time period is about 200 milliseconds or less.
43. The substrate processing chamber of claim 33, wherein the time period is about 20 milliseconds or less.
44. The substrate processing chamber of claim 33, further comprising an embedded heating element, an embedded thermocouple, or a combination thereof within the valve body.
45. The substrate processing chamber of claim 36, wherein the electronically controlled valve is coupled to the cylinder through a gas line having a length of about 2.54 cm or less.