1. A polymer containing a group of the following general formula (1) and having a weight average molecular weight of 1,000 to 500,000,
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wherein R1 to R3 each are hydrogen, fluorine or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, R2 and R3 may bond together to form a ring and in that event, each is an alkylene group of 1 to 20 carbon atoms which may contain a hetero atom such as oxygen, sulfur or nitrogen,
R4 and R5 each are hydrogen or fluorine,
R6 and R7 each are hydrogen, fluorine or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, at least one of R6 and R7 contains at least one fluorine atom, R6 and R7 may bond together to form a ring and in that event, each is a straight, branched or cyclic alkylene or fluorinated alkylene group of 1 to 20 carbon atoms, and
a is 0 or 1.
2. The polymer of claim 1 containing a group of the following general formula (1a):
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wherein R1 to R3 each are hydrogen, fluorine or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, R2 and R3 may bond together to form a ring and in that event, each is an alkylene group of 1 to 20 carbon atoms which may contain a hetero atom such as oxygen, sulfur or nitrogen, a is 0 or 1, and b is an integer of 1 to 4.
3. The polymer of claim 1 having a partial structure of any one of the following general formulae (2-1) to (2-5):
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wherein R0 is a group of formula (1) in claim 1 or a group of formula (1a) in claim 2,
R8 to R10 each are hydrogen, fluorine or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms,
R11 is a methylene group, oxygen atom or sulfur atom,
R12 and R13 each are hydrogen, methyl or CH2CO2R15,
R14 is a straight, branched or cyclic alkylene or fluorinated alkylene group of 1 to 20 carbon atoms,
R15 is a straight, branched or cyclic alkyl or substituted alkyl group of 1 to 20 carbon atoms, and
c is 0 or 1.
4. A resist composition comprising the polymer of claim 1.
5. A chemically amplified, positive resist composition comprising
(A) the polymer of any one of claims 1 to 3,
(B) an organic solvent, and
(C) a photoacid generator.
6. The resist composition of claim 5 further comprising (D) a basic compound.
7. The resist composition of claim 5 further comprising (E) a dissolution inhibitor.
8. A process for forming a resist pattern comprising the steps of:
applying the resist composition of claim 4 onto a substrate to form a coating,
heat treating the coating and then exposing it to high-energy radiation in a wavelength band of 100 to 180 nm or 1 to 30 nm through a photo mask, and
optionally heat treating the exposed coating and developing it with a developer.
9. The pattern forming process of claim 8 wherein the high-energy radiation is an F2 laser beam, Ar2 laser beam or soft x-ray.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A cleaning implement based on melamine-formaldehyde foam comprising hollow microspheres, wherein said hollow microspheres have a median particle diameter (D50, volume averaged, Malvern, Fraunhofer diffraction) in the range from 260 \u03bcm to 490 \u03bcm, and wherein the hollow microsphere are at least partly filled with a benefit agent.
2. The cleaning implement according to claim 1, wherein the hollow microsphere content is in the range from 0.1% to 60% by weight, wherein the % ages by weight are based on the total weight of hollow microspheres and melamine-formaldehyde precondensate used for foam production.
3. The cleaning implement according to claim 2, wherein the hollow microspheres are embedded into the open-cell pores of the foam structure.
4. The cleaning implement according to claim 3, wherein the hollow microsphere walls consist of a polymer or of an inorganic material.
5. The cleaning implement according to claim 4, wherein the hollow microsphere walls consist of glass.
6. The cleaning implement according to claim 5, wherein benefit agent is selected from the group consisting of a detergent composition; surfactants; dyes; inks; pigments; scents; acids; bases; oils; salts; bleach; antimicrobial agents; fragrances; solvents; biocides; hydrophobicizing agents; agents influencing haptics; agents influencing the soil release behavior; formaldehyde scavengers; abrasives such as inorganic nanoparticles; synthetic abrasives; or catalysts and mixtures thereof.
7. The use of cleaning implement based on melamine-formaldehyde foam comprising hollow microspheres according to claim 1 to clean a hard surface.