What is claimed is:
1. A method of producing a print medium that exhibits reduced bronzing comprising incorporating an additive into the print medium, wherein the additive increases a pH of the print medium.
2. The method of claim 1, wherein incorporating an additive into the print medium comprises incorporating an organic base or an inorganic base into the print medium.
3. The method of claim 1, wherein incorporating an additive into the print medium comprises incorporating the additive into a photographic print medium.
4. The method of claim 1, wherein incorporating an additive into the print medium comprises incorporating the additive into a wash coat.
5. The method of claim 1, wherein incorporating an additive into the print medium comprises mixing the additive into a coating formulation of the print medium.
6. The method of claim 1, wherein incorporating an additive into the print medium comprises incorporating at least one of 4-morpholineethane-sulfonic acid; bis(2-hydroxyethyl)imino-tris(hydroxymethyl)methane; N-(2-acetamido)imino-diacetic acid; N-(2-acetamido)-2-aminoethanesulfonic acid; piperazine-N,N-bis(2-ethanesulfonic acid); beta-hydroxy-4-morphol inepropanesulfonic acid; 1,3-bis(tris(hydroxymethyl)methylamino)-propane; N,N-bis(2-hydroxyethyl)-2-aminoethanesulfonic acid; 4-(N-morpholino)butanesulfonic acid; N-tris(hydroxymethyl)methyl-2-aminoethane sulfonic acid); N-(2-hydroxyethyl)piperazine-N-2-ethanesulfonic acid; N,N-bis(2-hydroxyethyl)-3-amino-2-hydroxypropanesulfonic acid; 4-morpholinepropanesulfonic acid; 3-(N-tris(hydroxymethyl )methylamino)-2-hydroxypropane-sulfonic acid; tris(hydroxymethyl)aminomethane; N-(2-hydroxyethyl)piperazine-N-(2-hydroxypropane-sulfonic acid)); piperazine-N,N-bis(2-hydroxypropanesulfonic acid)); triethanolamine; N-(2-hydroxyethyl)piperazine-N-(3-propanesulfonic acid); N-(tris(hydroxymethyl)methyl)glycine; glycyl-glycine; N,N-bis(2-hydroxyethyl)glycine; N-(2-hydroxyethyl)piperazine-N-(4-butanesulfonic acid); ((2-hydroxy-1,1-bis(hydroxymethyl)ethyl)amino)-1-propanesulfonic acid; 2-amino-2-methyl-1,3-propanediol; N-tris-(hydroxymethyl)methyl-4-aminobutanesulfonic acid; 3-((1,1-dimethyl-2-hydroxyethyl)amino)-2-hydroxypropanesulfonic acid; 2-(cyclohexylamino)ethanesulfonic acid; 3-(cyclohexylamino)-2-hydroxy-1-propanesulfonic acid; 2-amino-2-methylpropanol; 3-cyclohexylamino-1-propanesulfonic acid; 4-cyclohexylamino-1-butanesulfonic acid; sodium acetate; or sodium succinate into the print medium.
7. The method of claim 1, wherein incorporating an additive into the print medium comprises incorporating at least one of sodium bicarbonate, sodium carbonate, sodium borate, sodium phosphate, sodium acetate, sodium sulfite, sodium bisulfite, or sodium hydroxide into the print medium.
8. The method of claim 1, wherein incorporating an additive into the print medium comprises incorporating the additive into the print medium in an amount from approximately 0.001% by weight to approximately 20% by weight of a total coating formulation of the print medium.
9. The method of claim 1, wherein incorporating an additive into the print medium comprises homogenously incorporating the additive into the print medium.
10. A print medium comprising an additive selected from the group consisting of at least one of 4-morpholineethane-sulfonic acid; bis(2-hydroxyethyl)imino-tris(hydroxymethyl)methane; N-(2-acetamido)imino-diacetic acid; N-(2-acetamido)-2-aminoethanesulfonic acid; piperazine-N,N-bis(2-ethanesulfonic acid); beta-hydroxy-4-morpholinepropanesulfonic acid; 1,3-bis(tris(hydroxymethyl)methylamino)-propane; N,N-bis(2-hydroxyethyl)-2-aminoethanesulfonic acid; 4-(N-morpholino)butanesulfonic acid; N-tris(hydroxymethyl )methyl-2-aminoethane sulfonic acid); N-(2-hydroxyethyl)piperazine-N-2-ethanesulfonic acid; N,N-bis(2-hydroxyethyl)-3-amino-2-hydroxypropanesulfonic acid; 4-morpholinepropanesulfonic acid; 3-(N-tris(hydroxymethyl)methylamino)-2-hydroxypropane-sulfonic acid; tris(hydroxymethyl)aminomethane; N-(2-hydroxyethyl)piperazine-N-(2-hydroxypropane-sulfonic acid)); piperazine-N,N-bis(2-hydroxypropanesulfonic acid)); triethanolamine; N-(2-hydroxyethyl)piperazine-N-(3-propanesulfonic acid); N-(tris(hydroxymethyl)methyl)glycine; glycyl-glycine; N,N-bis(2-hydroxyethyl)glycine; N-(2-hydroxyethyl)piperazine-N-(4-butanesulfonic acid); ((2-hydroxy-11-bis(hydroxymethyl)ethyl)amino)-1-propanesulfonic acid; 2-amino-2-methyl-1,3-propanediol; N-tris-(hydroxymethyl)methyl-4-aminobutanesulfonic acid; 3-((1,1-dimethyl-2-hydroxyethyl)amino)-2-hydroxypropanesulfon ic acid; 2-(cyclohexylamino)ethanesulfonic acid; 3-(cyclohexylamino)-2-hydroxy-1-propanesulfonic acid; 2-amino-2-methylpropanol; 3-cyclohexylamino-1-propanesulfonic acid; 4-cyclohexylamino-1-butanesulfonic acid; sodium acetate; or sodium succinate into the print medium.
11. The print medium of claim 10, wherein the additive is in an amount in the print medium from approximately 0.001% by weight to approximately 20% by weight of a total coating formulation of the print medium.
12. A print medium comprising an additive selected from the group consisting of at least one of sodium bicarbonate, sodium carbonate, sodium borate, sodium phosphate, sodium acetate, sodium sulfite, sodium bisulfite, or sodium hydroxide into the print medium.
13. The print medium of claim 12, wherein the additive is in an amount in the print medium from approximately 0.001% by weight to approximately 20% by weight of a total coating formulation of the print medium.
14. A method of reducing bronzing in a printed image, comprising:
raising a pH of the print medium by incorporating an additive into the print medium; and
applying an image onto the print medium.
15. The method of claim 14, wherein raising a pH of the print medium comprises incorporating an inorganic or organic base into a photographic paper.
16. The method of claim 14, wherein raising a pH of the print medium comprises incorporating at least one of sodium bicarbonate, sodium carbonate, sodium borate, sodium phosphate, sodium acetate, sodium sulfite, sodium bisulfite, or sodium hydroxide into the print medium.
17. The method of claim 14, wherein raising a pH of the print medium comprises incorporating at least one of 4-morpholineethane-sulfonic acid; bis(2-hydroxyethyl)imino-tris(hydroxymethyl)methane; N-(2-acetamido)imino-diacetic acid; N-(2-acetamido)-2-aminoethanesulfonic acid; piperazine-N,N-bis(2-ethanesulfonic acid); beta-hydroxy-4-morpholinepropanesulfonic acid; 1,3-bis(tris(hydroxymethyl)methylamino)-propane; N,N-bis(2-hydroxyethyl)-2-aminoethanesulfonic acid; 4-(N-morpholino)butanesulfonic acid; N-tris(hydroxymethyl)methyl-2-aminoethane sulfonic acid); N-(2-hydroxyethyl)piperazine-N-2-ethanesulfonic acid; N,N-bis(2-hydroxyethyl)-3-amino-2-hydroxypropanesulfonic acid; 4-morpholinepropanesulfonic acid; 3-(N-tris(hydroxymethyl)methylamino)-2-hydroxypropane-sulfonic acid; tris(hydroxymethyl)aminomethane; N-(2-hydroxyethyl)piperazine-N-(2-hydroxypropane-sulfonic acid));
piperazine-N,N-bis(2-hydroxypropanesulfonic acid)); triethanolamine; N-(2-hydroxyethyl)piperazine-N-(3-propanesulfonic acid); N-(tris(hydroxymethyl)methyl)glycine; glycyl-glycine; N,N-bis(2-hydroxyethyl)glycine; N-(2-hydroxyethyl)piperazine-N-(4-butanesulfonic acid); ((2-hydroxy-1,1-bis(hydroxymethyl)ethyl)amino)-1-propanesulfonic acid; 2-amino-2-methyl-1,3-propanediol; N-tris-(hydroxymethyl)methyl-4-aminobutanesulfonic acid; 3-((11,1-dimethyl-2-hydroxyethyl)amino)-2-hydroxypropanesulfonic acid; 2-(cyclohexylamino)ethanesulfonic acid; 3-(cyclohexylamino)-2-hydroxy-1-propanesulfonic acid; 2-amino-2-methylpropanol; 3-cyclohexylamino-1-propanesulfonic acid; 4-cyclohexylamino-1-butanesulfonic acid; sodium acetate; or sodium succinate into the print medium.
18. The method of claim 14, wherein raising a pH of the print medium comprises incorporating from approximately 0.001% to approximately 20% by weight of the additive into the print medium.
19. The method of claim 14, wherein applying an image onto the print medium comprises applying a dye-based ihkjet ink onto the print medium.
20. A print medium having reduced bronzing, comprising:
at least one additive incorporated into the print medium, wherein the at least one additive is an organic base or inorganic base that increases a pH of the print medium.
21. The print medium of claim 20, wherein the at least one additive is selected from the group consisting of sodium bicarbonate, sodium carbonate, sodium borate, sodium phosphate, sodium acetate, sodium sulfite, sodium bisulfite, and sodium hydroxide.
22. The print medium of claim 20, wherein the at least one additive is selected from the group consisting of 4-morpholineethane-sulfonic acid; bis(2-hydroxyethyl)imino-tris(hydroxymethyl)methane; N-(2-acetamido)imino-diacetic acid; N-(2-acetamido)-2-aminoethanesulfonic acid; piperazine-N,N-bis(2-ethanesulfonic acid); beta-hydroxy-4-morpholinepropanesulfonic acid; 1,3-bis(tris(hydroxymethyl)methylamino)-propane; N,N-bis(2-hydroxyethyl)-2-aminoethanesulfonic acid; 4-(N-morpholino)butanesulfonic acid; N-tris(hydroxymethyl)methyl-2-aminoethane sulfonic acid); N-(2-hydroxyethyl)piperazine-N-2-ethanesulfonic acid; N,N-bis(2-hydroxyethyl)-3-amino-2-hydroxypropanesulfonic acid; 4-morpholinepropanesulfonic acid; 3-(N-tris(hydroxymethyl)methylamino)-2-hydroxypropane-sulfonic acid; tris(hydroxymethyl)aminomethane; N-(2-hydroxyethyl)piperazine-N-(2-hydroxypropane-sulfonic acid)); piperazine-N,N-bis(2-hydroxypropanesulfonic acid)); triethanolamine; N-(2-hydroxyethyl)piperazine-N-(3-propanesulfonic acid); N-(tris(hydroxymethyl)methyl)glycine; glycyl-glycine; N,N-bis(2-hydroxyethyl)glycine; N-(2-hydroxyethyl)piperazine-N-(4-butanesulfonic acid); ((2-hydroxy-1,1-bis(hydroxymethyl)ethyl)amino)-1-propanesulfonic acid; 2-amino-2-methyl-1,3-propanediol; N-tris-(hydroxymethyl)methyl-4-aminobutanesulfonic acid; 3-((1,1-dimethyl-2-hydroxyethyl)amino)-2-hydroxypropanesulfonic acid; 2-(cyclohexylamino)ethanesulfonic acid; 3-(cyclohexylamino)-2-hydroxy-1-propanesu Ifonic acid; 2-amino-2-methylpropanol; 3-cyclohexylamino-1-propanesulfonic acid; 4-cyclohexylamino-1-butanesulfonic acid; sodium acetate; and sodium succinate.
23. The print medium of claim 20, wherein the at least one additive is present in the print medium in an amount from approximately 0.001% to approximately 20% by weight of a total coating formulation.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A slurry system for an improved low-K oxidecopper chemical mechanical polishing (CMP) process with low solids content to avoid copper damascene sidewall erosion and to reduce CMP impact forces comprising:
an aqueous dispersion comprising particles, said particles comprising a first material having an elastomeric polymer outer surface, said first material surrounding a core comprising a second material, said second material different from said first material, said particles in said aqueous dispersion capable of exhibiting elastic behavior during the CMP process, said elastomeric polymer only on said particles in said aqueous dispersion;
said aqueous dispersion having a pH of between about 7.0 and about 10.0, and,
wherein said aqueous dispersion has a solids content of said particles of between about 0.5 and about 6.5 weight percent of the total weight of the aqueous dispersion.
2. The slurry system of claim 1, wherein the particles comprise a thermoplastic material.
3. The slurry system of claim 1, wherein the elastomeric polymer outer surface comprises a material selected from the group consisting of polyurethanes, neoprenes, silicones, fluorosilicones, fluorocarbon polymers, polysulfones, acrylic resins, polyacetals, saturated polyesters, polyamides, polyimides, polypropyilenes, phenol resins, urea resins, melamine resins, and epoxy resins.
4. The slurry system of claim 1, wherein the particles comprise an elastomeric polymer coating over a metal oxide.
5. The slurry system of claim 1, wherein the particles have a mean particle diameter of from about 20 nanometers to about 500 nanometers.
6. The slurry system of claim 1, wherein the particles have a mean particle diameter of from about 50 nanometers to about 200 nanometers.
7. The slurry system of claim 1, wherein the slurry system further comprises an additive selected from the group consisting of ammonium hydroxide (NH4OH), ammonia (NH3), and tetra methyl ammonium hydroxide (TMAH).
8. The slurry system of claim 1, further comprising a surfactant at about 0.01 weight percent to about 0.5 weight percent.
9. The slurry system of claim 8, wherein the surfactant is selected from the group consisting of fatty acids and their salts.
10. The slurry system of claim 9, wherein the surfactant includes at least one of a detergent and a soap.
11. The slurry system of claim 1, wherein the elastomeric polymer outer surface surrounds a core comprising an inorganic material.
12. A slurry system for an improved low-K oxidecopper chemical mechanical polishing (CMP) process to reduce copper damascene sidewall erosion comprising:
an alkaline aqueous dispersion comprising abrasive particles, said abrasive particles consisting essentially of particles comprising a first material having an elastomeric polymer outer surface, said first material surrounding a core comprising a second material, said second material different from said first material, said abrasive particles in said alkaline aqueous dispersion capable of exhibiting elastic behavior during the CMP process, said elastomeric polymer only on said particles in said alkaline aqueous dispersion.
13. The slurry system of claims 12 wherein said alkaline aqueous dispersion has a pH of between about 7.0 and about 10.0.
14. The slurry system of claims 12 wherein said alkaline aqueous dispersion has a solids content of said particles of between about 0.5 and about 6.5 weight percent of the total weight of the aqueous dispersion.
15. The slurry system of claim 12, wherein the particles comprise a thermoplastic material.
16. The slurry system of claim 12, wherein the elastomeric polymer outer surface comprises a material selected from the group consisting of polyurethanes, neoprenes, silicones, fluorosilicones, fluorocarbon polymers, polysulfones, acrylic resins, polyacetals, saturated polyesters, polyamides, polyimides, polypropylenes, phenol resins, urea resins, melamine resins, and epoxy resins.
17. The slurry system of claim 12, wherein the particles comprise an elastomeric polymer coating over a metal oxide.
18. The slurry system of claim 12, wherein the abrasive particles have a mean particle diameter of from about 20 nanometers to about 500 nanometers.
19. The slurry system of claim 12, wherein the abrasive particles have a mean particle diameter of from about 50 nanometers to about 200 nanometers.
20. The slurry system of claim 12, wherein the slurry system further comprises an additive selected from the group consisting of ammonium hydroxide (NH4OH), ammonia (NH3), and tetra methyl ammonium hydroxide (TMAH).
21. The slurry system of claim 12, further comprising a surfactant at about 0.01 weight percent to about 0.5 weight percent.
22. The slurry system of claim 21, wherein the surfactant is selected from the group consisting of fatty acids and their salts.
23. The slurry system of claim 12, wherein the elastomeric polymer outer surface surrounds a core comprising an inorganic material.
24. A slurry system for an improved low-K oxidecopper chemical mechanical polishing (CMP) process to reduce copper damascene sidewall erosion comprising:
an alkaline aqueous dispersion comprising abrasive particles, said abrasive particles consisting essentially of particles comprising a first material having an elastomeric polymer outer surface, said first material surrounding a core comprising a second material, said second material different from said first material, said abrasive particles in said alkaline aqueous dispersion capable of exhibiting elastic behavior during the CMP process, said elastomeric polymer only on said particles in said alkaline aqueous dispersion;
wherein said alkaline aqueous dispersion has a pH of between about 7.0 and about 10.0, and,
wherein said alkaline aqueous dispersion has a solids content of said particles of between about 0.5 and about 6.5 weight percent of the total weight of the aqueous dispersion.
25. The slurry system of claim 24, wherein the particles comprise a thermoplastic material.
26. The slurry system of claim 24, wherein the elastomeric polymer outer surface comprises a material selected from the group consisting of polyurethanes, neoprenes, silicones, fluorosilicones, fluorocarbon polymers, polysulfones, acrylic resins, polyacetals, saturated polyesters, polyamides, polyimides, polypropylenes, phenol resins, urea resins, melamine resins, and epoxy resins.
27. The slurry system of claim 24, wherein the abrasive particles comprise an elastomeric polymer coating over a metal oxide.
28. The slurry system of claim 24, wherein the abrasive particles have a mean particle diameter of from about 20 nanometers to about 500 nanometers.
29. The slurry system of claim 24, wherein the slurry system further comprises an additive selected from the group consisting of ammonium hydroxide (NH4OH), ammonia (NH3), and tetra methyl ammonium hydroxide (TMAH).
30. The slurry system of claim 24, further comprising a surfactant selected from the group consisting of fatty acids and their salts.
31. The slurry system of claim 24, further comprising a surfactant at about 0.01 weight percent to about 0.5 weight percent.
32. The slurry system of claim 31, wherein the surfactant is selected from the group consisting of fatty acids and their salts.
33. The slurry system of claim 24, wherein the elastomeric polymer outer surface surrounds a core comprising an inorganic material.