What is claimed is:
1. A method of preparing a cold confectionery, said method comprising:
foaming a mixture to have an overrun in the range of 150% to 500%; and
cooling said mixture to a temperature of not higher than 10 C.
2. The method as claimed in claim 1, wherein said mixture is foamed by using, as foaming agents, saccharose fatty acid ester in the range of 0.005 percents by weight to 0.2 percents by weight in combination with polyglycerin fatty acid ester in the range of 0.005 percents by weight to 0.2 percents by weight.
3. The method as claimed in claim 2, wherein said saccharose fatty acid ester has not less than 70 percents by weight of mono-ester content, and not less than 90 percents by weight of bonded fatty acids thereof comprise at least one fatty acid selected from the group consisting of caprylate, caprate, laurate, and myristate, and
wherein said polyglycerin fatty acid ester has not less than 70 percents by weight of mono-ester content, and not less than 90 percents by weight of bonded fatty acids thereof comprise at least one fatty acid selected from the group consisting of laurate and myristate, and polyglycerin of said polyglycerin fatty acid ester comprises one of hexaglycerin and decaglycerin.
4. The method as claimed in claim 2 or 3, wherein a substance obtained by hydrolyzing a protein is used as an additional foaming agent in combination with said foaming agent.
5. The method as claimed in any one of claims 2-4, wherein at least one of saponin and sodium alginate is used as a foamable agent in combination with said foaming agent.
6. The method as claimed in any one of claims 2-5, wherein at least one of stabilizers with low molecule weights is used for supporting foamability.
7. The method as claimed in any one of claims 2-6, wherein foaming said mixture is completed in a temperature range over a freezing point, and subsequently said mixture is frozen.
8. A cold confectionery including a cold mixture foamed with an overrun in the range of 150% to 500%.
9. The cold confectionery as claimed in claim 8, wherein said cold mixture includes, as foaming agents, saccharose fatty acid ester in the range of 0.005 percents by weight to 0.2 percents by weight in combination with polyglycerin fatty acid ester in the range of 0.005 percents by weight to 0.2 percents by weight.
10. The cold confectionery as claimed in claim 9, wherein said saccharose fatty acid ester has not less than 70 percents by weight of mono-ester content, and not less than 90 percents by weight of bonded fatty acids thereof comprise at least one fatty acid selected from the group consisting of caprylate, caprate, laurate, and myristate, and
wherein said polyglycerin fatty acid ester has not less than 70 percents by weight of mono-ester content, and not less than 90 percents by weight of bonded fatty acids thereof comprise at least one fatty acid selected from the group consisting of laurate and myristate, and polyglycerin of said polyglycerin fatty acid ester comprises one of hexaglycerin and decaglycerin.
11. The cold confectionery as claimed in claim 9 or 10, wherein said cold mixture further includes a substance obtained by hydrolyzing a protein as an additional foaming agent in combination with said foaming agent.
12. The cold confectionery as claimed in any one of claims 9-11, wherein said cold mixture further includes at least one of saponin and sodium alginate as a foamable agent in combination with said foaming agent.
13. The cold confectionery as claimed in any one of claims 9-12, wherein said cold mixture further includes at least one of stabilizers with low molecule weights for supporting foamability.
14. The cold confectionery as claimed in any one of claims 8-13, said cold mixture has a temperature of not higher than 10 C.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A lithographic apparatus comprising:
an illumination system configured to condition a beam of radiation;
a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation;
a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate;
a projection system configured to project the patterned beam of radiation onto the substrate; and
a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals, ions or both on the support surface of the substrate holder to remove contamination therefrom, wherein the cleaning system is located in an area of the apparatus in which an atmosphere of hydrogen is maintained, and wherein the cleaning unit includes
a housing including a plurality of openings and an outlet in communication with a vacuum unit, the plurality of openings enabling gas communication between the atmosphere of hydrogen and an interior of the housing, and
a plasma generator arranged in the interior of the housing and configured to create a plasma of hydrogen to generate hydrogen radicals, the atmosphere of hydrogen configured to act as a supply of hydrogen for the plasma generator.
2. The apparatus of claim 1, wherein the beam of radiation has a wavelength in the extreme ultraviolet range.
3. The apparatus of claim 1, wherein the plasma generator includes a RF electrode, a DC discharge electrode or a RF coil.
4. The apparatus of claim 1, wherein the housing, in use, is positioned proximate the substrate holder to generate the radicals on at least a portion of the support surface.
5. The apparatus of claim 4, wherein the housing is constructed and arranged to substantially cover an entire area defined by the support surface.
6. The apparatus of claim 1, wherein, in use, the substrate holder and the cleaning unit are movable relative to each other.
7. The apparatus of claim 6, wherein the cleaning unit is movable along a direction substantially perpendicular to the support surface.
8. The apparatus of claim 1, wherein the cleaning system further comprises a contamination detection system configured to detect contamination on the support surface and a controller in communication with the contamination detection system and the cleaning unit, the controller configured to control a position of the cleaning unit, the substrate holder, or both, based on a result of detection of the contamination detection system.
9. The apparatus of claim 1, wherein the housing is made of a mesh material.
10. The apparatus of claim 1, wherein the cleaning unit includes a high temperature element located within a flow of hydrogen, the temperature of the high temperature element being sufficient to cause thermal dissociation to create the radicals.
11. The apparatus of claim 1, wherein the radicals include oxygen radicals.
12. The apparatus of claim 1, wherein the housing is formed with an enclosure made of metal.
13. A device manufacturing method comprising:
conditioning a beam of radiation;
patterning the beam of radiation to form a patterned beam of radiation;
projecting the patterned beam of radiation onto a substrate, the substrate supported by a support surface of a substrate holder; and
generating radicals, ions or both on the support surface of the substrate holder to remove contamination therefrom, said generating includes
supplying hydrogen to an interior of a housing by maintaining an atmosphere of hydrogen in an area where the substrate holder is located, and
producing a plasma of hydrogen within the housing to generate hydrogen radicals.
14. The method of claim 13, wherein the beam of radiation has a wavelength in the extreme ultraviolet range.
15. The method of claim 13, wherein the housing is made of a mesh material.
16. The method of claim 13, wherein the plasma is produced with a RF electrode, a DC discharge electrode or a RF coil.
17. The method Of claim 13, further comprising moving the housing, the substrate holder, or both, to position the housing proximate the substrate holder so as to generate the radicals on at least a portion of the support surface.
18. The method of claim 17, wherein the housing is constructed and arranged to substantially cover an entire area defined by the support surface.
19. The method of claim 13, further comprising detecting contamination of the support surface and, based on the detecting, controlling a position of the cleaning unit, the substrate holder, or both , to position the housing proximate the substrate holder so as to generate the radicals on at least a portion of the support surface.
20. The method of claim 13, wherein the radicals include oxygen radicals.
21. The method of claim 13, wherein the housing is formed with an enclosure made of metal.