1. A film forming method comprising:
a first step of converting a natural oxide film on a silicon substrate into a volatile material;
a second step of evaporating the volatile material; and
a third step of growing a composite film of silicon and germanium on the silicon substrate from which the natural oxide film is removed.
2. The film forming method according to claim 1, wherein, in the first step, the natural oxide film reacts with an ammonium fluoride gas to be converted into volatile ammonium fluorosilicate.
3. The film forming method according to claim 1, wherein the first step is performed while maintaining the temperature of the silicon substrate at 100\xb0 C. or less.
4. The film forming method according to claim 1, where the second step heats the silicon substrate to 100\xb0 C. or more.
5. A film forming apparatus comprising:
a first processing chamber including a reactant gas supply unit that supplies a reactant gas for converting a natural oxide film on a silicon substrate into a volatile material and a heating unit that heats the silicon substrate;
a second processing chamber including a raw gas supply unit that supplies a raw gas for growing a composite film of silicon and germanium on the silicon substrate; and
a substrate transport chamber that transports the silicon substrate between the processing chambers in a controlled atmosphere.
6. A film forming apparatus comprising:
a first processing chamber including a reactant gas supply unit that supplies a reactant gas for converting a natural oxide film on a silicon substrate into a volatile material;
a second processing chamber including a heating unit that heats the silicon substrate;
a third processing chamber including a raw gas supply unit that supplies a raw gas for growing a composite film of silicon and germanium on the silicon substrate; and
a substrate transport chamber that transports the silicon substrate among the processing chambers in a controlled atmosphere.
7. A film forming apparatus comprising:
A processing chamber including a reactant gas supply unit that supplies a reactant gas for converting a natural oxide film on a silicon substrate into a volatile material, a heating unit that heats the silicon substrate, and a raw gas supply unit that supplies a raw gas for growing a composite film of silicon and germanium on the silicon substrate.
8. The film forming apparatus according to claim 5, wherein the reactant gas supply unit includes a nitrogen trifluoride gas supply unit and a hydrogen radical supply unit.
9. The film forming apparatus according to claim 6, wherein the reactant gas supply unit includes a nitrogen trifluoride gas supply unit and a hydrogen radical supply unit.
10. The film forming apparatus according to claim 7, wherein the reactant gas supply unit includes a nitrogen trifluoride gas supply unit and a hydrogen radical supply unit.
11. The film forming apparatus according to claim 5, wherein the heating unit heats the silicon substrate to 100\xb0 C. or more.
12. The film forming apparatus according to claim 6, wherein the heating unit heats the silicon substrate to 100\xb0 C. or more.
13. The film forming apparatus according to claim 7, wherein the heating unit heats the silicon substrate to 100\xb0 C. or more.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed:
1. A trap comprising:
first and second co-acting jaws for pivotally engaging a member of a captured animal, wherein the first and second jaws are configured for pivotal displacement between an opened position and a closed position;
at least one lever loaded with a biasing force for loading the first and second jaws into the closed position, wherein the at least one lever experiences torsional deformation when loaded;
a retaining arrangement for retaining the first jaw in the opened position, wherein the retaining arrangement releases the loaded first and second jaws upon actuation;
a leveling structure for providing first and second contact surfaces for the at least one lever so as to accommodate the torsional deformation and thereby provide level contact surfaces for the respective first and second jaws.
2. The trap of claim 1 wherein the leveling structure is a raised portion formed onto the at least one lever.
3. The trap of claim 1 wherein the leveling structure is a set screw for allowing adjustable setting of the leveling structure.
4. The trap of claim 1 wherein the at least one lever comprises first and second hinges, wherein the hinges include respective first and second holes such that the second hole is formed lower than the first hole, so as to anticipate the torsional deformation and thereby provide level contact surfaces of the levers for the first and second jaws.
5. The trap of claim 1 wherein the at least one lever comprises two levers on opposing sides and wherein a leveling structure is fashioned on each lever on an opposite side from the respective other lever.
6. The trap of claim 1 wherein the retaining arrangement includes a dog that is laid over the top of the loaded first jaw, and a pan which enables the release of the loaded jaws upon actuation such that the dog is placed over the top of the loaded first jaw and the end of the dog is engages the pan so as to releasably retain the jaws in the opened position.