1. A maintenance-free respirator that comprises:
(a) a mask harness; and
(b) a mask body that includes at least one layer of filter media, the mask body having a perimeter that includes an upper segment that comprises first and second concave segments that are located, respectively, on first and second sides of a central plane when viewing the mask body from a top view.
2. The maintenance-free respirator of claim 1, wherein the mask body can be folded flat and includes a plurality of panels, the panel that resides over the nose and beneath the wearer’s eyes, when the respirator is being worn, having the upper segment that comprises the first and second concave segments.
3. The maintenance-free respirator of claim 1, wherein the perimeter has five inflection points located on the upper segment of the perimeter.
4. The maintenance-free respirator of claim 1, wherein the slope of a line tangent to the upper segment of the perimeter includes both a negative and a positive slope in the first and second concave segments.
5. The maintenance-free respirator of claim 1, wherein a chord line that extends across each of the first and second concave segments has a length of about 3 to 7 centimeters.
6. The maintenance-free respirator of claim 1, wherein a chord line that extends across each of the first and second concave segments has a length of about 4 to 6 centimeters.
7. The maintenance-free respirator of claim 6, wherein a chord line that extends across each of the first and second concave segments has a length of about 5 centimeters.
8. The maintenance-free respirator of claim 6, wherein the path length of the first and second concave segments is greater than the chord length by about 1 to 3 millimeters.
9. The maintenance-free respirator of claim 1, wherein each of the first and second concave segments have a depth d that is about 2 to 11 millimeters.
10. The maintenance-free respirator of claim 1, wherein each of the first and second concave segments have a depth d that is about 4 to 9 millimeters.
11. The maintenance-free respirator of claim 1, wherein each of the first and second concave segments have a depth d that is about 5 to 7 millimeters.
12. The maintenance-free respirator of claim 1, wherein the mask body comprises a stiffening layer, a filtration layer, and a cover web.
13. The maintenance-free respirator of claim 1, wherein the mask body comprises a filtration layer, a shaping layer, and a cover web.
14. A mask body that comprises at least one filtration layer and that has a perimeter that includes an upper segment that has first and second concave segments that are located, respectively, on first and second sides of a central plane when viewing the mask body from a top view.
15. The mask body of claim 14, wherein the upper segment has five inflection points located thereon.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of manufacturing a display device, comprising:
forming a thin film transistor on a substrate including a plurality of pixel areas;
forming a pixel electrode connected to the thin film transistor in the pixel area;
forming a sacrificial layer on the pixel electrode;
forming a barrier layer on the sacrificial layer;
forming a common electrode on the barrier layer;
forming a roof layer on the common electrode;
patterning the barrier layer, the common electrode, and the roof layer to expose a portion of the sacrificial layer, thereby forming an injection hole;
removing the sacrificial layer to form a microcavity for a plurality of pixel areas;
removing the barrier layer;
injecting a liquid crystal into the microcavity through the injection hole; and
forming an encapsulation layer on the roof layer to seal the microcavity,wherein the barrier layer is made of metal or metal oxide having a different etching rate from the common electrode.
2. The method of claim 1, wherein
the barrier layer is made of a material having a different etching rate from the common electrode.
3. The method of claim 1, wherein
the barrier layer is made of one of zinc-aluminum oxide (ZAO), gallium-zinc oxide (GZO), and copper.
4. The method of claim 3, wherein
the common electrode is made of indium-zinc oxide (IZO).
5. The method of claim 1, wherein
the barrier layer is formed with a thinner thickness than the common electrode.
6. The method of claim 5, wherein
the thickness of the barrier layer is 50 \u212b or more.
7. The method of claim 1, wherein
the sacrificial layer is made of a photosensitive organic material, and
removing the sacrificial layer includes supplying a developer through the injection hole to remove the sacrificial layer.
8. The method of claim 7, wherein removing the barrier layer includes supplying an etchant through the injection hole to remove the barrier layer.
9. The method of claim 1, wherein
the sacrificial layer is formed with the same pattern as the barrier layer.
10. The method of claim 1, further comprising:
forming a gate line and a gate pad connected to the gate line on the substrate;
forming a gate insulating layer on the gate line and the gate pad;
forming a data line and a data pad connected to the data line on the gate insulating layer; and
forming a passivation layer on the data line and the data pad,
wherein a portion of the thin film transistor is connected to the gate line and another portion of the thin film transistor is connected to the data line.
11. The method of claim 10, further comprising
patterning the passivation layer and the gate insulating layer to remove at least a portion of the gate insulating layer and the passivation layer positioned on the gate pad and at least a portion of the passivation layer positioned on the data pad,
wherein forming the pixel electrode includes,
forming a first assistance gate pad on the gate pad and forming a first assistance data pad on the data pad, and
forming the first assistance gate pad and the second assistance data pad with the same material as the pixel electrode.
12. The method of claim 11, further comprising
patterning the sacrificial layer to remove a portion of the sacrificial layer positioned on the first assistance gate pad and the first assistance data pad,
wherein forming the barrier layer includes forming a second assistance gate pad on the first assistance gate pad and forming a second assistance data pad on the first assistance data pad, and
forming the second assistance gate pad and the second assistance data pad with the same material as the barrier layer.
13. The method of claim 12, wherein
forming the common electrode includes forming a third assistance gate pad on the second assistance gate pad and a third assistance data pad is formed on the second assistance data pad, and
forming the third assistance gate pad and the third assistance data pad with the same material as the common electrode.