1. An aircraft light comprising:
a light source;
a reflector housing;
a support frame;
a light aiming assembly connecting said reflector housing to said support frame, said light aiming assembly comprising a plurality of adjustment elements extending between said support frame and said reflector housing, each of said plurality of adjustment elements including a joint pivotally supporting said reflector housing, at least one of said plurality of adjustment elements being movable along a movement axis;
at least one of said joints being formed as a ball-type joint, said ball-type joint including a clamping portion that slidingly engages said reflector housing along a plane substantially orthogonal to the movement axis of said adjustment element; and
means for applying a predetermined clamping force between the clamping portion of said ball-type joint and said reflector housing.
2. The aircraft light of claim 1, wherein said ball-type joint comprises two opposed outer ring elements having concave inner sides, two inner ring elements respectively arranged adjacent to said outer ring elements and having convex outer sides in abutment with the inner sides of said outer ring elements, and a receiving opening arranged between said inner ring elements, wherein said adjustment element extends through an assembly comprising said ring elements and said receiving opening.
3. The aircraft light of claim 2, further comprising two thrust washer elements disposed between and adjacent to said inner ring elements.
4. The aircraft light of claim 1, wherein:
the predetermined clamping force is sufficient to prevent detectable vibration but below that which would prevent sliding engagement between the clamping portion of said ball-type joint and said reflector housing
5. The aircraft light of claim 1, wherein said adjustment element comprises a screw having a threaded engagement with said support frame and said ball-type joint is axially secured to said screw.
6. The aircraft light of claim 1, wherein said light aiming assembly comprises three adjustment elements arranged at a respective displacement radially disposed along an arc distal of a central illumination axis of said light source and disposed substantially 120\xb0 relative to each other, said adjustment elements being guided on a support frame in an extendable and retractable manner along movement axes oriented along a common movement direction, said reflector housing, via said three ball-type joints, being supported on said adjustment elements in a tiltable manner with sliding engagement between said ball-type joints and said mounting element, the sliding engagement being in a direction substantially orthogonal to the direction of said movement axes.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method for forming a growth mask on the surface of an initial crystalline substrate, comprising the following steps:
formation of a layer of second material on one of the faces of the initial substrate of first material,
formation of a pattern in the thickness of the layer of second material so as to expose zones of said face of the initial substrate, said zones forming growth windows on the initial substrate,
the method being characterised in that the formation of the pattern is obtained by ion implantation carried out in the surface layer of the initial substrate underlying the layer of second material, the implantation conditions being such that they cause, directly or after a heat treatment, on said face of the initial substrate, the appearance of exfoliated zones of first material leading to the localised removal of the zones of second material covering the exfoliated zones of first material, thereby locally exposing the initial substrate and forming growth windows on the initial substrate.
2. The method for forming a mask according to claim 1, wherein the formation of the layer of second material is obtained by oxidation of the face of the substrate of first material.
3. The method for forming a mask according to claim 1, wherein the formation of the layer of second material is formed by deposition of the second material on a face of the initial substrate of first material.
4. A method for forming at least one crystalline thin film on an initial crystalline substrate, comprises comprising the following steps:
formation of a growth mask on at least one face of an initial crystalline substrate of first material according to claim 1,
formation of a crystalline thin film of third material on the face(s) of the substrate comprising the mask(s).
5. The method for forming at least one thin film according to claim 4, wherein the formation of the thin film of third material is carried out by lateral growth of the third material from growth windows on the initial substrate.
6. The method for forming at least one thin film according to claim 4, wherein the first material and the third material are identical.
7. A method for forming a crystalline thin film, comprising the following steps:
formation of a crystalline thin film on a face of an initial crystalline substrate of first material comprising a growth mask of second material according to claim 4,
detachment of the crystalline thin film from the initial crystalline substrate.
8. The method for forming a thin film according to claim 7, wherein the detachment of the thin film from the initial substrate is obtained by the application of mechanical andor chemical stresses.
9. A method for transferring a crystalline thin film onto a host substrate, said method comprising the following steps:
formation of a crystalline thin film of third material on a face of an initial crystalline substrate of first material comprising a growth mask of second material according to claim 4,
bringing into contact and adhesion of the crystalline thin film on a face of a host substrate,
detachment of the crystalline thin film from the initial crystalline substrate so as to separate the initial substrate from the host substrate, the host substrate supporting the crystalline thin film.
10. The method for transferring a crystalline thin film onto a host substrate according to claim 9, wherein the adhesion of the thin film on a face of a host substrate is obtained by forming an adhesion layer on the thin film andor on the host substrate.
11. The method for transferring a crystalline thin film onto a host substrate according to claim 9, wherein the adhesion of the thin film on a face of a host substrate is obtained through bonding by molecular adhesion.
12. The method for transferring a crystalline thin film onto a host substrate according to claim 9, wherein the step of detachment of the thin film is carried out by applying mechanical andor chemical stresses.
13. The method for transferring a crystalline thin film onto a host substrate according to claim 9, wherein it further comprises, after the step of formation of the crystalline thin film, a step of chemical attack of the growth mask of second material.