1. A method of depositing a low resistivity material onto a substrate, the method comprising:
directing a precursor gas comprising a methylated or ethylated metal toward the substrate surface;
irradiating the substrate surface with an ion beam in the presence of the precursor gas, the precursor gas dissociating in the presence of the particle beam to deposit a low resistivity material on the substrate surface.
2. The method of claim 1 in which the ion beam is a gallium ion beam and in which the deposited material contains gallium and a metal dissociated from the precursor gas.
3. The method of claim 1 in which the precursor gas comprises hexamethylditin.
4. The method of claim 1 in which the precursor gas comprises methyl tin trichloride, hexaethylditin, or hexabutylditin.
5. The method of claim 1 in which the deposited material has a resistivity of less than 120 \u03bc\u03a9\xb7cm.
6. The method of claim 1 in which the deposited low resistivity material has a resistivity of less than 80 \u03bc\u03a9\xb7cm.
7. The method of claim 1 in which the deposited low resistivity material has a resistivity of less than 50 \u03bc\u03a9\xb7cm.
8. The method of claim 1 in which the deposited material is Ohmic.
9. The method of claim 2 in which the deposited material has a resistivity within a factor of 5 of the bulk metal.
10. The method of claim 3 in which the particle beam is a gallium ion beam, in which the metal dissociated from the precursor gas comprises tin, and in which the deposited material comprises tin and gallium.
11. The method of claim 10 in which the deposited material is at least 95% tin.
12. The method of claim 11 in which the deposited material has a resistivity of less than 50 \u03bc\u03a9\xb7cm.
13. The method of claim 1 in which the ion beam comprises a gallium focused ion beam.
14. The method of claim 1 in which the ion beam comprises a focused ion beam produced using a plasma source.
15. The method of claim 14 in which the focused ions are xenon, argon, or helium ions.
16. The method of claim 1 in which the ion beam is produced using a mass-selected ion source.
17. A method of depositing a low resistivity material onto a substrate, the method comprising:
directing a precursor gas comprising hexamethylditin toward the substrate surface;
irradiating the substrate surface with a gallium ion beam in the presence of the precursor gas, the precursor gas reacting in the presence of the particle beam to deposit material on the substrate surface, said deposited material containing tin and gallium and having a resistivity of less than 120 \u03bc\u03a9\xb7cm.
18. The method of claim 17 in which the deposited material is at least 95% tin.
19. The method of claim 17 in which the deposited material containing tin and gallium has a resistivity of less than 50 \u03bc\u03a9\xb7cm.
20. A method of beam induced deposition:
directing a precursor gas toward a substrate surface;
irradiating the substrate surface with a gallium ion beam in the presence of the precursor gas, the precursor gas reacting in the presence of the gallium ion beam to deposit a material on the substrate surface, the deposited material comprising a eutectic composition or solid solution of gallium and a metal dissociated from the precursor gas.
21. The method of claim 20 in which the precursor gas comprises a methylated or ethylated metal.
22. The method of claim 20 in which the precursor gas comprises hexamethylditin.
23. The method of claim 20 in which the precursor gas comprises methyl tin trichloride, hexaethylditin, or hexabutylditin.
24. The method of claim 20 in which the deposited material has a resistivity of less than 120 \u03bc\u03a9\xb7cm.
25. The method of claim 20 in which the deposited low resistivity material has a resistivity of less than 50 \u03bc\u03a9\xb7cm.
26. The method of claim 20 in which the precursor gas comprises tin and in which the precursor gas is mixed with a compound including oxygen to deposit a tin oxide on the substrate surface.
27. The method of claim 20 in which the precursor gas comprises tin and in which the precursor gas is mixed with a compound including nitrogen to deposit a tin nitride on the substrate surface.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A polymer represented by the formula (X):
where the dotted line indicates an optional double bond; x is 0 or 1; R1 and R2 can be the same or different and each is a hydrocarbyl group having from one to twenty carbon atoms; R3 and R4 can be the same or different and each is hydrogen or a hydrocarbyl group having from one the forty carbon atoms or R3 and R4 may be represented by the formula (X) above, provided R3 and R4 may be joined to form a five-membered or six-membered ring; and n is an integer from 1 to 100.
2. The polymer of claim 1, wherein each of R1 and R2 is an alkyl group having from one to twelve carbon atoms.
3. The polymer of claim 1, wherein each of R1 and R2 is an alkyl group having one to six carbon atoms.
4. The polymer of claim 1, wherein each of R3 and R4 is hydrogen or a C1 to C20 hydrocarbyl group.
5. The polymer of claim 1, wherein R3 is hydrogen and R4 is an ethylidene group.
6. The polymer of claim 1, wherein each pentane ring is saturated.
7. The polymer of claim 1, wherein R3 and R4 form a cyclic group.
8. The polymer of claim 1, wherein R1 and R2 can be the same or different and each is a hydrocarbyl group having from 1 to 12 carbon atoms; R3 and R4 can be the same or different and each is hydrogen or a hydrocarbyl group having from 1 to 20 carbon atoms, provided R3 and R4 may be joined to form a five-membered or six-membered ring; and n is an integer from 1 to 60.
9. The polymer of claim 1, wherein R1 is a C5-9 hydrocarbyl and R2 is a C5-9 hydrocarbyl.
10. The polymer of claim 1, wherein R3 and R4 form cyclopentene andor cyclopentane.
11. A process for producing the polymer of claim 1, the process comprising contacting at least one C5 based cyclic olefin with at least one linear mono-olefin having from two to twenty carbon atoms in the presence of an alkene metathesis catalyst.
12. The process of claim 11, wherein the linear mono-olefin has from four to twelve carbon atoms.
13. The process of claim 11, wherein the linear mono-olefin is an alpha olefin.
14. The process of claim 11, wherein the linear mono-olefin has an internal olefin.
15. The process of claim 14, wherein the internal olefin is a cis-isomer.
16. The process of claim 11, wherein the alkene metathesis catalyst is selected from (1-cyclohexylmethyl-3-(2,6-diisopropylphenyl)-4,5-dihydro-1H-imadazole) ruthenium (II) chloride and 2-(2,6-diethylphenyl)-3,3,5,5-tetramethylpyrrolidine2-(i-propoxy)-5-(N,N-dimethylaminosulfonyl)phenylmethylene ruthenium dichloride.
17. The process of claim 11, wherein the cyclic olefin is selected from the group consisting of norbornene, norbornadiene, ethylidene norbornene, dicyclopentadiene, and vinyl norbornene.
18. The process of claim 11, wherein the linear mono-olefin is selected from the group consisting of pentene, hexene, octene, and decene.
19. The process of claim 11, wherein the alkene metathesis catalyst is represented by the Formula (I):
where:
M is a Group 8 metal;
X and X1 are, independently, any anionic ligand, or X and X1 may be joined to form a dianionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
L and L1 are neutral two electron donors, L and L1 may be joined to form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
L and X may be joined to form a bidentate monoanionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
L1 and X1 may be joined to form a multidentate monoanionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
R and R1 are, independently, hydrogen or C1 to C30 substituted or unsubstituted hydrocarbyl;
R1 and L1 or X1 may be joined to form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms; and
R and L or X may be joined to form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
20. The process of claim 19, wherein:
M is Ru or Os;
X and X1 are, independently, a halogen, an alkoxide or a triflate, or X and X1 may be joined to form a dianionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
L and L1 are, independently, a phosphine or a N-heterocyclic carbene, L and L1 may be joined to form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system, of up to 30 non-hydrogen atoms;
L and X may be joined to form a multidentate monoanionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
L1 and X1 may be joined to form a multidentate monoanionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
R and R1 are, independently, hydrogen or a C1 to C30 substituted or unsubstituted alkyl or a substituted or unsubstituted C4 to C30 aryl;
R1 and L1 or X1 may be joined to form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms; and
R and L or X may be joined to form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms.
21. The process of claim 11, wherein the alkene metathesis catalyst is one or more of: tricyclohexylphosphine1,3-bis(2,4,6-trimethylphenyl)imidazol-2-ylidene3-phenyl-1H-inden-1-ylideneruthenium(II) dichloride, tricyclohexylphosphine3-phenyl-1H-inden-1-ylidene1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydro-imidazol-2-ylideneruthenium(II) dichloride, tricyclohexylphosphine1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidene(phenylthio)methyleneruthenium(II) dichloride, bis(tricyclohexylphosphine)-3-phenyl-1H-inden-1-ylideneruthenium(II) dichloride, 1,3-Bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidene2-(i-propoxy)-5-(N,N-dimethylaminosulfonyl)phenylmethyleneruthenium(II) dichloride, 1,3-Bis(2,4,6-trimethylphenyl)-2-imidazolidinylidene-2-(4-methylphenyl)iminomethyl-4-nitrophenolyl-3-phenyl-1H-inden-1-ylideneruthenium(II) chloride, benzylidene-bis(tricyclohexylphosphine)dichlororuthenium, benzylidene1,3-bis(2,4,6-trimethylphenyl)-2-imidazolidinylidenedichloro(tricyclohexylphosphine)ruthenium, dichloro(o-isopropoxyphenylmethylene)(tricyclohexylphosphine)ruthenium(II), (1,3-Bis-(2,4,6-trimethylphenyl)-2-imidazolidinylidene)dichloro(o-isopropoxyphenylmethylene)ruthenium, 1,3-Bis(2-methylphenyl)-2-imidazolidinylidenedichloro(2-isopropoxyphenylmethylene) ruthenium(II), 1,3-Bis(2,4,6-trimethylphenyl)-2-imidazolidinylidenedichloro3-(2-pyridinyl)propylideneruthenium(II), 1,3-Bis(2-methylphenyl)-2-imidazolidinylidenedichloro(phenylmethylene) (tricyclohexylphosphine)ruthenium(II), 1,3-Bis(2,4,6-trimethylphenyl)-2-imidazolidinylidenedichloro(3-methyl-2-butenylidene) (tricyclohexylphosphine)ruthenium(II), 1,3-Bis(2,4,6-trimethylphenyl)-2-imidazolidinylidenedichloro(benzylidene)bis(3-bromopyridine)ruthenium(II), 2-(2,6-diethylphenyl)-3,5,5,5-tetramethylpyrrolidine2-(i-propoxy)-5-(N,N-dimethylaminosulfonyl)phenylmethylene ruthenium dichloride, 2-(mesityl)-3,3,5,5-tetramethylpyrrolidine2-(i-propoxy)-5-(N,N-dimethylaminosulfonyl)phenylmethylene ruthenium dichloride; 2-(2-isopropyl)-3,3,5,5-tetramethylpyrrolidine2-(i-propoxy)-5-(N,N-dimethylaminosulfonyl)phenylmethylene ruthenium dichloride, and 2-(2,6-diethyl-4-fluorophenyl)-3,3,5,5-tetramethylpyrrolidine2-(i-propoxy)-5-(N,N-dimethylaminosulfonyl)phenylmethylene ruthenium dichloride.
22. The process of claim 1, wherein the alkene metathesis catalyst is represented by the formula:
wherein:
M is a Group 8 metal;
each X is independently an anionic ligand;
R1 and R2 are independently selected from the group consisting of hydrogen, a C1 to C30 hydrocarbyl, and a C1 to C30 substituted hydrocarbyl;
R3 and R4 are independently selected from the group consisting of hydrogen, C1 to C12 hydrocarbyl groups, substituted C1 to C12 hydrocarbyl groups, and halides; and
L is a neutral donor ligand.
23. The process of claim 1, wherein the alkene metathesis catalyst is represented by the formula:
where:
M* is a Group 8 metal;
X* and X1* are, independently, any anionic ligand or X* and X1* may be joined to form a dianionic group and may form a single ring of up to 30 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms;
L* is N\u2014R**, O, P\u2014R**, or S, (R** is a C1 to C30 hydrocarbyl or substituted hydrocarbyl);
R* is hydrogen or a C1 to C30 hydrocarbyl or substituted hydrocarbyl;
R1*, R2*, R3*, R4*, R5*, R6*, R7*, and R8* are, independently, hydrogen or a C1 to C30 hydrocarbyl or substituted hydrocarbyl;
each R9* and R13* are, independently, hydrogen or a C1 to C30 hydrocarbyl or substituted hydrocarbyl;
R10*, R11*, R12* are, independently hydrogen or a C1 to C30 hydrocarbyl or substituted hydrocarbyl;
each G, is, independently, hydrogen, halogen or C1 to C30 substituted or unsubstituted hydrocarbyl; and
where any two adjacent R groups may form a single ring of up to 8 non-hydrogen atoms or a multinuclear ring system of up to 30 non-hydrogen atoms.
24. The process of claim 1, wherein the alkene metathesis catalyst is represented by the formula:
where:
n is a linking group comprising from one to four ring vertices selected from the group consisting of C, Si, N, P, O, and S, with available valences optionally occupied by H, oxo, hydrocarbyl, or substituted hydrocarbyl groups;
each E is independently selected from the group comprising C, N, S, O, and P, with available valences optionally occupied by Lx, Ly, Lz, and Lz; and
Lx, Ly, Lz, and Lz\u2032 are independently selected from the group comprising hydrogen, hydrocarbyl groups, and substituted hydrocarbyl groups.
25. A lubricant or lubricant base stock comprising the polymer of claim 1.
26. The polymer of claim 1, wherein the polymer has been hydrogenated or functionalized.
27. A lubricant or lubricant base stock comprising the polymer of claim 26.