1. A measurement system comprising:
an irradiation unit configured to irradiate a measurement target with predetermined pattern light at a predetermined incident angle;
a reception unit configured to receive, at a reflection angle substantially equal to the incident angle, reflected light of the pattern light irradiating the measurement target;
a first extraction unit configured to extract information about a surface shape of the measurement target in a region irradiated with the pattern light, based on a shift amount between a light receiving position of the reflected light received by said reception unit, and a predetermined reference position;
a second extraction unit configured to extract, as information about a scattering characteristic of the measurement target in the region irradiated with the pattern light, information about a luminance value of the reflected light received by said reception unit, and information indicating a spread of the pattern light upon reflection by the measurement target; and
a control unit configured to control the pattern light emitted by said irradiation unit to have an interval at which outer edges of adjacent patterns are in contact with each other in an image obtained by receiving the reflected light by said reception unit on the basis of the information about the scattering characteristic of the measurement target that is extracted by said second extraction unit.
2. The system according to claim 1, wherein
the pattern light includes pattern light beams having different phases,
said control unit controls pattern light emitted by said irradiation unit to make adjacent patterns having different phases overlap each other in an image obtained by receiving the reflected light by said reception unit, and
said reception unit receives pattern light beams of respective phases that have been emitted by said irradiation unit at timings corresponding to the respective phases.
3. The system according to claim 1, wherein
the pattern light includes pattern light beams having different wavelength components or different polarization components,
said control unit controls pattern light emitted by said irradiation unit to make adjacent patterns having different wavelength components or different polarization components overlap each other in an image obtained by receiving the reflected light by said reception unit, and
said reception unit receives the pattern light beams for respective wavelength components or respective polarization components.
4. The system according to claim 1, wherein the pattern light includes one of dot pattern light having a predetermined diameter, and stripe pattern light having a predetermined width.
5. The system according to claim 4, wherein said second extraction unit extracts, as the information indicating a spread of the pattern light, one of a dot diameter of the dot pattern light and a stripe width of the stripe pattern light.
6. The system according to claim 5, further comprising a setting unit configured to set focus positions at a plurality of different positions in a reflection direction of the reflected light of the pattern light,
wherein said second extraction unit extracts, as the information indicating a spread of the pattern light, one of an enlargement ratio obtained by comparing dot diameters of the dot pattern light at the respective focus positions, and an enlargement ratio obtained by comparing stripe widths of the stripe pattern light.
7. A measurement processing method in a measurement system, the method comprising the steps of:
causing an irradiation unit to irradiate a measurement target with predetermined pattern light at a predetermined incident angle;
causing a reception unit to receive, at a reflection angle substantially equal to the incident angle, reflected light of the pattern light irradiating the measurement target;
causing a first extraction unit to extract information about a surface shape of the measurement target in a region irradiated with the pattern light, based on a shift amount between a light receiving position of the reflected light received in the step of causing a reception unit to receive reflected light, and a predetermined reference position;
causing a second extraction unit to extract, as information about a scattering characteristic of the measurement target in the region irradiated with the pattern light, information about a luminance value of the reflected light received in the step of causing a reception unit to receive reflected light, and information indicating a spread of the pattern light upon reflection by the measurement target; and
causing a control unit to control the pattern light emitted by the irradiation unit to have an interval at which outer edges of adjacent patterns are in contact with each other in an image obtained by receiving the reflected light by said reception unit on the basis of the information about the scattering characteristic of the measurement target that is extracted in the step of causing a second extraction unit to extract information.
8. A control program stored in a computer-readable storage medium for causing a computer to execute steps of a measurement processing method defined in claim 7.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A system that facilitates performance of operations associated with a memory, comprising:
a memory array associated with the memory that contains a plurality of memory cells; and
an optimized voltage component that supplies a predetermined source bitline voltage to a source bitline associated with at least one memory cell during an operation performed on the at least one memory cell.
2. The system of claim 1, the operation is a program operation, and the predetermined source bitline voltage is a positive voltage bias that is greater than zero volts.
3. The system of claim 2, the predetermined source bitline voltage is greater than 0.5 volts.
4. The system of claim 1, the optimized voltage component supplies a predetermined drain bitline voltage to a drain bitline associated with the at least one memory cell and a predetermined wordline voltage to a wordline associated with the at least one memory cell.
5. The system of claim 4, the predetermined source bitline voltage is based in part on at least one of the predetermined drain bitline voltage or the predetermined wordline voltage, or a combination thereof.
6. The system of claim 1, the predetermined source bitline voltage is determined based in part on at least one of characteristics associated with the plurality of memory cells or a type of the plurality of memory cells, or a combination thereof.
7. The system of claim 1, the plurality of memory cells are each a non-floating gate type of nonvolatile memory cell.
8. The system of claim 7, the plurality of memory cells are formed of an oxide layer, a silicon rich nitride layer, a polysilicon layer, another silicon rich nitride layer, and another oxide layer, wherein charge is stored in the polysilicon and silicon rich nitride layers to facilitate data storage.
9. The system of claim 1, the plurality of memory cells are each a floating gate type of nonvolatile memory cell.
10. The system of claim 1, further comprising:
a host processor that generates commands to facilitate performance of operations in the memory, the host processor is associated with the memory; and
a presentation component that facilitates displaying data read from the memory and receiving data input to the presentation component.
11. The system of claim 1, the plurality of memory cells are nonvolatile memory cells.
12. An electronic device comprising the system of claim 1.
13. The electronic device of claim 12, the electronic device is at least one of a computer, a cellular phone, a digital phone, a video device, a smart card, a personal digital assistant, a television, an electronic game, a digital camera, an electronic organizer, an audio player, an audio recorder, an electronic device associated with digital rights management, a Personal Computer Memory Card International Association (PCMCIA) card, a trusted platform module (TPM), an electronic control unit associated with a motor vehicle, a global positioning satellite (GPS) device, an electronic device associated with an airplane, an electronic device associated with an industrial control system, a Hardware Security Module (HSM), a set-top box, a secure memory device with computational capabilities, or an electronic device with at least one tamper-resistant chip.
14. A method that facilitates programming associated with a memory, comprising:
supplying a predetermined source voltage to at least one memory cell in the memory; and
programming data to the at least one memory cell based in part on the predetermined source voltage.
15. The method of claim 14, further comprising:
generating at least one command;
supplying the predetermined source voltage to the at least one memory cell based in part on the at least one command; and
supplying a predetermined drain voltage to the at least one memory cell based in part on the at least one command.
16. The method of claim 15, further comprising:
supplying a predetermined gate voltage to the at least one memory cell based in part on the at least one command;
programming data to the at least one memory cell, the at least one command is associated with a program operation; and
removing at least one of the predetermined source voltage, predetermined drain voltage, or the predetermined gate voltage, or a combination thereof.
17. The method of claim 16, the programming data to the at least one memory cell further comprising programming based in part on channel hot electron injection to facilitate programming the data.
18. The method of claim 14, the supplying a predetermined source voltage to at least one memory cell in the memory, further comprising supplying a positive source voltage to the at least one memory cell.
19. The method of claim 14, the supplying a predetermined source voltage to at least one memory cell in the memory, further comprising supplying a positive source voltage of at least 0.5 volts to the at least one memory cell.
20. The method of claim 14, the predetermined source voltage is based in part on at least one of the predetermined drain voltage or the predetermined gate voltage, or a combination thereof.