We claim:
1. A photolithography mask for optically transferring a pattern formed in said mask onto a substrate, said mask comprising:
a plurality of resolvable features to be printed on said substrate; and
a non-resolvable optical proximity correction feature disposed between two of said plurality of resolvable features, said non-resolvable optical proximity correction feature having a transmission coefficient in the range of greater than 0% to less than 100%.
2. The photolithography mask of claim 1, wherein said non-resolvable optical proximity correction feature has a width dimension which is less than the width of a space separating said two of said plurality of resolvable features.
3. The photolithography mask of claim 2, wherein said non-resolvable optical proximity correction feature is disposed in the center of the space separating said two of said plurality of resolvable features.
4. The photolithography mask of claim 1, further comprising a plurality of said non-resolvable optical proximity correction features, wherein one of said non-resolvable optical proximity correction features is placed between multiple pairs of said resolvable features.
5. The photolithography mask of claim 4, wherein said non-resolvable optical proximity correction features function to minimize the increase in a second order diffraction component of said mask.
6. The photolithography mask of claim 4, wherein said non-resolvable optical proximity correction features function to reduce an isofocal inflection point associated with a given set of said resolvable features.
7. The photolithography mask of claim 1, wherein said mask is illuminated utilizing off-axis illumination.
8. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a photolithography mask for optically transferring a pattern formed in said mask onto a substrate, said mask comprising:
a plurality of resolvable features to be printed on said substrate; and
a non-resolvable optical proximity correction feature disposed between two of said plurality of resolvable features, said non-resolvable optical proximity correction feature having a transmission coefficient in the range of greater than 0% to less than 100%.
9. The computer program product of claim 8, wherein said non-resolvable optical proximity correction feature has a width dimension which is less than the width of a space separating said two of said plurality of resolvable features.
10. The computer program product of claim 8, wherein said non-resolvable optical proximity correction feature is disposed in the center of the space separating said two of said plurality of resolvable features.
11. The computer program product of claim 8, wherein said mask further comprises a plurality of said non-resolvable optical proximity correction features, wherein one of said non-resolvable optical proximity correction features is placed between multiple pairs of said resolvable features.
12. The computer program product of claim 11, wherein said non-resolvable optical proximity correction features function to minimize the increase in a second order diffraction component of said mask
13. The computer program product of claim 11, wherein said non-resolvable optical proximity correction features function to reduce an isofocal inflection point associated with a given set of said resolvable features.
14. The computer program product of claim 8, wherein said mask is illuminated utilizing off-axis illumination.
15. A method of transferring a lithographic pattern from a photography mask onto a substrate by use of a lithographic exposure apparatus, said method comprising the steps of:
forming a plurality of resolvable features to be printed on said substrate; and
forming at least one non-resolvable optical proximity correction feature, said at least one non-resolvable optical proximity correction feature having a transmission coefficient in the range of greater than 0% to less than 100%.
16. The method of claim 15, wherein said non-resolvable optical proximity correction feature has a width dimension which is less than the width of a space separating said two of said plurality of resolvable features.
17. The method of claim 15, wherein said non-resolvable optical proximity correction feature is disposed in the center of the space separating said two of said plurality of resolvable features.
18. The method of claim 15, further comprising the step of forming one of said non-resolvable optical proximity correction features between multiple pairs of said resolvable features.
19. The method of claim 18, wherein said non-resolvable optical proximity correction features function to minimize the increase in a second order diffraction component of said mask.
20. The method of claim 18, wherein said non-resolvable optical proximity correction features function to reduce an isofocal inflection point associated with a given set of said resolvable features.
21. The method of claim 15, wherein said mask is illuminated utilizing off-axis illumination.
22. A device manufacturing method comprising the steps of:
(a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
(b) providing a projection beam of radiation using a radiation system;
(c) using a pattern on a mask to endow the projection beam with a pattern in its cross-section;
(d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material,
wherein, in step (c), use is made of a mask comprising:
a plurality of resolvable features to be printed on said substrate; and
a non-resolvable optical proximity correction feature disposed between two of said plurality of resolvable features, said non-resolvable optical proximity correction feature having a transmission coefficient in the range of greater than 0% to less than 100%.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1-33. (canceled)
34. A sealing mechanism for sealing an aperture, comprising:
a flange with an interface defining an entrance aperture;
a first drive shaft;
a second drive shaft;
a drive source for driving said first drive shaft;
left and right drive elements, each separately connected to said first drive shaft and said second shaft;
left and right linear rails, each separately located on opposing sides of said entrance aperture;
left and right door linkages, each pivotally attached to a door, said left and right door linkages each being respectively received by said left and right linear rails and respectively connected to said left and right drive elements, wherein relative motion between said door and said entrance aperture is obtained by driving said left and right drive elements in one of two opposing directions;
pivoting left and right cams, each respectively attached to said left and right door linkages; and
left and right cam latches, each located on opposing sides of said entrance aperture and sized to respectively receive said left and right cams, wherein respective contact between said left end right cam latches and said left and right cams cause said door to travel inwardly at an angle relative to the direction of travel of said door, causing said door to ultimately contact an outer edge of said entrance aperture.
35. The sealing mechanism according to claim 34, further comprising:
a seal formed on said outer edge and facilitating contact with said door.
36. The sealing mechanism according to claim 34, wherein said left and right drive elements each comprise a belt.
37. A sealing mechanism for sealing an entrance aperture to isolate an inspection system, said sealing mechanism comprising:
a flange with an interface defining the entrance aperture;
a first drive shaft;
a second drive shaft;
a first drive element coupled to said first drive shaft and said second shaft;
a first linear rail positioned on a first side of the entrance aperture;
a first door linkage pivotally coupled to a door, said first door linkage coupled to said first linear rail and coupled to said first drive element, wherein relative motion of said door with respect to the entrance aperture is obtained by driving said first drive element in one of a first direction and an opposing second direction;
a first pivoting cam coupled to said first door linkage; and
a first cam latch positioned on said first side of the entrance aperture and sized to receive said first pivoting cam, wherein contact between said first cam latch and said first pivoting cam urges said door to move inwardly at an angle relative to a direction of movement of said door, urging said door to contact an outer edge of said interface defining the entrance aperture.
38. The sealing mechanism according to claim 37, further comprising:
a seal formed on said outer edge and facilitating contact with said door.
39. The sealing mechanism according to claim 37, wherein said first drive element comprises a belt.
40. The sealing mechanism according to claim 37, further comprising:
a drive source for driving said first drive shaft;
41. The sealing mechanism according to claim 37, wherein said first door linkage comprises:
a carriage link;
a first control arm coupled to said carriage link at a first end of said carriage link;
a clamp coupled to said first drive element, and said first control arm pivotally coupled to said clamp.
42. The sealing mechanism according to claim 41, wherein said first control arm further comprises:
a first pin coupling said carriage link to said first control arm; and
a second pin pivotally coupling said door to said first control arm.
43. The sealing mechanism according to claim 41, wherein said first door linkage further comprises:
a first carriage slidably engaging said first linear rail, and said carriage link coupled to said first carriage.
44. The sealing mechanism according to claim 41, wherein said first door linkage further comprises:
a second control arm coupled to said carriage link at an opposing second end of said carriage link; and
a turnbuckle pivotally coupled to said second control arm, and operatively coupling said first control arm to said second control arm.
45. The sealing mechanism according to claim 44, wherein said first door linkage further comprises:
a second carriage slidably engaging said first linear rail, and said carriage link coupled to said second carriage.
46. The sealing mechanism according to claim 41, wherein said first door linkage further comprising:
a bracket coupled to said carriage link; and
a spring coupled between said first control arm and said bracket.
47. The sealing mechanism according to claim 41, wherein said first door linkage further comprising:
a cam spring coupled between said first control arm and said carriage link.
48. The sealing mechanism according to claim 41, wherein said first pivoting cam is pivotally positioned within a recess formed in said carriage link, said first pivoting cam forming an open end engageable with said first cam latch to urge an inner surface of said door to contact a seal formed on said outer edge.
49. A method for sealing an entrance aperture defined by an interface to isolate an inspection system, said method comprising:
coupling a door to a first drive element with a first door linkage, the first door linkage coupled to a first linear rail positioned on a first side of the entrance aperture;
driving a first drive shaft in a first rotational direction to move the first drive element about the first drive shaft and a cooperating second drive shaft; and
engaging a first pivoting cam coupled to the first door linkage with a cam latch positioned on the first side of the entrance aperture to urge the door to move inwardly at an angle relative to a direction of movement of the door, urging the door to contact an outer edge of the interface defining the entrance aperture.