1. A semiconductor device, comprising:
a function block comprising a plurality of transistors;
a temperature detector configured to detect a driving temperature of the function block in real time; and
an adaptive body bias generator configured to provide a body bias voltage to adaptively adjust leakage currents of the transistors according to the detected driving temperature,
wherein the adaptive body bias generator is further configured to generate the body bias voltage corresponding to a predetermined minimum leakage current according to the driving temperature.
2. The semiconductor device of claim 1, wherein the adaptive body bias generator is further configured to store level information of the body bias voltage which corresponds to the driving temperature, such that the predetermined minimum leakage current is minimized.
3. The semiconductor device of claim 1, wherein the temperature detector is further configured to sense the driving temperature and output a temperature code of binary data as a result of the sensing, and wherein
the adaptive body bias generator comprises:
a look-up table configured to provide a level code of the body bias voltage corresponding to the temperature code; and
a voltage generator configured to generate the body bias voltage according to the level code provided from the look-up table.
4. The semiconductor device of claim 1, wherein the temperature detector is further configured to sense the driving temperature to provide an analog type of a temperature signal.
5. The semiconductor device of claim 4, wherein the adaptive body bias generator comprises:
a function generator configured to generate a continuous function type of the body bias voltage based on the temperature signal.
6. The semiconductor device of claim 5, wherein the function generator is further configured to generate the body bias voltage according to the temperature signal, and the body bias voltage is generated based on a continuous linear function on the temperature signal.
7. The semiconductor device of claim 6, wherein the function generator comprises a register for setting a slope and an intercept of the continuous linear function.
8. The semiconductor device of claim 7, wherein the slope or the intercept is set according to process parameters of the transistors.
9. A body bias method of a semiconductor device, comprising:
detecting a driving temperature of the semiconductor device;
generating a body bias voltage for adjusting leakage currents of a plurality of transistors included in the semiconductor device at the driving temperature; and
providing the body bias voltage to the transistors of the semiconductor device.
10. The body bias method of claim 9, wherein upon detecting the driving temperature of the semiconductor device, the driving temperature is provided using an analog type of a temperature signal.
11. The body bias method of claim 10, wherein during generating the body bias voltage, the body bias voltage is generated as a continuous linear function based on the temperature signal.
12. The body bias method of claim 11, wherein an intercept and a slope of the continuous linear function are set according to process characteristics of the semiconductor device.
13. The body bias method of claim 9, wherein during detecting the driving temperature of the semiconductor device, the driving temperature is provided using a digital type of a temperature code.
14. The body bias method of claim 13, wherein the generating the body bias voltage comprises:
generating a level code corresponding to the temperature code; and
generating the body bias voltage according to the level code.
15. The body bias method of claim 14, wherein the level code corresponding to the temperature code is provided from a look-up table.
16. The body bias method of claim 9, wherein the body bias voltage has level information which corresponds to the driving temperature, such that the leakage currents of the transistors are minimized.
17. A system on chip, comprising:
a plurality of function blocks;
a temperature detector configured to detect a respective driving temperature of each of the function blocks in real time; and
a body bias generator configured to generate a respective body bias voltage to adaptively adjust leakage currents of each of the function blocks according to the respective driving temperature.
18. The system on chip of claim 17, wherein the body bias generator is further configured to generate the respective body bias voltage having a predetermined level according to the respective driving temperature of each of the function blocks.
19. The system on chip of claim 18, wherein the temperature detector comprises:
a plurality of temperature sensors configured to sense a plurality of respective temperatures of the function blocks.
20. The system on chip of claim 19, wherein the body bias generator is further configured to generate a plurality of body bias voltages which have different levels, according to the respective driving temperatures of each of the function blocks.
21. The system on chip of claim 18, wherein the respective body bias voltage having the predetermined level during a test enables the leakage currents to be minimized at the respective driving temperature.
22. The system on chip of claim 17, wherein the leakage currents correspond to a static leakage current flowing in a drain terminal of a transistor included in each of the function blocks.
23. The system on chip of claim 17, wherein the temperature detector configured to detect the respective driving temperature of each of the function blocks comprises at least one temperature sensor.
24. A function block comprising:
at least one NMOS transistor configured to receive a NMOS bias voltage from an adaptive body bias generator;
at least one PMOS transistor configured to receive a PMOS bias voltage from the adaptive body bias generator; and
a temperature detector configured to detect a driving temperature of the function block in real time and provide the detected driving temperature to the adaptive body bias generator.
25. The function block of claim 24, wherein the function block, the adaptive body bias generator, the at least one NMOS transistor, and the at least one PMOS transistor are provided with a driving voltage.
26. The function block of claim 24, wherein the adaptive body bias generator comprises a look-up table and a voltage generator for converting the detected driving temperature to a body bias voltage.
27. The function block of claim 24, wherein the adaptive body bias generator comprises a function generator for converting the detected driving temperature to a body bias voltage.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A cosmetic composition comprising, in an aqueous medium,
at least one anionic surfactant in an amount ranging from 1% to 35% by weight, relative to the total weight of the composition,
at least one compound chosen from cyclodextrins and derivatives thereof in an amount ranging from 1% to 15% by weight, relative to the total weight of the composition, and
at least one salt chosen from ammonium (NH4+) salts and salts of monovalent or divalent metals and of a mineral acid or of an organic acid comprising from 1 to 7 carbon atoms in an amount ranging from 0.1% to 10% by weight, relative to the total weight of the composition.
2. The composition according to claim 1, wherein the at least one compound is chosen from \u03b1-cyclodextrin, \u03b2-cyclodextrin, and \u03b3-cyclodextrin, and derivatives thereof.
3. The composition according to claim 2, wherein the at least one compound is chosen from \u03b2-cyclodextrin and \u03b3-cyclodextrin.
4. The composition according to claim 1, wherein the at least one compound is present in an amount ranging from 1% to 10% by weight, relative to the total weight of the final composition.
5. The composition according to claim 4, wherein the at least one compound is present in an amount ranging from 1.5% to 5% by weight, relative to the total weight of the final composition.
6. The composition according to claim 1, wherein the at least one anionic surfactant and the at least one compound are present in amounts effective to allow the formation of an insoluble complex in the composition, andor to make the composition nacreous.
7. The composition according to claim 1, wherein the salts of monovalent or divalent metals are chosen from alkali metal salts, alkaline-earth metal salts, and transition metal salts.
8. The composition according to claim 7, wherein the salts of monovalent or divalent metals are chosen from lithium, sodium, potassium, magnesium, calcium, strontium, barium, manganese, cobalt, and zinc salts, and mixtures thereof.
9. The composition according to claim 8, wherein the metal salts are chosen from sodium, potassium, magnesium, calcium, manganese, and zinc salts, and mixtures thereof.
10. The composition according to claim 1, wherein the mineral or organic acids are chosen from carbonates, bicarbonates, sulfates, glycerophosphates, borates, chlorides, nitrates, acetates, hydroxy acids, fruit acids, and amino acids.
11. The composition according to claim 1, wherein the at least one salt is chosen from sodium chloride, potassium chloride, calcium chloride, magnesium sulfate, magnesium gluconate, calcium gluconate, and sodium citrate.
12. The composition according to claim 11, wherein the at least one salt is sodium chloride.
13. The composition according to claim 1, wherein the at least one salt is present in an amount ranging from 0.5% to 5% by weight, relative to the total weight of the composition.
14. The composition according to claim 1, wherein the at least one anionic surfactant is present in an amount ranging from 4% to 35% by weight, relative to the total weight of the composition.
15. The composition according to claim 14, wherein the at least one anionic surfactant is present in an amount ranging from 8% to 30% by weight, relative to the total weight of the composition.
16. The composition according to claim 1, further comprising at least one conditioning agent.
17. The composition according to claim 16, wherein the at least one conditioning agent is chosen from poly-\u03b1-olefins, fluoro oils, fluoro waxes, fluoro gums, carboxylic acid esters, silicones, cationic polymers, mineral, plant and animal oils, ceramides, pseudoceramides, and mixtures thereof.
18. The composition according to claim 16, wherein the at least one conditioning agent is present in an amount ranging from 0.001% to 10% by weight, relative to the total weight of the composition.
19. The composition according to claim 18, wherein the at least one conditioning agent is present in an amount ranging from 0.005% to 5% by weight, relative to the total weight of the composition.
20. The composition according to claim 19, wherein the at least one conditioning agent is present in an amount ranging from 0.01% to 3% by weight, relative to the total weight of the composition.
21. The composition according to claim 1, wherein the cosmetic composition is in a form chosen from a gel, a milk, a cream, a lotion, and a mousse.
22. The composition according to claim 1, wherein the cosmetic composition is a foaming detergent composition.
23. The composition according to claim 22, wherein the foaming detergent composition is chosen from shampoos, shower gels, and bubble baths.
24. The composition according to claim 1, wherein the composition is chosen from rinse-out and leave-in conditioning compositions; permanent-waving, relaxing, dyeing and bleaching compositions; compositions to be applied before or after dyeing, bleaching, permanent-waving and relaxing the hair; and compositions to be applied between the two steps of a permanent-waving or hair-relaxing operation.
25. A method for treating keratin materials, comprising:
applying to the keratin materials a cosmetic composition comprising, in an aqueous medium,
at least one anionic surfactant in an amount ranging from 1% to 35% by weight, relative to the total weight of the composition,
at least one compound chosen from cyclodextrins and derivatives thereof in an amount ranging from 1% to 15% by weight, relative to the total weight of the composition, and
at least one salt chosen from ammonium (NH4+) salts and salts of monovalent or divalent metals and of a mineral acid or of an organic acid comprising from 1 to 7 carbon atoms in an amount ranging from 0.1% to 10% by weight, relative to the total weight of the composition; and
optionally rinsing the keratin materials with water.
26. A method for making a cosmetic composition for treating keratin materials, comprising including at least one salt chosen from ammonium (NH4+) salts and salts of a monovalent or divalent metal cation in a composition comprising at least one anionic surfactant and at least one compound chosen from cyclodextrins and derivatives thereof, wherein the at least one salt acts as an agent for suspending a complex formed from the at least one compound and the at least one surfactant.