1. A system for using regenerative suspension to perform a task, comprising:
a hydraulic shock configured for the pressurization of fluid upon the absorption of variations on a driving surface;
a hydraulic accumulator functionally situated and configured to receive all fluid pressurized by said hydraulic shock; and
a valve,
wherein said pressurized fluid is controllably released from said hydraulic accumulator via said valve in order to perform a task.
2. The system of claim 1, wherein said pressurized fluid is controllably released from said hydraulic accumulator when the pressure within said hydraulic accumulator reaches a threshold.
3. The system of claim 2, wherein said threshold is at least 1000 psi.
4. The system of claim 2, wherein said task is to rotate a hydraulic motor, wherein said hydraulic motor is mechanically coupled to an electric generator, wherein said electric generator is configured to charge a power supply.
5. The system of claim 4, wherein said pressurized fluid returns to a reservoir in communication with said hydraulic shock.
6. The system of claim 2, wherein said task is to turn an axle of a vehicle.
7. The system of claim 2, wherein said task is to directly power hydraulic machinery.
8. The system of claim 2, wherein said task is to turn a power take off shaft.
9. The system of claim 2, wherein said task is to power an air compressor.
10. The system of claim 2, wherein said task is to supercharge or turbocharge a vehicle.
11. A system for using regenerative suspension to charge a power supply, comprising:
a double acting fluid cylinder configured for the pressurization of fluid upon the compression of said double acting fluid cylinder;
a cylindrical hydraulic accumulator functionally situated and configured to receive all fluid pressurized by said double acting fluid cylinder; and
a solenoid valve,
wherein said solenoid valve is controllably opened when the pressure within said hydraulic accumulator reaches a threshold,
wherein said pressurized fluid rotates a hydraulic motor,
wherein said hydraulic motor is configured to rotate the shaft of an electric generator, and
wherein said electric generator is configured to charge a battery.
12. The system of claim 11, further comprising a one-way valve functionally situated between said hydraulic shock and said hydraulic accumulator.
13. A system for using regenerative suspension to charge a power supply, comprising:
a suspension system;
a motion converter configured to convert linear motion to rotary motion; and
an energy storage element configured to store rotational energy,
wherein linear motion from said suspension system is converted to rotary motion by said motion converter;
wherein said rotary motion is stored as rotational energy in said energy storage element,
wherein said rotational energy is controllably released from said energy storage element,
wherein said rotational energy rotates an alternator, and
wherein said alternator is configured to charge a battery.
14. A system for using regenerative suspension to charge a power supply, comprising:
a pneumatic shock configured for the pressurization of air upon the absorption of variations on a driving surface;
an air storage tank functionally situated and configured to receive all air pressurized by said pneumatic shock; and
a valve,
wherein said pressurized air is controllably released from said air storage tank via said valve in order to rotate an air motor, wherein said air motor is mechanically coupled to an electric generator, wherein said electric generator is configured to charge a power supply.
15. A method, comprising:
absorbing variations on a driving surface to compress a hydraulic shock and pressurize fluid;
delivering all fluid pressurized by said hydraulic shock to a hydraulic accumulator; and
opening a valve when the pressure of said pressurized fluid within said hydraulic accumulator reaches a threshold.
16. The method of claim 15, further comprising the steps of:
rotating a hydraulic motor with said pressurized fluid, wherein said hydraulic motor is mechanically coupled to an electric generator; and
charging a power supply with said electric generator.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A phase shift mask comprising:
a substrate having a main surface with a portion provided with a recess; and
a shielding film deposited on said main surface, wherein:
said recess includes an undercut formed such that said shielding film partially serves an eaves;
said shielding film includes a first main opening exposing said portion of said recess, a second main opening exposing said main surface of said substrate, and a first subopening exposing a portion of an end of said recess underlying said first main opening;
said recess has said end formed to be geometrically substantially similar to said first main opening; and
said first main opening is located within a region provided with said recess;
first light, having passed through said first main opening, and second light, having passed through said second main opening are shifted in wavelength substantially by one half.
2. The phase shift mask according to claim 1, wherein:
said first main opening has one straight side substantially parallel to said end of said recess exposed through the first subopening.
3. The phase shift mask according to claim 2, wherein said one side of said first main opening and said end of said recess exposed through said first subopening are spaced by a distance larger than that between said one side of said first main opening and said first subopening’s end closer to said first main opening and smaller than that between said one side of said first main opening and said first subopening’s end farther from said first main opening.
4. The phase shift mask according to claim 1, wherein said first subopening is in communication with said first main opening.
5. The phase shift mask according to claim 1, wherein said first main opening and said first subopening are located outer than an exposure region employed to form a pattern on a wafer.
6. The phase shift mask according to claim 1, wherein more than one said first subopening are provided.
7. The phase shift mask according to claim 6, wherein:
said first main opening has a plurality of sides; and
said first subopening is provided to correspond to each of at least two of said plurality of sides.
8. The phase shift mask according to claim 1, wherein:
said shielding film has a second subopening;
said first and second subopenings are aligned along one side of said first main opening; and
said first and second subopenings as seen along said one side recede gradually farther away from said first main opening.
9. The phase shift mask according to claim 8, wherein:
said first and second subopenings have ends, respectively, defined at at least one of a location closer to said first main opening and that farther from said first main opening, and mutually offset relative to said one side of said first main opening; and
said first and second subopenings have said ends mutually offset by an amount substantially constant in length.
10. The phase shift mask according to claim 1, wherein:
said shielding film has a second subopening;
said first and second subopenings are aligned along one side of said first main opening; and
said second subopening is different in length from said first subopening in a direction substantially perpendicular to said one side of said first main opening.
11. The phase shift mask according to claim 10, wherein:
said first and second subopenings have ends, respectively, defined at at least one of a location closer to said first main opening and that farther from said first main opening, and mutually offset relative to said one side of said first main opening; and
said first and second subopenings have said ends mutually offset by an amount substantially constant in length.
12. The phase shift mask according to claim 1, wherein:
said shielding film includes a second subopening;
said first and second subopenings are aligned along one side of said first main opening;
said first main opening and said first subopening’s end closer to said first main opening are spaced by a first distance; and
said first main opening and said second subopening’s end closer to said first main opening are spaced by a second distance different from said first distance.
13. The phase shift mask according to claim 12, wherein:
said first and second subopenings have ends, respectively, defined at at least one of a location closer to said first main opening and that farther from said first main opening, and mutually offset relative to said one side of said first main opening; and
said first and second subopenings have said ends mutually offset by an amount substantially constant in length.
14. The phase shift mask according to claim 1, wherein:
said shielding film includes a second subopening;
said first and second subopenings are aligned along one side of said first main opening;
said first subopening’s end farther from said first main opening and said first main opening are spaced by a third distance; and
said second subopening’s end farther from said first main opening and said first main opening are spaced by a fourth distance different from said third distance.
15. The phase shift mask according to claim 14, wherein:
said first and second subopenings have ends, respectively, defined at at least one of a location closer to said first main opening and that farther from said first main opening, and mutually offset relative to said one side of said first main opening; and
said first and second subopenings have said ends mutually offset by an amount substantially constant in length.
16. A phase shift mask comprising:
a substrate having a main surface with a portion provided with a recess; and
a shielding film deposited on said main surface, wherein:
said recess has a depth allowing a light passing therethrough to be shifted by one half of a wavelength of said light;
said recess includes an undercut formed such that said shielding film partially serves an eaves;
said shielding film includes a first main opening exposing a portion of said recess, a second main opening exposing a main surface of said substrate, and a first subopening exposing a portion of an end of said recess underlying said first main opening;
said recess has said end formed to be geometrically substantially similar to said first main opening; and
said first main opening is located within a region provided with said recess.