1460942119-a7c486fe-a6e3-4e26-9965-905cf14aeff0

1. An electro-optical device comprising:
a scan line extending in a first direction;
a data line extending in a second direction intersecting the scan line;
a pixel electrode provided in correspondence with intersection of the scan line and the data line;
a semiconductor layer including:
a channel region having a channel length along one of the first direction and the second direction;
a source region having a source length along the second direction and electrically connected to the data line;
a drain region having a drain length including a portion along the first direction and electrically connected to the pixel electrode;
a first junction region formed between the channel region and the source region; and
a second junction region formed between the channel region and the drain region, and bent in the drain region in correspondence with the intersection of the data line and the scan line in plan view;

a gate electrode including:
a main body portion facing the channel region with a gate insulating film interposed therebetween; and
an enclosure portion including an L-shaped portion enclosing at least the second junction region along the portion bent in the drain region in plan view; and

a sidewall portion rising or falling from the enclosure portion and including a portion arranged along the side of the second junction region.
2. The electro-optical device according to claim 1, wherein the sidewall portions include a portion used for a contact for electrically connecting the enclosure portion and the scan line.
3. The electro-optical device according to claim 1, wherein the second junction region is placed in an intersection region of the data line and the scan line or in a region closer to the intersection region than the channel region in plan view.
4. The electro-optical device according to claim 1, wherein:
the enclosure portion further includes a portion enclosing the second junction region from the opposite side of the L-shaped portion in plan view, and
each of the sidewall portions further includes a portion enclosing the second junction region from the side of the opposite side.
5. The electro-optical device according to claim 1, wherein the enclosure portion has an annular shape in plan view.
6. The electro-optical device according to claim 1, wherein each of the sidewall portions has a protrusion protruding the semiconductor layer such that a second distance from the semiconductor layer at the front end side thereof is shorter than a first distance from the semiconductor layer in the second junction region in plan view.
7. The electro-optical device according to claim 1, wherein the second junction region is a Lightly Doped Drain (LDD) region.
8. The electro-optical device according to claim 1, further comprising an upper light-shielding film laminated on an upper layer side of the semiconductor layer and formed with a width larger than that of at least the channel region and the second junction region in plan view.
9. The electro-optical device according to claim 8, wherein the upper light-shielding film has a portion used for the data line.
10. The electro-optical device according to claim 1, further comprising a lower light-shielding film laminated on a lower layer side of the semiconductor layer and formed with a width larger than that of at least the channel region and the second junction region in plan view.
11. The electro-optical device according to claim 10, wherein the lower light-shielding film has a portion used for the scan line.
12. An electronic apparatus comprising the electro-optical device according to claim 1.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An ingredient analysis method comprising the steps of:
setting the relationship between a wavelength and the emission intensity thereof obtained when plasma is applied to a specific element at atmospheric pressure;
selecting a specific wavelength having a peak value of the emission intensity on the basis of the relationship set in said step of setting;
applying said plasma to a substance to be analyzed at atmospheric pressure and measuring the emission intensity of said substance to be analyzed at said wavelength selected in said step of selecting; and
comparing the emission intensity measured in said step of measuring and the emission intensity at said wavelength of said step of setting and judging the presence or absence of said element in said substance to be analyzed.
2. The ingredient analysis method in accordance with claim 1, wherein when said specific element is lead, when said specific wavelength is 427 nm, 666 nm or 730 nm, and when the emission intensity has an emission peak at said specific wavelength, it is judged that lead is present in said substance to be analyzed.
3. The ingredient analysis method in accordance with claim 1, wherein at said step of measuring, the emission intensity of said substance to be analyzed is measured using arc discharge at a discharge electrode.
4. The ingredient analysis method in accordance with claim 1, wherein at said step of measuring, the emission intensity of said substance to be analyzed is measured at each of a plurality of wavelengths, and at said step of judging, the presence or absence of each of a plurality of elements in said substance to be analyzed is judged.
5. The ingredient analysis method in accordance with claim 1, wherein grinding said substance to be analyzed is preformed at the previous stage of applying, and at said step of grinding, ground powder is dispersed on the surface of said substance to be analyzed.
6. The ingredient analysis method in accordance with claim 1, wherein grinding said substance to be analyzed using a grinding tool is performed at the previous stage of applying, and at said step of appying, said plasma is applied to said substance to be analyzed, disposed on the grinding face of said grinding tool used at said step of grinding, and the emission intensity of said substance to be analyzed is measured, the emission intensity being produced by said plasma.
7. The ingredient analysis method in accordance with claim 1, wherein after the presence or absence of said element is judged at said step of judging, sending information to the outside depending on the result of said judgment is performed.
8. The ingredient analysis method in accordance with claim 1, wherein after the presence or absence of said element is judged at said step of judging, placing specific marks on said substance to be analyzed depending on the result of said judgment is performed.
9. The ingredient analysis method in accordance with claim 1, wherein removing stain from the surface of said substance to be analyzed by applying said plasma to said substance to be analyzed is performed at the previous stage of applying.
10. An ingredient analysis apparatus comprising:
a sample table on which a substance to be analyzed is placed;
a discharge electrode having a gas passage formed therein;
a gas supplying section for supplying gas to said discharge electrode;
power source for supplying power to said discharge electrode;
a light transmission section, formed of a light transmission material and having an emission input section disposed near plasma generated between said discharge electrode and said substance to be analyzed, for transmitting light from said substance to be analyzed, said light being generated by plasma irradiation;
a filter for allowing only the light having a specific wavelength in the light from said light transmission section to pass through; and
a controller for measuring the emission intensity of the light having passed through said filter and for judging the presence or absence of a specific element in said substance to be analyzed.
11. The ingredient analysis apparatus in accordance with claim 10, wherein when said specific element is lead, when said specific wavelength is 427 nm, 666 nm or 730 nm, and when the emission intensity has an emission peak at said specific wavelength, said controller judges that lead is present in said substance to be analyzed and stores data concerned.
12. The ingredient analysis apparatus in accordance with claim 10, wherein said discharge electrode is an electrode to which high frequency power is supplied from said power source, and a dielectric substance is formed at the tip of said discharge electrode so as to be opposed to said plasma.
13. The ingredient analysis apparatus in accordance with claim 10, wherein said light transmission section is configured so that the light from said substance to be analyzed enters each of a plurality of filters having different transmittable wavelengths, the emission intensity of the light having passed through each of said filters is measured by said controller, and the presence or absence of each of a plurality of elements to be detected in said substance to be analyzed is detected.
14. The ingredient analysis apparatus in accordance with claim 10, wherein said light transmission section formed of a light transmission material is provided on the external circumference face of said discharge electrode, an emission input section formed of a light transmission material is formed at the tip of said discharge electrode so as to be opposed to said plasma, and the light from said emission input section enters said filter via said light transmission section.
15. The ingredient analysis apparatus in accordance with claim 10, wherein a cylindrical light transmission section formed of a light transmission material is provided so as to cover the external circumference face of said discharge electrode, an emission input section formed of a light transmission material is formed at the tip of said discharge electrode so as to be opposed to said plasma, and a grounded conductive section is provided so as to cover the external circumference face of said light transmission section.
16. The ingredient analysis apparatus in accordance with claim 10, wherein said discharge electrode is provided with a spacer so that the tip of said discharge electrode opposed to said plasma has a desired distance to said substance to be analyzed.
17. The ingredient analysis apparatus in accordance with claim 10, wherein the tip of said discharge electrode opposed to said plasma is provided with a switch, and said switch is made contact with said substance to be analyzed at the time of inspection, thereby to operate analysis processing.
18. The ingredient analysis apparatus in accordance with claim 10, wherein an exhaust passage is provided externally with said discharge electrode so as to be formed integrally.
19. The ingredient analysis apparatus in accordance with claim 10, wherein the tip of said discharge electrode opposed to said plasma is provided with a monitor section having a mirror, a lens and a photodetector.
20. The ingredient analysis apparatus in accordance with claim 10, further comprising informing means, wherein after the presence or absence of said element is judged by said controller, said informing means sends information to the outside depending on the result of said judgment.