1. A telepresence robot comprising:
a drive system configured to move the telepresence robot;
a control system configured to control the drive system to drive the telepresence robot around a work area;
a status determination system configured to determine a current status for one or both of the telepresence robot and a human; and
a social path component configured to provide instructions to the control system to cause the telepresence robot to maintain a socially acceptable distance from humans, the socially acceptable distance based on the current status,
wherein the status determination system is configured to determine that the current status of the robot comprises a presence of the human,
wherein the social path component maintains a socially acceptable distance from the human by avoiding a lockout zone surrounding the human,
wherein the status determination system comprises a human classification component configured to determine a classification of a human, and
wherein the social path component determines the lockout zone based on the classification of the human.
2. The telepresence robot of claim 1, wherein the social path component is configured to timeout after a predetermined time period of being unable to drive the telepresence robot around the work area and maintain a socially acceptable distance from humans.
3. The telepresence robot of claim 2, wherein the social path component is configured to stop attempting to drive during timeout and automatically end the timeout after a predetermined time period.
4. The telepresence robot of claim 1, wherein the socially acceptable distance from humans is a larger distance when in a semi-autonomous mode than when in an autonomous mode.
5. The telepresence robot of claim 1, wherein the social path component maintains a socially acceptable distance from the human by maintaining a minimum distance from the human.
6. The telepresence robot of claim 1, wherein the current status further comprises the human involved in a conversation with one or more humans, and wherein the social path component is configured to maintain a socially acceptable distance by avoiding a conversation zone between the human and the one or more humans, the conversation zone comprising a continuous region between the human and the one or more humans such that the telepresence robot cannot pass between the human and the one or more humans without passing through the conversation zone.
7. The telepresence robot of claim 6, wherein the status determination system is configured to determine that the human and the one or more humans are involved in a conversation based on proximity between the human and the one or more humans.
8. The telepresence robot of claim 6, wherein the status determination system is configured to determine that the human and the one or more humans are involved in a conversation based on an orientation of the human and the one or more humans in relation to each other.
9. The telepresence robot of claim 1, wherein the social path component causes the telepresence robot to move out of the way of the human.
10. A telepresence robot comprising,
a drive system configured to move the telepresence robot;
a control system configured to control the drive system to drive the telepresence robot around a work area;
a status determination system configured to determine a current status for one or both of the telepresence robot and a human; and
a social path component configured to provide instructions to the control system to cause the telepresence robot to maintain a socially acceptable distance from humans, the socially acceptable distance based on the current status,
wherein the status determination system is configured to identify an intersection,
wherein the social path component is configured to determine a path at the intersection comprising a reduced speed.
11. The telepresence robot of claim 10, wherein the social path component is further configured to determine an entry angle through the intersection to increase visibility to any approaching humans.
12. The telepresence robot of claim 10, wherein the social path component is further configured to determine whether a crossing human will reach the intersection within a threshold time of the telepresence robot and wherein the social path component is configured to modify a path of the telepresence robot to avoid a lockout zone for the human.
13. A telepresence robot comprising,
a drive system configured to move the telepresence robot;
a control system configured to control the drive system to drive the telepresence robot around a work area;
a status determination system configured to determine a current status for one or both of the telepresence robot and a human; and
a social path component configured to provide instructions to the control system to cause the telepresence robot to maintain a socially acceptable distance from humans, the socially acceptable distance based on the current status,
wherein the status determination system is configured to identify a doorway,
wherein the social path component is configured to determine a path at the doorway comprising a reduced speed.
14. The telepresence robot of claim 13, wherein the social path component is further configured to determine an entry angle through the doorway to increase visibility to any approaching humans.
15. The telepresence robot of claim 1, wherein the social path component is further configured to cause the telepresence robot to indicate a direction of intended travel to nearby humans.
16. The telepresence robot of claim 15, wherein the telepresence robot indicates the direction of intended travel using an indicator light.
17. The telepresence robot of claim 15, wherein the telepresence robot further comprises a gesture component and wherein the telepresence robot comprises one or more body portions, wherein the gesture component is configured to provide instructions to the control system to cause the one or more body portions to perform a gesture to indicate the intended direction of travel.
18. The telepresence robot of claim 17, wherein the gesture comprises turning an upper portion of the telepresence robot in the intended direction of travel.
19. The telepresence robot of claim 18, wherein the upper portion comprises a display screen.
20. The telepresence robot of claim 17, wherein the gesture component is configured to cause the gesture to be performed prior to moving in the intended direction.
21. The telepresence robot of claim 1, wherein the current status comprises a delayed navigation status, wherein the status determination system is configured to determine that the current status comprises a delayed navigation status based on a determination that a path is blocked by one or more individuals and objects for at least a delay time period.
22. The telepresence robot of claim 21, wherein the social path component is configured to cause the telepresence robot to follow a first set of rules during the delay time period and follow a second set of rules following the delay time period.
23. The telepresence robot of claim 22, wherein the first set of rules prohibit entering a first lockout zone of an object and wherein the second set of rules prohibit entering a second lockout zone of the object, wherein the first lockout zone is larger than the second lockout zone.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An array substrate for a fringe field switching mode liquid crystal display device, comprising:
a gate line on a substrate;
a gate electrode connected to the gate line;
a gate insulating layer on the gate line and the gate electrode;
a semiconductor layer on the gate insulating layer and corresponding to the gate electrode;
source and drain electrodes on the semiconductor layer and spaced apart from each other, the source electrode having first and second sub-source layers, the drain electrode having first and second sub-drain layers, wherein one side portion of the first sub-source layer has an identical end line with one side portion of the semiconductor layer, and one side portion of the first sub-drain layer has an identical end line with the other side portion of the semiconductor layer, and wherein the second sub-source layer covers an upper surface and a side surface of the first sub-source layer, and the second sub-drain layer covers an upper surface and a side surface of the first sub-drain layer;
a data line having a double-layered structure and crossing the gate line to define a pixel region;
a pixel electrode in the pixel region and extending from the second sub-drain layer;
a passivation layer on the pixel electrode; and
a common electrode on the passivation layer and having at least one opening corresponding to the pixel electrode.
2. The array substrate according to claim 1, wherein the gate electrode overlaps a portion of the gate line.
3. The array substrate according to claim 1, wherein the second sub-source layer covers a side surface of the one side portion of the semiconductor layer, and the second sub-drain layer covers a side surface of the other side portion of the semiconductor layer.
4. The array substrate according to claim 1, further comprising a semiconductor pattern being disposed under the data line.
5. The array substrate according to claim 4, wherein a lower layer of the data line has an identical end line with semiconductor pattern.
6. The array substrate according to claim 5, wherein an upper layer of the data line covers side surfaces of the lower layer and side surfaces of the semiconductor layer.
7. The array substrate according to claim 1, wherein each of the second sub-source layer, the second sub-drain layer, an upper layer of the data line, the pixel electrode and the common electrode includes a transparent conductive material.
8. The array substrate according to claim 1, wherein an exposed portion of the semiconductor layer between the first sub-source layer and the first sub-drain layer perfectly overlaps an exposed portion of the semiconductor layer between the second sub-source layer and the second sub-drain layer.
9. The array substrate according to claim 1, wherein the pixel electrode has a substantially plate shape, and wherein the at least one opening has a substantially bar shape.
10. The array substrate according to claim 1, wherein the semiconductor layer includes amorphous silicon.
11. A method of fabricating an array substrate for a fringe field switching mode liquid crystal display device, comprising:
forming a gate line and a gate electrode on a substrate, the gate electrode connected to the gate line;
forming a gate insulating layer on the gate line and the gate electrode;
forming a first semiconductor pattern on the gate insulating layer, a metal pattern on the first semiconductor pattern and a first sub-data line over the gate insulating layer, the first semiconductor pattern corresponding the gate electrode, the metal pattern having an identical end line with the first semiconductor pattern, the first sub-data line connected to the metal pattern and crossing the gate line to define a pixel region;
forming a first sub-source layer, a first sub-drain layer, a second sub-data line and a pixel electrode, the first sub-source layer and the first sub-drain layer disposed on the metal pattern and spaced apart from each other, the second sub-data line disposed on the first sub-data line, the pixel electrode disposed in the pixel region and extending from the first sub-drain layer;
etching an exposed portion of the metal pattern between the first sub-source layer and the first sub-drain layer to form a second sub-source layer under the first sub-source layer and a second sub-drain layer under the first sub-drain layer;
forming a passivation layer on the pixel electrode; and
forming a common electrode on the passivation layer and having at least one opening corresponding to the pixel electrode.
12. The method according to claim 11, wherein the step of forming the first semiconductor pattern, the metal pattern and the first sub-data line comprise:
sequentially forming an intrinsic amorphous silicon layer, an impurity-doped amorphous silicon layer and a metal layer on the gate insulating layer; and
etching the metal layer, the impurity-doped amorphous silicon layer and the intrinsic amorphous silicon layer by a single mask process to form the first semiconductor layer, which includes an active layer on the gate insulating layer and an ohmic contact pattern on the active layer, the metal pattern, a second semiconductor pattern, which includes a first layer from the intrinsic amorphous silicon layer and a second layer from the impurity-doped amorphous silicon layer, and the first sub-data line on the second semiconductor pattern.
13. The method according to claim 12, wherein the step of forming the first sub-source layer, the first sub-drain layer, the second sub-data line and the pixel electrode comprise:
forming a transparent conductive material layer on an entire surface of the substrate including the metal pattern;
forming first, second and third photoresist (PR) patterns on the transparent conductive material layer, the first PR pattern corresponding to the first sub-source layer having a width greater than the second sub-source layer, the second PR pattern corresponding to the first sub-drain layer and the pixel electrode, and the third PR pattern corresponding to the second sub-data line and having a width greater than the first sub-data line, wherein a portion of the transparent conductive material layer corresponding to the gate electrode is exposed between the first and second PR patterns; and
etching the transparent conductive metal layer using the first, second and third PR patterns as an etching mask.
14. The method according to claim 13, further comprising etching an exposed portion of the ohmic contact pattern between the second sub-source layer and the second sub-drain layer to expose a portion of the active layer.
15. The method according to claim 13, wherein the first sub-data line has an identical end line with the second semiconductor pattern, and the second sub-data line covers side surfaces of the first sub-data line and side surfaces of the second semiconductor pattern.
16. The method according to claim 11, wherein the first sub-source layer covers one side surface of the second sub-source layer and one side surface of the first semiconductor pattern, and the first sub-drain layer covers one side surface of the second sub-drain layer and the other side surface of the first semiconductor layer.
17. The method according to claim 11, wherein the pixel electrode has a substantially plate shape, and the common electrode includes a transparent conductive material, and wherein the at least opening has a substantially bar shape.