1. A method for creating NAND flash memory, comprising:
creating gate structures of one or more NAND strings, said NAND strings include at least a first NAND string and a second NAND string, said first NAND string and said second NAND string are connected to a common control line;
masking sourcedrain regions of said second NAND string;
performing source implantation at a first angular orientation to create source regions for said first NAND string; and
performing drain implantation at a second angular orientation, different from said first angular orientation, to create drain regions for said first NAND string;
masking sourcedrain regions of said first NAND string;
performing source implantation at said second angular orientation to create source regions for said second NAND string; and
performing drain implantation at said first angular orientation to create drain regions for said second NAND string.
2. The method of claim 1, wherein:
said first angular orientation includes one or more small angles in a first direction; and
said second angular orientation includes one or more small angles in an opposite direction from said first direction.
3. The method of claim 1, wherein:
said first angular orientation includes a doping angle perpendicular to a substrate for said first NAND string.
4. The method of claim 1, wherein:
said second angular orientation includes doping at an angle perpendicular to a substrate for said first NAND string.
5. The method of claim 1, wherein:
said source implantation and said drain implantation include doping a source line area and a bit line contact area; and
said method further comprises performing additional doping of said source line area and said bit line area using an implantation angle larger than with respect to said first angular orientation and said second angular orientation so that said additional doping of said source line area and said bit line area does not include doping of sourcedrain regions of said NAND string.
6. The method of claim 1, wherein:
said source implantation to create source regions for said first NAND string and said drain implantation to create drain regions for said first NAND string include doping a source line area while masking a bit line contact area for said first NAND string; and
said method further comprises performing additional doping of said bit line area.
7. The method of claim 1, wherein:
said source implantation to create source regions for said first NAND string and said drain implantation to create drain regions for said first NAND string include doping a bit line area while masking a source line area for said first NAND string; and
said method further comprises performing additional doping of said source line area.
8. The method of claim 1, wherein:
said source implantation to create source regions for said first NAND string and said drain implantation to create drain regions for said first NAND string do not include doping a bit line area and do not include doping a source line area for said first NAND string; and
said method further comprises performing additional doping of said source line area and bit line contact area for said first NAND string.
9. The method of claim 1, wherein:
said stacked gate structures are formed on a substrate;
said substrate includes channel areas between source areas and drain areas for said first NAND string and said second NAND string;
said source implantation for said first NAND string and said source implantation for said second NAND string include doping said source areas;
said drain implantation for said first NAND string and said drain implantation for said second NAND string include doping said drain areas; and
said channel areas include B-Halos.
10. The method of claim 1, further comprising:
adding higher doped B-Halos for channel areas between source areas and drain areas for said first NAND string and said second NAND string; and
adding lower doped B-Halos for said channel areas, said higher doped B-Halos are added at source sides of said channels and said lower doped B-Halos are added at drain sides of said channels.
11. The method of claim 1, wherein:
said common control line is a bit line.
12. The method of claim 1, wherein:
said drain implantation for said first NAND string and said drain implantation for said second NAND string include creating lower doped regions of a first conductivity type; and
said source implantation for said first NAND string and said source implantation for said second NAND string include creating higher doped regions of said first conductivity type.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A suture spacer, comprising:
a first member having a proximal end, a distal end, and a surface contacting side for contacting a surface from which one or more sutures emanate;
a second member having a proximal end, a distal end, a surface contacting side for contacting a surface from which one or more sutures emanate, a knot formation side on which a knot is formed, and a knot formation site being located on said knot formation side; and
a border disposed between said first and second members such that said border, and said distal ends of said first and second members define a suture receiving site for releasably receiving one or more sutures.
2. The suture spacer of claim 1, wherein said suture spacer has dimensions which are suitable for use in transvaginal surgical procedures.
3. The suture spacer of claim 1, further comprising a suture retaining ridge disposed generally perpendicular to and adjacent to said knot formation site of said second member.
4. The suture spacer of claim 1, wherein said first and second members are movable with respect to each other to facilitate insertion of one or more sutures into said suture receiving site.
5. The suture spacer of claim 1, further comprising a protuberance extending from said distal end of said first member and a protuberance extending from said distal end of said second member, wherein said protuberance of said first member and said protuberance of said second member define a distal end of said suture receiving site.
6. The suture spacer of claim 5, wherein said protuberance of said first member contacts said protuberance of said second member.
7. The suture spacer of claim 5, wherein said protuberances of said first and second members are substantially rigid.
8. The suture spacer of claim 5, wherein said protuberances of said first and second members are substantially flexible.
9. The suture spacer of claim 1, further comprising a limiting protuberance for limiting movement of said first and second members with respect to each other, said limiting protuberance being disposed between said first member and said second member.
10. The suture spacer of claim 1, wherein said proximal end of said first member and said proximal end of said second member comprise handles.
11. A suture spacer, comprising:
a first member having a proximal end and a distal end, said distal end also having a surface contacting side for contacting a surface from which one or more sutures emanate and a knot formation side located generally opposite to said surface contacting side;
a second member having a proximal end and a distal end, said distal end also having a surface contacting side for contacting a surface from which one or more sutures emanate and a knot formation side located generally opposite to said surface contacting side; and
a border disposed between said first and second members, wherein said border, and said distal ends of said first and second members define a suture receiving site for releasably receiving one or more sutures, and wherein a distance between said surface contacting sides and said knot formation sides of said first and second members defines a preselected amount of suture slack between a surface from which one or more sutures emanate and a suture knot.
12. The suture spacer of claim 11, wherein said suture spacer has dimensions which are suitable for use in transvaginal surgical procedures.
13. The suture spacer of claim 11, further comprising a pivot disposed between said first and second members.
14. A suture spacer, comprising:
a body having a surface contacting end for contacting a surface from which one or more sutures emanate, a knot formation end at which a suture knot is formed, and a suture receiving lumen extending from said surface contacting end to said knot formation end, said body also having a slot extending parallel to a longitudinal axis of said body, said slot being in fluid communication with said suture receiving lumen, said slot also being adapted to releasably retain a suture within said suture receiving lumen, wherein a distance from said surface contacting end to said knot formation end of said body and back again defines a preselected amount of slack in said suture when said suture spacer is used to form said suture knot.
15. The suture spacer of claim 14, wherein said suture spacer has dimensions which are suitable for use in transvaginal surgical procedures.
16. The suture spacer of claim 14, wherein said body is a cylinder.
17. The suture spacer of claim 14, further comprising a forceps tang on an external surface of said body.
18. The suture spacer of claim 14, wherein said suture receiving lumen is disposed centrally in said body.
19. The suture spacer of claim 14, wherein said suture receiving lumen is disposed off-center in said body.
20. The suture spacer of claim 14, wherein said body is substantially rigid.
21. The suture spacer of claim 14, wherein said body is substantially flexible.
22. The suture spacer of claim 14, wherein the portions of said body adjacent to said slot are flexible.
23. The suture spacer of claim 21, wherein said preselected amount of slack in said suture is defined by a distance from said surface contacting end to said knot formation end and back again when said body is compressed.
24. A suture spacer, comprising:
an elongate body having a surface contacting side for contacting a surface from which one or more sutures emanate, a knot formation side adjacent to which a suture knot is formed, and one or more suture receiving sites extending between said surface contacting side and said knot formation side, said one or more suture receiving sites being positioned to facilitate removal of said suture spacer after formation of said suture knot, wherein a distance from said surface contacting side to said knot formation side and back again defines a preselected amount of suture slack.
25. The suture spacer of claim 24, wherein said suture spacer has dimensions which are suitable for use in transvaginal surgical procedures.
26. The suture spacer of claim 24, wherein said elongate body is substantially rigid
27. The suture spacer of claim 24, wherein said elongate body is substantially flexible.
28. The suture spacer of claim 24, wherein said elongate body has a longitudinal axis and said suture receiving sites extend substantially perpendicular to said longitudinal axis.
29. A suture spacer, comprising:
a body having a surface contacting side for contacting a surface from which one or more sutures emanate and a knot formation side adjacent to which a suture knot is tied; and
an engagement member, said engagement member comprising an engagement body and at least one securing portion, said at least one securing portion being movable between a first position in which said at least one securing portion and said surface contacting side engage said surface from which one or more sutures emanate and a second position in which said at least one securing portion releases said surface from which one or more sutures emanate.
30. The suture spacer of claim 29, further comprising a knot formation site on said knot formation side of said body.
31. The suture spacer of claim 29, further comprising a knot formation site on said engagement body.
32. The suture spacer of claim 29, wherein said suture spacer has dimensions which are suitable for use in transvaginal surgical procedures.
33. The suture spacer of claim 29, further comprising a connector disposed between said surface contacting side of said body and said knot formation side of said body.
34. The suture spacer of claim 29, wherein said engagement member comprises two securing portions.
35. The suture spacer of claim 29, wherein said at least one securing portion is positioned above and generally parallel to said surface contacting side of said body when said engagement member is in said first position.
36. The suture spacer of claim 29, wherein said engagement member is flexible.
37. The suture spacer of claim 29, wherein said engagement member moves from said first position to said second position in response to application of a compressive force.
38. The suture spacer of claim 29, wherein said engagement member further comprises a suture groove adapted to releasably retain a suture.
39. A suture spacer, comprising:
a shaft having a proximal end and a distal end;
a connector having a proximal end and a distal end, said proximal end of said connector being connected to said distal end of said shaft; and
a slack defining member connected to said distal end of said connector, said slack defining member having a surface contacting side for contacting a surface from which one or more sutures emanate and a knot formation side adjacent to which a suture knot is formed, said knot formation side being disposed generally opposite to said surface contacting side, wherein a preselected amount of suture slack is defined by a distance from said surface contacting side to said knot formation side and back again.
40. The suture spacer of claim 39, wherein said suture spacer has dimensions which are suitable for use in transvaginal surgical procedures.
41. The suture spacer of claim 39, wherein said slack defining member is substantially spherical in cross-section.
42. A method for producing a preselected amount of slack in a suture, comprising the steps of:
transvaginally contacting a surface from which one or more sutures emanate with a suture spacer, said suture spacer comprising a surface contacting side for contacting the surface from which one or more sutures emanate, said suture spacer also comprising a knot formation side located generally opposite to said surface contacting side, said suture spacer further comprising a suture receiving site for releasably receiving said one or more sutures;
inserting said one or more sutures emanating from the surface into said suture receiving site;
tying a knot in said one or more sutures, said knot being tied generally adjacent to said knot formation side; and
removing said suture spacer to produce the preselected amount of slack in said suture.
43. The method of claim 42, wherein said step of transvaginally contacting a surface comprises contacting a sling.
44. The method of claim 43, further comprising the step of positioning the sling between a urethra and an upper vaginal wall.
45. A method for producing a preselected amount of slack in a suture, comprising the steps of:
contacting a surface from which one or more sutures emanate with a suture spacer so that said suture spacer lies between the sutures, said suture spacer comprising a shaft having a proximal end and a distal end, said suture spacer also comprising a connector having a proximal end and a distal end, said proximal end of said connector being connected to said distal end of said shaft,
said suture spacer further comprising a slack defining member connected to said distal end of said connector, said slack defining member having a surface contacting side for contacting the surface from which one or more sutures emanate and a knot formation side generally adjacent to which a suture knot is formed, said knot formation side being disposed generally opposite to said surface contacting side, wherein a preselected amount of suture slack is defined by a distance from said surface contacting side to said knot formation side and back again;
tying a knot in said suture, said knot being tied generally adjacent to said knot formation side; and
removing said suture spacer to produce the preselected amount of slack in said suture.
46. The method of claim 45, wherein said step of contacting a surface comprises contacting a sling.
47. The method of claim 46, further comprising the step of positioning the sling between a urethra and an upper vaginal wall.