What is now claimed is:
1. A one-step chemical vapor deposition process such that the deposited coating comprises at least one interface containing chemical groups having sufficient intrinsic reactivity to react with target molecules.
2. A chemical vapor deposition process; said process includes coating a substrate with a reactive coating that includes repeating units selected from the following:
2
3. The chemical vapor deposition process of claim 1, wherein the interfaces are based on polypara-xylyleness or copolymers thereof.
4. The chemical vapor deposition process of the claim 1, wherein 2.2paracyclophanes are polymerized during the chemical vapor deposition process.
5. The chemical vapor deposition process as defined in claim 1, wherein the polymeric coating is polypara-xylylene carboxylic acid pentafluorophenolester-co-para-xylylene.
6. The chemical vapor deposition process of claim 1, wherein the coating includes interfaces containing functional groups, which are capable of reacting with functional groups of target molecules resulting in stable linkages.
7. The chemical vapor deposition process of claim 1, wherein the coating includes interfaces containing functional groups, where illumination with light was used to induce reaction with functional groups of target molecules resulting in stable linkages.
8. The chemical vapor deposition process of claim 7, wherein photolithography is used to create immobilization pattern on a substrate.
9. The chemical vapor deposition of claim 1, wherein a 2.2paracyclophane is deposited onto a substrate, said process including:
providing purified 2.2paracyclophane;
sublimating the 2.2paracyclophane under a reduced pressure of less than 100 Pa;
heating the sublimated material to approximately 550 C.-900 C. to cleave CC bonds to produce monomers;
polymerizing the monomers which are absorbed on the substrate at a temperature below 150 C. to produce a topologically uniform polymer film.
10. The chemical vapor deposition process of claim 9, wherein the sublimation of 2.2paracyclophane 4-carboxylic acid pentafluorophenolester is conducted at a pressure of 0.2 mbar and at a temperature between 120 to 130 C. and the polymerization temperature is below 45 C.
11. The chemical vapor deposition process of claim 10 wherein the polymer film is transparent.
12. The chemical vapor deposition process of claim 10, wherein the polymeric film has a thickness between 40 and 2000 nm.
13. The chemical vapor deposition process of claim 1, wherein said coating is applied in a pattern on a substrate.
14. A chemical vapor deposition coating process as claimed in claim 1, including microstructuring by stamping a surface of a substrate to produce a pattern.
15. The chemical vapor deposition process of claim 1, wherein the polymer interface is patterned by spatially restricted attachment of biotin-ligands.
16. The chemical vapor deposition process of claim 1, wherein the polymer interface is patterned by spatially restricted attachment of peptides.
17. The chemical vapor deposition process of claim 1, wherein the polymer interface is patterned by spatially restricted attachment of proteins.
18. The chemical vapor deposition process of claim 1, wherein the polymer interface is patterned by spatially restricted attachment of oligonucleotides.
19. The chemical vapor deposition process of claim 1, wherein the polymer interface is patterned by spatially restricted attachment of DNA.
20. The chemical vapor deposition process of claim 1, wherein the polymer interface is patterned by spatially restricted attachment of polysaccharides.
21. The chemical vapor deposition process of claim 1 further including patterning the surface of the substrate using layer-by-layer adsorption.
22. A chemical vapor deposition process of claim 1, wherein ()-biotinyl-3,6,9-trioxaundecanediamine was used for coating different patterns of substrates with polypara-xylylene carboxylic acid pantaflourophenolester-co-para-xylylene.
23. The chemical vapor deposition process as claimed in claim 1, further including masking a surface of the substrate to produce a patterned coating having defined areas, each area having different functional groups.
24. The chemical vapor deposition process as claimed in claim 1 further including a plasma treatment of the substrate prior to the chemical vapor deposition process.
25. The chemical vapor deposition process as claimed in claim 1, wherein a polymer interface containing chemical groups having sufficient intrinsic reactivity to react with target molecules is created and the chemical groups show an anisotropic distribution on the surface.
26. The chemical vapor deposition process as claimed in claim 25, wherein a gradient of reactivity is formed.
27. The chemical vapor deposition process as claimed in claim 1, wherein the deposited coating comprises co-polymers with at least two different types of chemical groups each having sufficient intrinsic reactivity to react with target molecules.
28. The chemical vapor deposition process as claimed in claim 1, wherein the deposited coating comprises co-polymers of at least one polymer with at least one type of chemical groups having sufficient intrinsic reactivity to react with target molecules and of at least one polymer that has no sufficient intrinsic reactivity to react with target molecules.
29. The chemical vapor deposition process as claimed in claim 28 wherein the polymer that has no sufficient intrinsic reactivity to react with target molecules is a poly(p-xylylene).
30. The chemical vapor deposition process as claimed in claim 28 wherein the polymer that has no sufficient intrinsic reactivity to react with target molecules is a functionalized poly(p-xylylene).
31. The chemical vapor deposition process as claimed in claim 28 wherein the polymer that has no sufficient intrinsic reactivity to react with target molecules is a poly(olefin).
32. Preparation of an electrophoresis chamber including depositing a polymer coating by chemical vapor deposition as claimed in claim 1, said coating including functional groups to enhance surface properties.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of dental impression taking, comprising the step of applying a polymeric material at least partially to the region to be reproduced by the impression, wherein the polymeric material is translucent.
2. A method according to claim 1, wherein the polymeric material exhibits translucency in the range of about 30% to about 100%.
3. The method according to claim 2, further comprising: identifying an irregularity, especially air inclusion(s) within andor under said translucent polymeric material; and eliminating said irregularity before hardening of said translucent polymeric material.
4. A method as in claim 1, in which the process of dental impression taking is a process chosen from the group consisting of two-material-two-phase processes, two-material-one-phase processes, and one-material-one-phase processes.
5. A polymeric material for dental applications, especially for impression taking, wherein said polymeric material exhibits:
a translucency in the range of about 30% to about 100%;
a shore A hardness according to DIN 53505 in the range of about 20 to about 70; and
a tensile strength according to DIN 53504 in the range of about 0.2 MPa to about 7 MPa.
6. A polymeric material for dental applications, especially for impressing taking, wherein said polymeric material exhibits:
a translucency in the range of \u226740% to about 100%;
a shore A hardness according to DIN 53505 in the range of about 30 to about 60; and
a tensile strength according to DIN 53504 in the range of about 1 MPa to about 6 MPa.
7. A polymeric material for dental applications, especially for impression taking, wherein said polymeric material exhibits:
a translucency in the range of \u226750% to about 100%;
a shore A hardness according to DIN 53505 in the range of about 45 to about 55; and
a tensile strength according to DIN 53504 in the range of about 1.5 mPa to about 4.5 mPa.
8. A polymeric material according to claim 5, wherein said material exhibits a consistency according to DIN ISO 4823:2000 of type 1 to type 3.
9. A polymeric material according to claim 5, wherein said material exhibits a consistency according to DIN ISO 4823:2000 of type 2 to type 3.
10. A polymeric material according to claim 5, wherein said material exhibits a wetting angle of contact of less than about 50\xb0 after 2 minutes.
11. A polymeric material according to claim 5, wherein said material is a silicon-based material.
12. A polymeric material according to claim 11, wherein said silicone-based material is an addition cross-linked silicone material.
13. A kit of parts, comprising a translucent polymeric material as in claim 5, and an additional material which is non-translucent or translucent.
14. A dental impression which is at least partially translucent.
15. A dental impression according to claim 14 selected from the group consisting of (i) a key for temporary or definitive composite crowns, telescope crowns or bridges;
(ii) a key for composite facings or veneers;
(iii) a positioning key for orthodontic brackets;
(iv) a positioning key prior to insertion of a dental implant;
(v) an implant template matrix; and
(vi) a (pre) impression for build-up of anterior and posterior teeth in restorative dentistry.