What is claimed is:
1. A computer program product embodied on a computer-readable medium and comprising code that, when executed, causes the computer to perform the following:
a configuration of a structured system for the planning, integration, analysis and management of new product development on a real-time, enterprise-wide basis at the initiation of said computer code, said system comprising:
a portfolio planning and management component;
a project planning and management component;
a resource planning and management component;
a process planning and management component; and
a managed parent construct defining a flexible relationship between parent data and child data in at least one of said components;
a modification of said child data in one of said components; and
an automatic reconfiguration of each of said other components to conform with said modified one of said components without automatic modification to said parent data.
2. A computer program according to claim 1 further comprising a visual display for indicating discrepancies between parent data and child data.
3. A computer program according to claim 1 further comprising a rolled-up parent construct defining a linked relationship between said parent data and said child data in at least one of said components so as to permit an automatic reconfiguration of each of said other components to conform to said modified one of said components with automatic modification to said parent data within said rolled-up parent construct
4. A computer program according to claim 3 further comprising a selectively configurable parent construct configured to be switched between said managed parent construct and said rolled-up parent construct.
5. A computer program product embodied on a computer-readable medium and comprising code that, when executed, causes the computer to perform the following:
a configuration of a structured system for the planning, integration, analysis and management of new product development on a real-time, enterprise-wide basis at the initiation of said computer code, said system comprising:
a portfolio planning and management component;
a project planning and management component;
a resource planning and management component; and
a constraint construct selectively defining at least one of a start constraint and a finish constraint for a system element of at least one of said components;
a modification of one of said components without automatic modification of the system element beyond said start constraint and said finish constraint; and
an automatic reconfiguration of each of said other components without automatic modification of the system element beyond said start constraint and said finish constraint.
6. A computer program according to claim 5 further comprising a warning display for indicating a violation of one of said start constraint and said finish constraint for said system element by said modification of one of said components and said automatic reconfiguration of each of said other components.
7. A computer program according to claim 5 wherein said start constraint comprises a start of said system element no earlier than a first given time constraint and a start of said system element no later than a second given time constraint.
8. A computer program according to claim 5 wherein said finish time constraint comprises a finish of said system element no earlier than a third given time constraint and a finish of said system element no later than a fourth given time constraint.
9. A computer program product embodied on a computer-readable medium and comprising code that, when executed, causes the computer to perform the following:
a configuration of a structured system for the planning, integration, analysis and management of new product development on a real-time, enterprise-wide basis at the initiation of said computer code, said system comprising:
a portfolio planning and management component;
a project planning and management component;
a resource planning and management component;
a process planning and management component; and
an anchored element construct defining a disconnected relationship between parent data and child data in at least one of the components, a system element comprising at least a portion of one of said parent data and said child data in at least one of the components, and selectively configurable restriction parameters for setting a given start time and a given finish time for said system element;
a modification of at least one of said components; and
an automatic reconfiguration of each of said other components to conform with said modified one of said components without automatic modification to said anchored system element.
10. A computer program according to claim 9 wherein said anchored system element is prohibited from being moved by any user except for an owner of said anchored system element.
11. A computer program according to claim 9 wherein said anchored system element is prohibited from being moved based on movement of said child data corresponding thereto.
12. A computer program product embodied on a computer-readable medium and comprising code that, when executed, causes the computer to perform the following:
a configuration of a structured system for the planning, integration, analysis and management of new product development on a real-time, enterprise-wide basis at the initiation of said computer code, said system comprising:
a portfolio planning and management component;
a project planning and management component;
a resource planning and management component;
a process planning and management component; and
a dependent system element structure, wherein at least a given start time and a given end time of an action of a first system element in at least one of said components is dependent on at least one of a given start time and a given end time of another action of a second system element in at least one of said components;
a modification of one of said components; and
an automatic reconfiguration of each of said other components to conform with said modified one of said components, and an automatic reconfiguration of said action of said first system element to conform with said another action of said second system element.
13. A computer program product according to claim 12 wherein said given start time of said action of said first system element is dependent on said end time of said another action of said second system element.
14. A computer program product according to claim 12 wherein said given end time of said action of said first system element is dependent on said given end time of said another action of said second system element.
15. A computer program product according to claim 12 wherein said given start time of said action of said first system element is dependent on said given start time of said another action of said second system element.
16. A computer program product according to claim 12 wherein said given end time of said action of said first system element is dependent on said given start time of said another action of said second system element.
17. A computer program product according to claim 12 further comprising a float period between said action of said first system element and said another action of said second system element.
18. A computer program product according to claim 17 further comprising a visual indicator representing said float period.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1-15. (canceled)
16. A photocatalyst production apparatus for producing a photocatalyst comprising a photocatalytic film of a compound of titanium and oxygen, the apparatus comprising:
a first film formation chamber capable of keeping atmosphere at a reduced pressure lower than the atmospheric pressure;
an electric power source for applying voltage to a target installed in the first film formation chamber;
heating means for heating a substrate;
a gas introduction mechanism for introducing a reaction gas containing oxygen into the first film formation chamber; and
a controller capable of controlling the heating means and the gas introduction mechanism,
wherein, at the time of forming the photocatalytic film of a compound of titanium and oxygen on the substrate by sputtering in the first film formation chamber, the controller controls the gas introduction mechanism so as to keep the pressure of the first film formation chamber at not lower than 3 Pa and not higher than 5 Pa and to keep the oxygen content in the first film formation chamber not less than 10% and not more than 30%, and controls the heating means so as to satisfy the following inequality:
R\u22662.36 exp(\u2212410(1T)
between a film formation rate R of the photocatalytic film and a surface temperature T of the substrate at a formation rate not lower than 0.2 nms and not higher than 0.6 nms.
17. The photocatalyst production apparatus according to claim 16, wherein the electric power source is a DC power source.
18. The photocatalyst production apparatus according to claim 16, wherein the controller controls so as to make a film thickness of the photocatalyst not thinner than 40 nm and not thicker than 100 nm.
19. The photocatalyst production apparatus according to claim 16, further comprising:
a heating chamber having the heating means; and
a transporting mechanism for transporting the substrate from the heating chamber to the first film formation chamber,
wherein the substrate can be transported to the first film formation chamber by the transporting mechanism after the substrate is heated in the heating chamber to carry out the formation of the photocatalytic film by sputtering.
20. The photocatalyst production apparatus according to claim 19, further comprising a second film formation chamber capable of forming a silicon oxide film,
wherein a silicon oxide can be formed on the substrate prior to the formation of the photocatalytic film by sputtering.
21. The photocatalyst production apparatus according to claim 19, further comprising a third film formation chamber capable of forming a silicon oxide film,
wherein a silicon oxide can be formed on the photocatalytic film after the formation of the photocatalytic film by sputtering.
22. A photocatalyst production apparatus, comprising:
a first film formation chamber capable of keeping atmosphere at a reduced pressure lower than the atmospheric pressure;
an electric power source for applying voltage to a target installed in the first film formation chamber;
heating means for heating a substrate;
a gas introduction mechanism for introducing a reaction gas containing oxygen into the first film formation chamber; and
a controller capable of controlling the heating means,
wherein, at the time of forming a photocatalytic film of a compound consisting of titanium and oxygen on the substrate by sputtering in the first film formation chamber, the controller controls the heating means so as to satisfy the following inequality:
R\u22662.36 exp(\u2212410(1T))
between a film formation rate R of the photocatalytic film and a surface temperature T of the substrate,
wherein the photocatalytic film is an agglomerate of a number of grains, is formed to be porous including gaps among the number of grains at a surface of the photocatalytic film, and has 0.02 to higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with a film thickness, and the film thickness of the photocatalytic film is not thinner than 40 nm and not thicker than 100 nm,
the photocatalytic film is made of titanium oxide formed by the sputtering, and
the titanium oxide has 100 or less value as the intensity ratio of a (101) diffraction peak of the anatase structure of titanium oxide to a (215) diffraction peak of the anatase structure of titanium oxide measure using a K\u03b11 characteristic X-ray of copper.
23. The photocatalyst production apparatus according to claim 22, wherein the controller controls the gas introduction mechanism so as to keep the pressure of the first film formation chamber at not lower than 3 Pa and not higher than 5 Pa at the time of forming the photocatalytic film by sputtering.
24. The photocatalyst production apparatus according to claim 22, wherein the controller controls the gas introduction mechanism so as to keep the oxygen content in the first film formation chamber not less than 10% and not more than 30% at the time of forming the photocatalytic film by sputtering.
25. The photocatalyst production apparatus according to claim 22, further comprising:
a heating chamber having the heating means; and
a transporting mechanism for transporting the substrate from the heating chamber to the first film formation chamber,
wherein the substrate can be transported to the first film formation chamber by the transporting mechanism after the substrate is heated in the heating chamber to carry out the formation of the photocatalytic film by sputtering.
26. The photocatalyst production apparatus according to claim 25, further comprising a second film formation chamber capable of forming a silicon oxide film,
wherein a silicon oxide can be formed on the substrate prior to the formation of the photocatalytic film by sputtering.
27. The photocatalyst production apparatus according to claim 25, further comprising a third film formation chamber capable of forming a silicon oxide film,
wherein a silicon oxide can be formed on the photocatalytic film after the formation of the photocatalytic film by sputtering.