1. A manufacturing method of a multi-chips bumpless assembly package, comprising:
providing a plurality of first chips with a first encapsulation encompassed, wherein the first chips have first bonding pads and the first bonding pads are exposed out of the first encapsulation;
providing a patterned first dielectric layer with a plurality of first vias over the first chips and the first encapsulation, wherein the first bonding pads are exposed out of the patterned first dielectric layer through the first vias;
providing a patterned first conductive layer located over the patterned first dielectric layer and connected to the first bonding pads through the first vias;
providing an insulation layer located over the patterned first conductive layer and the patterned first dielectric layer;
providing a plurality of second chips with a second encapsulation encompassed to be disposed on the insulation layer, wherein the second chips have second bonding pads and the second bonding pads are exposed out of the second encapsulation;
forming a plurality of through holes, wherein the through holes penetrate the second encapsulation and the insulation layer and expose portions of the patterned first conductive layer;
providing a conductive material filled in the through holes;
disposing a conductive trace on the second chips and the second encapsulation, wherein the conductive trace connects the conductive material and one of the second bonding pads;
providing a patterned second dielectric layer with a plurality of second vias over the second chips, the second encapsulation and the conductive trace, wherein portions of the second bonding pads are exposed out of the patterned second dielectric layer through the second vias;
providing a patterned second conductive layer located above the second chips, the second encapsulation and the patterned second dielectric layer, wherein the patterned second conductive layer connects to the portions of the second bonding pads;
providing a patterned third dielectric layer with a plurality of third vias over the patterned second conductive layer and the patterned second dielectric layer, wherein portions of the patterned second patterned conductive layer are exposed out of the patterned third dielectric layer through the third vias; and
forming a plurality of bumps in the third vias, wherein the bumps are connected to the patterned second conductive layer.
2. The manufacturing method of claim 1, further comprising a heat spreader attached to first lower surfaces of the first chips.
3. The manufacturing method of claim 1, wherein the step of providing the first chips with the first encapsulation encompassed further comprising:
providing the first chips disposed on a carrier, wherein the first bonding pads are faced upwardly and the first chips are arranged separately to form gaps;
providing the first encapsulation covering the first chips and filling in the gaps; and
removing the first encapsulation to leave the first bonding pads exposed.
4. The manufacturing method of claim 3, wherein the first encapsulation is made of a photosensitive material.
5. The manufacturing method of claim 4, wherein the step of removing the first encapsulation is performed by a photolithography process.
6. The manufacturing method of claim 1, wherein the step of filling the conductive material in the through holes is performed by the method of electroless plating.
7. The manufacturing method of claim 1, wherein the step of filling the conductive material in the through holes is performed by the method of screen-printing.
8. The manufacturing method of claim 1, wherein the step of disposing the conductive trace on the second chip and the second encapsulation is performed by the method of electroless plating.
9. The manufacturing method of claim 1, further comprising a bottom plate disposed over the patterned first dielectric layer.
10. The manufacturing method of claim 9, further comprising a dielectric material disposed on the bottom plate.
11. The manufacturing method of claim 10, further comprises a top plate disposed on the dielectric material over the bottom plate.
12. The manufacturing method of claim 1, wherein the step of providing the first chips with the first encapsulation encompassed further comprising:
providing the first chips disposed on a film, wherein the first bonding pads are attached to the film and the first chips are arranged separately to form gaps;
providing the first encapsulation to cover the first chips, the gaps and the films;
removing the first encapsulation not covered by the film to leave first back surfaces of the first chips exposed; and
removing the film.
13. The manufacturing method of claim 1, further comprising reflowing the bumps.
14. The manufacturing method of claim 1, further comprising performing a singulating process to form a plurality of multi-chips bumpless assembly package, wherein the multi-chips bumpless assembly package at least comprises one first chip, and one second chip disposed above the first chip.
15. The manufacturing method of claim 1, wherein the step of forming the through hole is performed by performing a laser penetrating the second encapsulation and the insulation layer.
16. The manufacturing method of claim 1, wherein the step of forming the through hole is performed by an etching process to penetrate the second encapsulation and the insulation layer.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A computer-implemented method for computing an array of holographic diffraction patterns each representative of an image of a particular scene, comprising:
for the first of the holographic diffraction patterns of the array:
obtaining a color image of one view of the scene;
obtaining corresponding depth information about the scene;
creating image layers from the color image and the depth information;
encoding spatial information in each of the image layers into a diffraction pattern for that layer; and
adding together the diffraction pattern information for each of the image layers to compute the holographic diffraction pattern representative of that view; and
repeating the above operations for each of the other holographic diffraction patterns of the array where each holographic diffraction pattern is representative of a different view of the scene.
2. A computer-implemented method as defined in claim 1, further including for each layer adding a holographic lens to the diffraction pattern information for that layer.
3. A computer-implemented method as defined in claim 1, wherein the color image and the corresponding depth information come from computer graphics rendering.
4. A computer-implemented method as defined in claim 1, wherein the color image and the corresponding depth information come from a camera.
5. A computer-implemented method as defined in claim 1, further including displaying images based on the array of holographic diffraction patterns with a tiled holographic display system.
6. A computer-implemented method as defined in claim 1, wherein the operation of creating image layers includes thresholding based on the depth information.
7. A computer-implemented method as defined in claim 1, wherein the operation of creating image layers includes depth blending based on the depth information.
8. A computer-implemented method as defined in claim 1, wherein the operation of converting spatial information into diffraction pattern information includes performing a Fast Fourier Transform.
9. A computer-implemented method as defined in claim 1, further including storing the array of holographic diffraction patterns.
10. A computer-implemented method as defined in claim 9, further including displaying holographic images based on the stored array of holographic diffraction patterns.
11. A computer-implemented method as defined in claim 1, further including displaying holographic images based on the stored array of holographic diffraction patterns.
12. A method for computing and displaying an array of holographic images, comprising:
for the first of the holographic images of the array:
obtaining a color image of one view of the scene;
obtaining corresponding depth information about the scene;
creating image layers from the color image, the depth information, and depth blending;
encoding spatial and depth information in each of the image layers into diffraction patterns for that layer; and
adding together the diffraction patterns for each of the image layers to compute the holographic diffraction pattern representative of that view;
repeating the above operations for each of the other holographic diffraction patterns of the array where each holographic diffraction pattern is representative of a different view of the scene; and
displaying each of the array of a holographic images on an angularly-tiled holographic display system.
13. A method as defined in claim 12, wherein the angularly-tiled holographic display system includes one or more spatial light modulators.
14. A method as defined in claim 12, further including for each layer adding a holographic lens to the diffraction pattern information for that layer.
15. A method as defined in claim 12, wherein the color image and the corresponding depth information come from a camera.
16. A method as defined in claim 12, wherein the operation of creating image layers includes thresholding based on the depth information.
17. A computer-implemented method for computing an array of holographic diffraction patterns each representative of an image of a particular scene, comprising:
for the first of the holographic diffraction patterns of the array:
creating image layers that include color image, depth information, and depth blending about one view of a scene;
encoding spatial information in each of the image layers into a diffraction pattern for that layer; and
adding together the diffraction pattern for each of the image layers to compute the holographic diffraction pattern representative of that view; and
repeating the above operations for each of the other holographic diffraction patterns of the array where each holographic diffraction pattern is representative of a different view of the scene.
18. A computer-implemented method as defined in claim 17, further including for each layer adding a holographic lens to the diffraction pattern information for that layer.
19. A computer-implemented method as defined in claim 17, wherein the color image and the corresponding depth information come from a camera.
20. A computer-implemented method as defined in claim 17, wherein the operation of creating image layers includes thresholding based on the depth information.