1460730293-4f0ca9ba-fda9-40e5-b2b8-3309ac3ea236

1. A method for generating content for a life story collection, comprising the steps of:
receiving content that has been entered through a user interface configured to support a predetermined user activity;
storing the content in accordance with the predetermined user activity; and
parsing the content and generating new content for a life story collection using the parsed content.
2. The method according to claim 1, wherein the predetermined user activity comprises adding a text narrative to a life story collection and the received and stored content comprises the text narrative, and wherein the step of generating new content includes the steps of:
constructing a search query from the parsed content; and
performing an image search using the search query to generate at least one image to be added as the new content for the life story collection.
3. The method according to claim 2, wherein the step of performing an image search includes issuing the search query to a third party image search provider and receiving image search results from the third party image search provider, and wherein the new content is included in one of the image search results.
4. The method according to claim 1, wherein the predetermined user activity comprises exchanging e-mail communications, and the new content includes a text narrative of an event that has been parsed from one of the e-mail communications.
5. The method according to claim 4, wherein the new content further includes an interview question in response to which the text narrative of the event was composed, the question also being parsed from one of the e-mail communications.
6. The method according to claim 1, wherein the predetermined user activity comprises a first user adding a comment to a second user’s life story, and the new content includes a text narrative for the first user’s life story that has been parsed from the first user’s comment to the second user’s life story.
7. The method according to claim 6, further comprising the step of preparing a user interface for the first user, the user interface including a editable text window for displaying the text narrative for the first user’s life story using which the first user can modify the text narrative before adding the text narrative to the first user’s life story collection.
8. A method for adding images to content relating to a life story, comprising the steps of:
receiving a text narrative of the life story;
generating a search query based on the context of the text narrative; and
performing an image search using the search query to generate at least one image to be added to the content relating to the life story.
9. The method according to claim 8, wherein the step of performing an image search includes the steps of issuing the search query to a third party image search provider and receiving image search results that includes said at least one image to be added, from the third party image search provider.
10. The method according to claim 8, further comprising the steps of:
preparing a user interface including a plurality of images obtained from the image search;
receiving a selection of at least one of the images; and
adding said at least one of the images to the content relating to the life story.
11. The method according to claim 10, wherein the user interface includes a section for displaying thumbnail images, user interface controls for enabling the user to scroll through the thumbnail images, and a section for displaying an enlarged version of one of the thumbnail images.
12. A method for generating content to be added to a life story collection of a first user based on collaborative activities between the first user and a second user, said method comprising the steps of:
preparing content submitted by the second user for viewing by the first user;
transmitting the prepared content to the first user;
receiving content submitted by the first user in response to the content submitted by the second user;
parsing the received content and generating new content to be added to the life story collection of the first user using the parsed content.
13. The method according to claim 12, wherein the prepared content comprises an e-mail communication from the second user to the first user, and the content submitted by the first user comprises a reply e-mail communication from the first user to the second user.
14. The method according to claim 13, wherein the e-mail communication comprises an interview question posed to the first user by the second user and the new content is generated from the reply e-mail communication and includes a text narrative for a life story of the first user parsed from the reply e-mail communication.
15. The method according to claim 14, further comprising the steps of:
receiving additional content submitted by the second user in response to the reply e-mail communication; and
parsing the received additional content and generating additional new content to be added to the life story collection of the first user using the parsed additional content.
16. The method according to claim 13, further comprising the step of determining whether the e-mail communication is to be prepared and transmitted to the first user based on a notification setting specified by the first user.
17. The method according to claim 12, wherein the prepared content comprises content relating to a life story of the second user, and the content submitted by the first user comprises a comment to the life story of the second user.
18. The method according to claim 17, wherein the new content is generated from the comment and includes a text narrative parsed from the comment.
19. The method according to claim 18, further comprising the step of preparing a graphical user interface for the first user, the user interface including an editable text window for displaying the text narrative using which the first user can modify the text narrative before adding the text narrative to the first user’s life story collection.
20. The method according to claim 17, further comprising the step of receiving a confirmation from the first user to use the comment as the new content for the first user’s life story collection.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for manufacturing a marker structure on a semiconductor surface of a semiconductor substrate, the marker structure comprising line elements and trench elements, the line elements and trench elements being arranged in a repetitive order in the marker structure, the method comprising:
filling the trench elements with silicon dioxide and leveling the marker structure;
growing a sacrificial oxide layer on the semiconductor surface;
exposing at least a first subset of the line elements to at least a first ion implantation beam to dope at least the first subset of line elements and to change an etching rate of at least the first subset of line elements, said first ion implantation beam comprising a first dopant species and having first ion implementation beam characteristics;
annealing the substrate to activate the first dopant species in at least the first subset of line elements; and
etching the semiconductor surface to remove the sacrificial oxide layer and to create a topology such that the first subset of line elements has a first level differing from a second level of a surface portion of the marker structure different from the first subset of line elements.
2. A method for manufacturing a marker structure according to claim 1, wherein the first level of the first subset of line elements is below the second level.
3. A method for manufacturing a marker structure according to claim 1, wherein the first level of the first subset of line elements is above the second level.
4. A method for manufacturing a marker structure according to claim 1, said method comprising:
exposing a second subset of the line elements to at least a second ion implantation beam to dope the second subset of line elements, said second ion implantation beam comprising a second dopant species and having second ion beam characteristics,
wherein said etching includes creating a topology such that the second subset of line elements has a third level differing from said first and second levels.
5. A method for manufacturing a marker structure according to claim 1, wherein the first dopant species comprises one of arsenic, phosphorus, antimony, and boron.
6. A method for manufacturing a marker structure according to claim 1, wherein the second dopant species comprises one of arsenic, phosphorus, antimony, and boron.
7. A method for manufacturing a marker structure according to claim 1, wherein the first dopant species differs from the second dopant species.
8. A method for manufacturing a marker structure according to claim 1, wherein the first ion beam characteristics differ from the second ion beam characteristics.
9. A method for manufacturing a marker structure according to claim 1, wherein said surface portion of the marker structure comprises surfaces of silicon dioxide.
10. A device manufacturing method comprising:
manufacturing a marker structure on a substrate, the marker structure comprising line elements and trench elements, the line elements and trench elements being arranged in a repetitive order in the marker structure, said manufacturing a marker structure comprising:
filling the trench elements with silicon dioxide and leveling the marker structure;
growing a sacrificial oxide layer on the semiconductor surface;
exposing at least a first subset of the line elements to at least a first ion implantation beam to dope at least the first subset of line elements and to change an etching rate of at least the first subset of line elements, said first ion implantation beam comprising a first dopant species and having first ion beam characteristics;
annealing the substrate to activate the first dopant species in at least the first subset of line elements; and
etching the semiconductor surface to remove the sacrificial oxide layer and to create a topology such that the first subset of line elements has a first level differing from a second level of a surface portion of the marker structure different from the first subset of line elements;
determining a position of said marker structure; and
based on said determining, projecting a patterned beam of radiation onto a radiation-sensitive layer on the substrate.
11. A method according to claim 10, further comprising depositing a gate layer stack after said etching, wherein a thickness of the gate layer stack is less than twice the width of said trench elements.
12. A method for aligning a substrate relative to a mask in a lithographic apparatus comprising:
projecting a beam of light onto a marker structure disposed on said substrate;
detecting light diffracted by said marker structure; and
adjusting a position of said substrate on the basis of the diffracted light,
wherein the marker structure includes a plurality of lines of a first material and a plurality of trenches of a second material that differs from the first material, said plurality of lines and trenches being alternately and contiguously disposed in a substrate, and wherein a first subset of said plurality of lines has a different elevation than said plurality of trenches.
13. A method for manufacturing a marker structure at a surface of a substrate, the marker structure comprising line elements and trench elements arranged in a repetitive order, said method comprising:
filling the trench elements with silicon dioxide;
growing a sacrificial oxide layer on the surface;
exposing at least a first subset of the line elements to an ion implantation beam to change an etching rate of the first subset, said ion implantation beam comprising a dopant species;
annealing the substrate to activate the dopant species in the first subset; and
etching the semiconductor surface to remove the sacrificial oxide layer and to create a plurality of levels on the surface such that the first subset of line elements has a first level differing from a second level of a surface portion of the marker structure different from the first subset of line elements.