1. A device comprising:
a substrate having a land disposed thereon;
a passivation layer disposed over the substrate and over the land, the passivation layer having a first opening exposing a portion of the land;
an insulation layer disposed over at least a portion of the passivation layer and having a second opening disposed over the land and exposing a surface of the passivation layer disposed outside the first opening and facing away from the substrate; and
a conductive layer disposed over and contacting the surface of the passivation layer exposed by the second opening, the conductive layer in electrical contact with the land, the conductive layer having a portion extending over at least a portion of the insulation layer, the conductive layer having an outermost edge disposed in the second opening and over the passivation layer, the conductive layer having a contact portion between the outermost edge and the portion extending over the insulation layer, the contact portion disposed over at least a portion of the land; and
a protective layer disposed over at least a portion of the conductive layer, wherein the insulation layer avoids extending beneath the outermost edge of the conductive layer, and wherein the protective layer has a thickness over the contact portion of at least about 7 \u03bcm.
2. The device of claim 1, wherein a sidewall of the second opening is aligned substantially over an edge of the land.
3. The device of claim 2, wherein the outermost edge of the conductive layer is in contact with the sidewall of the second opening.
4. The device of claim 2, wherein the outermost edge of the conductive layer is spaced apart from the sidewall of the second opening.
5. The device of claim 1, wherein a sidewall of the second opening is aligned substantially outside of an edge of the land.
6. The device of claim 5, wherein the outermost edge of the conductive layer is aligned substantially outside the edge of the land.
7. The device of claim 5, wherein the outermost edge of the conductive layer is aligned substantially over a body of the land.
8. A device comprising:
a passivation layer disposed over a substrate having a land disposed therein, the passivation layer extending over a portion of the land, wherein a first surface of the passivation layer physically contacts an upper surface of the land;
an insulation layer disposed over the substrate and having an opening disposed over at least a portion of the land, wherein a second surface of the passivation layer opposite the first surface is free from the insulation layer;
a post passivation interconnect (PPI) layer disposed over a portion of the passivation layer, the PPI layer having a first outermost edge, a second outermost edge opposite the first outermost edge, and a post passivation interconnect (PPI) contact portion between the first outermost edge and the second outermost edge, wherein the first outermost edge is an edge of a portion of the PPI layer extending over at least a portion of the insulation layer, wherein the PPI contact portion is disposed in the opening of the insulation layer and over at least a portion of the land, wherein the second outermost edge is disposed in the opening of the insulation layer and over the passivation layer, wherein the second outermost edge avoids overlying the insulation layer; and
a protective layer disposed over at least a portion of the PPI layer, wherein the protective layer has a thickness over the PPI contact portion of at least about 7 \u03bcm.
9. The device of claim 8, wherein the protective layer has a thickness over the PPI contact portion of about 8.5 \u03bcm.
10. The device of claim 8, further comprising an interconnect disposed on the portion of the PPI layer extending over the insulation layer.
11. The device of claim 8, wherein the second outermost edge is aligned substantially over an edge of the land.
12. The device of claim 8, wherein the PPI layer is formed from copper.
13. A device comprising:
a passivation layer disposed over a substrate and extending over a portion of a top surface of a land disposed on the substrate;
an insulation layer disposed over the passivation layer, the insulation layer having first sidewalls forming an opening exposing at least a portion of the land and at least a portion of a top surface of the passivation layer;
a conductive layer disposed over the passivation layer, the conductive layer having a portion extending over at least a portion of the insulation layer, the conductive layer comprising a contact portion disposed in the opening and in electrical contact with the land, the contact portion having second sidewalls disposed in the opening and over the passivation layer, wherein one of the second sidewalls comprises an outermost edge of the conductive layer, wherein no portion of the insulation layer is disposed beneath the outermost edge of the conductive layer, and wherein the first sidewalls are disposed outside of the second sidewalls;
an interconnect disposed on the portion of the conductive layer extending over the insulation layer; and
a protective layer disposed over at least a portion of the conductive layer, wherein a portion of the protective layer is disposed beneath a peripheral portion of the interconnect.
14. The device of claim 13, wherein the first sidewalls are spaced apart from the second sidewalls, and wherein a portion of the protection layer extends between the first sidewalls and the second sidewalls.
15. The device of claim 14, wherein the first sidewalls are aligned outside of a region aligned directly over the land; and
wherein the second sidewalls are aligned directly over the land.
16. The device of claim 13, wherein the contact portion contacts the passivation layer outside of a region aligned directly over the land.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A process for the preparation of a compound of formula (1):
13
wherein:
Ar1 is an optionally substituted aromatic or heteroaromatic group;
L2 is a linker group selected from N(R4) where R4 is a hydrogen atom or an optionally substituted straight or branched C1-6alkyl group, CON(R4) or S(O)2N(R4);
R1 is a carboxylic acid (CO2H) or a derivative or biostere thereof;
R2 is a hydrogen atom or a C1-6alkyl group;
Rx, Ry and Rz which may be the same or different is each an atom or group L1(Alk1)n(R3)v in which L1 is a covalent bond or a linker atom or group, Alk1 is an optionally substituted aliphatic or heteroaliphatic chain, R3 is a hydrogen or halogen atom or group selected from OR3a where R3a is a hydrogen atom or an optionally substituted straight or branched C1-6alkyl group or C3-8cycloalkyl group, SR3a, CN or an optionally substituted cycloaliphatic, heterocycloaliphatic, polycycloaliphatic, heteropolycycloaliphatic, aromatic or heteroaromatic group, n is zero or the integer 1 and v is the integer 1, 2 or 3 provided that when n is zero and L1 is a covalent bond v is the integer 1;
or Rz is an atom or group as previously defined and Rx and Ry are joined together to form an optionally substituted spiro linked cycloaliphatic or heterocycloaliphatic group;
and the salts, solvates, hydrates and N-oxides thereof;
which comprises reacting a compound of formula (2):
14
wherein:
Qa is a group N(R4)H;
and the salts, solvates, hydrates and N-oxides thereof;
with a compound Ar1W wherein W is a group selected from X1 (wherein X1 is a leaving atom or group), COX2 (wherein X2 is a halogen atom or a OH group) or SO2X3 (in which X3 is a halogen atom).
2. A process according to claim 1 wherein the reaction is carried out in a solvent in the presence of an acid when W is the group X1.
3. A process according to claim 2 wherein the solvent is selected from an alcohol, ether, acetic acid, water, acetonitrile, substituted amide or ester.
4. A process according to claim 2 wherein the reaction is carried out in an alcohol in the presence of an acid catalyst.
5. A process according to claim 1 wherein the reaction is carried out in the presence of a base, an organic amine or a cyclic amine and an organic solvent when W is the group COX2 and X2 is a halogen atom.
6. A process according to claim 5 wherein the organic solvent is selected from a halogenated hydrocarbon, a dipolar aprotic solvent, an ether or an ester.
7. A process according to claim 1 wherein the reaction is carried out in the presence of a condensing agent and a halogenated hydrocarbon, dipolar aprotic or an ether solvent when W is the group CO2H.
8. A process according to claim 1 wherein the reaction is carried out in the presence of a base, an organic amine or a cyclic amine and a halogenated hydrocarbon, dipolar aprotic or an ether solvent when W is the group SO2X3.
9. A process according to any one of claims 1-8 wherein the compound of formula (2) is prepared by reduction of a compound of formula (4):
15
10. A process according to claim 9 wherein the reduction is carried out by catalytic hydrogenation or by chemical reduction.
11. A process according to claim 1 or claim 9 wherein R4 is a hydrogen atom.
12. A process according to claim 9 wherein the compound of formula (4) is prepared by reaction of a compound of formula (5):
16
with a compound of formula (6a) or (6b):
17
wherein Ra represents a C1-6alkyl group or a silyl group.
13. A process according to claim 12 wherein the reaction is carried out in the presence of an organic solvent.
14. A process according to claim 13 wherein the solvent is selected from an aromatic hydrocarbon, a halogenated hydrocarbon or an ester.
15. A process according to any one of claims 1-14 wherein R1 is the group CO2Alk7.
16. A process according to any one of the preceding claims which comprises subsequently interconverting a compound of formula (1) to another compound of formula (1).
17. A process according to claim 16 which comprises hydrolysing a compound of formula (1) in which R1 is CO2Alk7 to produce a compound of formula (1) in which R1 is CO2H.
18. A process according to claim 16 which comprises esterifying a compound of formula (1) in which R1 is CO2H to produce a compound of formula (1) in which R1 is CO2Alk7.
19. A process according to any one of the preceding claims for the preparation of compounds of formula (1b):
18
wherein G is CR18, N or N(O);
R16, R17 and R18, which may be the same or different is each a hydrogen atom or an atom or group L3(Alk2)tL4(R5)u;
and the salts, solvates, hydrates and N-oxides thereof.
20. A process according to any one of the preceding claims for the preparation of compounds of formula (1d):
19
wherein g is the integer 1, 2, 3 or 4;
R16, is an atom or group L3(Alk2)tL4(R5)u;
and the salts, solvates, hydrates and N-oxides thereof.
21. A process according to any one of the preceding claims for the preparation of:
ethyl (2S)-2-(2-bromo-3-oxospiro3.5non-1-en-1-yl)amino-3-4-(3,5-dichloroisonicotinoyl)aminophenylpropanoate;
and the salts, solvates, hydrates and N-oxides thereof.
22. A process according to any one of the preceding claims for the preparation of:
ethyl (2S)-2-(2-bromo-3-oxo-spiro3.5non-1-en-1-ylamino)-3-4(2,7naphthyridin-1-ylamino)phenylpropanoate;
and the salts, solvates, hydrates and N-oxides thereof.
23. A process according to any one of the preceding claims for the preparation of:
ethyl (2S)-2-(2-isopropylsulfanyl-3-oxo-7-oxa-spiro3.5non-1-en-1yl)amino-3-4-(2,7naphthyridin-1-ylamino)phenylpropanoate;
and the salts, solvates, hydrates and N-oxides thereof.
24. A process according to any preceding one of the claims for the preparation of:
2-hydroxyethyl (2S)-2-(2-bromo-3-oxo-spiro3.5non-1-en-1-ylamino)-3-4-(3,5-dichloroisonicotinoyl)aminophenylpropanoate;
and the salts, solvates, hydrates and N-oxides thereof.
25. A compound of formula (2):
20
wherein:
R1, R2, Rx, Ry and Rz are as defined in claim 1;
Qa is a group N(R4)H;
and the salts, solvates, hydrates and N-oxides thereof.
26. A compound according to claim 25 which is:
3-(4-aminophenyl)-2(S)-(3-oxo-7-oxaspiro3.5non-1-en-1-ylamino)propionic acid hydroxyethyl ester.
27. A compound of formula (4):
21
wherein:
R1, R2, Rx, Ry and Rz are as defined in claim 1;
and the salts, solvates, hydrates and N-oxides thereof.
28. A compound according to claim 27 which is:
3-(4-nitrophenyl)-2(S)-(3-oxo-7-oxaspiro3.5non-1-en-1-ylamino)propionic acid hydroxyethyl ester.