1. A live attenuated homogeneous viral population comprising the WN1415 (+) RNA virus.
2. A vaccine for West Nile virus that protects a subject against West Nile infection comprising a therapeutically effective does of an infectious agent selected from the group consisting of:
a live attenuated infectious (+) RNA virus designated as WN1415,
a vector comprising DNA encoding infectious (+) RNA molecule encoding the West Nile virus, and
the West Nile (+) RNA virus designated as WN956D117B3 (GenBank #M12294).
3. The vaccine as set forth in claim 2 wherein said infectious agent is a vector containing DNA encoding an infectious (+) RNA molecule encoding the West Nile virus.
4. The vaccine as set forth in claim 3 wherein said vector is in the form of a plasmid comprising DNA encoding for infectious (+) RNA molecule encoding the West Nile virus and under the control of an eukaryotic promoter.
5. The vaccine according to claim 4 wherein said plasmid comprises DNA having an intron at position 357 of the DNA set forth in GenBank #M12294.
6. The vaccine according to claim 4 wherein said promoter is a cytomegalovirus promoter.
7. The vaccine as set forth in claim 2 wherein said infectious agent comprises West Nile (+) RNA virus 956D117B3 (GenBank Accession #M12294).
8. The vaccine as set forth in claim 2 further comprising a pharmaceutically acceptable carrier.
9. A method for immunizing a mammal against a West Nile virus comprising the step of administering to the mammal the vaccine of claim 2 and a pharmaceutically acceptable carrier.
10. The method of claim 11 wherein said administering step is performed intracerebrally, intramuscularly, or intradermally.
11. A vector comprising DNA encoding an infectious (+) RNA molecule encoding the West Nile virus.
12. The vector of claim 11 in the form of a plasmid comprising DNA encoding for infectious (+) RNA molecule encoding the West Nile virus under the control of an eukaryotic promoter.
13. The vector of claim 12 wherein said plasmid comprises a DNA having an intron at position 357 of the DNA set forth in GenBank #M12294.
14. The vector of claim 12 wherein said promoter is a cytomegalovirus promotor.
15. The vector of claim 12 designated as pCMVWN.
16. A cell transformed or transfected with the vector of claim 12.
17. A progeny infectious West Nile virus produced by cells containing the vector of claim 12.
18. The progeny infectious West Nile virus according to claim 17, wherein the progeny virus derived from a plasmid having an intron at position 357 of the viral genome as set forth in GenBank #M12294.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1-15. (canceled)
16. A method for determining exposure settings for a target field on a substrate in a lithographic exposure process, comprising:
determining calibration data comprising a plurality of relative calibration positions including position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field;
determining production data by establishing position of the target field on the substrate in the second and third direction;
measuring position of an exposure field in the first direction at least one measurement position relative to position of the exposure field in the second and third direction;
comparing the at least one first relative measurement position and the plurality of relative calibration positions; and
determining, based on the comparing, exposure settings based on the measured position of the exposure field in the first direction and the calibration data, wherein the calibration data relates to at least one relative calibration position which differs from the at least one relative measurement position.
17. The method according to claim 16, wherein the position in the first direction of the calibration field on a calibration substrate is determined using a first sensor.
18. The method according to claim 17, wherein the position of the target field in the first direction is measured using a second sensor and wherein the first sensor and the second sensor are based on a different measuring principle.
19. The method according to claim 17, wherein the position of the calibration field on the calibration substrate differs from the position of the target field on the substrate.
20. The method according to claim 17, wherein the calibration substrate and the substrate are different substrates.
21. The method according to claim 16, wherein the exposure settings comprise at least one member of a set comprising height settings, tilt settings and scanning set points for a support for supporting the substrate comprising the target field during exposure of the target field.
22. The method according to claim 16, further comprising:
determining calibration exposure settings based on the calibration data;
determining production exposure settings based on the measured position of the exposure field; and
determining the exposure settings by correcting the production exposure settings based on the comparing and the calibration exposure settings.
23. The method according to claim 16, further comprising:
correcting the measured position of the exposure field based on the comparison comparing and the calibration data; and
determining the exposure settings based on the corrected measured position.
24. The method according to claim 16, wherein providing the production data comprises measuring position of a further target field in the first direction at least one position relative to the position of the further target field while measuring the position in the first direction of the target field.
25. The method according to claim 16, wherein a distance to a first edge of the calibration field of at least one of the plurality of positions is smaller than a distance to corresponding edge of the target field of the at least one position.
26. The method according to claim 16, wherein providing the calibration data comprises determining position of a further calibration field in the first direction at a further plurality of positions in the second and third direction relative to the position of the further calibration field.
27. The method according to claim 16, comprising exposing the target field in accordance with the determined exposure data.
28. A lithographic exposure apparatus for exposing a target field, comprising:
a storage device configured to store calibration data comprising position of a calibration field determined at a plurality of calibration positions in a second and third direction relative to the position of the calibration field;
an alignment sensor arranged to measure position of the target field in the second and third direction;
a sensor to measure position of the target field in a first direction at least one measurement position relative to the position of the target field in the second and third direction; and
a unit configured to compare the at least one first relative measurement position and the plurality of the calibration positions and to determine, based on the comparison, exposure settings based on the measured position of the target field in the first direction and the calibration data, wherein the calibration data relates to at least one relative calibration position which differs from the at least one relative measurement position.
29. A computer readable storage medium having instructions stored thereon that, if executed by a computing device, cause the computing device to perform a method comprising:
determining calibration data comprising a plurality of relative calibration positions including position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field;
determining production data by establishing position of the target field on the substrate in the second and third direction;
measuring position of an exposure field in the first direction at least one measurement position relative to position of the exposure field in the second and third direction;
comparing the at least one first relative measurement position and the plurality of relative calibration positions; and
determining, based on the comparing, exposure settings based on the measured position of the exposure field in the first direction and the calibration data, wherein the calibration data relates to at least one relative calibration.