1460733331-c8b9f41f-7306-4a48-8a2a-0683c0fe30b1

What is claimed is:

1. A gas delivery system for providing a gas to manufacturing equipment, comprising:
a gas supply unit for providing the gas to the manufacturing equipment including devices to regulate the supply of gas from the gas supply unit to the manufacturing equipment;
a main control unit for regulating the supply of the gas to the manufacturing equipment; and
a supplemental control unit which receives an emergency shutdown signal from the main control unit for closing off the supply of gas in response to a malfunction of the main control unit and generates a signal for maintaining a gas flow to operate the manufacturing equipment until the cause of the malfunction has been determined.
2. The system of clam 1, which further includes a warning unit which cautions a worker regarding the malfunction so that the worker can determine the cause of the malfunction.
3. The system of clam 1, the supplemental control unit has an auto recovery function.
4. The system of clam 1, wherein the emergency shutdown signal generated from the main control unit comprises a command for closing off the flow of gas from the gas supply unit.
5. The system of claim 1, wherein the supplemental control unit provides for the gas to flow to the manufacturing equipment until the cause of the malfunction has been determined by a worker who then decides when to terminate the gas flow.
6. The system of claim 1, wherein the supplemental control unit is coupled to a signal output end of the main control unit so that when the main control unit outputs the emergency shutdown signal, the supplemental control unit receives the emergency shutdown signal.
7. The system of claim 1, wherein the devices to regulate the supply of gas from the gas supply unit to manufacturing equipment comprise onoff valves.
8. The system of claim 7, wherein the onoff valves comprise air operated onoff valves.
9. The system of claim 1, which further comprises a relay for independently supplying power to each of the supplemental control unit and the main control unit.
10. The system of claim 1, further comprising a supplemental power supply for providing power to the supplemental control unit independently of the main control unit.
11. The system of claim 10, wherein the supplemental control unit further comprises a warning unit which is coupled to the supplemental power supply for cautioning a worker of the malfunction.
12. The system of claim 2, wherein the warning unit is one of a display unit and a warning lamp for displaying the operating status of the main control unit.
13. The system of claim 1, further comprising a gas leakage detection unit for sensing a gas leakage and transmitting a gas leakage detection signal to the main control unit such that the main control unit generates the emergency shutdown signal.
14. The system of claim 1, further comprising a plurality of gas containers for storing the gas to be supplied to the manufacturing equipment.
15. A gas delivery system comprising:
a gas supply unit which includes a gas flow path for supplying a gas to manufacturing equipment, and a plurality of onoff valves installed along the gas flow path to control the gas stream passing through the gas flow path;
a main control unit for controlling the supply of gas from the gas flow path to the manufacturing equipment; and
a supplemental control unit which receives an emergency shutdown signal from the main control unit and generates a signal for keeping open the plurality of onoff valves for maintaining a gas flow to operate the manufacturing equipment until the cause of the malfunction has been determined.
16. The system of claim 15, wherein the emergency shutdown signal generated from the main control unit comprises a command for closing off the plurality of valves.
17. The system of claim 15, wherein the supplemental control unit has an auto recovery function.
18. The system of claim 15, further comprising a relay for independently supplying power to each of the supplemental control unit and the main control unit.
19. The system of claim 15, which further includes a warning unit which cautions a worker regarding the malfunction so that the worker can determine the cause of the malfunction.
20. A method for providing a gas to manufacturing equipment, comprising:
supplying and regulating a flow of the gas to the manufacturing equipment using a main control unit;
generating an emergency shutdown signal from the main control unit for closing off the supply of gas in response to a malfunction of the main control unit, the main control unit in communication with a supplemental control unit; and
generating a supplemental control signal for maintaining the gas flow to operate the manufacturing equipment from the supplemental control unit until the cause of the malfunction has been determined.
21. The method of claim 20, further comprising:
stopping the flow of gas to the manufacturing equipment if there is a gas leakage.
22. A fluid delivery system for providing a fluid to manufacturing equipment, comprising:
a fluid supply unit for providing the fluid to the manufacturing equipment including devices to regulate the supply of fluid from the fluid supply unit to the manufacturing equipment;
a main control unit for regulating the supply of the fluid to the manufacturing equipment; and
a supplemental control unit which receives an emergency shutdown signal from the main control unit for closing off the supply of fluid in response to a malfunction of the main control unit, the supplemental control unit generating a signal for maintaining a fluid flow to operate the manufacturing equipment until the cause of the malfunction has been determined.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A resist composition for immersion exposure comprising:
a fluorine-containing polymeric compound (F) comprising a structural unit (f1) represented by general formula (f1-1) or (f1-2) shown below and a structural unit (f2) represented by general formula (f2-1) shown below;
a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and
an acid generator component (B) that generates acid upon exposure:
wherein each R independently represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group; Aaryl represents a divalent aromatic cyclic group which may have a substituent; X01 represents a single bond or a divalent linking group; and each R2 independently represents an organic group having a fluorine atom;
wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4):
wherein R21 represents an alkyl group of 2 or more carbon atoms; R22 and R23 are bonded to each other to form an aliphatic monocyclic group of 7 or more carbon atoms; R24 represents a branched alkyl group of 3 or more carbon atoms; R25 and R26 are bonded to each other to form an aliphatic cyclic group; R27 represents an acid dissociable, dissolution inhibiting group; R28 represents a divalent linking group; R29 represents a linear or branched alkyl group or an aliphatic cyclic group; n represents an integer of 0 to 3; R30 and R30\u2032 each independently represent a linear or branched alkyl group or a hydrogen atom; and R29 and R30 may be bonded to each other to form an aliphatic cyclic group.
2. The resist composition for immersion exposure according to claim 1, which is a positive resist composition.
3. The resist composition for immersion exposure according to claim 2, wherein said base component (A) is a resin component (A1) that exhibits increased solubility in an alkali developing solution under action of acid.
4. The resist composition for immersion exposure according to claim 3, wherein said resin component (A1) comprises a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group.
5. The resist composition for immersion exposure according to claim 4, wherein said resin component (A1) further comprises a structural unit (a2) derived from an acrylate ester having a lactone-containing cyclic group.
6. The resist composition for immersion exposure according to claim 4, wherein said resin component (A1) further comprises a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group.
7. The resist composition for immersion exposure according to claim 1, which further comprises a nitrogen-containing organic compound (D).
8. A method of forming a resist pattern comprising:
applying the resist composition for immersion exposure of any one of claims 1 and 2-7 to a substrate to form a resist film;
subjecting said resist film to immersion exposure; and
subjecting said resist film to alkali developing to form a resist pattern.
9. A fluorine-containing polymeric compound comprising:
a structural unit (f1) represented by general formula (f1-1) or (f1-2) shown below:
wherein each R independently represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group; Aaryl represents a divalent aromatic cyclic group which may have a substituent; X01 represents a single bond or divalent linking group; and each R2 independently represents an organic group having a fluorine atom, and
a structural unit (f2) represented by general formula (f2-1) shown below:
wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4):
wherein R21 represents an alkyl group of 2 or more carbon atoms; R22 and R23 are bonded to each other to form an aliphatic monocyclic group of 7 or more carbon atoms; R24 represents a branched alkyl group of 3 or more carbon atoms; R25 and R26 are bonded to each other to form an aliphatic cyclic group; R27 represents an acid dissociable, dissolution inhibiting group; R28 represents a divalent linking group; R29 represents a linear or branched alkyl group or an aliphatic cyclic group; n represents an integer of 0 to 3; R30 and R30\u2032 each independently represent a linear or branched alkyl group or a hydrogen atom; and R29 and R30 may be bonded to each other to form an aliphatic cyclic group.