1. A method for the synthesis of 18F-labeled trifluoromethylketones comprising the steps of
reacting 18F-F2 with a silyl ether compound having the general formula 1
wherein R refers to an alkyl group having between 1 and 24 carbon atoms or an aryl group having between 6 and 24 carbon atoms under reaction conditions sufficient to form a 18F-labeled trifluoromethylketone.
2. The method of claim 1, wherein the alkyl or the aryl group comprises a ring.
3. The method of claim 1, wherein the alkyl group is substituted with at least one halogen, nitro, or alkoxy group.
4. The method of claim 3, wherein the alkoxy group has one to eight carbon atoms.
5. The method of claim 3, wherein the substituent does not participate in the reaction.
6. The method of claim 3, wherein the alkoxy is substituted with at least one substituents selected from the group consisting of an alkyl group having between 1 and 8 carbon atoms, a halogen, and an amino group, or any combination thereof.
7. The method of claim 1, wherein the condition sufficient to form a 18F-labeled trifluoromethylketone include a reaction temperature of between about \u221250\xb0 C. to about \u221215\xb0 C.
8. The method of claim 1, wherein the 1819F-F2 is prepared by bombardment with 18OO2 in a cyclotron and mixing with non-radioactive F2.
9. The method of claim 1, wherein the 18F-F2 mixture is bubbled into a solution comprising silyl ether compounds for about 5 to 15 minutes.
10. The method of claim 1, wherein the silyl ether is 2,2-difluoroenol silyl ether and further wherein the 2,2-difluroenol silyl ether is prepared by:
mixing magnesium, tetrahydrofuran, and chlorotrimethylsilane to form a reactant mixture;
cooling the mixture to between about \u221215\xb0 C. to 5\xb0 C.;
adding trifluoroacetophenone to the cooled mixture; and
stirring the mixture for about 0.5 to 1.5 hours to produce the difluoroenol silyl ether.
11. The method of claim 10, wherein the difluroenol silyl ether is 2,2-difluoro-1-phenyl-1-trimethylsiloxy-ethene.
12. The method of claim 1, which further comprises:
dissolving the silyl ether compound in acetonitrile to form a solution;
cooling the solution to about \u221250\xb0 to about \u221215\xb0 C.;
preparing a mixture of 1819F-F2 and nitrogen; and
bubbling the mixture of 1819F-F2 and nitrogen into the solution for about 5 to 15 minutes to form a reaction mixture.
13. The method of claim 1, wherein the 18F-labeled trifluoromethylketones synthesized have a radiochemical purity greater than 99%.
14. The method of claim 1, wherein the 18F-labeled trifluoromethylketones that are synthesized have specific activities between about 15 to 20 GBqmmol at the end of synthesis.
15. The method of claim 1, wherein the radiochemical yields of the 18F-labeled trifluoromethylketones are between about 45 to 55%.
16. The method of claim 1, wherein the 18F-labeled trifluoromethylketones synthesized has the following general formula 2a.
17. The method of claim 1, wherein the 18F-labeled trifluoromethylketones synthesized has the following general formula 2b.
18. The method of claim 1, wherein the 18F-labeled trifluoromethylketones synthesized has the following general formula 2c.
19. The method of claim 1, wherein the 18F-labeled trifluoromethylketones synthesized has the following general formula 2d.
20. An imaging agent comprising the 18F-labeled trifluoromethyl ketone of claim 1.
21. The imaging agent of claim 20, having a radiochemical purity of about 99% for use in positron emission tomography.
22. A marker for detecting cell proliferation or viral infections comprising the 18F-labeled trifluoromethyl ketone of claim 1.
23. The marker of claim 22, having a radiochemical purity of about 99%.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of manufacturing polymer-coated particles useful for chemical mechanical polishing magnetic, optical, semiconductor or silicon substrates comprising:
providing a dispersion of particle cores in a non-aqueous solvent;
reacting a polymeric precursor within the dispersion to polymerize the polymeric precursor to form a polymer and to coat the particle cores with the polymer, the polymeric precursor being monomeric or oligomeric and the polymer coating at least a portion of the surface of the particle cores with the polymer and forming the polymer-coated particles having a solid outer polymeric shell;
substituting the non-aqueous solvent with water to form an aqueous mixture containing the polymer-coated particles; and
forming an aqueous chemical mechanical polishing formulation with the polymer-coated particles without drying the polymer-coated particles.
2. The method of claim 1 including the additional step of separating the polymer-coated particles as a supernatant.
3. The method of claim 1 wherein the aqueous substituting step relies upon azeotropic distilling to remove the non-aqueous solvent from the polymer-coated particles.
4. The method of claim 1 including the additional step of attaching functional groups to the polymer-coated particles.
5. The method of claim 1 wherein the dispersing particles in the non-aqueous solvent occurs without an earlier solvent transfer from an aqueous solution.
6. A method of manufacturing polymer-coated particles useful for chemical mechanical polishing magnetic, optical, semiconductor or silicon substrates comprising:
providing a dispersion of particle cores in a non-aqueous solvent;
reacting a polymeric precursor within the dispersion to polymerize the polymeric precursor to form a polymer and to coat the particle cores with the polymer, the polymeric precursor being monomeric or oligomeric and the polymer coating at least a portion of the surface of the particle cores with the polymer and forming the polymer-coated particles having a solid outer polymeric shell;
substituting the non-aqueous solvent with water to form an aqueous mixture containing the polymer-coated particles; and
forming an aqueous chemical mechanical polishing formulation with an aqueous dispersion of the polymer-coated particles without drying the polymer-coated particles.
7. The method of claim 6 including the additional step of separating the polymer-coated particles as a supernatant.
8. The method of claim 6 wherein the aqueous substituting step relies upon azeotropic distilling to remove the non-aqueous solvent from the polymer-coated particles.
9. The method of claim 6 including the additional step of attaching functional groups to the polymer-coated particles.
10. The method of claim 6 wherein the dispersing particles in the non-aqueous solvent occurs without an earlier solvent transfer from an aqueous solution.