1461116316-ed6fcf8c-40e8-4c1d-9eb6-5ec8815aa5c8

1. An ultrasonic surgical system, comprising:
an instrument and an ultrasonic signal generator linked to the instrument for supplying a desired signal to the instrument, the instrument includes an ultrasonic transducer, a housing and an end-effector;
the ultrasonic signal generator includes a control system, the control system includes a generator supplying electrical energy to the instrument, the electrical energy supplied by the generator being controlled such that power applied by the instrument is maintained constant once a predetermined pressure threshold is met.
2. The ultrasonic surgical system according to claim 1, wherein the power applied by the instrument is equal to the product of the current and voltage generated by the generator.
3. The ultrasonic surgical system according to claim 2, further including means for measuring impedance passing through the instrument and controlling the power level based upon the measured impedance.
4. The ultrasonic surgical system according to claim 3, wherein the means for controlling the power level includes adjusting current passing through the instrument based upon the measured impedance.
5. The ultrasonic surgical system according to claim 1, wherein voltage supplied by the generator is increased as the force applied continues to increase.
6. The ultrasonic surgical system according to claim 3, further including means for measuring impedance passing through the instrument and controlling the power level based upon the measured impedance.
7. The ultrasonic surgical system according to claim 6, wherein the means for controlling the power level includes adjusting current passing through the instrument based upon the measured impedance.
8. The ultrasonic surgical system according to claim 1, further including means for balancing vibration levels of the instrument with pressure applied by the instrument.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A surface emitting laser comprising:
a substrate with top and bottom surfaces;
a first stack of mirror layers of alternating indices of refraction located upon the top surface of the substrate;
an active layer disposed over the first stack;
a second stack of mirror layers of alternating indices of refraction disposed over the active layer;
a current confinement region disposed within the second stack of mirrors; and
a reduced-diameter mirror extension portion of the second stack that forms an optical aperture of the surface emitting laser extending outwards from a center portion of the second stack on a side of the second stack opposite the active layer said reduced-diameter mirror extension portion having a relative diameter smaller than the current confining region and wherein the relative diameter and height of the reduced-diameter mirror extension portion results in emission coupling only a fundamental mode of optical energy through the mirror extension portion and suppresses higher order transverse modes.
2. The surface emitting laser as in claim 1 further comprising an annular contact disposed around a base of the mirror extension.
3. The surface emitting laser as in claim 1 wherein the mirror extension further comprises an undoped distributed Bragg reflector.
4. The surface emitting laser as in claim l wherein the mirror extension further comprises a dielectric distributed Bragg reflector.
5. The surface emitting laser as in claim l wherein the mirror extension further comprises a diameter of from 4 to 5 micrometer.
6. The surface emitting laser as in claim l wherein the mirror extension further comprises a height of approximately 0.2 to 1.5 micrometers.
7. The surface emitting laser as in claim 1 wherein the mirror extension further comprises a cylindrical shaped region.
8. The surface emitting laser as in claim 1 wherein said laser is a gain guided implant VCSEL including an implant region for current confinement.
9. The surface emitting laser as in claim 1 further comprising disposing a p-contact layer on an antiphase layer of the second stack of mirror layers.
10. A surface emitting laser comprising:
a substrate with top and bottom surfaces;
a first stack of mirror layers of alternating indices of refraction located upon the top surface of the substrate;
an active layer disposed over the first stack; and
a second stack of mirror layers of alternating indices of refraction disposed over the active layer, said second stack of mirror layers having a current confinement region, a first diameter adjacent the active layer and a step change to a second reduced diameter on a distal end of a relative size smaller than the current confining region and wherein the relative diameter and height of the second reduced diameter portion of second stack of mirror layers results in emission coupling only a fundamental mode of optical energy through the distal end and suppresses higher order transverse modes.
11. The surface emitting laser as in claim 10 further comprising an annular contact disposed around the second stack of mirror layers on a surface of the step change from the first diameter to the second diameter.
12. The surface emitting laser as in claim 10 wherein mirror layers within the second reduced diameter further comprises an undoped distributed Bragg reflector.
13. The surface emitting laser as in claim 10 wherein mirror layers within the second reduced diameter further comprises a dielectric distributed Bragg reflector.
14. The surface emitting laser as in claim 10 wherein the second reduced diameter further comprises 4 to 5 micrometer.
15. The surface emitting laser as in claim 10 wherein the mirror layers within the second reduced diameter further comprises a height of approximately 0.2 to 1.5 micrometers.
16. The surface emitting laser as in claim 10 wherein the mirror layers within the second reduced diameter further comprises a cylindrical shaped region.
17. The surface emitting laser as in claim 10 wherein said laser is a gain guided implant VCSEL including an implant region for current confinement.
18. The surface emitting laser as in claim 10 further comprising disposing a p-contact layer on an antiphase layer of the second stack of mirror layers.
19. A surface emitting laser comprising:
a substrate with top and bottom surfaces;
a first stack of mirror layers of alternating indices of refraction located upon the top surface of the substrate;
an active layer disposed over the first stack; and
a second stack of mirror layers of alternating indices of refraction disposed over the active layer, said second stack of mirror layers having a current confinement region, a first portion of mirror layers having a first diameter adjacent the active layer and a second portion of mirror layers having a second reduced diameter on a distal end, wherein a relative height and diameter of the second reduced diameter portion of the second stack of mirrors results in emission coupling only a fundamental mode of optical energy through the distal end and suppresses higher order transverse modes.
20. The surface emitting laser as in claim 19 further comprising disposing a p-contact on an outside surface of a periphery of a mirror layer of the first portion lying adjacent the second portion.