1. A method of manufacturing a flash memory device, the method comprising:
forming an insulating layer, first and second hard mask layers, and a first photoresist pattern over a semiconductor substrate, the first photoresist pattern having a first pitch;
coating a silylation reagent containing silicon over the first photoresist pattern;
baking the first photoresist pattern coated with the silylation reagent to change outer portion of the first photoresist pattern to a silylated photoresist containing silicon;
removing an upper region of the silylated photoresist to form a silylated photoresist pattern having a second pitch that is less than the first pitch;
etching the second hard mask layer using the silylated photoresist pattern to form a second hard mask layer pattern that extends along a first direction;
forming a second photoresist pattern defining a first region that is not exposed and a second region that is exposed, the second region extending along a second direction that is orthogonal to the first direction and exposing at least a portion of the second hard mask layer pattern;
etching the first hard mask layer using the second photoresist pattern to form a first hard mask layer pattern having a rectangular-like shape; and
etching the insulating layer using the first hard mask layer pattern to form a contact hole having a rectangular-like shape, the contact hole exposing the semiconductor substrate.
2. The method of claim 1, wherein the first photoresist pattern is formed from a chemical amplification type photosensitizer.
3. The method of claim 1, wherein the first photoresist pattern defining a plurality of structures and a plurality of spaces, each space being provided between the two adjacent structures, each structure having a width that is wider than the space along the second direction.
4. The method of claim 1, wherein the first photoresist pattern defining a plurality of structures and a plurality of spaces, each space being provided between the two adjacent structures, each structure having a width that is narrower than the space along the second direction.
5. The method of claim 4, wherein spacer material is formed over the first photoresist pattern.
6. The method of claim 5, wherein the spacer material is formed from inorganic material or organic material containing silicon.
7. The method of claim 1, wherein the silylation reagent includes SiO2.
8. The method of claim 1, wherein the silylated photoresist pattern is formed by performing a dry etch process.
9. The method of claim 8, wherein at the time of the dry etch process, the first photoresist pattern that has not changed to the silylated photoresist is also removed.
10. The method of claim 1, wherein the second pitch of the silylated photoresist pattern is no more than one half of the first pitch of the first photoresist pattern.
11. The method of claim 1, wherein an anisotropic etch process is performed to etch the second hard mask layer.
12. The method of claim 1, wherein in the step of forming the second hard mask layer patterns, a photoresist layer is provided between the second hard mask layer patterns at the second region.
13. The method of claim 1, wherein in the step of forming the second hard mask layer pattern, a photoresist layer is not coated between the second hard mask layer patterns at the first region.
14. A method of manufacturing a flash memory device, the method comprising:
providing a substrate having an insulating layer, a first mask layer over the insulating layer, a second mask layer over the first mask layer, a first photoresist pattern over the second mask layer, the first photoresist pattern having a first pitch;
providing a material layer over the first photoresist pattern;
etching the material layer to convert the material layer into a material layer pattern having a second pitch that is less than the first pitch;
etching the second hard mask layer using the material layer pattern to form a second hard mask layer pattern that extends along a first direction;
forming a second photoresist pattern defining a first region that is not exposed and a second region that is exposed, the second region extending along a second direction that is orthogonal to the first direction;
etching the first hard mask layer using the second photoresist pattern to form a first hard mask layer pattern having an angular shape; and
etching the insulating layer using the first hard mask layer pattern to form a contact hole having an angular shape that expose material underlying the insulating layer.
15. The method of claim 14, wherein the contact hole has a rectangular-like shape.
16. The method of claim 14, wherein the contact hole has corners that are substantially angular.
17. The method of claim 14, wherein the material exposed by the contact hole is silicon material.
18. The method of claim 14, wherein the material layer is coated over the first photoresist pattern.
19. The method of claim 18, wherein the material layer is inorganic material or organic material containing silicon.
20. The method of claim 14, wherein providing the material layer over the first photoresist pattern comprises:
coating a silylation reagent containing silicon over the first photoresist pattern; and
baking the first photoresist pattern coated with the silylation reagent to change a portion of the first photoresist pattern to the material layer containing silicon.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A culture system comprising:
(a) a fluid inlet;
(b) a first culture compartment having a tubular housing;
(c) a first end piece attached to the fluid inlet on one side and to a first end of the tubular housing on a second side,
(d) a second culture compartment coaxial with the first culture compartment, the second culture compartment having a proximal end and a distal end;
(e) a fluid connector having a first side mounted on a second end of the tubular housing and a second side mounted on the proximal end of the second culture compartment, the fluid connector having a through bore passing from the first side to the second side of the fluid connector, wherein the through bore directs a fluid stream from the first culture compartment into the second culture compartment;
(f) a connector filter positioned on the first side of the fluid connector to filter a fluid stream passing out of the first culture compartment and into the through bore of the fluid connector;
(g) a fluid outlet;
(h) a distal end piece mounted on the distal end of the second culture compartment and connected to the fluid outlet; and
(i) an outlet filter transversing the second culture compartment including:
a support cylinder having a first end supported by the fluid connector and a second end supported by the distal end piece,
a molecular weight cut-off membrane secured to an exterior surface of the support cylinder, and
a chamber between the exterior surface of the cylinder and an interior surface of the membrane, the chamber in fluid communication with the through bore of the fluid connector and the fluid outlet.
2. A culture system comprising:
(a) a fluid inlet;
(b) a first culture compartment having a tubular housing made of a fluid-impenetrable material, wherein the tubular housing has a first end and an opposed second end;
(c) a first end piece attached to the fluid inlet on one side and to the first end of the tubular housing on a second side,
(d) a second culture compartment coaxial with the first culture compartment and in fluid communication with the first culture compartment, the second culture compartment having a proximal end and a distal end;
(e) a fluid connector having a first side mounted on the second end of the tubular housing and a second side mounted on the, proximal end of the second culture compartment, the fluid connector having a through bore passing from the first side to the second side of the fluid connector;
(f) a connector filter having a first end and a second end, wherein the first end is mounted on the first side of the fluid connector, the connector filter positioned to filter a fluid stream passing out of the first culture compartment into the through bore of the fluid connector and into the second culture compartment;
(g) a fluid outlet;
(h) a distal end piece mounted on the distal end of the second culture compartment and connected to the fluid outlet; and
(i) an outlet filter having a one end mounted on a proximal side of the distal end piece, wherein the outlet filter is a membrane carrier assembly transversing the second culture compartment wherein the membrane carrier assembly has:
a support cylinder;
a molecular weight cut-off membrane secured to an exterior surface of the support cylinder, and
a chamber between the exterior surface of the cylinder and an interior surface of the membrane, the chamber in fluid communication with the through bore of the fluid connector and the fluid outlet.
3. The culture system of claim 2, wherein the through bore of the fluid connector is intersected by a through bore of a second fluid inlet.
4. The culture system of claim 2, further comprising at least one penetration port extending through a wall of the first or second culture compartment.
5. The culture system of claim 2, further comprising a gas venting means for allowing gas to escape from the first or second culture compartment as the compartment is filled with fluid.
6. The culture system of claim 2, further comprising a fill means for inserting fluids into or removing fluids out of the first or second culture compartment.
7. The culture system of claim 2, wherein the first end, the distal end and the fluid connector are concurrently rotated by a drive assembly.
8. The culture system of claim 2, wherein the second culture compartment has a greater volume than the first culture compartment.
9. The culture system of claim 2, further comprising an identifier.
10. The culture system of claim 9, wherein the identifier is a bar code.
11. A culture system comprising:
(a) a fluid inlet;
(b) a first culture compartment having
(i) a fluid-impenetrable tubular sleeve having a first end and an opposed second end,
(ii) a growth compartment within the sleeve, and
(iii) a first end piece having one side attached to the fluid inlet and a second side attached to a first end of the tubular sleeve;
(c) a second culture compartment coaxial with the first culture compartment, the second culture compartment having
(i) a fluid-impenetrable housing having a proximal end and a distal end; and
(ii) a growth compartment within the housing that is in fluid communication with the growth compartment within the sleeve,
(d) a fluid connector having a first side mounted on the second end of the tubular sleeve and a second side mounted on the proximal end of the housing, the fluid connector having a through bore passing from the first side to the second side of the fluid connector wherein the through bore is in fluid communication with the growth compartment of the first and second culture compartment;
(e) a connector filter having a one end supported by the first side of the fluid connector;
(f) a membrane carrier assembly transversing the second culture compartment comprising
(i) a support cylinder,
(ii) a molecular weight cut-off membrane secured to an exterior surface of the support cylinder, and
(iii) a chamber between the exterior surface of the cylinder and an interior surface of the membrane, the chamber in fluid communication with the through bore of the fluid connector and the growth compartment within the housing;
(g) a fluid outlet; and
(h) a distal end piece mounted on the distal end of the second culture compartment and connected to the fluid outlet.
12. The culture system of claim 11, wherein the connector filter includes a molecular weight cut-off membrane.
13. The culture system of claim 12, wherein the connector filter includes a molecular weight cut-off membrane having a different molecular weight cut-off than the molecular weight cut-off membrane of the membrane carrier assembly.
14. The culture system of claim 12, wherein the molecular weight cut-off membrane of the connector filter is identical to the molecular weight cut-off membrane of the membrane carrier assembly.
15. The culture system of claim 11, wherein the connector filter includes:
a cylindrical support transversing the first culture compartment, the support having a first end supported by the first end of the sleeve and a second end supported by the first side of the fluid connector;
a molecular weight cut-off membrane secured to an exterior surface of the cylindrical support, and
a channel between the exterior surface of the cylindrical support and an interior surface of the membrane, the channel in fluid communication with the through bore of the fluid connector and the growth compartment of the first and second culture compartment.