1. A vending machine comprising:
a tray comprising a dispensing door openable to dispense merchandise disposed in said tray, said dispensing door being connected to a sensor actuator;
a sensor comprising an actuatable element that causes an operation when actuated by said sensor actuator, said sensor comprising a holder; and
a biasing device that imparts a biasing force against said holder that compensates for relative movement between said actuatable element and said sensor actuator so as to maintain said actuatable element substantially at a predetermined spatial position with respect to said sensor actuator,
wherein when said tray is in an activating position, opening of said dispensing door causes said sensor actuator to actuate said actuatable element to cause said operation, and wherein said holder and said biasing device are mounted on a mounting bracket.
2. The vending machine according to claim 1, wherein said biasing device maintains a substantially constant gap between said actuatable element and said sensor actuator in said activating position.
3. The vending machine according to claim 1, wherein said holder is formed with a groove and a recess adjacent said groove, and wherein said biasing device is placed in said recess and said mounting bracket passes through said groove.
4. The vending machine according to claim 1, wherein said holder comprises a leading face that protects a portion of said sensor from impact applied against said leading face.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A radiation sensitive resin composition comprising:
a first polymer having a group represented by a following formula (1); and
a radiation sensitive acid generator,
wherein in the formula (1),
n is an integer of 2 to 4,
X represents a single bond or a bivalent organic group,
A represents a (n+1) valent linking group, and
each Q independently represents a group that includes an alkali-dissociable group.
2. The radiation sensitive resin composition according to claim 1, wherein A in the formula (1) represents an alicyclic group having 4 to 20 carbon atoms, or a chain hydrocarbon group having 1 to 20 carbon atoms.
3. The radiation sensitive resin composition according to claim 1, wherein Q in the formula (1) is a group represented by a following formula (2-1) or a following formula (2-2):
wherein in the formula (2-1),
each of R2 and R3 independently represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms,
R4 represents a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 10 carbon atoms,
R5 represents a fluorine atom or a monovalent organic group, wherein a part or all of hydrogen atoms included in the hydrocarbon group represented by R2, R3 and R4 are substituted or unsubstituted, and a part or all of hydrogen atoms included in the monovalent organic group represented by R5 are substituted or unsubstituted, and
wherein in the formula (2-2),
each of R6 and R7 independently represents a hydrogen atom or a chain hydrocarbon group having 1 to 10 carbon atoms, and
R8 represents a monovalent organic group.
4. The radiation sensitive resin composition according to claim 1, wherein a content of structural units having the group represented by the formula (1) with respect to entire structural units that constitute the first polymer is no less than 5 mol %.
5. The radiation sensitive resin composition according to claim 1, further comprising: a second polymer which is a base polymer and which has an acid-dissociable group.
6. A method for forming a pattern, comprising:
forming a resist film by applying the radiation sensitive resin composition according to claim 1 on a substrate;
exposing at least a part of the resist film by irradiating with a radioactive ray by liquid immersion lithography;
heating the exposed resist film; and
developing the heated resist film.
7. A polymer comprising:
a group represented by a following formula (1):
wherein in the formula (1),
n is an integer of 2 to 4,
X represents a single bond or a bivalent organic group,
A represents a (n+1) valent linking group, and
each Q independently represents a group that includes an alkali-dissociable group.
8. The polymer according to claim 7, wherein A in the formula (1) represents an alicyclic group having 4 to 20 carbon atoms or a chain hydrocarbon group having 1 to 20 carbon atoms.
9. The polymer according to claim 7, wherein Q in the formula (1) represents a group represented by a following formula (2-1) or a following formula (2-2):
wherein in the formula (2-1),
each of R2 and R3 independently represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms,
R4 represents a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 10 carbon atoms,
R5 represents a fluorine atom or a monovalent organic group, wherein a part or all of hydrogen atoms included in the hydrocarbon group represented by R2, R3 and R4 are substituted or unsubstituted, and a part or all of hydrogen atoms included in the monovalent organic group represented by R5 are substituted or unsubstituted, and
wherein in the formula (2-2),
each of R6 and R7 independently represents a hydrogen atom or a chain hydrocarbon group having 1 to 10 carbon atoms, and
R8 represents a monovalent organic group.
10. A compound represented by a following formula (0):
wherein in the formula (0),
n is an integer of 2 to 4,
X represents a single bond or a bivalent organic group,
A represents a (n+1) valent linking group,
each Q independently represents a group that includes an alkali-dissociable group, and
R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group.
11. The compound according to claim 10, wherein A in the formula (0) represents an alicyclic group having 4 to 20 carbon atoms or a chain hydrocarbon group having 1 to 20 carbon atoms.
12. The compound according to claim 10, wherein Q in the formula (0) represents a group represented by a following formula (2-1) or a following formula (2-2):
wherein in the formula (2-1),
each of R2 and R3 independently represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms,
R4 represents a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 10 carbon atoms,
R5 represents a fluorine atom or a monovalent organic group, wherein a part or all of hydrogen atoms included in the hydrocarbon group represented by R2, R3 and R4 are substituted or unsubstituted, and a part or all of hydrogen atoms included in the monovalent organic group represented by R5 are substituted or unsubstituted, and
wherein in the formula (2-2),
each of R6 and R7 independently represents a hydrogen atom or a chain hydrocarbon group having 1 to 10 carbon atoms, and
R8 represents a monovalent organic group.