1. A system for enhancing the business performance of an enterprise, comprising:
one or more client systems;
a server operably coupled to said one or more client systems over a network;
a data storage device coupled to said server;
a component business model map of components for said enterprise, said map having been developed using an industry business architecture model residing on said server, said model having business processes, enterprise key performance indicators, and attributes;
operational key performance indicators in said model, based on said enterprise key performance indicators;
an automatic data collection apparatus coupled to said server, for gathering cost center data from said enterprise, and therefrom calculating said enterprise and said operational key performance indicators, and gradients of said enterprise key performance indicators; and
a real-time dashboard having a user interface comprising said component business model map, said key performance indicators, and said gradients for modifying said business processes and therefrom recalculating said key performance indicators using said cost center data and said gradients.
2. The system of claim 1, wherein said dashboard is adapted to show a heat map from said component business model map in response to selection of a corresponding enterprise key performance indicator.
3. The system of claim 1, wherein said dashboard displays a key performance indicator tree with one of said enterprise key performance indicators as the root and said operational key performance indicators as its children.
4. The system of claim 1, further comprising an enterprise architecture assessment model performing:
generating a maturity model map including a component business model, a process model, a service model, and an information model, each said model having content elements;
defining specific levels of maturity for said maturity model map;
determining associations, relationships, and linkages between said content elements; and
therefrom determining one of said specific levels of aggregate maturity for said business model according to an algorithm.
5. The system of claim 1 wherein said industry business architecture model comprises a component business model, a process model, a services model, and an information model.
6. The system of claim 5 wherein said information model comprises a data model, a message model, and a glossary of business terms.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A scanner for performing an exposure process through a photomask on a wafer, wherein the exposure process comprises an alignment step and an exposure step, and the scanner comprising:
an alignment apparatus;
a wafer table, comprising at least one chuck hole to attach the wafer to the wafer table by vacuum chucking; and
a controller, moving the wafer table to align the wafer with the alignment apparatus, detecting an actual position of each of a plurality of alignment marks on the wafer, calculating an index value based on a difference between a predicted position and the actual position of each said alignment mark, adjusting a vacuum pressure of the at least one chuck hole in the alignment step when the index value is larger than a first threshold value, controlling the scanner to finish the exposure process when the index value is smaller than or equal to the first threshold value.
2. The scanner of claim 1, wherein the controller repeats the aligning of the wafer, the detecting of the actual positions, and the calculating of the index value in the alignment step after adjusting the vacuum pressure of the at least one chuck hole.
3. The scanner of claim 1, wherein the at least one chuck hole comprises a plurality of chuck holes sharing the same vacuum pressure.
4. The scanner of claim 1, wherein the controller adjusts the vacuum pressure according to a preset sequence of a plurality of candidate pressures, and the controller sets the vacuum pressure to be one said candidate pressure that keeps the index value smaller than or equal to the first threshold value.
5. The scanner of claim 1, wherein the at least one chuck hole comprises a plurality of chuck holes arranged into a plurality of clusters, each said cluster comprises at least one of the chuck holes, the at least one chuck hole in each said cluster shares a same vacuum pressure corresponding to the said cluster, and the controller adjusts the vacuum pressure of each said cluster independently.
6. The scanner of claim 5, wherein the controller adjusts the vacuum pressures of the clusters according to a preset sequence of a plurality of candidate sets, each said candidate set comprises a candidate pressure for each said cluster, and the controller sets the vacuum pressures of the clusters according to one said candidate set that keeps the index value smaller than or equal to the first threshold value.
7. The scanner of claim 1, wherein the controller controls the scanner to abort the exposure process in the alignment step when the index value is larger than a second threshold value.
8. A method for performing an exposure process through a photomask on a wafer, wherein the exposure process comprises an alignment step and an exposure step, and the method comprising:
moving a wafer table to align the wafer with an alignment apparatus, wherein the wafer table comprises at least one chuck hole to attach the wafer to the wafer table by vacuum chucking;
detecting an actual position of each of a plurality of alignment marks on the wafer;
calculating an index value based on a difference between a predicted position and the actual position of each said alignment mark;
adjusting a vacuum pressure of the at least one chuck hole in the alignment step when the index value is larger than a first threshold value; and
finishing the exposure process when the index value is smaller than or equal to the first threshold value.
9. The method of claim 8, further comprising:
repeating the aligning of the wafer, the detecting of the actual positions, and the calculating of the index value in the alignment step after adjusting the vacuum pressure of the at least one chuck hole.
10. The method of claim 8, wherein the at least one chuck hole comprises a plurality of chuck holes sharing the same vacuum pressure.
11. The method of claim 8, further comprising:
adjusting the vacuum pressure according to a preset sequence of a plurality of candidate pressures; and
setting the vacuum pressure to be one said candidate pressure that keeps the index value smaller than or equal to the first threshold value.
12. The method of claim 8, wherein the at least one chuck hole comprises a plurality of chuck holes arranged into a plurality of clusters, each said cluster comprises at least one of the chuck holes, the at least one chuck hole in each said cluster shares a same vacuum pressure corresponding to the said cluster, and the vacuum pressure of each said cluster is adjusted independently.
13. The method of claim 12, further comprising:
adjusting the vacuum pressures of the clusters according to a preset sequence of a plurality of candidate sets, wherein each said candidate set comprises a candidate pressure for each said cluster; and
setting the vacuum pressures of the clusters according to one said candidate set that keeps the index value smaller than or equal to the first threshold value.
14. The method of claim 8, further comprising:
aborting the exposure process in the alignment step when the index value is larger than a second threshold value.