What is claimed is:
1. A seal apparatus for a water pump provided between a non-rotating member having an inner peripheral surface and a rotating shaft of the water pump inserted into the non-rotating member and having an outer peripheral surface; comprising a seal ring having an outer peripheral edge fastened to the inner peripheral surface of the non-rotating member, and a slinger having an outer peripheral surface and fitted around the rotating shaft to block between the inner peripheral surface of the non-rotating member and the outer peripheral surface of the rotating shaft of the water pump, the slinger having an outer peripheral edge formed with an outer-diameter-side cylindrical section which is concentric with the rotating shaft and has an outer peripheral surface, the seal ring comprising a first seal lip that comes in sliding contact with the outer peripheral surface of the rotating shaft or with the outer peripheral surface of the slinger that rotates together with the rotating shaft, and a second seal lip that has a tip edge which comes in sliding contact with the outer peripheral surface of the outer-diameter-side cylindrical section, and that is tilted inward in the radial direction toward the tip edge thereof, wherein the amount of elastic deformation of the second seal lip, which occurs when the tip edge of the second seal lip comes in contact with the outer peripheral surface of the outer-diameter-side cylindrical section, is at least {fraction (110)} and up to {fraction (710)} the height of the second seal lip in a free state, and the roughness of a section of the outer peripheral surface of the outer-diameter-side cylindrical section with which the tip edge of the second seal lip comes in sliding contact is from 0.2 m to 2.0 m in the arithmetic mean Ra, or is from 0.8 m to 8.0 m in the maximum height Ry.
2. A rotation-support apparatus for a water pump comprising: an outer ring having an inner peripheral surface formed with an outer ring raceway, a rotating shaft for the water pump having an outer peripheral surface formed with an inner ring raceway, a plurality of rolling elements rotatably located between the outer-ring raceway and inner-ring raceway, a seal ring having an outer peripheral edge fastened to the inner peripheral surface of the outer ring at one end thereof, and a slinger having an outer peripheral surface and fitted around the rotating shaft, the slinger having an outer peripheral edge formed with an outer-diameter-side cylindrical section which is concentric with the rotating shaft and has an outer peripheral surface, the seal ring comprising a first seal lip that comes in sliding contact with the outer peripheral surface of the rotating shaft or with the outer peripheral surface of the slinger that rotates together with the rotating shaft, and a second seal lip that has a tip edge which comes in sliding contact with the outer peripheral surface of the outer-diameter-side cylindrical section, and that is tilted inward in the radial direction toward the tip edge thereof, wherein the amount of elastic deformation of the second seal lip, which occurs when the tip edge of the second seal lip comes in contact with the outer peripheral surface of the outer-diameter-side cylindrical section, is at least {fraction (110)} and up to {fraction (710)} the height of the second seal lip in a free state, and the roughness of a section of the outer peripheral surface of the outer-diameter-side cylindrical section with which the tip edge of the second seal lip comes in sliding contact is from 0.2 m to 2.0 m in the arithmetic mean Ra, or is from 0.8 m to 8.0 m in the maximum height Ry.
3. A water pump comprising a housing having an inner peripheral surface; an outer-ring raceway that is formed directly around the inner peripheral surface of this housing or formed around a separate outer ring around the inner peripheral surface of this housing, a rotating shaft having an outer peripheral surface formed with an inner-ring raceway, a plurality of rolling elements rotatably located between the outer-ring raceway and inner-ring raceway, a seal ring having an outer peripheral edge fastened to the inner peripheral surface of the outer ring at one end thereof, a slinger having an outer peripheral surface and fitted around the rotating shaft, a pulley fastened to the rotating shaft at an outer end thereof, an impeller fastened to the rotating shaft at an inner end thereof, a mechanical seal provided between the inner peripheral surface of the housing and the outer peripheral surface of the rotating shaft and axially between the impeller and the slinger, and a space provided axially between the mechanical seal and the seal ring, the slinger having an outer peripheral edge formed with an outer-diameter-side cylindrical section which is concentric with the rotating shaft and has an outer peripheral surface, the seal ring comprising a first seal lip that comes in sliding contact with the outer peripheral surface of the rotating shaft or with the outer peripheral surface of the slinger that rotates together with the rotating shaft, and a second seal lip that has a tip edge which comes in sliding contact with the outer peripheral surface of the outer-diameter-side cylindrical section, and that is tilted inward in the radial direction toward the tip edge thereof, wherein the amount of elastic deformation of the second seal lip, which occurs when the tip edge of the second seal lip comes in contact with the outer peripheral surface of the outer-diameter-side cylindrical section, is at least {fraction (110)} and up to {fraction (710)} the height of the second seal lip in a free state, and the roughness of a section of the outer peripheral surface of the outer-diameter-side cylindrical section with which where the tip edge of the second seal lip comes in sliding contact is from 0.2 m to 2.0 m in the arithmetic mean Ra, or is from 0.8 m to 8.0 m in the maximum height Ry.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method for etching an ultra high aspect ratio feature dielectric layer through a carbon based mask in an etch chamber, comprising:
a selective etching the dielectric layer with respect to the carbon based mask, wherein the selective etching provides a net deposition of a fluorocarbon based polymer on the carbon based mask;
stopping the selective etch; and
a subsequent selective etching the dielectric layer with respect to the carbon based mask, comprising:
providing a flow of an etch gas, comprising a fluorocarbon containing molecule and an oxygen containing molecule to the etch chamber;
providing a pulsed bias RF signal; and
providing an energizing RF signal.
2. The method, as recited in claim 1, wherein the selective etching the dielectric layer with respect to the carbon based mask, comprises:
providing a flow of an etch gas and a fluorocarbon polymer gas to the etch chamber;
providing a continuous wave bias RF signal; and
providing an energizing RF signal.
3. The method, as recited in claim 2, wherein the carbon based mask is one of a photoresist and amorphous carbon.
4. The method, as recited in claim 2, wherein the carbon based mask is amorphous carbon.
5. The method, as recited in claim 4, wherein the ultra high aspect ratio feature has an aspect ratio of at least 30:1.
6. The method, as recited in claim 4, wherein the selective etching has a selectivity greater than 3 to 1.
7. The method, as recited in claim 6, wherein the subsequent selective etching has a selectivity greater than 3 to 1.
8. The method, as recited in claim 4, wherein the selective etching has a selectivity greater than 5 to 1.
9. The method, as recited in claim 8, wherein the subsequent selective etching has a selectivity greater than 5 to 1.
10. The method, as recited in claim 4, wherein the selective etching has an infinite selectivity.
11. The method, as recited in claim 10, wherein the subsequent selective etching has an infinite selectivity.
12. The method, as recited in claim 1, wherein the dielectric layer is a silicon oxide or silicon nitride based layer.
13. The method, as recited in claim 12, wherein the dielectric layer is a single uniform layer.
14. A method for selectively etching an ultra high aspect ratio feature dielectric layer through a carbon based mask in an etch chamber, comprising:
providing a flow of an etch gas, comprising a fluorocarbon containing molecule and an oxygen containing molecule to the etch chamber;
providing a pulsed bias RF signal;
providing an energizing RF signal to transform the etch gas to a plasma; and etching the carbon based mask until a feature has a high aspect ratio greater than 25.
15. The method, as recited in claim 14, wherein the carbon based mask is amorphous carbon.
16. The method, as recited in claim 15, wherein the ultra high aspect ratio feature has an aspect ratio of at least 30:1.
17. The method, as recited in claim 16, wherein the selective etching has an infinite selectivity.
18. The method, as recited in claim 17, wherein the dielectric layer is a single uniform silicon oxide or silicon nitride based layer.