1-8. (canceled)
9. A fluid injection device comprising:
a fluid chamber to which fluid is configured to be supplied;
an actuator configured to change a pressure in the fluid chamber;
an inlet flow passage and an outlet flow passage connected to the fluid chamber; and
a fluid injection opening connected to the outlet flow passage,
wherein an inertance of the inlet flow passage is greater than that of the outlet flow passage.
10. The fluid injection device according to claim 9, wherein
the pressure in the fluid chamber is configured to be above 30 atmospheres when the actuator is driven.
11. The fluid injection device according to claim 9, further comprising:
a diaphragm that forms a part of the fluid chamber,
wherein the actuator includes a piezoelectric element configured to deform the diaphragm.
12. The fluid injection device according to claim 11, further comprising:
a reinforcing plate that has an opening whose diameter is substantially equal to the diameter of the fluid chamber, and that is formed between a sealing surface on which the inlet flow passage is formed and the diaphragm.
13. The fluid injection device according to claim 12, wherein
the diaphragm and the reinforcing plate are stacked and attached in intimate contact with each other as an integral body.
14. The fluid injection device according to claim 9, further comprising:
a fluid supply passage connected to the inlet flow passage; and
a fluid basin formed between the fluid supply passage and the inlet flow passage.
15. The fluid injection device according to claim 9, wherein
the inlet flow passage is formed by a tubular member.
16. The fluid injection device according to claim 11, further comprising:
a ring-shaped packing separately disposed at a position in the circumferential direction of the diaphragm.
17. The fluid injection device according to claim 9, wherein
part of the inlet flow passage is curved.
18. The fluid injection device according to claim 9, further comprising:
a fluid supply pump connected to the inlet flow passage and configured to supply fluid to the fluid chamber.
19. The fluid injection device according to claim 18, wherein
a check valve is not disposed between the fluid supply pump and the fluid injection opening.
20. The fluid injection device according to claim 9, wherein
fluid is injected from the fluid injection opening when the actuator increases the pressure in the fluid chamber.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of calibrating a model of the effect on an optical characteristic of a projection system of a lithographic system of performing exposures according to a recipe, the method comprising in order:
first measuring the optical characteristic of the projection system to generate a first measurement result;
exposing a substrate according to the recipe;
second measuring the optical characteristic of the projection system to generate a second measurement result;
allowing the projection system to cool for a period of time;
third measuring the optical characteristic of the projection system to generate a third measurement result;
second exposing according to the recipe; and
fourth measuring the optical characteristic of the projection system to generate a fourth measurement result,
wherein the model has a first part modeling the effect of heating on the optical characteristic and a second part modeling the effect of cooling on the optical characteristic, the first, second, third and fourth measurement results being used to calibrate the first part and the second part, the calibrated first and second parts used for subsequent calculation of a compensatory adjustment of the projection system or other exposure process parameter.
2. The method of claim 1, wherein the second exposing comprises exposing a second substrate according to the recipe and further comprising in order after the fourth measuring:
allowing the projection system to cool for a period of time;
fifth measuring the optical characteristic of the projection system to generate a fifth measurement result;
wherein the third and fourth measurement results are used to calibrate the first part and the fourth and fifth measurements are used to calibrate the second part.
3. The method of claim 1, wherein the optical characteristic is at least one optical characteristic selected from the group consisting of astigmatism offset, field curvature, astigmatism curvature, magnification, third order distortion, or an aberration described by Zernike polynomials and sums of Zernike polynomials.
4. The method of claim 1, wherein the measurements are used to determine time constants of heating and cooling curves.
5. The method of claim 1, wherein the first part comprises a curve of the form:
A
\u2061
(
t
)
=
\u2211
k
\u2062
\u03bc
k
\xb7
\u2147
–
t
\u03c4
k
+
P
\xb7
\u2211
h
\u2062
\u03bc
h
\xb7
\u2147
–
x
\u03c4
h
\u2062
1
–
\u2147
–
t
\u03c4
h
1
+
\u2147
–
x
\u03c4
h
and the second part comprises a curve of the form:
A
\u2061
(
t
)
=
\u2211
k
\u2062
\u03bc
k
\xb7
\u2147
–
t
\u03c4
k
+
P
\xb7
\u2211
h
\u2062
\u03bc
h
\xb7
1
–
\u2147
–
t
+
x
\u03c4
h
1
+
\u2147
–
x
\u03c4
h
.
6. The method of claim 1, wherein the substrate is removed from a table on which it was exposed and a second substrate loaded onto the table while the projection system is allowed to cool.
7. The method of claim 1, wherein the second and third measuring of the optical characteristic of the projection system are performed at respectively a first and second numerical aperture of the projection system.
8. A device manufacturing method comprising:
calibrating a model of the effect on an optical characteristic of a projection system of a lithographic system of performing exposures according to a recipe, the calibrating comprising in order:
first measuring the optical characteristic of the projection system to generate a first measurement result;
exposing a substrate according to the recipe;
second measuring the optical characteristic of the projection system to generate a second measurement result;
allowing the projection system to cool for a period of time;
third measuring the optical characteristic of the projection system to generate a third measurement result;
second exposing according to the recipe; and
fourth measuring the optical characteristic of the projection system to generate a fourth measurement result,
wherein the model has a first part modeling the effect of heating on the optical characteristic and a second part modeling the effect of cooling on the optical characteristic, the first, second, third and fourth measurement results being used to calibrate the first part and the second part, the calibrated first and second parts used for subsequent calculation of a compensatory adjustment of the projection system or other exposure process parameter;
calculating a corrective action to compensate for or ameliorate lens heating effects in the exposure of a second substrate;
exposing the second substrate according to the recipe and performing the corrective action.
9. The method of claim 8, wherein the exposing the second substrate is performed after exposure of a substrate according to at least one other recipe.
10. The method of claim 8, wherein the second exposing comprises exposing a second substrate according to the recipe and further comprising in order after the fourth measuring:
allowing the projection system to cool for a period of time;
fifth measuring the optical characteristic of the projection system to generate a fifth measurement result;
wherein the third and fourth measurement results are used to calibrate the first part and the fourth and fifth measurements are used to calibrate the second part.
11. The method of claim 8, wherein the measurements are used to determine time constants of heating and cooling curves.
12. The method of claim 8, wherein the first part comprises a curve of the form:
A
\u2061
(
t
)
=
\u2211
k
\u2062
\u03bc
k
\xb7
\u2147
–
t
\u03c4
k
+
P
\xb7
\u2211
h
\u2062
\u03bc
h
\xb7
\u2147
–
x
\u03c4
h
\u2062
1
–
\u2147
–
t
\u03c4
h
1
+
\u2147
–
x
\u03c4
h
and the second part comprises a curve of the form:
A
\u2061
(
t
)
=
\u2211
k
\u2062
\u03bc
k
\xb7
\u2147
–
t
\u03c4
k
+
P
\xb7
\u2211
h
\u2062
\u03bc
h
\xb7
1
–
\u2147
–
t
+
x
\u03c4
h
1
+
\u2147
–
x
\u03c4
h
.
13. The method of claim 8, wherein the substrate is removed from a table on which it was exposed and the second substrate loaded onto the table while the projection system is allowed to cool.
14. The method of claim 8, wherein the second and third measuring of the optical characteristic of the projection system are performed at respectively a first and second numerical aperture of the projection system.
15. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system, the apparatus further comprising:
a sensor arranged to measure an optical characteristic of the projection system;
a controller to control the sensor to generate a first measurement result before exposure of a substrate according to a recipe, a second measurement result after the exposure, a third measurement result after allowing the projection system to cool for a period of time, and a fourth measurement after the cooling and after a further exposure according to the recipe; and
a storage device storing a model of the effect of performing exposures according to the recipe on an optical characteristic of the projection system, the model having a first part modeling the effect of heating on the optical characteristic and a second part modeling the effect of cooling on the optical characteristic, the first, second, third and fourth measurement results being used to calibrate the first part and the second part, the calibrated first and second parts used for subsequent calculation of a compensatory adjustment of the projection system or other exposure process parameter.
16. The lithographic apparatus of claim 15, wherein the storage device stores a plurality of models of the effects on an optical characteristic of the projection system of performing exposures according to a plurality of recipes.
17. The lithographic apparatus of claim 15, wherein the further exposure comprises exposure of a second substrate according to the recipe and the controller is further configured to generate a fifth measurement result after allowing the projection system to cool for a period of time, wherein the third and fourth measurement results are used to calibrate the first part and the fourth and fifth measurements are used to calibrate the second part.
18. The lithographic apparatus of claim 15, wherein the measurements are used to determine time constants of heating and cooling curves.
19. The lithographic apparatus of claim 15, wherein the first part comprises a curve of the form:
A
\u2061
(
t
)
=
\u2211
k
\u2062
\u03bc
k
\xb7
\u2147
–
t
\u03c4
k
+
P
\xb7
\u2211
h
\u2062
\u03bc
h
\xb7
\u2147
–
x
\u03c4
h
\u2062
1
–
\u2147
–
t
\u03c4
h
1
+
\u2147
–
x
\u03c4
h
and the second part comprises a curve of the form:
A
\u2061
(
t
)
=
\u2211
k
\u2062
\u03bc
k
\xb7
\u2147
–
t
\u03c4
k
+
P
\xb7
\u2211
h
\u2062
\u03bc
h
\xb7
1
–
\u2147
–
t
+
x
\u03c4
h
1
+
\u2147
–
x
\u03c4
h
.
20. The lithographic apparatus of claim 15, wherein the second and third measurements are performed at respectively a first and second numerical aperture of the projection system.