1. A lithographic apparatus, comprising:
a lithographic projection apparatus arranged to transfer a pattern to a radiation-sensitive layer of a substrate using a beam of radiation having an exposure wavelength;
a coater arranged to at least partially coat the substrate with a layer of non-radiation-sensitive coating material which is at least partially transparent to radiation of the exposure wavelength, wherein the layer of non-radiation-sensitive coating material is positioned before the layer of radiation-sensitive material in the path of the beam of radiation, and wherein, in use, the coater applies the layer of non-radiation-sensitive coating material to a thickness which is greater than the exposure wavelength; and
a liquid supply system configured to provide a liquid to a space between a projection system of the lithographic projection apparatus and the non-radiation sensitive layer of the substrate to be in contact with the non-radiation sensitive layer.
2. The apparatus of claim 1, wherein the coater is further arranged to at least partially coat the substrate with a protective material to protect the layer of radiation-sensitive material prior to coating the substrate with the non-radiation-sensitive coating material.
3. The apparatus of claim 2, wherein the protective material is or becomes substantially solid.
4. The apparatus of claim 1, wherein the coater is further arranged to at least partially cover the non-radiation-sensitive coating material with an evaporation prevention material configured to prevent the non-radiation-sensitive coating material from evaporating.
5. The apparatus of claim 1, wherein the coating material has a refractive index in the range of from 1.0 to 1.9.
6. The apparatus of claim 5, wherein the coating material is substantially water.
7. The apparatus of claim 1, wherein the thickness is at least 5 \u03bcm.
8. The apparatus of claim 1, wherein the non-radiation sensitive material has a first refractive index, the liquid has a second refractive index, and the first refractive index is within 0.2 of the second refractive index.
9. The apparatus of claim 1, wherein the non-radiation sensitive material is substantially insoluble in and unreactive with the liquid.
10. The apparatus of claim 1, wherein the coater is configured to coat the non-radiation sensitive material to a thickness effective to substantially reduce the effect of bubbles in the liquid, of particles in the liquid, or both, on the quality of the patterned beam impinging on the radiation sensitive layer.
11. The apparatus of claim 1, wherein the non-radiation sensitive material is a material different than that of the liquid.
12. The apparatus of claim 1, wherein the layer of non-radiation sensitive material is or becomes a substantially solid or gel.
13. A lithographic apparatus, comprising:
a lithographic projection apparatus arranged to transfer a pattern to a radiation-sensitive layer of a substrate using a beam of radiation and configured to provide a liquid to a space between a projection system of the lithographic projection apparatus and a layer of non-radiation sensitive coating material of the substrate to be in contact with the layer of non-radiation sensitive coating material; and
a coater arranged to at least partially coat the substrate with the layer of non-radiation-sensitive coating material which is at least partially transparent to radiation of the exposure wavelength, wherein the layer of non-radiation-sensitive coating material is positioned before the layer of radiation-sensitive material in the path of the beam of radiation, and wherein, in use, the coater applies the layer of non-radiation sensitive material to a thickness effective to substantially reduce the effect of bubbles in the liquid, of particles in the liquid, or both, on the quality of the beam impinging on the radiation sensitive layer.
14. The apparatus of claim 13, wherein the coater is further arranged to at least partially coat the substrate with a protective material to protect the layer of radiation-sensitive material prior to coating the substrate with the non-radiation-sensitive coating material.
15. The apparatus of claim 13, wherein the coater is further arranged to at least partially cover the non-radiation-sensitive coating material with an evaporation prevention material configured to prevent the non-radiation-sensitive coating material from evaporating.
16. The apparatus of claim 13, wherein the coating material is substantially water.
17. A lithographic apparatus, comprising:
a lithographic projection apparatus arranged to transfer a pattern to a radiation-sensitive layer of a substrate using a beam of radiation having an exposure wavelength; and
a coater arranged to at least partially coat the substrate with a layer of non-radiation-sensitive coating material which is at least partially transparent to radiation of the exposure wavelength, wherein the layer of non-radiation-sensitive coating material is positioned before the layer of radiation-sensitive material in the path of the beam of radiation, and wherein, in use, the coater applies the layer of non-radiation-sensitive coating material to a thickness which is greater than the exposure wavelength before the substrate is moved to the pattern transfer location and the layer of non-radiation-sensitive coating material has a free top surface during such movement.
18. The apparatus of claim 17, wherein the layer of non-radiation sensitive material is or becomes a substantially solid or gel.
19. The apparatus of claim 17, wherein the coater is further arranged to at least partially cover the non-radiation-sensitive coating material with an evaporation prevention material configured to prevent the non-radiation-sensitive coating material from evaporating.
20. A substrate for use in a lithographic projection apparatus, the substrate being at least partly covered by a radiation sensitive layer, the radiation sensitive layer being at least partly covered with non-radiation sensitive material which is at least partly transparent to said radiation and being of a different material than an immersion liquid through which a patterned beam of said radiation of the lithographic projection apparatus is projected onto a target portion of said substrate, wherein the non-radiation sensitive material has a thickness and the radiation has a wavelength and the thickness is greater than said wavelength.
21. The substrate of claim 20, wherein said non-radiation sensitive material has a thickness of at least 5 \u03bcm.
22. The substrate of claim 21, wherein said non-radiation sensitive material has a thickness of one of at least 10 \u03bcm and at least 20 \u03bcm.
23. The substrate of claim 20, wherein said non-radiation sensitive material has a first refractive index and said immersion liquid has a second refractive index, and said first refractive index is within 0.2 of said second refractive index.
24. The substrate of claim 23, wherein said first refractive index is one of within 0.1 of and substantially the same as said second refractive index.
25. The substrate of claim 20, wherein said non-radiation sensitive material has a refractive index in the range of 1.0 to 1.7.
26. The substrate of claim 20, wherein a further protective material is present between said radiation sensitive layer and said non-radiation sensitive layer.
27. The substrate of claim 20, wherein said non-radiation sensitive material is substantially insoluble in and unreactive with said immersion liquid.
28. The substrate of claim 20, wherein the non-radiation sensitive layer is of a thickness effective to substantially reduce the effect of at least one of bubbles and particles in said immersion liquid on the quality of a patterned beam impinging on the radiation sensitive layer.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of making a dual filter for in situ water purification that minimizes obstruction to normal flow through a filter housing comprising:
weaving a first fiber with a second fiber to form a porous filter medium for allowing water therethrough but for preventing waste particles from flowing therethrough; and
securing a controllable release water purification material to said filter medium to enable said dual filter medium to simultaneously screen waste particles from a water source and purify water that come into contact with water purification material.
2. The method of claim 1 wherein the step of securing the releasable water purification material comprises securing a first releasable water purification material to the first fiber and securing a second releasable water purification material to the second fiber.
3. The method of claim 2 wherein the steps of securing the first water purification material to the first fiber and securing the second water purification material to the second fiber comprises dispersibly securing the first water purification material to the first fiber and dispersibly securing the second water purification material to the second fiber.
4. The method of claim 2 wherein the steps of securing the first water purification material to the first fiber and securing the second water purification material to the second fiber comprises securing a film of the first water purification material to the first fiber and securing a film of the second water purification material to the second fiber.
5. The method of claim 2 wherein the steps of securing the first water purification material to the first fiber and securing the second water purification material to the second fiber comprises securing a first bacteria killing material to the first fiber and securing a second bacteria killing material to the second fiber.
6. The method of claim 5 wherein the steps of securing a first bacteria killing material to the first fiber and securing a second bacteria killing material to the second fiber comprises securing a first metal ion yielding material to the first fiber and securing a second metal ion yielding material to the second fiber.
7. A dual water purification apparatus for a swimming pool, hot tub or spa that minimizes obstruction to normal flow through the filter housing comprising:
a filter cartridge, said filter cartridge having a porous filter medium for filtration removal of waste particles from water flowing through said porous filter medium;
a water purification material, said water purification material dispersibly secured to a carrier, said carrier placeable in a flow path through said filter cartridge medium, said water purification material controllably releasable so that a flow of water through said filter medium purifies the water therein while the porous filter medium removes waste particles to thereby enable the dual filter to simultaneously screen debris particles and purify water in said filter cartridge over an extended period of time.
8. The dual water purification apparatus of claim 7 wherein the carrier comprises a screen for engaging an exterior surface of the filter cartridge.
9. The dual water purification apparatus of claim 7 wherein the carrier comprises an insert placeable within the core opening of said filter cartridge.
10. The dual water purification apparatus of claim 9 wherein the insert contains the water purification material located within an interior space of the insert.
11. The dual water purification apparatus of claim 7 wherein the carrier is a rigid annular water porous insert.
12. The dual water purification apparatus of claim 11 wherein the annular insert is located between a core of the filter cartridge and the filter medium of the filter cartridge.
13. The dual water purification apparatus of claim 7 wherein the carrier comprises an annular member placeable around an exterior of said filter cartridge.
14. The dual water purification apparatus of claim 13 wherein the annular member comprises an elastic material.
15. The filter cartridge of claim 7 wherein the carrier comprises a non-woven fibrous material.
16. The filter cartridge of claim 15 wherein the carrier comprises a rubber, plastic or metal.
17-44. (canceled)