1. A method for decomposing at least one of organic compound contained in an aqueous solution, comprising:
a step a of adding catalyst particles into the aqueous solution;
a step b of decomposing the organic compound by irradiating the aqueous solution with light having a wavelength of 200 nanometers or more and 400 nanometers or less while stirring the catalyst particles in the aqueous solution; and
a step c of stopping the stirring in the step b, and separating the catalyst particles from the aqueous solution by sedimentation,
wherein the catalyst particles are composed only of titanium dioxide particles and zeolite particles, the titanium dioxide particles are adsorbed on outer surfaces of the zeolite particles, the zeolite particles have a silicaalumina molar ratio of 10 or more, and the catalyst particles are contained in the aqueous solution at a concentration of 0.4 gramsliter or more and 16 gramsliter or less.
2. The method according to claim 1, comprising a step d of adding again the catalyst particles separated by sedimentation in the step c into the aqueous solution after the step c,
wherein the step b and the step c are performed again after the step d.
3. The method according to claim 1,
wherein the catalyst particles are separated by sedimentation in a solid-liquid separation vessel having a filtration membrane in the step c,
the method further comprises a step e of producing treated water from the aqueous solution using the filtration membrane, and
in the step e, the filtration membrane is a filtration membrane obtained by adhering a filter paper made of a resin to each of both sides of a plate-like frame, and the filtration membrane is arranged parallel to a direction in which the catalyst particles sediment.
4. The method according to claim 3, comprising a step f of adding again the catalyst particles separated by sedimentation in the step c into the aqueous solution after the step c,
wherein the step b, the step c and the step e are performed again after the step f.
5. The method according to claim 1, wherein the zeolite particles are zeolite particles treated with an acid aqueous solution to dissolve alumina portions thereof to introduce active sites for adsorbing the titanium dioxide particles directly on the zeolite particles, and then washed with water to remove the acid aqueous solution adhered to surfaces of the zeolite particles.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An apparatus comprising:
a grating structure on a mirror substrate etched to have a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength, and
a multi-layer coating deposited on the grating structure that reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength.
2. The apparatus of claim 1 wherein the grating structure has one of a one-dimensional layout and a two-dimensional layout.
3. The apparatus of claim 1 wherein the grating structure comprises:
a plurality of ridges spaced at the grating period, the ridges having a ridge width and height, the ridge width being approximately proportionally to the grating period with a first proportionality constant, the ridge height being approximately proportionally to the grating period with a second proportionality constant.
4. The apparatus of claim 1 wherein the first wavelength is longer than approximately 60 nm.
5. The apparatus of claim 1 wherein the second wavelength is at approximately 13.4 nm.
6. The apparatus of claim 1 wherein the multi-layer coating comprises:
a plurality of layers of first and second materials having one of high and low atomic numbers, respectively, and high and low densities of charge carriers, respectively.
7. The apparatus of claim 6 wherein the first material is molybdenum (Mo).
8. The apparatus of claim 6 wherein the second material is one of silicon (Si) and beryllium (Be).
9. The apparatus of claim 6 wherein the multi-layer coating further comprises:
a plurality of layers of a compound interspersed within the plurality of the first and second materials.
10. The apparatus of claim 9 wherein the compound is silicon carbide (SiC).
11. An apparatus comprising:
a first multi-layer coating deposited on a mirror substrate to reflect a first incident radiation, in an optical path, within a first band around a first wavelength and a second incident radiation within a second band around a second wavelength; and
a grating structure deposited on the first multi-layer coating, the grating structure being etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.
12. The apparatus of claim 11 wherein the grating structure comprises:
a plurality of ridges spaced at the grating period, the ridges having a ridge width and height, the ridge width being approximately proportionally to the grating period with a first proportionality constant, the ridge height being approximately proportionally to the grating period with a second proportionality constant.
13. The apparatus of claim 12 wherein each of the ridges comprises:
one of a metal spacer, a second multi-layer coating, and a combination of the metal spacer and the second multi-layer coating, the metal spacer providing grating spacing, the second multi-layer coating reflecting the first incident radiation within the first band and the second incident radiation within the second band.
14. The apparatus of claim 11 further comprises:
a stop layer deposited between the grating structure and the first multi-layer coating to protect the first multi-layer coating during etching the grating structure.
15. The apparatus of claim 11 wherein the first wavelength is at approximately 13.4 nm.
16. The apparatus of claim 13 wherein each of the first and second multi-layer coatings comprises a plurality of layers of first and second materials having one of high and low atomic numbers, respectively, and high and low densities of charge carriers, respectively.
17. The apparatus of claim 16 wherein the first material is molybdenum (Mo).
18. The apparatus of claim 16 wherein the second material is one of silicon (Si) and beryllium (Be).
19. The apparatus of claim 16 wherein each of the first and second multi-layer coatings further comprises:
a plurality of layers of a compound interspersed within the plurality of the first and second materials.
20. The apparatus of claim 19 wherein the compound is silicon carbide (SiC).
21. A method comprises:
etching a grating structure on a mirror substrate to have a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength; and
depositing a multi-layer coating on the grating structure, the multi-layer coating reflecting, in the optical path, the first incident radiation within the first band and a second incident radiation within a second band around a second wavelength.
22. The method of claim 21 wherein etching the grating structure comprises etching the grating structure to have one of a one-dimensional layout and a two-dimensional layout.
23. The method of claim 21 wherein etching the grating structure comprises:
etching a plurality of ridges spaced at the grating period, the ridges having a ridge width and height, the ridge width being approximately proportionally to the grating period with a first proportionality constant, the ridge height being approximately proportionally to the grating period with a second proportionality constant.
24. The method of claim 21 wherein the first wavelength is longer than approximately 60 nm.
25. The method of claim 21 wherein the second wavelength is at approximately 13.4 nm.
26. The method of claim 21 wherein depositing the multi-layer coating comprises:
depositing a plurality of layers of first and second materials having one of high and low atomic numbers, respectively, and high and low densities of charge carriers, respectively.
27. The method of claim 26 wherein the first material is molybdenum (Mo).
28. The method of claim 26 wherein the second material is one of silicon (Si) and beryllium (Be).
29. The method of claim 26 wherein depositing the multi-layer coating further comprises:
interspersing a plurality of layers of a compound within the plurality of the first and second materials.
30. The method of claim 29 wherein the compound is silicon carbide (SiC).
31. A method comprising:
depositing a first multi-layer coating on a mirror substrate, the first multi-layer coating reflecting, in an optical path, a first incident radiation within a first band around a first wavelength and a second incident radiation within a second band around a second wavelength; and
etching a grating structure on the first multi-layer coating to have a grating period causing diffracting, out of the optical path, the second radiation within the second band.
32. The method of claim 31 wherein etching the grating structure comprises:
etching a plurality of ridges spaced at the grating period, the ridges having a ridge width and height, the ridge width being approximately proportionally to the grating period with a first proportionality constant, the ridge height being approximately proportionally to the grating period with a second proportionality constant.
33. The method of claim 32 wherein etching each of the ridges comprises:
etching one of a metal spacer, a second multi-layer coating, and a combination of the metal spacer and the second multi-layer coating, the metal spacer providing grating spacing, the second multi-layer coating reflecting the first incident radiation within the first band and the second incident radiation within the second band.
34. The method of claim 31 further comprises:
depositing a stop layer between the grating structure and the first multi-layer coating to protect the first multi-layer coating during etching the grating structure.
35. The method of claim 31 wherein the first wavelength is at approximately 13.4 nm.
36. The method of claim 33 wherein depositing each of the first and second multi-layer coatings comprises depositing a plurality of layers of first and second materials having one of high and low atomic numbers, respectively.
37. The method of claim 36 wherein the first material is molybdenum (Mo).
38. The method of claim 36 wherein the second material is one of silicon (Si) and beryllium (Be).
39. The method of claim 36 wherein depositing each of the first and second multi-layer coatings further comprises:
interspersing a plurality of layers of a compound within the plurality of the first and second materials.
40. The method of claim 39 wherein interspersing a plurality of layers of the compound comprises interspersing a plurality of layers of silicon carbide (SiC).
41. A system comprising:
a mirror to reflect an extreme ultra violet (EUV) radiation;
a baffle having an opening positioned to stop diffracted radiation rays and allowing actinic radiation rays to pass through the opening; and
a reflective spectral filter positioned to generate the diffracted radiation rays and the actinic radiation rays from the reflected EUV radiation, the reflective spectral filter comprising:
a grating structure on a mirror substrate etched to have a grating period causing diffracting, out of an optical path, a first band around a first wavelength, and
a multi-layer coating deposited on the grating structure that reflects the first incident radiation, in an optical path, within the first band and a second incident radiation within a second band around a second wavelength.
42. The system of claim 41 wherein the grating structure has one of a one-dimensional layout and a two-dimensional layout.
43. The system of claim 41 wherein the grating structure comprises:
a plurality of ridges spaced at the grating period, the ridges having a ridge width and height, the ridge width being approximately proportionally to the grating period with a first proportionality constant, the ridge height being approximately proportionally to the grating period with a second proportionality constant.
44. The system of claim 41 wherein the first wavelength is longer than approximately 60 nm.
45. The system of claim 41 wherein the second wavelength is at approximately 13.4 nm.
46. The system of claim 41 wherein the multi-layer coating comprises:
a plurality of layers of first and second materials having one of high and low atomic numbers, respectively, and high and low densities of charge carriers, respectively.
47. The system of claim 46 wherein the first material is molybdenum (Mo).
48. The system of claim 46 wherein the second material is one of silicon (Si) and beryllium (Be).
49. The system of claim 46 wherein the multi-layer coating further comprises:
a plurality of layers of a compound interspersed within the plurality of the first and second materials.
50. The system of claim 49 wherein the compound is silicon carbide (SiC).
51. A system comprising:
a mirror to reflect an extreme ultra violet (EUV) radiation;
a baffle having an opening positioned to stop diffracted radiation rays and allowing actinic radiation rays to pass through the opening; and
a reflective spectral filter positioned to generate the diffracted radiation rays and the actinic radiation rays from the reflected EUV radiation, the reflective spectral filter comprising:
a first multi-layer coating deposited on a mirror substrate, the first multi-layer coating reflecting a first incident radiation, in an optical path, within a first band around a first wavelength and a second incident radiation within a second band around a second wavelength, and
a grating structure deposited on the first multi-layer coating, the grating structure being etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.
52. The system of claim 51 wherein the grating structure comprises:
a plurality of ridges spaced at the grating period, the ridges having a ridge width and height, the ridge width being approximately proportionally to the grating period with a first proportionality constant, the ridge height being approximately proportionally to the grating period with a second proportionality constant.
53. The system of claim 52 wherein each of the ridges comprises:
one of a metal spacer, a second multi-layer coating, and a combination of the metal spacer and the second multi-layer coating, the metal spacer providing grating spacing, the second multi-layer coating reflecting the first incident radiation within the first band and the second incident radiation within the second band.
54. The system of claim 51 wherein the reflective spectral filter further comprises:
a stop layer deposited between the grating structure and the first multi-layer coating to protect the first multi-layer coating during etching the grating structure.
55. The system of claim 51 wherein the first wavelength is at approximately 13.4 nm.
56. The system of claim 53 wherein each of the first and second multi-layer coatings comprises a plurality of layers of first and second materials having one of high and low atomic numbers, respectively, and high and low densities of charge carriers, respectively.
57. The system of claim 56 wherein the first material is molybdenum (Mo).
58. The system of claim 56 wherein the second material is one of silicon (Si) and beryllium (Be).
59. The system of claim 56 wherein each of the first and second multi-layer coatings further comprises:
a plurality of layers of a compound interspersed within the plurality of the first and second materials.
60. The system of claim 59 wherein the compound is silicon carbide (SiC).