What is claimed is:
1. A liquid crystal display device comprising:
a liquid crystal cell including a first transparent substrate, a second transparent substrate, a first electrode disposed on an inside surface side of the first substrate, and a first alignment film disposed on an opposite side of the first electrode as a side opposing the first transparent substrate, a second electrode disposed on an inside surface side of the second substrate, and a second alignment film disposed on an opposite side of the second electrode as a side opposing the second substrate, and a liquid crystal layer sandwiched between the first substrate and the second substrate;
a reflector disposed one of at an outside surface side of the first transparent substrate and between the first transparent substrate and the first electrode; and
a retardation plate and a polarizing plate disposed in that order from an outside surface side of the second substrate,
wherein, when an angle between a direction of a normal line with respect to a display surface of the liquid crystal display device and a main viewing direction is from about 0 degrees to about 20 degrees, a reflection ratio peak value of light incident upon the liquid crystal display device and reflected by the reflector is set so as to occur within a range of about 30 degrees from the normal line direction.
2. A liquid crystal display device according to claim 1, wherein the reflection ratio peak value of the light incident upon the liquid crystal display device and reflected by the reflector is set so as to occur within a range of about 20 degrees from the normal line direction.
3. A liquid crystal display device according to claim 1, wherein the reflector includes a plurality of recesses with light reflectivity formed in one of a surface of a base material and a metallic film formed on the base material, the recesses having inside surfaces which form parts of spherical surfaces and an inclination angle distribution in a range of from about 30 degrees to about 30 degrees, the recesses being formed irregularly so as to have depths within a range of from about 0.1 m to about 3 m, and the recesses being disposed irregularly so that pitches between adjacent recesses are in a range of from about 5 m to about 50 m.
4. A liquid crystal display device according to claim 2, wherein the reflector includes a plurality of recesses with light reflectivity formed in one of a surface of a base material and a metallic film formed on the base material, the recesses having inside surfaces which form parts of spherical surfaces and an inclination angle distribution in a range of from about 30 degrees to about 30 degrees, the recesses being formed irregularly so as to have depths within a range of from about 0.1 m to about 3 m, and the recesses being disposed irregularly so that pitches between adjacent recesses are in a range of from about 5 m to about 50 m.
5. A liquid crystal display device according to claim 1, wherein a thickness of the one of the base material and the metallic film of the reflector is in a range of from about 8 nm to about 20 nm.
6. A portable electronic apparatus comprising the liquid crystal display device of claim 1 at a display section thereof.
7. A liquid crystal display device according to claim 1, wherein the reflection ratio peak value of the light incident upon the liquid crystal display device and reflected by the reflector is substantially constant between a range of one of about 10 degrees to about 50 degrees and about 20 degrees to about 40 degrees from the normal line direction.
8. A liquid crystal display device according to claim 1, further comprising a backlight disposed more distal to the liquid crystal layer than the first transparent substrate.
9. A liquid crystal display device according to claim 1, wherein the reflection ratio peak value of the light incident upon the liquid crystal display device and reflected by the reflector is substantially constant over a range of not less than about 10 degrees.
10. A liquid crystal display device comprising:
a liquid crystal cell including a first transparent substrate, a second transparent substrate, a first electrode disposed on an inside surface side of the first substrate, and a first alignment film disposed on an opposite side of the first electrode as a side opposing the first transparent substrate, a second electrode disposed on an inside surface side of the second substrate, and a second alignment film disposed on an opposite side of the second electrode as a side opposing the second substrate, and a liquid crystal layer sandwiched between the first substrate and the second substrate;
a reflector disposed one of at an outside surface side of the first substrate and between the first substrate and the first electrode; and
a retardation plate and a polarizing plate disposed in that order from at an outside surface side of the second substrate, wherein, when an angle between a direction of a normal line with respect to a display surface of the liquid crystal display device and a main viewing direction is from about 0 degrees to about 20 degrees, a reflection ratio peak value of light incident upon the liquid crystal display device and reflected by the reflector is set so as to occur within a range of angles less than about 30 degrees from the normal line direction.
11. A liquid crystal display device according to claim 10, wherein the reflection ratio peak value of the light incident upon the liquid crystal display device and reflected by the reflector is set so as to occur within a range of about 20 degrees from the normal line direction.
12. A liquid crystal display device according to claim 10, wherein the reflector includes a plurality of recesses with light reflectivity formed in one of a surface of a base material and a metallic film formed on the base material, each of the recesses being formed so that an inclination angle (absolute value of an angle between the base material surface and a tangential plane at any point on a curvature) at each one of a corresponding side portion becomes a maximum, the recesses being formed irregularly so as to have depths within a range of from about 0.1 m to about 3 m, and the recesses being disposed irregularly so that pitches between adjacent recesses are in a range of from about 5 m to about 50 m.
13. A liquid crystal display device according to claim 10, wherein a thickness of the one of the base material and the metallic film of the reflector is in a range of from about 8 nm to about 20 nm.
14. A portable electronic apparatus comprising the liquid crystal display device of claim 10 at a display section thereof.
15. A liquid crystal display device according to claim 10, wherein the reflection ratio peak value of the light incident upon the liquid crystal display device and reflected by the reflector is substantially constant between a range of one of about 20 degrees to about 30 degrees and about 10 degrees to about 25 degrees from the normal line direction.
16. A liquid crystal display device according to claim 10, wherein the reflector includes a plurality of aspherical recesses with light reflectivity formed in one of a surface of a base material and a metallic film formed on the base material.
17. A liquid crystal display device according to claim 16, wherein each of the recesses have a maximum inclination angle (an absolute value of an angle between a surface of the base material and a tangential plane at any point on a curvature) that differ irregularly and have values within a range of from about 2 degrees to about 90 degrees, the recesses are formed irregularly and have depths (a distance between a minimum point of each recess and the surface of the base material) within a range of from about 0.1 m to about 3 m, and the recesses are disposed irregularly such that pitches between adjacent recesses are in a range of from about 5 m to about 50 m.
18. A liquid crystal display device according to claim 17, wherein the maximum inclination angles of a majority of the recesses have values within a range of from about 4 degrees to about 35 degrees.
19. A liquid crystal display device according to claim 17, wherein the recesses have a single minimum point.
20. A liquid crystal display device according to claim 10, further comprising a backlight disposed more distal to the liquid crystal layer than the first transparent substrate.
21. A liquid crystal display device according to claim 10, wherein the reflection ratio peak value of the light incident upon the liquid crystal display device and reflected by the reflector is substantially constant over a range of not less than about 10 degrees.
22. A method of improving viewing of a liquid crystal display device having a reflector and a display surface, the method comprising setting a reflection ratio peak value of light incident upon the liquid crystal display device and reflected by the reflector to occur within a range of less than about 20 degrees from a direction of a normal line with respect to the display surface when an angle between the normal line direction and a main viewing direction of the display surface is about 0 degrees to about 20 degrees; and broadening the reflection ratio peak value to be substantially constant over a range of not less than about 10 degrees.
23. The method according to claim 22, further comprising providing a plurality of asymmetric recesses in the reflector.
24. A method according to claim 22, further comprising providing a thickness of material in which the recesses are formed in a range of from about 8 nm to about 20 nm.
25. A method according to claim 22, further comprising providing recesses: that have a maximum inclination angle (an absolute value of an angle between a surface of material in which the recesses are formed and a tangential plane at any point on a curvature) that differs irregularly and has a value within a range of from about 2 degrees to about 90 degrees, that are formed irregularly and have depths (a distance between a minimum point of each recess and the surface of the base material) within a range of from about 0.1 m to about 3 m, and that are disposed irregularly such that pitches between adjacent recesses are in a range of from about 5 m to about 50 m.
26. A method according to claim 25, further comprising providing recesses in which the maximum inclination angles of a majority of the recesses have values within a range of from about 4 degrees to about 35 degrees.
27. A method according to claim 25, further comprising providing recesses that have a single minimum point.
28. A method according to claim 22, further comprising providing a backlight more distal to a viewer than the reflector that supplies light to the reflector.
29. A method of providing a portable electronic apparatus comprising the method of claim 22.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A copper alloy material comprising:
25 to 40 mass % of Zn; and
the balance of Cu and inevitable impurities;
wherein arithmetic mean surface roughness (Ra) along a direction perpendicular to a rolling direction for the material is 0.07 to 0.13 m;
maximum height (Ry) is not more than 1.3 m;
a surface oxide film has a thickness in a range of from 3 to 80 nm; and
not less than 10 atom % of oxide of alloy elements, except for Cu, is contained in the oxide film.
2. A copper alloy material comprising:
3 to 11 mass % of Sn;
0.03 to 0.35 mass % of P; and
the balance of Cu and inevitable impurities;
wherein arithmetic mean surface roughness (Ra) along a direction perpendicular to a rolling direction for the material is 0.07 to 0.14 m;
maximum height (Ry) is not more than 1.4 m;
a surface oxide film has a thickness in a range of from 3 to 80 nm; and
not less than 10 atom % of oxide of alloy elements, except for Cu, is contained in the oxide film.
3. A copper alloy material comprising:
1.5 to 4.0 mass % of Ni;
0.30 to 1.2 mass % of Si; and
the balance of Cu and inevitable impurities;
wherein arithmetic mean surface roughness (Ra) along a direction perpendicular to a rolling direction for the material is 0.05 to 0.15 m;
maximum height (Ry) is not more than 1.5 m;
a surface oxide film has a thickness in a range of from 3 to 80 nm; and
not less than 10 atom % of oxide of alloy elements, except for Cu, is contained in the oxide film.
4. A copper alloy material comprising:
1.5 to 4.0 mass % of Ni;
0.30 to 1.2 mass % of Si;
0.05 to 0.20 mass % of Mg; and
the balance of Cu and inevitable impurities;
wherein arithmetic mean surface roughness (Ra) along a direction perpendicular to a rolling direction for the material is 0.05 to 0.15 m;
maximum height (Ry) is not more than 1.5 m;
a surface oxide film has a thickness in a range of from 3 to 80 nm; and
not less than 10 atom % of oxide of alloy elements, except for Cu, is contained in the oxide film.
5. A copper alloy material comprising:
0.5 to 5 mass % of Ti; and
the balance of Cu and inevitable impurities;
wherein arithmetic mean surface roughness (Ra) along a direction perpendicular to a rolling direction for the material is 0.10 to 0.18 m;
maximum height (Ry) is not more than 2.0 m;
a surface oxide film has a thickness in a range of from 3 to 80 nm; and
not less than 10 atom % of oxide of alloy elements, except for Cu, is contained in the oxide film.
6. The copper alloy material according to claim 1, wherein the material has a wet tension (surface tension) of more than 30 mNm with an oil.
7. The copper alloy material according to claim 2, wherein the material has a wet tension (surface tension) of more than 30 mNm with an oil.
8. The copper alloy material according to claim 3, wherein the material has a wet tension (surface tension) of more than 30 mNm with an oil.
9. The copper alloy material according to claim 4, wherein the material has a wet tension (surface tension) of more than 30 mNm with an oil.
10. The copper alloy material according to claim 5, wherein the material has a wet tension (surface tension) of more than 30 mNm with an oil.
11. A process for production of the copper alloy material according to claim 1, wherein the surface roughness is obtained by a mechanical surface treatment.
12. A process for production of the copper alloy material according to claim 2, wherein the surface roughness is obtained by a mechanical surface treatment.
13. A process for production of the copper alloy material according to claim 3, wherein the surface roughness is obtained by a mechanical surface treatment.
14. A process for production of the copper alloy material according to claim 4, wherein the surface roughness is obtained by a mechanical surface treatment.
15. A process for production of the copper alloy material according to claim 5, wherein the surface roughness is obtained by a mechanical surface treatment.
16. The process for production of the copper alloy material according to claim 11, wherein the mechanical surface treatment is performed by surface grinding.
17. The process for production of the copper alloy material according to claim 12, wherein the mechanical surface treatment is performed by surface grinding.
18. The process for production of the copper alloy material according to claim 13, wherein the mechanical surface treatment is performed by surface grinding.
19. The process for production of the copper alloy material according to claim 14, wherein the mechanical surface treatment is performed by surface grinding.
20. The process for production of the copper alloy material according to claim 15, wherein the mechanical surface treatment is performed by surface grinding.
21. The process for production of the copper alloy material according to claim 16, wherein the mechanical surface grinding is performed just before press working.
22. The process for production of the copper alloy material according to claim 17, wherein the mechanical surface grinding is performed just before press working.
23. The process for production of the copper alloy material according to claim 18, wherein the mechanical surface grinding is performed just before press working.
24. The process for production of the copper alloy material according to claim 19, wherein the mechanical surface grinding is performed just before press working.
25. The process for production of the copper alloy material according to claim 20, wherein the mechanical surface grinding is performed just before press working.
26. The process for production of the copper alloy material according to claim 11, wherein the mechanical surface treatment is performed by rolling.
27. The process for production of the copper alloy material according to claim 12, wherein the mechanical surface treatment is performed by rolling.
28. The process for production of the copper alloy material according to claim 13, wherein the mechanical surface treatment is performed by rolling.
29. The process for production of the copper alloy material according to claim 14, wherein the mechanical surface treatment is performed by rolling.
30. The process for production of the copper alloy material according to claim 15, wherein the mechanical surface treatment is performed by rolling.