1. A semiconductor device comprising:
a semiconductor chip;
a circuit element for operation as a passive element or an active element;
a first pad electrically connected to the semiconductor chip;
a second pad electrically connected to the circuit element;
a land on which the semiconductor chip is mounted;
a wiring line integrally extended from the land and having a width smaller than a width of the semiconductor chip; and
an insulating resin for sealing the semiconductor chip, the circuit element, the first pad, the second pad and the land,
wherein each of the first pad, the second pad and the land comprises crystals oriented more transversally than vertically relative to a plane of each of the first pad, the second pad and the land.
2. The semiconductor device according to claim 1, further comprising a plating film disposed on at least one of the first pad, the second pad and the land, wherein a part of grain boundaries of the plating film is covered with the transversally oriented crystals to prevent the intrusion of impurities into the first pad, the second pad and the land.
3. The semiconductor device according to claim 2, wherein the plating film is disposed within a surface of at least one of the first pad, the second pad and the land.
4. The semiconductor device according to claim 1, wherein each of the first pad, the second pad, the land and the wiring line is derived from a rolled foil mainly made of copper.
5. The semiconductor device according to claim 1, wherein the insulating resin comprises a thermosetting resin by transfer molding and have a thickness equal to or less than 400 micrometers.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of washing a filter for removing impurities trapped in a filter bed during a service run of the filter, said method comprising the steps of:
(a) providing an underdrain lateral having at least a first chamber and a second chamber, the first chamber having at least one opening for permitting a liquid and a gas to pass from said first chamber into the filter bed and the second chamber having at least one opening for permitting a fluid to pass from said second chamber into the filter bed;
(b) directing a washing liquid and a washing gas from the first chamber into the filter bed; and,
(c) directing only a washing gas from the second chamber into the filter bed while a washing gas and a washing liquid are directed from the first chamber into the filter bed.
2. A method of washing a filter bed for filtering water or wastewater, said method including the steps of:
(a) providing an underdrain lateral having at least a first chamber, a second chamber and a third chamber, said first chamber being a washing gas chamber as said first chamber receives a washing gas from a washing fluid supply source during washing of a filter bed, said second chamber being in fluid communication with said first chamber such that a washing gas introduced into said first chamber passes into said second chamber, said third chamber being in fluid communication with said second chamber; and
(b) directing a gas in a pulsating manner into the filter bed from said third chamber while simultaneously directing gas in a steady stream manner into the filter bed from said second chamber.