1. A process for cleaning a substance from a reactor surface, said process comprising:
providing a reactor containing the reactor surface, wherein: (a) the reactor surface is at least partially coated with a film of the substance; (b) the substance is at least one member selected from the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide, a Group 13 metal silicate, a nitrogen containing Group 13 metal oxide, a nitrogen containing Group 13 metal silicate, a nitrogen containing transition metal oxide, a nitrogen containing transition metal silicate, or a laminate comprising at least one layer selected from the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide, a Group 13 metal silicate, a nitrogen containing transition metal oxide, a nitrogen containing transition metal silicate, a nitrogen containing Group 13 metal oxide, or a nitrogen containing Group 13 metal silicate; and (c) the substance has a dielectric constant greater than the dielectric constant of silicon dioxide;
reacting the substance with a reactive agent to form a volatile product, wherein the reactive agent comprises at least one member selected from the group consisting of a halogen-containing compound; a boron-containing compound, a carbon-containing compound, a hydrogen-containing compound, a nitrogen-containing compound, a chelating compound, a chlorosilane compound, a hydrochlorosilane compound, or an organochlorosilane compound; and
removing the volatile product from the reactor to thereby remove the substance from the surface.
2. The process of claim 1, wherein the reactor is an atomic layer deposition reactor.
3. The process of claim 1, wherein the substance is at least one member selected from the group consisting of Al2O3, HfO2, ZrO2, HfSixOy, and ZrSixOy wherein x is a number greater than 0 and y is 2x 2, and any of the aforementioned compounds containing nitrogen.
4. The process of claim 1 wherein the reactive agent is at least one member selected from the group consisting of BCl3, COCl2, HCl, Cl2, ClF3, and NFzCl3-z, where z is an integer from 0 to 2.
5. The process of claim 4, wherein the reactive agent is COCl2 formed by an in situ reaction of CO and Cl2.
6. The process of claim 4, wherein the reactive agent is BCl3.
7. The process of claim 1 wherein the reactive agent is a carbon-containing compound having the formula CxHyClz, wherein x is a number ranging from 1 to 6, y is a number ranging from 0 to 13, and z is a number ranging 1 from 14.
8. The process of claim 1, wherein the reactive agent is conveyed to the substance from a gas cylinder, a safe delivery system or a vacuum delivery system.
9. The process of claim 1, wherein the reactive agent is formed in situ by a point-of-use generator.
10. The process of claim 1, wherein the substance is contacted with the reactive agent diluted with an inert gas diluent.
11. A process for removing a substance from at least a portion of the surface of a reaction chamber, the process comprising:
providing a reaction chamber wherein at least a portion of the surface is at least partially coated with the substance and wherein the substance has a dielectric constant of 4.1 or greater and is at least one member of the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide, a Group 13 metal silicate, a nitrogen containing Group 13 metal oxide, a nitrogen containing Group 13 metal silicate, a nitrogen containing transition metal oxide, a nitrogen containing transition metal silicate, or a laminate comprising at least one layer of the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide, a Group 13 metal silicate, a nitrogen containing Group 13 metal oxide, a nitrogen containing Group 13 metal silicate, a nitrogen containing transition metal oxide, a nitrogen containing transition metal silicate;
introducing a reactive agent into the reaction chamber wherein the reactive agent comprises at least one member selected from the group consisting of a halogen-containing compound; a boron-containing compound, a carbon-containing compound, a hydrogen-containing compound, a nitrogen-containing compound, a chelating compound, a chlorosilane compound, a hydrochlorosilane compound, or an organochlorosilane compound;
exposing the reactive agent to one or more energy sources sufficient to react the substance with the reactive agent and form a volatile product; and
removing the volatile product from the reaction chamber.
12. The process of claim 11, wherein the reactive agent is conveyed to the substance from a gas cylinder, a safe delivery system or a vacuum delivery system.
13. The process of claim 11, wherein the reactive agent is formed in situ by a point-of-use generator.
14. The process of claim 11, wherein the substance is contacted with the reactive agent diluted with an inert gas diluent.
15. The process of claim 11 wherein the reactive agent is deposited onto a nonreactive support.
16. The process of claim 11 wherein the reactive agent is exposed to one or more energy sources and the exposing step is conducted prior to the introducing step.
17. The process of claim 11 wherein the reactive agent is exposed to one or more energy sources and the exposing step is conducted during at least a portion of the introducing step.
18. The process of claim 11 wherein a temperature of the exposing step is at least 150 C.
19. The process of claim 11 wherein a pressure of the exposing step is at least 10 mTorr.
20. An apparatus for removing a substance from at least one surface of a reactor, the apparatus comprising:
an at least one reactive agent selected from the group consisting of a halogen-containing compound; a boron-containing compound, a carbon-containing compound, a hydrogen-containing compound, a nitrogen-containing compound, a chelating compound, a chlorosilane compound, a hydrochlorosilane compound, or an organochlorosilane compound; and
a non-reactive support having the at least one reactive agent deposited thereupon.
21. A mixture for removing a substance from at least one surface of a reactor, the mixture comprising:
an at least one reactive agent selected from the group consisting of a halogen-containing compound; a boron-containing compound, a carbon-containing compound, a hydrogen-containing compound, a nitrogen-containing compound, a chelating compound, a chlorosilane compound, a hydrochlorosilane compound, or an organochlorosilane compound; and
an inert diluent.
22. A process for removing a substance from an at least one surface of a substrate, said process comprising:
providing the substrate wherein the substrate is at least partially coated with a film of the substance that is at least one member selected from the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide other than Al2O3, a Group 13 metal silicate, a nitrogen containing Group 13 metal oxide, a nitrogen containing Group 13 metal silicate, a nitrogen containing transition metal oxide, a nitrogen containing transition metal silicate, or a laminate comprising at least one layer of the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide, a Group 13 metal silicate, a nitrogen containing Group 13 metal oxide, a nitrogen containing Group 13 metal silicate, a nitrogen containing transition metal oxide, or a nitrogen containing transition metal silicate; and wherein the substance has a dielectric constant greater than a dielectric constant of silicon dioxide;
reacting the substance with a reactive agent to form a volatile product, wherein the reactive agent comprises at least one member from the group consisting of a halogen-containing compound ; a boron-containing compound, a carbon-containing compound, a hydrogen-containing compound, a nitrogen-containing compound, a chelating compound, a chlorosilane compound, a hydrochlorosilane compound, or an organochlorosilane compound; and
removing the volatile product from the substrate to thereby remove the substance from the substrate.
23. The process of claim 22, wherein the substance is at least one member selected from the group consisting of HfO2, ZrO2, HfSixOy, ZrSixOy where x is greater than 0 and y is 2x 2, Al2SiwOz, where w is greater than 0 and z is 2w 3, or any of the aforementioned compounds containing nitrogen.
24. The process of claim 22, wherein the substance is a laminate comprising layers of at least one material selected from the group consisting of a transition metal oxide, a transition metal silicate, a Group 13 metal oxide, a Group 13 metal silicate, a nitrogen containing transition metal oxide, a nitrogen containing transition metal silicate, a nitrogen containing Group 13 metal oxide, or a nitrogen containing Group 13 metal silicate.
25. The process of claim 22, wherein the reactive agent is at least one member selected from the group consisting of BCl3, COCl2, HCl, Cl2, ClF3, and NFzCl3-z, where z is an integer from 0 to 2.
26. The process of claim 25, wherein the substance is at least one member selected from the group consisting of HfO2, ZrO2, HfSixOy, ZrSixOy, where x is greater than 0 and y is 2x 2, Al2SiwOz, where w is greater than 0 and z is 2w 3, or any of the aforementioned compounds containing nitrogen.
27. The process of claim 25, wherein the reactive agent is COCl2 formed by an in situ reaction of CO and Cl2.
28. The process of claim 25, wherein the reactive agent is BCl3.
29. The process of claim 22 wherein the reactive agent is a carbon-containing compound having the formula CxHyClz, wherein x is a number ranging from 1 to 6, y is a number ranging from 0 to 13, and z is a number ranging 1 from 14.
30. The process of claim 22 wherein the reactive agent is conveyed to the substance from a gas cylinder, a safe delivery system or a vacuum delivery system.
31. The process of claim 22 wherein the reactive agent is formed in situ by a point-of-use generator.
32. The process of claim 22 wherein the substance is contacted with the reactive agent diluted with an inert gas diluent.
33. The process of claim 22, wherein the substance is coated on the substrate by atomic layer deposition.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
I claim:
1. A ratchet screwdriver comprising:
a handle;
a main body provided with an axial hole, a sleeve fitted thereover, a shaft rod having a gear mounted on an inner end thereof, a locking ring fastened with an outer end of said main body and provided with a center through hole via which an outer end of said shaft rod is jutted out of the outer end of said main body, said shaft rod being disposed in said axial hole of said main body in conjunction with two check plates, each having a stop side, said main body further provided with an insertion slot and a stop plate disposed in said insertion slot; and
a movable joint member fastened between said handle and said main body such that said movable joint member is adjustable in angle in relation to said handle;
wherein said main body is provided in an outer wall with two indented edges opposite to each other and extending along the longitudinal direction of said main body; wherein said sleeve is provided in an inner wall with two guide edges corresponding to said indented edges of said main body and contiguous to said stop sides of said check plates;
wherein said movable joint member is formed of a ratchet portion fastened with an inner end of said main body, and a locating device which is fastened pivotally at one end with said ratchet portion and at other end with said handle, said locating device comprising a position confining slot, a recovery spring, and a retaining member formed of a press portion and a retaining portion, said retaining member being urged by said recovery spring such that said retaining portion is retained by said ratchet portion, so as to fix said movable joint member whereby said retaining portion is forced to move away from said ratchet portion at such time when said press portion of said retaining member is exerted on by an external force, thereby enabling said movable joint member to swivel.