What is claimed is:
1. A diamond saw blade with a shank, and with plural diamond tips provided on the circumference of the shank at a finite interval, slots for discharging cut chips being positioned between the adjoining diamond tips, further comprising undercut preventing tips disposed on respective walls of said slots, said undercut preventing tips including tungsten-carbide-based cemented carbide tips provided with cobalt-based layer, wherein said undercut preventing tips are formed by diffusing and joining the cobalt-based powder to said cemented carbide tips at a high temperature and said undercut preventing tips are fixed on respective walls of said slots by means of laser welding.
2. The diamond saw blade according to claim 1, wherein the cemented carbide tips are produced by sintering metal mixture substantially of tungsten carbide at a temperature of over 800 C., the cobalt-based powder to be molded includes the metal powder of over 50 wt. % of cobalt, and lesser amount of nickel and iron, the metal powder having a good weldability, and the sintered cemented carbide tips together with the cobalt-based powder are maintained at a temperature of over 800 C. for several minutes to yield undercut preventing tips by interface binding through the sintering.
3. The diamond saw blade according claim 1 or 2, wherein said cemented carbide tips include at least 5 wt. % of cobalt.
4. The diamond saw blade according claim 2, wherein the molded interface of the cobalt-based powder with said cemented carbide tips is in the form of irregularities or corrugations.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A microlithography method comprising the steps of:
A) providing an substrate;
B) overlaying the substrate with a photoresist material to establish an image medium;
C) exposing the image medium to an image pattern;
D) adding a material having a cyclical carbon structure into a developing solution; and,
E) submerging said imaging medium in said solution to yield said image pattern.
2. The method of claim 1 wherein said cyclical carbon structure is incorporated into said photoresist material during step E).
3. The method of claim 1 wherein said step A) is accomplished with a material that includes Mercury, Cadmium and Telluride materials (HgCdTe).
4. The method of claim 1 wherein said step B) is accomplished with a diazonophthoquinone (DNQ) Novolak photoresist material.
5. The method of claim 1 wherein said cyclical carbon structure is a fullerene (C60) material.
6. The method of claim 5 wherein said developing solution in step D) is a tetra-methyl ammonium hydroxide (TMAH) solution.
7. The method of claim 6 wherein said step D) is accomplished by sonicating said fullerene in said TMAH solution.
8. The method of claim 1 further comprising the step of:
F) etching said imaging medium.
9. The method of claim 8 wherein said step F) is accomplished by electron cyclotron resonance (ECR) in an ArgonHydrogen environment.
10. A technique for lithographic imaging comprising the steps of:
A) providing a substrate;
B) coating said substrate with a photoresist material to establish an imaging medium;
C) exposing said imaging medium to an image pattern; and, D) incorporating a fullerene material into said photoresist material, said incorporating step being accomplished after said coating step is complete.
11. The method of claim 10 wherein said fullerene is insoluble in said photoresist material and wherein said step D) further comprises the steps of:
E) affording a developing solution;
F) dissolving said fullerene in said developing solution; and,
G) submerging said imaging medium in said developing solution.