What is claimed is:
1. A method of monitoring a thickness of a conductive layer in a substrate during a polishing operation, comprising:
positioning a substrate on a first side of a polishing surface;
generating an alternating magnetic field from an inductor positioned on a second side of the polishing surface opposite the substrate, the magnetic field extending through the polishing surface to induce eddy currents in the conductive layer; and
detecting a change in the alternating magnetic field caused by a change in the thickness of the conductive layer.
2. The method of claim 1, wherein generating the alternating magnetic field from an inductor includes driving a first coil with an oscillator at a first frequency.
3. The method of claim 2, wherein the first frequency is a resonant frequency when the substrate is not in proximity to the magnetic field.
4. The method of claim 2, wherein detecting a change in the alternating magnetic field includes sensing the alternating magnetic field with a second coil.
5. The method of claim 4, wherein the second coil is connected in parallel with a capacitor.
6. The method of claim 4, wherein the first coil is wound around a first portion of a core and the second coil is wound around a second portion of the core.
7. The method of claim 1, wherein generating the alternating magnetic field includes directing the magnetic field through a core positioned at least partially in a recess in a polishing pad.
8. The method of claim 1, further comprising determining when the inductor is adjacent the substrate.
9. The method of claim 8, wherein determining when the inductor is adjacent the substrate includes using an optical interrupter.
10. The method of claim 8, wherein determining when the inductor is adjacent the substrate includes using an encoder.
11. The method of claim 1, wherein generating an alternating magnetic field from an inductor includes driving the inductor with a first signal, and detecting a change in the alternating magnetic field includes generating a second signal from the alternating magnetic field.
12. The method of claim 11, further comprising determining a change in amplitude in the second signal.
13. The method of claim 11, further comprising determining a change in a phase difference between the first signal and the second signal.
14. A method of chemical mechanical polishing, comprising:
positioning a substrate having a conductive layer on a first side of a polishing surface;
generating an alternating magnetic field from an inductor positioned on a second side of the polishing surface opposite the substrate, the magnetic field extending through the polishing surface to induce eddy currents in the conductive layer;
creating relative motion between the substrate and the polishing surface to polish the conductive layer;
sensing the eddy currents in the substrate; and
halting polishing when the sensed eddy currents exhibit an endpoint criteria.
15. The method of claim 14, wherein the endpoint criteria comprises the eddy current signal passing a threshold strength.
16. The method of claim 14, wherein the endpoint criteria comprises a slope of the eddy current signal leveling off.
17. The method of claim 14, wherein the endpoint criteria comprises a change in slope of the eddy current signal.
18. The method of claim 14, wherein the endpoint criteria comprises a local minima or local maxima of the eddy current signal.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A compound of the formula I,
the racemic-diastereomeric mixtures, optical isomers, or pharmaceutically-acceptable salts thereof, wherein
the dotted line in the structure of formula (I) represents an optional double bond;
X is CR1; Y is N; Q is O;
R3 for each occurrence is independently hydrogen, hydroxy, substituted or unsubstituted alkyl or substituted or unsubstituted alkoxy;
R1 is
where Z100 is nitro, optionally substituted amino,
\u2003or a group optionally substituted with Rb selected from the group consisting of cycloalkyl, naphthyl, tetrahydronaphthyl, benzothienyl, furanyl, thienyl, benzoxazolyl, benzothiazolyl,
\u2003thiazolyl, benzofuranyl, 2,3-dihydrobenzofuranyl, indolyl, isoxazolyl, tetrahydropyranyl, tetrahydrofuranyl, piperidinyl, pyrazolyl, pyrrolyl, oxazolyl, isothiazolyl, oxadiazolyl, thiadiazolyl, indolinyl, indazolyl, benzoisothiazolyl, pyrido-oxazolyl, pyrido-thiazolyl, pyrimido-oxazolyl, pyrimido-thiazolyl and benzimidazolyl;
when a is 1 and D1, G1, J1, L1 and M1 are each independently selected from the group consisting of CRa and N, provided that at least two of D1, G1, J1, L1 and M1 are CRa; or
when a is 0, and one of D1, G1, L1 and M1 is NRa, one of D1, G1, L1 and M1 is CRa and the remainder are independently selected from the group consisting of CRa and N;
when b is 1 and D2, G2, J2, L2 and M2 are each independently selected from the group consisting of CRa and N, provided that at least two of D2, G2, J2, L2 and M2 are CRa; or
when b is 0, and one of D2, G2, L2 and M2 is NRa, one of D2, G2, L2 and M2 is CRa and the remainder are independently selected from the group consisting of CRa and N;
Ra and Rb each represent one or more substituents and are for each occurrence independently selected from the group consisting of hydrogen, halogen, \u2014CN, \u2014NO2, \u2014C(O)OH, \u2014C(O)H, \u2014OH, \u2014C(O)O-alkyl, \u2014Z105\u2014C(O)N(R)2, \u2014Z105\u2014N(R)\u2014C(O)\u2014Z200, \u2014Z105\u2014N(R)\u2014S(O)2\u2014Z200, \u2014Z105\u2014N(R)\u2014C(O)\u2014N(R)\u2014Z200, Rc, CH2ORe, tetrazolyl, trifluoromethylcarbonylamino, trifluoromethylsulfonamido, and an optionally substituted group selected from the group consisting of carboxamido, alkyl, alkoxy, aryl, alkenyl, aryloxy, heteroaryloxy, arylalkyl, alkynyl, amino, aminoalkyl, amido groups, heteroarylthio and arylthio;
Z105 for each occurrence is independently a covalent bond or (C1-C6) aliphatic;
Z200 for each occurrence is independently an optionally substituted (C1-C6) aliphatic, optionally substituted phenyl, or optionally substituted \u2014(C1-C6)-phenyl aliphatic group-phenyl;
Rc for each occurrence is independently hydrogen, optionally substituted alkyl, optionally substituted aryl, \u2014CH2\u2014NRdRe, \u2014W\u2014(CH2)t\u2014NRdRe, \u2014W\u2014(CH2)t\u2014Oalkyl, \u2014W\u2014(CH2)t\u2014S-alkyl or \u2014W\u2014(CH2)t\u2014OH;
Rd and Re for each occurrence are independently H, alkyl, alkanoyl or SO2-alkyl; or
Rd, Re and the nitrogen atom to which they are attached together form a five- or six-membered heterocyclic ring;
t for each occurrence is independently an integer from 2 to 6;
W for each occurrence is independently a direct bond or O, S, S(O), S(O)2, or NRf;
Rf for each occurrence is independently H or alkyl;
Z110 is a covalent bond, or an optionally substituted (C1-C6) aliphatic which is optionally substituted with one or more substituents selected from the group consisting of alkyl, CN, OH, halogen, NO2, COOH, optionally substituted amino and optionally substituted phenyl;
Z111 is a covalent bond, an optionally substituted (C1-C6) aliphatic or an optionally substituted \u2014(CH2)n-cycloalkyl-(CH2)n\u2014; where the optionally substituted groups are optionally substituted with one or more substituents selected from the group consisting of alkyl, CN, OH, halogen, NO2, COOH, optionally substituted amino and optionally substituted phenyl; or
R1 is a substituted or unsubstituted carbocyclic or heterocyclic ring fused with ring 2;
A is a covalent bond, \u2014O\u2014; \u2014S\u2014; \u2014S(O)p\u2014; \u2014N(R)\u2014; \u2014N(C(O)OR)\u2014; \u2014N(C(O)R)\u2014; \u2014N(SO2R)\u2014; \u2014CH2O\u2014; \u2014CH2S\u2014; \u2014CH2N(R)\u2014; \u2014CH(NR)\u2014; \u2014CH2N(C(O)R)\u2014; \u2014CH2N(C(O)OR)\u2014; \u2014CH2N(SO2R)\u2014; \u2014CH(NHR)\u2014; \u2014CH(NHC(O)R)\u2014; \u2014CH(NHSO2R)\u2014; \u2014CH(NHC(O)OR)\u2014; \u2014CH(OC(O)R)\u2014; \u2014CH(OC(O)NHR); \u2014CH\u2550CH\u2014; \u2014C(\u2550NOR)\u2014; \u2014C(O)\u2014; \u2014CH(OR)\u2014; \u2014C(O)N(R)\u2014; \u2014N(R)C(O)\u2014; \u2014N(R)S(O)p\u2014; \u2014OC(O)N(R)\u2014; \u2014N(R)\u2014C(O)\u2014(CH2), \u2014N(R)\u2014, \u2014N(R)C(O)O\u2014; \u2014N(R)\u2014(CH2)n+1\u2014C(O)\u2014, \u2014S(O)pN(R)\u2014; \u2014N(C(O)R)S(O)p\u2014; \u2014N(R)S(O)pN(R)\u2014; \u2014N(R)\u2014C(O)\u2014(CH2)n\u2014O\u2014, \u2014C(O)N(R)C(O)\u2014; \u2014S(O)pN(R)C(O)\u2014; \u2014OS(O)pN(R)\u2014; \u2014N(R)S(O)pO\u2014; \u2014N(R)S(O)pC(O)\u2014; \u2014SOpN(C(O)R)\u2014; \u2014N(R)SOpN(R)\u2014; \u2014C(O)O\u2014; \u2014N(R)P(ORg)O\u2014; \u2014N(R)P(ORg)\u2014; \u2014N(R)P(O)(ORg)O\u2014; \u2014N(R)P(O)(ORg)\u2014; \u2014N(C(O)R)P(ORg)O\u2014; \u2014N(C(O)R)P(ORg)\u2014; \u2014N(C(O)R)P(O)(ORg)O\u2014, or \u2014N(C(O)R)P(ORg)\u2014;
p is 1 or 2;
R for each occurrence is independently H, optionally substituted alkyl, optionally substituted arylalkyl or optionally substituted aryl;
Rg for each occurrence is independently H, or an optionally substituted group selected from the group consisting of alkyl, arylalkyl, cycloalkyl and aryl; or
R, Rg, the nitrogen atom and the phosphorus atom, together form a five- or six-membered heterocyclic ring when R and Rg are in a phosphorus containing group; or
A is NRSO2 and R, Ra and the nitrogen atom together form an optionally substituted five- or six-membered heterocyclic ring fused to ring 1; and
n for each occurrence is independently an integer from 0 to 6.
2. A compound according to claim 1 of formula (III),
wherein
A is selected from the group consisting of a covalent bond, \u2014N(R)C(O)\u2014, and \u2014N(R)\u2014C(O)\u2014(CH2)n\u2014N(R)\u2014;
Z100 is selected from the group consisting of nitro, amino, substituted amino, and optionally substituted aryl;
R is hydrogen; and n is 0.
3. The compound of claim 2 wherein
A is a covalent bond; and Z100 is selected from the group consisting of nitro, amino and substituted amino.
4. The compound of claim 3 selected from the group consisting of 3-(4-nitrophenyl)isoxazolo5,4-dpyrimidin-4-amine; and 3-(4-aminophenyl)isoxazolo5,4-dpyrimidin-4-amine.
5. The compound of claim 2 wherein
A is selected from the group consisting of \u2014N(R)C(O)\u2014, and \u2014N(R)\u2014C(O)\u2014(CH2)n\u2014N(R)\u2014; and Z100 is optionally substituted aryl.
6. The compound of claim 5 selected from the group consisting of
N-4-(4-aminoisoxazolo5,4-dpyrimidin-3-yl)phenyl-N\u2032-(3-methylphenyl)urea;
N-4-(4-aminoisoxazolo5,4-dpyrimidin-3-yl)phenyl-N\u2032-(3-ethylphenyl)urea;
N-4-(4-aminoisoxazolo5,4-dpyrimidin-3-yl)phenyl-N\u2032-(3-chlorophenyl)urea;
N-4-(4-aminoisoxazolo5,4-dpyrimidin-3-yl)phenylbenzamide;
N-4-(4-aminoisoxazolo5,4-dpyrimidin-3-yl)phenyl-N\u2032-3-(trifluoromethyl)phenylurea; and
N-4-(4-aminoisoxazolo5,4-dpyrimidin-3-yl)phenyl-N\u2032-2-fluoro-5-(trifluoromethyl)phenylurea.
7. A pharmaceutical composition comprising a compound according to claim 1 and a pharmaceutically acceptable carrier or diluent.