1. An optical transceiver system that uses digital signal processing to process a data stream sent through a fiber optical channel to modify an optical receiver of the optical transceiver system capabilities both to achieve the a predetermined end-to-end bit error rate while to altering power dissipation in the optical receiver to that sufficient to meet said end-to-end bit error rate, the optical transceiver system comprising: an optical transmitter; and the optical receiver, the optical receiver comprising digital logic; and a controller in electrical communication with the optical receiver, wherein the controller controls either, the bypassing of portions of the digital logic, or at least reduction of one of the value of power to, parameters of or clock to portions of the digital logic, so as to reduce power dissipation in the optical receiver while meeting the end-to-end bit error rate,
wherein a portion of the digital logic is an adaptive equalizer module and the adaptive equalizer module can simultaneously perform both polarization mode dispersion equalization and chromatic dispersion compensation and wherein the chromatic dispersion compensation function is reduced so as to save power when the chromatic dispersion compensation is small enough such that it can be compensated by the PMD block alone.
2. The system of claim 1 wherein the adaptive equalizer module includes sub-modules, wherein the sub-modules are repeatedly monitored for their level of use, and wherein the state of the sub-modules are dynamically changed so as to minimize power consumption.
3. An optical transceiver system that uses digital signal processing to process a data stream sent through a fiber optical channel to modify an optical receiver of the optical transceiver system capabilities both to achieve the a predetermined end-to-end bit error rate while to altering power dissipation in the optical receiver to that sufficient to meet said end-to-end bit error rate, the optical transceiver system comprising: an optical transmitter; and the optical receiver, the optical receiver comprising digital logic; and a controller in electrical communication with the optical receiver, wherein the controller controls either, the bypassing of portions of the digital logic, or at least reduction of one of the value of power to, parameters of or clock to portions of the digital logic, so as to reduce power dissipation in the optical receiver while meeting the end-to-end bit error rate,
wherein the digital logic further includes an analog to digital converter and the power utilization is reduced by reducing at least one of the sampling rate and the sampling precision of the analog to digital converter.
4. An optical transceiver system that uses digital signal processing to process a data stream sent through a fiber optical channel to modify an optical receiver of the optical transceiver system capabilities both to achieve the a predetermined end-to-end bit error rate while to altering power dissipation in the optical receiver to that sufficient to meet said end-to-end bit error rate, the optical transceiver system comprising: an optical transmitter; and the optical receiver, the optical receiver comprising digital logic; and a controller in electrical communication with the optical receiver, wherein the controller controls either, the bypassing of portions of the digital logic, or at least reduction of one of the value of power to, parameters of or clock to portions of the digital logic, so as to reduce power dissipation in the optical receiver while meeting the end-to-end bit error rate,
wherein the controller controls in response a measurement of at least one channel parameter,
wherein the measured parameter is bulk dispersion and
wherein if a compensation of the bulk dispersion is required that is at a predetermined level so as to be compensated by the polarization mode dispersion equalization, the bulk dispersion compensation module is bypassed.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A plasma flood gun for use in an ion implantation system, the plasma flood gun comprising:
a plasma chamber having an exit aperture;
a gas source capable of supplying a gaseous substance to the plasma chamber;
a single-turn radio-frequency (RF) coil disposed within the plasma chamber, wherein a bent portion of the RF coil is located outside the plasma chamber;
a power source coupled to the RF coil for inductively coupling radio frequency electrical power into the plasma chamber via the RF coil to excite the gaseous substance to generate a plasma; and
a pair of magnets aligned with, and disposed on opposite sides of, the exit aperture, the pair of magnets each having the same pole configuration, wherein the exit aperture has a width sufficient to allow charged particles of the plasma to flow therethrough.
2. The plasma flood gun according to claim 1, wherein a portion of an inner surface of the plasma chamber comprises one or more materials selected from a group consisting of graphite and silicon carbide.
3. The plasma flood gun according to claim 1, wherein the RF coil has an encasement to protect the RF coil from exposure to the plasma.
4. The plasma flood gun according to claim 3, wherein the encasement comprises a quartz material.
5. The plasma flood gun according to claim 1, further comprising a plurality of magnets disposed about the plasma chamber.
6. The plasma flood gun according to claim 5, wherein the plurality of magnets are arranged in an alternating pole arrangement to produce one or more magnetic dipoles within the plasma chamber to confine the plasma within the plasma chamber.
7. The plasma flood gun of claim 1, wherein the pair of magnets are of unequal strength to provide an unbalanced cusp field about the exit aperture.
8. The plasma flood gun of claim 1, wherein the pair of magnets are of equal strength.
9. The plasma flood gun of claim 1, wherein the pair of magnets are of equal strength and positioned an unequal distance about the exit aperture.
10. The plasma flood gun of claim 1, wherein a first of the pair of magnets has an N pole configuration and a second of the pair of magnets has an N pole configuration.
11. The plasma flood gun of claim 1, wherein a first of the pair of magnets has an S pole configuration and a second of the pair of magnets has an S pole configuration.
12. A method for providing a plasma flood gun in an ion implantation system, the method comprising:
providing a plasma chamber having an exit aperture, wherein an entire inner surface of the plasma chamber is free of metal or metal compound;
supplying at least one gaseous substance to the plasma chamber;
generating a plasma by coupling radio frequency (RF) power into the plasma chamber via a single-turn coil disposed within the plasma chamber to excite the at least one gaseous substance; and
causing at least a portion of charged particles from the plasma to exit the plasma chamber via the exit aperture, wherein a pair of magnets are provided on opposite sides of the exit aperture and wherein the pair of magnets each have a same pole configuration.
13. The method of claim 12, further comprising maintaining the plasma away from the inner surface of the plasma chamber using a plurality of magnets.
14. The method of claim 12, further comprising adjusting plasma density and uniformity using a plurality of magnets arranged in a multi-pole configuration.
15. The method of claim 12, wherein the pair of magnets are of unequal strength to provide an unbalanced cusp field about the exit aperture.
16. The method of claim 12, wherein the pair of magnets are of equal strength.
17. The method of claim 12, wherein the pair of magnets are of equal strength and positioned an unequal distance about the exit aperture.
18. The method of claim 12, wherein at least one of an arrangement, polarity and strength of the pair of magnets is selected to bend high energy electrons into a Larmor radius away from an exiting trajectory.
19. The method of claim 12, wherein a portion of the inner surface of the plasma chamber comprises one or more materials selected from a group consisting of graphite and silicon carbide.
20. The method of claim 12, wherein the single-turn coil has an encasement to protect the coil from exposure to the plasma.
21. The method of claim 20, wherein the encasement comprises a quartz material.
22. A plasma flood gun for use in an ion implantation system, the plasma flood gun comprising:
a plasma chamber having an exit aperture;
a gas source capable of supplying a gaseous substance to the plasma chamber;
a single-turn radio-frequency (RF) coil disposed within the plasma chamber;
a power source coupled to the RF coil for inductively coupling radio frequency electrical power into the plasma chamber via the RF coil to excite the gaseous substance to generate a plasma; and
a pair of magnets aligned with, and disposed on opposite sides of the exit aperture, the pair of magnets each having the same pole configuration;
wherein the exit aperture has a width sufficient to allow charged particles of the plasma to flow therethrough.
23. The plasma flood gun of claim 22, wherein a bent portion of the RF coil is located outside the plasma chamber.