Author: claimsbot

1. A cyclone dust-collecting apparatus comprising:
a cyclone chamber configured to separate dust from air which is drawn in along with the dust;
a dust receptacle configured to store the dust separated by the cyclone chamber;
a transparent case configured to surround the cyclone chamber and the dust receptacle; and
a colored guide unit configured to form a spiral passage so that a whirling air current is formed in the cyclone chamber.
2. The cyclone dust-collecting apparatus of claim 1, wherein the colored guide unit comprises:
a discharge pipe configured to allow air, from which the dust is separated by the cyclone chamber, to be discharged; and
a spiral blade configured to be disposed on an outer circumference of the discharge pipe to form the spiral passage.
3. The cyclone dust-collecting apparatus of claim 2, wherein the colored guide unit further comprises:
a connection portion configured to be in contact with the transparent case so that the colored guide unit is stably fixed to the transparent case.
4. The cyclone dust-collecting apparatus of claim 3, wherein the discharge pipe and the spiral blade protrude further than the connection portion.
5. The cyclone dust-collecting apparatus of claim 1, wherein the spiral passage is rotated at an angle more than 360\xb0 and less than 720\xb0.
6. The cyclone dust-collecting apparatus of claim 1, wherein the cyclone chamber is disposed horizontally above the dust receptacle.
7. The cyclone dust-collecting apparatus of claim 6, further comprising a second cyclone chamber arranged side by side to the cyclone chamber.
8. The cyclone dust-collecting apparatus of claim 1, wherein a dust discharge portion is formed on a first side of the cyclone chamber, and the colored guide unit is connected to a second side of the cyclone chamber.
9. The cyclone dust-collecting apparatus of claim 1, further comprising:
a bottom plate configured to be openablyclosably connected to a lower side of the transparent case.
10. The cyclone dust-collecting apparatus of claim 1, further comprising:
an inlet configured to allow dust-laden air drawn in from outside to flow into the cyclone dust-collecting apparatus; and
a connection passage configured to connect the inlet to the colored guide unit.
11. A cleaner comprising:
a suction brush configured to draw in air along with dust from a surface being cleaned;
a cyclone dust-collecting apparatus configured to separate dust from the air drawn in through the suction brush; and
a main body to which the cyclone dust-collecting apparatus is mounted,
wherein the cyclone dust-collecting apparatus comprises:
a cyclone chamber configured to separate dust from air which is drawn in along with the dust;
a dust receptacle configured to store the dust separated by the cyclone chamber;
a transparent case configured to surround the cyclone chamber and the dust receptacle; and
a colored guide unit configured to form a spiral passage so that a whirling air current is formed in the cyclone chamber.
12. A cyclone dust-collecting apparatus comprising:
a transparent case;
a cyclone chamber;
a dust receptacle; and a colored guide unit;
wherein the colored guide unit is positioned within the transparent case and the transparent case encloses the cyclone chamber and the dust receptacle; and
wherein the dust receptacle is in communication with the cyclone chamber.
13. The cyclone dust-collecting apparatus of claim 12, wherein the cyclone chamber is bounded by the transparent case and the colored guide unit.
14. The cyclone dust-collecting apparatus of claim 12, wherein the cyclone dust-collecting apparatus is configured to be removably attachable to a main body of a cleaner.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A constant voltage circuit for a power adapter comprising:
a transformer having a primary coil and a secondary coil, the transformer transforming a primary voltage based on a pulse width modulation (PWM) control into a secondary voltage according to a turn ratio of the primary and secondary coils;
a voltage detector for detecting an output voltage from the transformer;
a current detector for detecting output current which is supplied from the transformer to a load;
a currentvoltage converter for converting the output current detected by the current detector into a current detection voltage and outputting the converted current detection voltage to a detected voltage terminal of the voltage detector; and
a comparator for comparing a voltage of the output voltage detected by the voltage detector plus the current detection voltage from the currentvoltage converter with a predetermined reference voltage to output a difference voltage therebetween necessary for the PWM control of the transformer.
2. The constant voltage circuit according to claim 1, further comprising a rectifier connected between the transformer and the load for rectifying the output voltage from the transformer.
3. The constant voltage circuit according to claim 1, further comprising:
a signal coupler for outputting a signal corresponding to the difference voltage from the comparator through optical coupling; and
a controller for controlling the primary voltage of the transformer in a PWM manner in response to the output signal from the signal coupler.
4. The constant voltage circuit according to claim 1, wherein the currentvoltage converter comprises:
an IV conversion circuit for converting the output current detected by the current detector into the current detection voltage; and
a buffer for outputting the converted current detection voltage from the IV conversion circuit to the detected voltage terminal of the voltage detector.
5. The constant voltage circuit according to claim 4, wherein the buffer is implemented in one integrated circuit (IC) along with the comparator.
6. The constant voltage circuit according to claim 5, wherein the comparator comprises:
an inverting input terminal configured to receive the output voltage detected by the voltage detector; and
a non-inverting input terminal configured to receive the reference voltage;
wherein the buffer comprises:
an inverting input terminal connected to an output terminal of the buffer and connected to the inverting input terminal of the comparator; and
a non-inverting input terminal configured to receive the current detection voltage.

1. Manufacturing process of an element of a chemical device comprising at least one first and one second coated assembly parts, each said coated assembly part comprising a metal support part and at least one anticorrosion metallic coating, said process comprising:
manufacturing intermediate coated assembly parts according to a process comprising a brazing operation comprising:
forming an initial assembly comprising a support part, an anticorrosion coating and at least one brazing material between the support part and the coating;
introducing the initial assembly into a controlled-atmosphere brazing chamber;
forming a controlled atmosphere in said chamber;
heating said assembly up to a temperature at least equal to the brazing temperature of said brazing material, in such a way as to fix the anticorrosion coating on the support part by brazing;

shaping of said intermediate coated parts, by plastic deformation, in such a way as to obtain said coated assembly parts;
assembling the coated assembly parts, in such a way as to obtain said element of a chemical device.
2. Manufacturing process according to claim 1, wherein the brazing temperature is less than approximately 750 C.
3. Manufacturing process according to claim 2, wherein the brazing temperature is between 600 C. and 720 C.
4. Manufacturing process according to any of claims 1 to 3, wherein the controlled atmosphere is essentially composed of inert gas.
5. Manufacturing process according to claim 4, wherein the inert gas is chosen in the group comprising rare gases, nitrogen and mixtures thereof.
6. Manufacturing according to claim 1, wherein the controlled atmosphere of the chamber is a pressure P between approximately 102 and 105 Pa during brazing.
7. Manufacturing process according to claim 1, wherein it also comprises the application of a plating pressure on said initial assembly during all or part of the brazing operation.
8. Manufacturing process according to claim 7, wherein the plating pressure is greater than 0.1 MPa, preferentially greater than 0.3 MPa, and more preferentially greater than 0.5 MPa.
9. Manufacturing process according to claim 1, wherein it also comprises at least one pre-treatment of the surface of said support parts intended to be coated and in that the treatment is selected from the group consisting of chemical, electrochemical, physicochemical and mechanical treatments and combinations thereof.
10. Manufacturing process according to claim 1, wherein it also comprises depositing at least one layer capable of improving the adherence of the brazing material and limiting the formation of weakening compounds.
11. Manufacturing process according to claim 10, wherein said layer is metallic.
12. Manufacturing process according to claim 10 or 11, wherein the deposition is performed by chemical means, electrolytic means or in vapour phase.
13. Manufacturing process according to claim 1, wherein the thickness of said coating is less than 1 mm.
14. Manufacturing process according to claim 1, wherein the thickness of said coating is less than 0.5 mm.
15. Manufacturing process according to claim 1, wherein said coating is made of a metal selected from the group consisting of tantalum, tantalum alloys, titanium, titanium alloys, zirconium, zirconium alloys, nickel-based alloys and stainless steels.
16. Manufacturing process according to claim 1, wherein the brazing material contains silver, copper, zinc, cadmium or tin, or a mixture thereof.
17. Manufacturing process according to claim 1, wherein the brazing material is in the form of a powder, a sheet or a mesh.
18. Manufacturing process according to claim 1, wherein said support part is made of steel.
19. Manufacturing process according to claim 18, wherein said steel is a carbon steel or a stainless steel.
20. Manufacturing process according to claim 1, wherein said support part takes the form of plates or sheets.
21. Manufacturing process according to claim 1, wherein said coating takes the form of plates or sheets.
22. Manufacturing process according to claim 1, wherein it also comprises:
forming recesses at the ends of each support part intended to be joined before the brazing operation, in such a way as to avoid brazing between each coating and each support part at the location of said recesses;
clearing of the ends of each coating after the brazing operation;
forming a join between the ends of said support parts;
forming a join between the ends of said coatings.
23. Manufacturing process according to claim 22, wherein the joins between the ends of said support parts and the joins between the ends of said coatings are produced by welding.
24. Manufacturing process according to claim 1, wherein said element of the chemical device is selected from the group consisting of storage chambers, tanks, heat exchangers, reaction vessels, mixers, processing devices and routing devices.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of dynamically balancing load in a system of servers, comprising:
a) monitoring for servers that are able to respond to requests directed at the system, including actively discovering new servers in said system of servers;
b) determining a performance metric for a first set of said servers discovered by said monitoring for the servers;
c) maintaining a table comprising said performance metric for said first set of discovered servers; and
d) in response to receiving a request, routing said request to a selected server in the system of servers based on said performance metric, wherein the system of servers comprises the first set of discovered servers.
2. The method of claim 1, further comprising:
determining a load on ones of the servers in the system of servers.
3. The method of claim 2, further comprising:
determining a stress factor for a given server based on the performance metric of the given server and the load on the given server.
4. The method of claim 1, further comprising:
determining a stress factor for ones of the servers in the system of servers based on the performance metrics.
5. The method of claim 1, wherein the performance metric is a response time.
6. The method of claim 1, wherein the performance metric is a response time when the servers discovered by said monitoring are unloaded.
7. The method of claim 1, further comprising:
periodically reevaluating said performance metric for the servers in the system of servers.
8. A method of dynamically balancing load, comprising:
a) dynamically discovering a first set of servers that are able to respond to requests directed at a system and actively discovering new servers of said system;
b) determining a response time of each of the first set of discovered servers;
c) calculating stress factors for each of the first set of discovered servers, based in part on said response time;
d) receiving a request to the system;
e) determining a server in the system to route the request to based on the stress factors, wherein the system comprises the first set of discovered servers; and
f) routing said request to said server in the system determined in said e).
9. The method of claim 8, wherein said b) comprises determining a response time for each of the first set of discovered servers to a request.
10. The method of claim 8, wherein said b) comprises determining a response time for each of the first set of discovered servers to a database query.
11. The method of claim 8, wherein said c) comprises calculating the stress factor for each of the first set of discovered servers, based on said response time and a load for each of the first set of discovered servers.
12. The method of claim 8, wherein:
said b) further comprises determining a response time of a second set of discovered servers not discovered in said a);
said c) comprises calculating stress factors for each of the second set of discovered servers not discovered in said a), wherein the system further comprises the second set of discovered servers not discovered in said a).
13. The method of claim 12, wherein said second set of discovered servers not discovered in said a) are reported to a load-balancing agent in a configuration file.
14. A system for balancing load, comprising:
a plurality of back-end servers that are able to service requests to the system;
a front-end server having a load balancing agent comprising a table, wherein said front-end server receives requests that are forwarded to said back-end servers, and wherein said load balancing agent is operable to:
monitor for back-end servers that are able to service requests to the system, including actively discovering new back-end servers;
determine a performance metric for the back-end servers discovered by the monitoring; and
determine a server of said back-end servers to route a request to based on the performance metric.
15. The system of claim 14, wherein said load balancing agent is further operable to determine a load on a given back-end server.
16. The system of claim 14, wherein said load balancing agent is further operable to determine a stress factor for ones of the back-end servers.
17. The system of claim 16, wherein the stress factor for a given one of the back-end servers is based on the performance metric and the load on a given of the given one of the back-end servers.
18. The system of claim 17, wherein said load balancing agent is able to determine which server of said back-end servers to route a request to based on the stress factor.
19. The system of claim 14, wherein the performance metric is a response time.
20. The system of claim 17, wherein said load balancing agent is able to include back-end servers that the load balancing agent did not discover in the determination of which server to route the request to.