Author: claimsbot

1. A slat support assembly comprising a slat support arm which is movable to deploy a slat from a leading edge of an aircraft wing about an axis of rotation of the arm and a slat mount on a slat which is coupled to one end of said slat support arm by a joint, wherein the joint is configured to allow the slat mount to slide in a direction of the axis of rotation of the arm.
2. A slat support assembly according to claim 1, wherein the joint comprises a bearing element mounted to the slat mount, the bearing element being slidably received in a bearing sleeve on the slat support arm.
3. A slat support assembly according to claim 2, wherein the bearing element is configured to slide in a linear direction in the bearing sleeve.
4. A slat support assembly according to claim 3, wherein the bearing element comprises a shaft which is slidable in the bearing sleeve in a direction along a longitudinal axis of the shaft.
5. A slat support assembly according to claim 4, wherein the bearing sleeve comprises opposing bushes on the slat support arm and ends of the shaft are slidably received in the bushes, and the shaft extends between the opposing bushes.
6. A slat support assembly according to claim 5, further comprising a yoke formed at the one end of the slat support arm with two spaced yoke members, wherein the opposing bushes are formed in the yoke members.
7. A slat support assembly according to claim 6, wherein the slat mount is disposed between the yoke members.
8. A slat support assembly according to claim 5, wherein the slat mount is mountable to the shaft of the bearing element between the ends of the shaft.
9. A slat support assembly according to claim 5, wherein the ends of the shaft form cylindrical bearing journal surfaces which mate with corresponding bearing seats of the bushes.
10. A slat support assembly according to claim 5, wherein the longitudinal axis of the shaft extends parallel to the axis of rotation of the arm.
11. A slat support assembly according to claim 5, wherein each bush has an end stop at an end thereof, and the ends of the shaft are capable of abutting the end stops to restrict the range of motion of the shaft.
12. A slat support assembly according to claim 11, wherein the length of the shaft is shorter than the distance between the end stops of the opposing bushes so that the shaft is slidable in the bushes between the two end stops.
13. A slat support assembly according to claim 11, wherein an outlet is formed through each end stop.
14. A slat support assembly according to claim 8, wherein the slat mount is pivotally mounted to the shaft.
15. A slat support assembly according to claim 14, further comprising a collar on the slat mounting slat mount which locates around and mates with the shaft.
16. A slat support assembly according to claim 15, wherein the shaft further comprises a part-spherical section disposed between each end of the shaft and the collar locates around and mates with the part-spherical section of the shaft.
17. A slat support assembly according to claim 11, wherein the range of motion of the shaft is configured to prevent the slat mount abutting the yoke members.
18. A slat support assembly according to claim 4, further comprising a link arm extending between the slat support arm and the slat to prevent rotation of the slat about the longitudinal axis of the shaft.
19. A slat support assembly according to claim 18, wherein the link arm is pivotally mounted to the slat support arm and the slat by spherical bearings.
20. A slat support assembly according to claim 4, wherein a pin extends through the shaft along the longitudinal axis of the shaft to strengthen the shaft.
21. A slat support assembly according to claim 20, wherein the pin is fixedly mounted at each end to the bearing seat and the shaft is slidable along the pin.
22. A slat support assembly according to claim 21, when dependent on claim 11, wherein the pin is fixedly mounted to the end stops.
23. A slat support assembly according to claim 2, further comprising a plurality of bearings mountable within a wing, each bearing being in rolling contact with an associated bearing surface on the slat support arm to support the slat support arm and guide it during deployment and retraction of the slat, wherein at least some of the bearing surfaces and associated bearings are configured so that each bearing counteracts load applied to the slat support arm in more than one direction.
24. A slat support assembly according to claim 23, wherein the slat support arm has a pair of adjacent upper bearing surfaces, each upper bearing surface being arranged at an angle relative to its adjacent upper bearing surface such that a bearing associated with one upper bearing surface does not share a common axis with the bearing associated with the other upper bearing surface.
25. A slat support assembly according claim 1, comprising a groove in the slat support arm and a slat rack mounted to the slat support arm in the groove for cooperation with a drive pinion configured to rotate the slat track about its axis for deployment and retraction of the slat.
26. A joint for coupling a slat to one end of a slat support arm which is movable to deploy said slat from a leading edge of an aircraft wing about an axis of rotation of said slat support arm, the joint comprising a bearing element mountable to a slat and a bearing element sleeve mountable to a slat support arm, wherein the bearing element is configured to slide in the sleeve so that said slat is slidable relative to said slat support arm in the direction of the axis of rotation of the arm.
27. An aircraft wing having a slat and a slat support assembly according to claim 1.
28. An aircraft wing according to claim 27, wherein the slat support assembly according to any of claims 1 to 25 is a secondary slat support assembly which mounts a secondary slat mount of a slat to a secondary slat support assembly, and the aircraft wing further comprises a primary slat support assembly configured to fixedly mount a primary slat mount of said slat to a primary slat support arm which is configured to prevent the primary slat mount from sliding in the direction of the axis of rotation of the primary slat support arm.
29. (canceled)

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A seed of maize inbred line designated PHCK5, representative seed of said line having been deposited under ATCC Accession No: PTA-7035.
2. A maize plant, or a part thereof, produced by growing the seed of claim 1.
3. Pollen of the plant of claim 2.
4. An ovule or ovules of the plant of claim 2.
5. The maize plant of claim 2, wherein said plant has been detasseled.
6. A maize plant, or a part thereof, expressing all the physiological and morphological characteristics of inbred line PHCK5, representative seed of said line having been deposited under ATCC Accession No: PTA-7035.
7. A maize plant cell comprising all of the alleles of inbred line PHCK5 at the SSR loci listed in Table 2, representative seed of said line having been deposited under ATCC Accession No: PTA-7035.
8. A maize seed comprising the maize plant cell of claim 7.
9. A maize plant, or a part thereof, produced by growing the seed of claim 8.
10. A tissue culture comprising the maize plant cell of claim 7.
11. A tissue culture of regenerable cells produced from the plant of claim 2.
12. Protoplasts or callus produced from the tissue culture of claim 11.
13. The tissue culture of claim 11, wherein the regenerable cells of the tissue culture are produced from protoplasts or from tissue of a plant part selected from the group consisting of leaf, pollen, embryo, immature embryo, meristematic cells, immature tassels, microspores, root, root tip, anther, silk, flower, kernel, ear, cob, husk and stalk.
14. A maize plant regenerated from the tissue culture of claim 13, said plant having all the morphological and physiological characteristics of maize inbred line PHCK5, representative seed of said line having been deposited under ATCC Accession No: PTA-7035.
15. A process for producing an F1 hybrid maize seed, said process comprising crossing the plant of claim 2 with a different maize plant and harvesting F1 hybrid maize seed.
16. The process of claim 15, further comprising growing the F1 hybrid maize seed to produce a hybrid maize plant.
17. A process of producing a maize plant with a desired trait, wherein the desired trait is selected from the group consisting of male sterility, site-specific recombination, and abiotic stress tolerance, comprising transforming the maize plant of claim 2 with a nucleic acid molecule that confers said desired trait.
18. A maize plant produced by the process of claim 17, wherein the desired trait is male sterility and the trait is conferred by a nucleic acid molecule that confers male sterility.
19. A maize plant produced by the method of claim 17, wherein the desired trait is site-specific recombination and the site-specific recombination site is conferred by a member of the group consisting of flpfrt, crelox, Gin, Pin, and RRS.
20. A maize plant produced by the process of claim 17, wherein the desired trait is abiotic stress tolerance and the trait is conferred by a member of the group consisting of cytokinin, ethylene, abscisic acid, CBF, and a transcription factor.
21. A process of producing a herbicide resistant, disease resistant or insect resistant maize plant comprising transforming the maize plant of claim 2 with a nucleic acid molecule that confers said resistance.
22. A maize plant produced by the process of claim 21, wherein said resistance comprises herbicide, disease or insect resistance.
23. The resistant maize plant of claim 22, wherein said resistance is herbicide resistance and the herbicide is glyphosate, glufosinate, a sulfonylurea herbicide, an imidazolinone herbicide, a hydroxyphenylpyruvate dioxygenase inhibitor or a protoporphyrinogen oxidase inhibitor.
24. The resistant maize plant of claim 22, wherein the resistance is insect resistance and the insect resistance is conferred by a nucleic acid molecule encoding a Bacillus thuringiensis endotoxin.
25. The resistant maize plant of claim 22, wherein the resistance is disease resistance and the disease is caused by a bacterium, fungus, nematode or virus.
26. A process of producing a maize plant with altered grain characteristics, comprising transforming the maize plant of claim 2 with a nucleic acid molecule that confers altered phosphorus, antioxidants, fatty acids, essential amino acids or carbohydrates.
27. A maize plant produced by the process of claim 26, wherein said altered grain characteristics are conferred by a nucleic acid molecule selected from the group consisting of thioredoxin, dek1, Ipa1, Ipa3, mi1ps, hpt and hggt.
28. A process of introducing a desired trait into maize inbred line PHCK5 comprising:
(a) crossing PHCK5 plants grown from PHCK5 seed, representative seed of which has been deposited under ATCC Accession No: PTA-7035, with plants of another maize line that comprise a desired trait to produce F1 progeny plants, wherein the desired trait is selected from the group consisting of male sterility, site-specific recombination, increased transformability and abiotic stress tolerance;
(b) selecting F1 progeny plants that have the desired trait to produce selected F1 progeny plants;
(c) crossing the selected progeny plants with the PHCK5 plants to produce backcross progeny plants;
(d) selecting for backcross progeny plants that have the desired trait and physiological and morphological characteristics of maize inbred line PHCK5 to produce selected backcross progeny plants; and
(e) repeating steps (c) and (d) three or more times in succession to produce selected fourth or higher backcross progeny plants that comprise the desired trait and all of the physiological and morphological characteristics of maize inbred line PHCK5 listed in Table 1 as determined at the 5% significance level when grown in the same environmental conditions.
29. A plant produced by the process of claim 28, wherein the plant has the desired trait and all of the physiological and morphological characteristics of maize inbred line PHCK5 listed in Table 1 as determined at the 5% significance level when grown in the same environmental conditions.
30. The plant of claim 29, wherein the desired trait is male sterility and the trait is conferred by a nucleic acid molecule that confers male sterility.
31. The plant of claim 29, wherein the desired trait is site specific recombination and the site-specific recombination site is conferred by a member of the group consisting of flpfrt, crelox, Gin, Pin, and RRS.
32. The plant of claim 29, wherein the desired trait is abiotic stress tolerance and the trait is conferred by a member of the group consisting of cytokinin, ethylene, abscisic acid, CBF, and a transcription factor.
33. The plant of claim 29, wherein the desired trait is increased transformability and the trait is conferred by inbred maize line Hi-II.
34. A process of introducing a desired trait into maize inbred line PHCK5 comprising:
(a) crossing PHCK5 plants grown from PHCK5 seed, representative seed of which has been deposited under ATCC Accession No: PTA-7035, with plants of another maize line that comprise a desired trait to produce F1 progeny plants, wherein the desired trait is selected from the group consisting of herbicide resistance, insect resistance and disease resistance;
(b) selecting F1 progeny plants that have the desired trait to produce selected F1 progeny plants;
(c) crossing the selected progeny plants with the PHCK5 plants to produce backcross progeny plants;
(d) selecting for backcross progeny plants that have the desired trait and physiological and morphological characteristics of maize inbred line PHCK5 to produce selected backcross progeny plants; and
(e) repeating steps (c) and (d) three or more times in succession to produce selected fourth or higher backcross progeny plants that comprise the desired trait and all of the physiological and morphological characteristics of maize inbred line PHCK5 listed in Table 1 as determined at the 5% significance level when grown in the same environmental conditions.
35. A plant produced by the process of claim 34, wherein the plant has the desired trait and all of the physiological and morphological characteristics of maize inbred line PHCK5 listed in Table 1 as determined at the 5% significance level when grown in the same environmental conditions.
36. The plant of claim 35, wherein the desired trait is herbicide resistance and said herbicide is glyphosate, glufosinate, a sulfonylurea herbicide, an imidazolinone herbicide, a hydroxyphenylpyruvate dioxygenase inhibitor or a protoporphyrinogen oxidase inhibitor.
37. The plant of claim 35, wherein the desired trait is insect resistance and the insect resistance is conferred by a nucleic acid molecule encoding a Bacillus thuringiensis endotoxin.
38. The plant of claim 35, wherein the desired trait is disease resistance and the disease is caused by a bacterium, fungus, nematode or virus.
39. A process of introducing altered grain characteristics trait into maize inbred line PHCK5 comprising:
(a) crossing PHCK5 plants grown from PHCK5 seed, representative seed of which has been deposited under ATCC Accession No: PTA-7035, with plants of another maize line that comprise a desired trait to produce F1 progeny plants, wherein the desired trait is altered phosphorus, antioxidants, fatty acids, essential amino acids or carbohydrates;
(b) selecting F1 progeny plants that have the desired trait to produce selected F1 progeny plants;
(c) crossing the selected progeny plants with the PHCK5 plants to produce backcross progeny plants;
(d) selecting for backcross progeny plants that have the desired trait and physiological and morphological characteristics of maize inbred line PHCK5 to produce selected backcross progeny plants; and
(e) repeating steps (c) and (d) three or more times in succession to produce selected fourth or higher backcross progeny plants that comprise the desired trait and all of the physiological and morphological characteristics of maize inbred line PHCK5 listed in Table 1 as determined at the 5% significance level when grown in the same environmental conditions.
40. A plant produced by the process of claim 39, wherein the plant has the desired trait and all of the physiological and morphological characteristics of maize inbred line PHCK5 listed in Table 1 as determined at the 5% significance level when grown in the same environmental conditions.
41. A plant produced by the process of claim 39, wherein the desired trait is altered carbohydrate and the carbohydrate is waxy starch.

1. A method of making an embedded microlens structure comprising:
providing a substrate including at least one photo-sensing region;
forming a dielectric film overlying the substrate, the dielectric film having a first index of refraction;
forming a mask layer overlying the dielectric film;
creating a circular opening in the mask layer, the opening being center-aligned over the at least one photo-sensing region;
etching the dielectric film to form a cavity under the mask layer by introducing an isotropic etchant through the opening, the cavity being characterized by a truncated plano-convex shape having a flat circular bottom and convex peripheral sides curved towards the dielectric film;
removing the mask layer;
depositing a lens material having a second index of refraction overlying the dielectric film and filling at least partially the cavity, the second index of refraction being higher than the first index of refraction;
planarizing the lens material to form a microlens in the cavity having a smooth top surface; and
forming a color filter layer overlaying the smooth top surface of the microlens.
2. The method of claim 1, wherein the photo-sensing region comprises a photodiode.
3. The method of claim 1, wherein the dielectric film comprises a light transparent material having a refractive index of 1.5 or less.
4. The method of claim 1, wherein the dielectric film comprises silicon dioxide.
5. The method of claim 1, wherein the mask layer comprises a photoresist.
6. The method of claim 1, wherein creating a circular opening in the mask layer comprises dry etching or lithography patterning.
7. The method of claim 1, wherein the circular opening comprises an area that is smaller than the photo-sensing region in the substrate.
8. The method of claim 1, wherein etching the dielectric film to form a cavity under the mask layer comprises an isotropic wet etching process using a buffered HF etchant.
9. The method of claim 1, wherein the truncated plano-convex shaped cavity is approximately center-aligned to the opening of the mask layer.
10. The method of claim 1 further comprising a wet-dip process that is performed around a rim edge of the cavity to reduce a curvature of the rim edge following the removing of the mask layer.
11. The method of claim 1, wherein the depositing a lens material comprises one of the PVD, or CVD, or spin-on process.
12. The method of claim 1, wherein the lens material is selected from the group consisting of SiNx, Al2O3, ZrO2, TiO2, and HfO2.
13. The method of claim 1, wherein the second index of refraction is equal to about 2.0 and higher.
14. The method of claim 1, wherein the planarizing the lens material comprises a CMP process.
15. The method of claim 1, wherein the microlens formed in the cavity comprises a truncated plano-convex shaped lens that is center-aligned to the photo-sensing region.
16. The method of claim 1, wherein the smooth top surface of the microlens is circular shaped having a radius that is approximately 2 to 4 times a radius of the flat circular bottom.
17. The method of claim 1, wherein the microlens is located at a pre-determined distance atop the photo-sensing region separated by the dielectric film.
18. The method of claim 1, wherein the color filter layer overlying the microlens comprises a negative photoresist that is based on an acrylic polymer including color pigments.
19. The method of claim 1, wherein the color filter layer has a refractive index that is smaller than the second refractive index of the lens material.
20. The method of claim 1 further comprising forming a color transparent layer including an anti-reflection coating overlying the color filter layer to seal and protect the color filter layer.
21. A method of forming an embedded microlens array comprising:
providing a semiconductor substrate including an array of photo-detectors;
depositing a transparent film overlying the photo-detector array;
forming a mask layer overlying the transparent film;
forming a plurality of circular openings in the mask layer, each of the openings being center-aligned over at least one photo-detector;
etching the transparent film to form a plurality of cavities under the mask layer by introducing an isotropic etchant through the openings, each cavity being characterized by a truncated plano-convex shape having a flat circular bottom and convex peripheral sides towards the transparent film;
removing the mask layer;
wet-dipping around a peripheral rim of each cavity to obtain a curved surface;
depositing a lens material overlying the transparent film and filling the plurality of cavities;
planarizing the lens material to form a microlens array with a smooth top surface; each microlens having the truncated plano-convex shape of the cavity; and
forming a color filter layer overlying the top surface of the microlens array.
22. The method of claim 21, wherein the lens material is selected from the group consisting of silicon nitride (Si3N4), zirconium oxide (ZrO2), hafnium oxide (HfO2), titanium dioxide (TiO2), aluminum oxide (Al2O3), and zinc oxide (ZnO).
23. The method of claim 21, wherein the array of photo-detectors receives an incident light through the color filter layer and the microlens array and converts the incident light to an electrical signal.
24. The method of claim 21, wherein the array of photo-detectors is associated with a color CMOS image sensor.
25. The method of claim 21, wherein the array of photo-detectors is associated with a charge-coupled device (CCD).
26. The method of claim 21, wherein the array of photo-detectors is associated with a contact image sensor.
27. The method of claim 21, wherein the transparent film comprises silicon dioxide.
28. The method of claim 21, wherein the lens material comprises a refractive index equal to or greater than 2.0.
29. The method of claim 21, wherein the color filter layer has a refractive index smaller than a refractive index of the lens material.
30. An image sensor device comprising:
an array of photo sensing portions formed in a semiconductor substrate;
a first dielectric layer overlying the array of photo-sensors, the first dielectric layer having a first index of refraction and including a surface;
an array of microlenses embedded in the surface, each of the microlenses being center-aligned over one of the array of photo-sensors and having a truncated plano-convex shape, the microlenses being formed from a second dielectric material having a second index of refraction; and
a color filter layer overlying the array of microlenses.
31. The image sensor device of claim 30 further comprising a plurality of charge transfer circuits formed in the semiconductor substrate, each of the charge transfer circuits being coupled to each of the array of photo sensors.
32. The image sensor device of claim 30, wherein each of the array of photo-sensors comprises a CCD camera pixel, a photodiode, or an RGB color sensor element.
33. The image sensor device of claim 30, wherein the semiconductor substrate comprises a back-end-of-line processed silicon wafer, an SOI substrate, a quartz substrate, a ceramic substrate, or a glass substrate.
34. The image sensor device of claim 30, wherein the first dielectric layer comprises silicon dioxide or polyimide with index of refraction equal to or slightly less than 1.5.
35. The image sensor device of claim 30, wherein the first dielectric layer comprises a thickness capable of forming embedded microlens having a predetermined focal length.
36. The image sensor device of claim 30, wherein the second dielectric material is selected from the group consisting of silicon nitride, titanium oxide, zirconium oxide, hafnium oxide, and zinc oxide.
37. The image sensor device of claim 30, wherein the second dielectric material comprises an index of refraction about 2.0 or higher.
38. The image sensor device of claim 30, wherein the truncated plano-convex shape of the microlens includes a circular top having a smooth top surface, a flat circular bottom, and a curved circumferential side convex towards the first dielectric layer.
39. The image sensor device of claim 38, wherein the circular top comprises a diameter that is equal to or slightly less than a distance between the center of any two adjacent microlenses.
40. The image sensor device of claim 38, wherein the circular top of each of the microlenses is co-planar with the surface of the first dielectric layer.
41. The image sensor device of claim 38, wherein the flat circular bottom comprises a diameter that is about \xbc to \xbd of the circular top’s diameter.
42. The image sensor device of claim 38, wherein the circular bottom is separated from the array of photo sensors by the first dielectric layer.
43. The image sensor device of claim 30, wherein the color filter layer comprises a negative photoresist based on an acrylic polymer including color pigments.
44. The image sensor device of claim 43, wherein the color pigments comprise red, green, blue (RGB) or cyan, magenta, and yellow (CMY) dyed polymers.
45. The image sensor device of claim 30, wherein the color filter layer comprises an index of refraction smaller than the second index of refraction.
46. The image sensor device of claim 30 further comprising an anti-reflection coating interposed between the microlenses and the color filter layer.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for providing a challenge user interface for an enterprise social network including users associated with an entity, the method comprising:
receiving, by a processor system of the enterprise social network, a request for a challenge leader board of users of the enterprise social network in response to a challenge being selected from a list of displayed challenges with the selected challenge having an associated point category, wherein the challenge leader board is based on users of the enterprise social network awarding challenge points to other users of the enterprise social network for challenges in the same point category as the point category of the selected challenge;
obtaining, by the processor system, in response to the request, challenge leader board information comprising an ordered list of users based on an amount of challenge points each user has been awarded in challenges in the same point category as the point category of the selected challenge; and
transmitting, by the processor system, challenge user interface information including the challenge leader board information to the user system associated with the user for display of the challenge leader board with the challenge user interface, wherein the challenge user interface further comprises a selected challenge section including fields for information related to the selected challenge, wherein the challenge user interface further comprises a challenge comment section including fields for entering comments related to the selected challenge, and wherein the selected challenge section, the challenge comment section, and the challenge leader board are provided for concurrent display in the challenge user interface.
2. The method of claim 1 wherein the ordered list of users being ordered in a descending order from highest to lowest based on the amount of challenge points each user has earned in the same point category as the point category of the selected challenge.
3. The method of claim 1 wherein the challenge information further comprises images corresponding to each listed user, a name corresponding to each image, and a total number of points corresponding to each listed user.
4. The method of claim 3 wherein the each image is one of a digital photo and an avatar.
5. The method of claim 1 further comprising transmitting, by the processor system in response to the request, a rank and points corresponding to the user requesting the challenge leader board information for display on the user system associated with the user who sent the request.
6. The method of claim 5 further comprising transmitting, by the processor system in response to the request, 1 wherein the challenge leader board is based on overall points earned by each user, wherein the overall points are for two or more types of points.
7. The method of claim 1 wherein the challenge leader board is based on total points earned by each user within a category of points.
8. A non-transitory machine-readable medium carrying one or more sequences of instructions for a challenge user interface for an enterprise social network including users associated with an entity, which instructions, when executed by one or more processors, cause the one or more processors to carry out the steps of:
receiving, by a processor system of the enterprise social network, a request for a challenge leader board of users of the enterprise social network, wherein the challenge leader board is based on users of the enterprise social network awarding challenge points to other users of the enterprise social network;
obtaining, by the processor system, in response to the request, challenge leader board information comprising an ordered list of users based on an amount of challenge points each user has been awarded; and
transmitting, by the processor system, challenge user interface information including the challenge leader board information to the user system associated with the user for display of the challenge leader board with the challenge user interface, wherein the challenge user interface further comprises a selected challenge section including fields for information related to the selected challenge, wherein the challenge user interface further comprises a challenge comment section including fields for entering comments related to the selected challenge, and wherein the selected challenge section, the challenge comment section, and the challenge leader board are provided for concurrent display in the challenge user interface.
9. The non-transitory machine-readable medium of claim 8 wherein the ordered list of users being ordered in a descending order from highest to lowest based on the amount of challenge points each user has earned.
10. The non-transitory machine-readable medium of claim 8 wherein the recognition challenge information further comprises images corresponding to each listed user, a name corresponding to each image, and a total number of points corresponding to each listed user.
11. The non-transitory machine-readable medium of claim 10 wherein the each image is one of a digital photo and an avatar.
12. The non-transitory machine-readable medium of claim 8 further comprising transmitting, by the processor system in response to the request, a rank and points corresponding to the user requesting the challenge leader board information for display on the user system associated with the user who sent the request.
13. The non-transitory machine-readable medium of claim 8 wherein the challenge leader board is based on overall points earned by each user, wherein the overall points are for two or more types of points.
14. The non-transitory machine-readable medium of claim 8 wherein the challenge leader board is based on total points earned by each user within a category of points.
15. An apparatus for a challenge user interface for an enterprise social network including users associated with an entity, the apparatus comprising:
a processor system; and
one or more stored sequences of instructions which, when executed by the processor system, cause the processor to carry out the steps of:
receiving a request for a challenge leader board of users of the enterprise social network, wherein the challenge leader board is based on users of the enterprise social network awarding challenge points to other users of the enterprise social network;
obtaining in response to the request, challenge leader board information comprising an ordered list of users based on an amount of challenge points each user has been awarded; and
transmitting challenge user interface information including the challenge leader board information to the user system associated with the user for display of the challenge leader board with the challenge user interface, wherein the challenge user interface further comprises a selected challenge section including fields for information related to the selected challenge, wherein the challenge user interface further comprises a challenge comment section including fields for entering comments related to the selected challenge, and wherein the selected challenge section, the challenge comment section, and the challenge leader board are provided for concurrent display in the challenge user interface.
16. The apparatus of claim 15 wherein the ordered list of users being ordered in a descending order from highest to lowest based on the amount of challenge points each user has earned.
17. The apparatus of claim 15 wherein the recognition challenge information further comprises images corresponding to each listed user, a name corresponding to each image, and a total number of points corresponding to each listed user.
18. The apparatus of claim 15 further comprising transmitting, by the processor system in response to the request, a rank and points corresponding to the user requesting the challenge leader board information for display on the user system associated with the user who sent the request.
19. The apparatus of claim 15 wherein the challenge leader board is based on overall points earned by each user, wherein the overall points are for two or more types of points.
20. The apparatus of claim 15 wherein the challenge leader board is based on total points earned by each user within a category of points.