Author: claimsbot

1. A composition for providing a hydrophobic wateralcohol repellent surface on a non-woven polypropylene barrier composite which comprises a perfluorinated ester and a hydrophobic non-ionic wax, wherein the perfluorinated ester and the hydrophobic non-ionic wax each comprises 10 to 60% by weight of the composition making up a total of at least 75% by weight of the composition, with other components which do not harmfully affect the hydrophobic wateralcohol repellent properties of the non-woven polypropylene barrier composite comprising up to 25% of the composition.
2. The composition of claim 1, wherein the perfluorinated ester is a straight chain ester comprising straight chain alkyl groups where a fluorocarbon portion thereof is a C1-C6 fluorocarbon.
3. The composition of claim 1, wherein the perfluorinated ester has the formula CF3(CF2)nCH2CH2COOR; where n\u22665, and R is alkyl chain with greater than 16-24 carbon atoms.
4. The composition of claim 1, wherein the perfluorinated ester has the formula
where R is a C16-C24 straight chain alkyl group, Rf is C4,-C6 fluorocarbon and n is 4-10.
5. The composition of claim 1, wherein the perfluorinated ester has the formula CF3(CF2)nCOOR; where R is an alkyl sulfonate or urethane chain and n\u22675.
6. The composition of claim 1, wherein the hydrophobic non-ionic wax has the formula CH3(CH2)mCH3, where m is >20.
7. The composition of claim 1, wherein the hydrophobic non-ionic wax has the formula (CH3(CH2)m\u2014CO\u2014O\u2014(CH2)nCH3 where m and n are 7-21).
8. The composition of claim 1, wherein the hydrophobic non-ionic wax has the formula (CH3(CH2)m\u2014CO\u2014NH\u2014(CH2)nCH3 where m and n are 7-21).
9. A non-woven polypropylene barrier composite which comprises a surface having thereon a perfluorinated ester and a hydrophobic non-ionic wax, wherein the perfluorinated ester and the hydrophobic non-ionic wax each comprises 10 to 60% by weight of the composition making up a total of at least 75% by weight of the composition, with other components which do not harmfully affect the hydrophobic wateralcohol repellent properties of the non-woven polypropylene barrier composite comprising up to 25% of the composition.
10. The composite of claim 9, wherein the perfluorinated ester is a straight chain ester comprising straight chain alkyl groups where a fluorocarbon portion thereof is a C1-C6 fluorocarbon.
11. The composite of claim 9, wherein the perfluorinated ester has the formula CF3(CF2)nCH2CH2COOR; where n\u22665, and R is alkyl chain with greater than 16-24 carbon atoms.
12. The composite of claim 9, wherein the perfluorinated ester has the formula
where R is a C16-C24 straight chain alkyl group, Rf is C4,-C6 fluorocarbon and n is 4-10.
13. The composite of claim 9, wherein the perfluorinated ester has the formula CF3(CF2)mCOOR; where R is an alkyl sulfonate or urethane chain and n\u22675.
14. The composite of claim 9, wherein the hydrophobic non-ionic wax has the formula CH3(CH2)mCH3, where m is >20.
15. The composite of claim 9, wherein the hydrophobic non-ionic wax has the formula (CH3(CH2)m\u2014CO\u2014O\u2014(CH2)nCH3 where m and n are 7-21).
16. The composite of claim 9, wherein the hydrophobic non-ionic wax has the formula (CH3(CH2)m\u2014CO\u2014NH\u2014(CH2)nCH3 where m and n are 7-21).
17. A process for forming a hydrophobic wateralcohol repellent surface on a non-woven polypropylene barrier composite which comprises adding to polypropylene which is to form the non-woven polypropylene barrier composite a composition which comprises a perfluorinated ester and a hydrophobic non-ionic wax, wherein the perfluorinated ester and the hydrophobic non-ionic wax each comprises 10 to 60% by weight of the composition making up a total of at least 75% by weight of the composition, with other components which do not harmfully affect the hydrophobic wateralcohol repellent properties of the non-woven polypropylene barrier composite comprising up to 25% of the composition, and then extruding the polypropylene containing said composition, whereby the composition is incorporated in an amount such that there is 0.5 to 5% by weight of the composition in the resultant non-woven polypropylene barrier composite.
18. The process of claim 17, wherein the perfluorinated ester is a straight chain ester comprising straight chain alkyl groups where a fluorocarbon portion thereof is a C1-C6 fluorocarbon.
19. The process of claim 17, wherein the perfluorinated ester has the formula CF3(CF2)nCH2CH2COOR; where n\u22665, and R is alkyl chain with greater than 16-24 carbon atoms.
20. The process of claim 17, wherein the perfluorinated ester has the formula
where R is a C16-C24 straight chain alkyl group, Rf is C4, -C6 fluorocarbon and n is 4-10.
21. The process of claim 17, wherein the perfluorinated ester has the formula CF3(CF2)nCOOR; where R is an alkyl sulfonate or urethane chain and n\u22665.
22. The process of claim 17, wherein the hydrophobic non-ionic wax has the formula CH3(CH2)mCH3, where m is >20.
23. The process of claim 17, wherein the hydrophobic non-ionic wax has the formula (CH3(CH2)m\u2014CO\u2014O\u2014(CH2)nCH3 where m and n are 7-21).
24. The process of claim 17, wherein the hydrophobic non-ionic wax has the formula Wax (CH3(CH2)m\u2014CO\u2014NH\u2014(CH2)nCH3 where m and n are 7-21).

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for manufacturing complementary metal oxide semiconductor (CMOS) image sensor structures, comprising the steps of:
(a) forming a gate insulating layer, a conductive layer and an ion implantation barrier layer on a semiconductor substrate;
(b) patterning said ion implantation barrier layer, said conductive layer, and said gate insulating layer;
(c) forming a photoresist layer on said patterned ion implantation barrier layer, said conductive layer, and said gate insulating layer and patterning said photoresist layer to define a photodiode region in said substrate; and
(d) implanting low-concentration dopant ions into said photodiode region using said photoresist layer pattern as an ion implantation mask to form a low-concentration dopant region of a photodiode.
2. The method as claimed in claim 1, wherein said low-concentration dopant region has a depth greater than a height of said conductive layer.
3. The method as claimed in claim 2, wherein said conductive layer has a thickness between 1500 and 2600 \u212b.
4. The method as claimed in claim 2, wherein said low-concentration dopant region has a depth between 2500 and 3500 \u03bcm.
5. The method as claimed in claim 1, wherein said ion implantation barrier layer comprises an oxide layer andor a nitride layer.
6. The method as claimed in claim 5, wherein said ion implantation barrier layer comprises a TEOS (Tetra Ethyl Ortho Silicate) based insulating layer.
7. The method as claimed in claim 1, further comprising a step of implanting high-concentration dopant ions into the low-concentration dopant region after implanting said low-concentration dopant ions, so as to reduce a current generated by said image sensor.
8. The method as claimed in claim 1, further comprising forming a p-type epitaxial layer on or in said substrate before said gate insulating layer is formed on said substrate.
9. The method as claimed in claim 1, wherein the step of forming said gate insulating layer, said conductive layer and said ion implantation barrier layer comprises blanket depositing said conductive layer and said ion implantation barrier layer onto said gate insulating layer to form a composite gate electrode layer.
10. The method as claimed in claim 9, wherein the step of patterning said ion implantation barrier layer, said conductive layer, and said gate insulating layer comprises depositing, selectively irradiating and developing a second photoresist on said composite gate electrode layer, then sequentially etching said ion implantation barrier layer, said conductive layer and said gate insulating layer.
11. The method as claimed in claim 1, wherein the step of patterning said photoresist layer prevents ion from being implanted into a sourcedrain terminal region of a CMOS transistor comprising said gate electrode.
12. The method as claimed in claim 11, further comprising the step of forming said sourcedrain terminal region of said CMOS transistor.
13. The method as claimed in claim 1, further comprising the step of removing said ion implantation barrier layer after the step of implanting low-concentration dopant ions into said photodiode region.
14. The method as claimed in claim 1, further comprising the step of implanting high-concentration ions into said photodiode region.

1. Ready-to-use composition for the oxidation dyeing of keratin fibres, and in particular human keratin fibres such as the hair, characterized in that it comprises, in a medium which is suitable for dyeing:
at least one oxidation base,
2-amino-3-hydroxypyridine andor at least one of the addition salts thereof with an acid as coupler,
at least one enzyme of 2-electron oxidoreductase type, and
at least one donor for the said enzyme.
2. Composition according to claim 1, characterized in that the 2-electron oxidoreductase is chosen from pyranose oxidases, glucose oxidases, glycerol oxidases, lactate oxidases, pyruvate oxidases and uricases.
3. Composition according to either of claims 1 and 2, characterized in that the 2-electron oxidoreductase is chosen from uricases of animal, microbiological or biotechnological origin.
4. Composition according to any one of the preceding claims, characterized in that the 2-electron oxidoreductase(s) represent(s) from 0.01 to 20% by weight relative to the total weight of the ready-to-use dye composition.
5. Composition according to claim 4, characterized in that the 2-electron oxidoreductase(s) represent(s) from 0.1 to 5% by weight relative to the total weight of the ready-to-use dye composition.
6. Composition according to claim 3, characterized in that the donor (or substrate) for the said 2-electron oxidoreductase is chosen from uric acid and its salts.
7. Composition according to any one of the preceding claims, characterized in that the donor(s) represent(s) from 0.01 to 20% by weight relative to the total weight of the ready-to-use dye composition.
8. Composition according to claim 7, characterized in that the donor(s) represent(s) from 0.1 to 5% by weight relative to the total weight of the ready-to-use dye composition.
9. Composition according to any one of the preceding claims, characterized in that the oxidation base(s) is (are) chosen from para-phenylenediamines, double bases, para-aminophenols, ortho-aminophenols and heterocyclic oxidation bases.
10. Composition according to claim 9, characterized in that the para-phenylenediamines are chosen from the compounds of formula (I), and the addition salts thereof with an acid:
8
in which:
R1 represents a hydrogen atom, a C1-C4 alkyl radical, a C1-C4 monohydroxyalkyl radical, a C2-C4 polyhydroxyalkyl radical, a (C1-C4)alkoxy(C1-C4)alkyl radical, a C1-C4 alkyl radical substituted with a nitrogenous group, a phenyl radical or a 4-aminophenyl radical;
R2 represents a hydrogen atom, a C1-C4 alkyl radical, a C1-C4 monohydroxyalkyl radical, a C2-C4 polyhydroxyalkyl radical, a (C1-C4)alkoxy(C1-C4)alkyl radical or a C1-C4 alkyl radical substituted with a nitrogenous group;
R3 represents a hydrogen atom, a halogen atom such as a chlorine, bromine, iodine or fluorine atom, a C1-C4 alkyl radical, a C1-C4 monohydroxyalkyl radical, a C1-C4 hydroxyalkoxy radical, an acetylamino(C1-C4)alkoxy radical, a C1-C4 mesylaminoalkoxy radical or a carbamoylamino (C1-C4) alkoxy radical,
R4 represents a hydrogen or halogen atom or a C1-C4 alkyl radical.
11. Composition according to claim 10, characterized in that the para-phenylenediamines of formula (I) are chosen from para-phenylenediamine, para-toluylenediamine, 2-chloro-para-phenylenediamine, 2,3-dimethyl-para-phenylenediamine, 2,6-dimethyl-para-phenylenediamine, 2,6-diethyl-para-phenylenediamine, 2,5-dimethyl-para-phenylenediamine, N,N-dimethyl-para-phenylenediamine, N,N-diethyl-para-phenylenediamine, N,N-dipropyl-para-phenylenediamine, 4-amino-N,N-diethyl-3-methylaniline, N,N-bis(-hydroxyethyl)-para-phenylenediamine, 4-amino-N,N-bis(-hydroxyethyl)-2-methylaniline, 4-amino-2-chloro-N,N-bis(-hydroxyethyl)aniline, 2–hydroxyethyl-para-phenylenediamine, 2-fluoro-para-phenylenediamine, 2-isopropyl-para-phenylenediamine, N-(-hydroxypropyl)-para-phenylenediamine, 2-hydroxymethyl-para-phenylenediamine, N,N-dimethyl-3-methyl-para-phenylenediamine, N,N-(ethyl–hydroxyethyl)-para-phenylenediamine, N-(,-dihydroxypropyl)-para-phenylenediamine, N-(4-aminophenyl)-para-phenylenediamine, N-phenyl-para-phenylenediamine, 2–hydroxyethyloxy-para-phenylenediamine, 2–acetylaminoethyloxy-para-phenylenediamine and N-(-methoxyethyl)-para-phenylenediamine, and the addition salts thereof with an acid.
12. Composition according to claim 9, characterized in that the double bases are chosen from the compounds of formula (II), and the addition salts thereof with an acid:
9
in which:
Z1 and Z2, which may be identical or different, represent a hydroxyl or NH2 radical which may be substituted with a C1-C4 alkyl radical or with a linker arm Y;
the linker arm Y represents a linear or branched alkylene chain containing from 1 to 14 carbon atoms, which may be interrupted by or terminated with one or more nitrogenous groups andor one or more hetero atoms such as oxygen, sulphur or nitrogen atoms, and optionally substituted with one or more hydroxyl or C1-C6 alkoxy radicals;
R5 and R6 represent a hydrogen or halogen atom, a C1-C4 alkyl radical, a C1-C4 monohydroxyalkyl radical, a C2-C4 polyhydroxyalkyl radical, a C1-C4 aminoalkyl radical or a linker arm Y;
R7, R8, R9, R10, R11, and R12, which may be identical or different, represent a hydrogen atom, a linker arm Y or a C1-C4 alkyl radical;
it being understood that the compounds of formula (II) contain only one linker arm Y per molecule.
13. Composition according to claim 12, characterized in that the double bases of formula (II) are chosen from N,N-bis(-hydroxyethyl)-N,N-bis(4-aminophenyl)-1,3-diaminopropanol, N,N-bis(-hydroxyethyl)-N,N-bis(4-aminophenyl)ethylenediamine, N,N-bis(4-aminophenyl)tetramethylenediamine, N,N-bis(-hydroxyethyl)-N,N-bis(4-aminophenyl)tetramethylenediamine, N,N-bis(4-methylaminophenyl)tetramethylenediamine, N,N-bis(ethyl)-N,N-bis(4-amino-3-methylphenyl)ethylenediamine and 1,8-bis(2,5-diaminophenoxy)-3,5-dioxaoctane, and the addition salts thereof with an acid.
14. Composition according to claim 9, characterized in that the para-aminophenols are chosen from the compounds of formula (III), and the addition salts thereof with an acid:
10
in which:
R13 represents a hydrogen or halogen atom or a C1-C4 alkyl, C1-C4 monohydroxyalkyl, (C1-C4)alkoxy(C1-C4)alkyl, C1-C4 aminoalkyl or hydroxy(C1-C4) alkylamino(C1-C4 )alkyl radical,
R14 represents a hydrogen or halogen atom or a C1-C4 alkyl, C1-C4 monohydroxyalkyl, C2-C4 polyhydroxyalkyl, C1-C4 aminoalkyl, C1-C4 cyanoalkyl or (C1-C4)alkoxy(C1-C4)alkyl radical,
it being understood that at least one of the radicals R13 or R14 represents a hydrogen atom.
15. Composition according to claim 14, characterized in that the para-aminophenols of formula (III) are chosen from para-aminophenol, 4-amino-3-methylphenol, 4-amino-3-fluorophenol, 4-amino-3-hydroxymethylphenol, 4-amino-2-methylphenol, 4-amino-2-hydroxymethylphenol, 4-amino-2-methoxymethylphenol, 4-amino-2-aminomethylphenol, 4-amino-2-(-hydroxyethylaminomethyl)phenol and 4-amino-2-fluorophenol, and the addition salts thereof with an acid.
16. Composition according to claim 9, characterized in that the ortho-aminophenols are chosen from 2-aminophenol, 2-amino-5-methylphenol, 2-amino-6-methylphenol and 5-acetamido-2-aminophenol, and the addition salts thereof with an acid.
17. Composition according to claim 9, characterized in that the heterocyclic bases are chosen from pyridine derivatives, pyrimidine derivatives, pyrazole derivatives and pyrazolopyrimidine derivatives, and the addition salts thereof with an acid.
18. Composition according to any one of the preceding claims, characterized in that the oxidation base(s) represent(s) from 0.0005 to 12% by weight relative to the total weight of the dye composition.
19. Composition according to claim 18, characterized in that the oxidation base(s) represent(s) from 0.005 to 6% by weight relative to the total weight of the dye composition.
20. Composition according to any one of the preceding claims, characterized in that the 2-amino-3-hydroxypyridine andor the addition salt(s) thereof with an acid represent(s) from 0.0001 to 8% by weight relative to the total weight of the dye composition.
21. Composition according to claim 20, characterized in that the 2-amino-3-hydroxypyridine andor the addition salt(s) thereof with an acid represent(s) from 0.005 to 5% by weight relative to the total weight of the dye composition.
22. Composition according to any one of the preceding claims, characterized in that it contains one or more other couplers other than 2-amino-3-hydroxypyridine andor direct dyes.
23. Composition according to any one of the preceding claims, characterized in that the addition salts with an acid are chosen from the hydrochlorides, hydrobromides, sulphates, tartrates, lactates and acetates.
24. Composition according to any one of the preceding claims, characterized in that the medium which is suitable for dyeing consists of water or a mixture of water and at least one organic solvent.
25. Composition according to any one of the preceding claims, characterized in that it has a pH of between 5 and 11.
26. Composition according to any one of the preceding claims, characterized in that it contains at least one peroxidase.
27. Process for dyeing keratin fibres, and in particular human keratin fibres such as the hair, characterized in that at least one ready-to-use dye composition as defined in any one of the preceding claims is applied to the said fibres, for a period which is sufficient to develop the desired coloration.
28. Process according to claim 27, characterized in that it includes a preliminary step which consists in separately storing, on the one hand, a composition (A) comprising, in a medium which is suitable for dyeing, at least one oxidation base and 2-amino-3-hydroxypyridine andor at least one of the addition salts thereof with an acid, and, on the other hand, a composition (B) comprising, in a medium which is suitable for dyeing, at least one enzyme of 2-electron oxidoreductase type in the presence of at least one donor for the said enzyme, and then in mixing them together at the time of use, after which this mixture is applied to the keratin fibres.
29. Multi-compartment dyeing device or kit, characterized in that it includes a first compartment comprising composition (A) as defined in claim 28 and a second compartment comprising composition (B) as defined in claim 28.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An equipment rack comprising:
a frame;
a first pair of mounting rails and a second pair of mounting rails, each pair of mounting rails comprising:
a front mounting rail comprising:
a first plurality of front equipment-mounting apertures being disposed substantially adjacent to an outer edge of a first planar surface of the front mounting rail,
the first planar surface having a first width sized to align the first plurality of front equipment-mounting apertures at a first predefined position defining in part a first equipment-mounting interface when the front mounting rail is coupled to the frame through a first set of front frame-mounting apertures disposed in a second planar surface of the front mounting rail substantially perpendicular to the first planar surface; and

a second plurality of front equipment-mounting apertures being disposed in:
(i) a third planar surface of the front mounting rail substantially perpendicular to the second planar surface, and
(ii) a fourth planar surface of the front mounting rail surface substantially perpendicular to the third planar surface,
the second planar surface having a second width sized to align the second plurality of front equipment-mounting apertures disposed in the third planar surface at a second predefined position defining in part a second equipment-mounting interface, and the third planar surface having a third width sized to align the second plurality of front equipment-mounting apertures disposed in the fourth planar surface at a third predefined position defining in part the second equipment-mounting interface when the front mounting rail is coupled to the frame through a second set of front frame-mounting apertures disposed in the first planar surface,
wherein the first planar surface is directly connected to the second planar surface, the second planar surface is directly connected to the first and third planar surfaces, the third planar surface is directly connected to the second and fourth planar surfaces, and the fourth planar surface is directly connected to the third planar surface; and
a rear mounting rail comprising:
a first plurality of rear equipment-mounting apertures being disposed substantially adjacent to an outer edge of a first planar surface of the rear mounting rail,
the first planar surface having a fourth width sized to align the first plurality of rear equipment-mounting apertures at a fourth predefined position defining in part the first equipment-mounting interface when the rear mounting rail is coupled to the frame through a first set of rear frame-mounting apertures disposed in a second planar surface of the rear mounting rail substantially perpendicular to the first planar surface; and

a second plurality of rear equipment-mounting apertures being disposed in a fourth planar surface of the rear mounting rail substantially perpendicular to a third planar surface of the rear mounting rail, the third planar surface being substantially perpendicular to the second planar surface,
the second planar surface having a fifth width sized to align the third planar surface at a fifth predefined position defining in part the second equipment-mounting interface, and the third planar surface having a sixth width sized to align the second plurality of rear equipment-mounting apertures at a sixth predefined position defining in part the second equipment-mounting interface when the rear mounting rail is coupled to the frame through a second set of rear frame-mounting apertures disposed in the first planar surface,
wherein the first planar surface is directly connected to the second planar surface, the second planar surface is directly connected to the first and third planar surfaces, the third planar surface is directly connected to the second and fourth planar surfaces, and the fourth planar surface is directly connected to the third planar surface;
wherein the first equipment-mounting interface is defined by a first configuration of the first and second pairs of mounting rails; and
wherein the second equipment-mounting interface is defined by a second configuration of the first and second pairs of mounting rail.
2. The equipment rack of claim 1 wherein the first equipment-mounting interface complies with a first equipment rack standard specifying an equipment rack for mounting equipment having a first front panel width, the first front panel width being substantially 19 inches.
3. The equipment rack of claim 2 wherein the first equipment rack standard is a version of Electronic Industries Alliance 310 (EIA-310).
4. The equipment rack of claim 1 wherein the second equipment-mounting interface complies with a second equipment-mounting standard specifying an equipment rack for mounting equipment having a first enclosure width, the first enclosure width being substantially 538 millimeters.
5. The equipment rack of claim 4 wherein the second equipment rack standard is a version of an Open Compute Project Open Rack standard.
6. The equipment rack of claim 1 wherein the first and second pairs of mounting rails in the first configuration are rotated substantially ninety degrees about a longitudinal axis in the second configuration.
7. The equipment rack of claim 1 wherein the first pair of mounting rails is coupled to a first side of the frame in the first configuration and the second pair of mounting rails is coupled to a second side of the frame in the first configuration.
8. The equipment rack of claim 7 wherein the first pair of mounting rails is coupled to the second side of the frame in the second configuration and the second pair of mounting rails is coupled to the first side of the frame in the second configuration.
9. The equipment rack of claim 1 wherein the first and second pairs of mounting rails in the first configuration are each rotated substantially one hundred eighty degrees about a horizontal axis in the second configuration.
10. The equipment rack of claim 9 wherein the first pair of mounting rails is coupled to a first side of the frame in the second configuration and the second pair of mounting rails is coupled to a second side of the frame in the second configuration.
11. The equipment rack of claim 1 further comprising:
a plurality of wire management blocks for coupling to the frame when the first and second pairs of mounting rails are in the second configuration, each wire management block configured to:
provide a recessed channel for routing one or more wires within; and
provide a first alignment surface with which to align one front mounting rail, the first alignment surface being a first predetermined distance from a vertical member of the frame adjacent to the front mounting rail; and

a plurality of power bus blocks for coupling to the frame when the first and second pairs of mounting rails are in the second configuration, each power bus block configured to:
provide a first power bus mounting surface for mounting power bus components in the equipment rack; and
provide a second alignment surface with which to align one rear mounting rail, the second alignment surface being a second predetermined distance from a vertical member of the frame adjacent to the rear mounting rail.
12. A kit for configuring an equipment rack comprising a frame, the kit comprising:
a first pair of mounting rails and a second pair of mounting rails, each pair of mounting rails comprising:
a front mounting rail comprising:
a first plurality of front equipment-mounting apertures being disposed substantially adjacent to an outer edge of a first planar surface of the front mounting rail,
the first planar surface having a first width sized to align the first plurality of front equipment-mounting apertures at a first predefined position defining in part a first equipment-mounting interface when the front mounting rail is coupled to the frame through a first set of front frame-mounting apertures disposed in a second planar surface of the front mounting rail substantially perpendicular to the first planar surface; and

a second plurality of front equipment-mounting apertures being disposed in:
(i) a third planar surface of the front mounting rail substantially perpendicular to the second planar surface, and
(ii) a fourth planar surface of the front mounting rail surface substantially perpendicular to the third planar surface,
the second planar surface having a second width sized to align the second plurality of front equipment-mounting apertures disposed in the third planar surface at a second predefined position defining in part a second equipment-mounting interface, and the third planar surface having a third width sized to align the second plurality of front equipment-mounting apertures disposed in the fourth planar surface at a third predefined position defining in part the second equipment-mounting interface when the front mounting rail is coupled to the frame through a second set of front frame-mounting apertures disposed in the first planar surface,
wherein the first planar surface is directly connected to the second planar surface, the second planar surface is directly connected to the first and third planar surfaces, the third planar surface is directly connected to the second and fourth planar surfaces, and the fourth planar surface is directly connected to the third planar surface; and
a rear mounting rail comprising:
a first plurality of rear equipment-mounting apertures being disposed substantially adjacent to an outer edge of a first planar surface of the rear mounting rail,
the first planar surface having a fourth width sized to align the first plurality of rear equipment-mounting apertures at a fourth predefined position defining in part the first equipment-mounting interface when the rear mounting rail is coupled to the frame through a first set of rear frame-mounting apertures disposed in a second planar surface of the rear mounting rail substantially perpendicular to the first planar surface; and

a second plurality of rear equipment-mounting apertures being disposed in:
(i) a fourth planar surface of the rear mounting rail substantially perpendicular to a third planar surface of the rear mounting rail, the third planar surface being substantially perpendicular to the second planar surface,
the second planar surface having a fifth width sized to align the third planar surface at a fifth predefined position defining in part the second equipment-mounting interface, and the third planar surface having a sixth width sized to align the second plurality of rear equipment-mounting apertures at a sixth predefined position defining in part the second equipment-mounting interface when the rear mounting rail is coupled to the frame through a second set of rear frame-mounting apertures disposed in the first planar surface,
wherein the first planar surface is directly connected to the second planar surface, the second planar surface is directly connected to the first and third planar surfaces, the third planar surface is directly connected to the second and fourth planar surfaces, and the fourth planar surface is directly connected to the third planar surface;
wherein the first equipment-mounting interface is defined by a first configuration of the first and second pairs of mounting rails; and
wherein the second equipment-mounting interface is defined by a second configuration of the first and second pairs of mounting rail.
13. The kit of claim 12 wherein the first equipment-mounting interface complies with a first equipment rack standard specifying an equipment rack for mounting equipment having a first front panel width, the first front panel width being substantially 19 inches.
14. The kit of claim 13 wherein the first equipment rack standard is a version of Electronic Industries Alliance 310 (EIA-310).
15. The kit of claim 12 wherein the second equipment-mounting interface complies with a second equipment-mounting standard specifying an equipment rack for mounting equipment having a first enclosure width, the first enclosure width being substantially 538 millimeters.
16. The kit of claim 15 wherein the second equipment rack standard is a version of an Open Compute Project Open Rack standard.
17. The kit of claim 12 wherein the first and second pairs of mounting rails in the first configuration are rotated substantially ninety degrees about a longitudinal axis in the second configuration.
18. The kit of claim 12 wherein the first pair of mounting rails is coupled to a first side of the frame in the first configuration and the second pair of mounting rails is coupled to a second side of the frame in the first configuration.
19. The kit of claim 18 wherein the first pair of mounting rails is coupled to the second side of the frame in the second configuration and the second pair of mounting rails is coupled to the first side of the frame in the second configuration.
20. The kit of claim 12 wherein the first and second pairs of mounting rails in the first configuration are each rotated substantially one hundred eighty degrees about a horizontal axis in the second configuration.
21. The kit of claim 20 wherein the first pair of mounting rails is coupled to a first side of the frame in the second configuration and the second pair of mounting rails is coupled to a second side of the frame in the second configuration.
22. The kit of claim 12 further comprising:
a plurality of wire management blocks for coupling to the frame when the first and second pairs of mounting rails are in the second configuration, each wire management block configured to:
provide a recessed channel for routing one or more wires within; and
provide a first alignment surface with which to align one front mounting rail, the first alignment surface being a first predetermined distance from a vertical member of the frame adjacent to the front mounting rail; and

a plurality of power bus blocks for coupling to the frame when the first and second pairs of mounting rails are in the second configuration, each power bus block configured to:
provide a first power bus mounting surface for mounting power bus components to the equipment rack; and
provide a second alignment surface with which to align one rear mounting rail, the second alignment surface being a second predetermined distance from a vertical member of the frame adjacent to the rear mounting rail.
23. A method for configuring an equipment rack comprising a frame, the method comprising:
coupling a first pair of mounting rails and a second pair of mounting rails to the frame in a first configuration defining a first equipment-mounting interface, the first pair of mounting rails being coupled to a first side of the frame, the second pair of mounting rails being coupled to a second side of the frame, each pair of mounting rails comprising a front mounting rail and a rear mounting rail, the front and rear mounting rails each comprising a first planar surface defining in part the first equipment-mounting interface when the front and rear mounting rails are coupled to the frame through a second planar surface of each of the front and rear mounting rails;
decoupling the first and second pairs of mounting rails from the frame;
rotating the first and second pairs of mounting rails substantially ninety degrees about a longitudinal axis; and
coupling the first and second pairs of mounting rails to the frame in a second configuration defining a second equipment-mounting interface, the front and rear mounting rails of the first and second pairs of mounting rails each further comprising a third planar surface and a fourth planar surface defining in part the second equipment-mounting interface when the front and the rear mounting rails are coupled to the frame through the first planar surface of each of the front and rear mounting rails,
wherein the first equipment-mounting interface comprises:
a first linear distance between outer edges of the first planar surfaces of the front mounting rails and a second linear distance between outer edges of the first planar surfaces of the rear mounting rails, the first and second linear distances sized for mounting equipment having a first width; and

wherein the second equipment-mounting interface comprises one or more of:
a third linear distance between the third planar surfaces of the front mounting rails and a fourth linear distance between the third planar surfaces of the rear mounting rails, the third and fourth linear distances sized for mounting equipment having a second width.
24. The method of claim 23 wherein coupling the first and second pairs of mounting rails to the frame in the second configuration further comprises:
aligning the first pair of mounting rails to the second side of the frame; and
aligning the second pair of mounting rails to the first side of the frame.
25. The method of claim 23 wherein coupling the first and second pairs of mounting rails to the frame in the second configuration further comprises:
rotating each mounting rail substantially one hundred eighty degrees about a horizontal axis
aligning the first pair of mounting rails to the first side of the frame; and
aligning the second pair of mounting rails to the second side of the frame.
26. The method of claim 23 further comprising:
coupling a plurality of wire management blocks to the frame, each wire management block configured to:
provide a recessed channel for routing one or more wires within; and
provide a first alignment surface with which to align one front mounting rail in the second configuration, the first alignment surface being a first predetermined distance from a vertical member of the frame adjacent to the front mounting rail; and

coupling a plurality of power bus blocks to the frame, each power bus block configured to:
provide a first power bus mounting surface for mounting power bus components to the equipment rack; and
provide a second alignment surface with which to align one rear mounting rail in the second configuration, the second alignment surface being a second predetermined distance from a vertical member of the frame adjacent to the rear mounting rail.
27. The method of claim 26 wherein coupling the first and second pairs of mounting rails to the frame in the second configuration further comprises:
aligning the second planar surfaces of the front mounting rails adjacent to the first alignment surfaces of the plurality of wire management blocks; and
aligning the second planar surfaces of the rear mounting rails adjacent to the second alignment surfaces of the plurality of power bus blocks.
28. The method of claim 23 wherein rotating further comprises:
rotating the front mounting rail of the first pair of mounting rails and the rear mounting rail of the second pair of mounting rails in a clockwise direction relative to the longitudinal axis; and
rotating the front mounting rail of the second pair of mounting rails and the rear mounting rail of the first pair of mounting rails in a counterclockwise direction relative to the longitudinal axis.
29. The method of claim 23, wherein the first equipment-mounting interface further comprises a first plurality of front equipment-mounting apertures disposed in the first planar surfaces of the front mounting rails and a first plurality of rear equipment-mounting apertures disposed in the first planar surfaces of the rear mounting rails, the first plurality of front equipment-mounting apertures and first plurality of rear equipment-mounting apertures aligned at a first predefined position, for mounting equipment having a first mounting hole pattern; and
wherein the second equipment-mounting interface further comprises a second plurality of front equipment-mounting apertures disposed in the third and fourth planar surfaces of the front mounting rails and a second plurality of rear equipment-mounting apertures disposed in the fourth planar surfaces of the rear mounting rails, the second plurality of front equipment-mounting apertures and second plurality of rear equipment-mounting apertures aligned at a second predefined position for mounting equipment having a second mounting hole pattern.
30. The method of claim 29, wherein the first and second linear distances are substantially the same as the third and fourth linear distances.