Author: claimsbot

1. A method for assaying biomolecules wherein said assay is selected from the group consisting of a fluorescence assay, a radioactive assay, a magnetic assay and an optical assay, comprising the steps of:
(A) functionalizing a support with acrylate groups;
(B) forming a polyacrylate hydrogel by reacting a 6-acryloyl-beta-O-methyl monosaccharide with a crosslinker with two or more polymerizable double bonds, and 2-acrylamido hyrdroxyacetic acid,
(C) reacting said polyacrylate hydrogel with said acrylate groups of said support to form a polyacrylate hydrogel linked to a support,
(D) reacting said biomolecule to be assayed with a second crosslinker and said polyacrylate hydrogel thereby forming a covalent bond between said biomolecule and said second crosslinker and a covalent bond between said second crosslinker and said polyacrylate hydrogel linked to said support, and
(E) assaying said covalently bonded biomolecule.
2. The method of claim 1, wherein said biomolecule is a DNA.
3. The method of claim 2, wherein said DNA comprises up to 100,000 nucleotide base units.
4. The method according to claim 1, wherein said polyacrylate hydrogel is a network and said polyacrylate hydrogel has a pore size of 0.1-10\u03bc.
5. The method according to claim 4, wherein the polyacrylate is a three-dimensional, macroporous substrate used for the immobilization of oligonucleotides, peptides and proteins.
6. The method according to claim 1, wherein said biomolecule is CY3-Staphylococcal enterotoxin B (SEB).
7. The method according to claim 1 wherein said biomolecule is a protein.
8. The method according to claim 1 wherein said biomolecule comprises a fluorophore group.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A plasma process system (1) characterized by comprising:
a chamber (2);
an electrode plate (20) provided with gas holes (19) for supplying a process gas into said chamber (2) and having a projection (20a); and
a shield ring (26) having an opening (26a) which is fitted over said projection (20a) and is constituted by a ring-like plate member which covers a peripheral portion of said electrode plate (20) with said projection (20a) and said opening (26a) fitted together.
2. The plasma process system (1) according to claim 1, characterized in that said projection (20a) of said electrode plate (20), in such a state as to be fitted in said opening (26a), forms a substantially flat surface together with a major surface of said shield ring (26).
3. A plasma process system (1) characterized by comprising:
a first electrode plate (10) on one surface of which a subject to be processed is placed; and
a second electrode plate (20) connected to a high-frequency power supply and having an opposing surface opposing said one surface in parallel and having a diameter 1.2 to 1.5 times a diameter of said one surface.
4. The plasma process system (1) according to claim 3, characterized by further comprising a shield ring (26) which has an opening (26a) formed therein with a diameter approximately equal to the diameter of said opposing surface and covers a peripheral portion of said second electrode plate (20) in such a way that said opposing surface is exposed to the inside said opening (26a).
5. The plasma process system (1) according to claim 4, characterized in that said opposing surface is a major surface and said second electrode plate (20) has a projection (20a) which fits in said opening (26a)
6. A plasma process system (1) characterized by comprising:
a chamber (2);
an electrode plate (20) connected to a high-frequency power supply and provided with first gas holes (19) for supplying a process gas into said chamber (2); and
a shield ring (26) which is provided with second gas holes (26b), has an opening (26a) and covers a periphery of said electrode plate (20) in such a way that said electrode plate (20) is exposed to the inside of said opening (26a).
7. The plasma process system (1) according to claim 6, characterized in that said second gas holes (26b) are laid out annually around said opening (26a) and a maximum layout diameter of said second gas holes (26b) is about 1.1 times a diameter of said opening (26a).
8. The plasma process system (1) according to claim 6, characterized in that said exposed surface is a major surface, said electrode plate (20) has a projection (20a) which fits in said opening (26a), and a major surface of said projection (20a) forms a substantially flat surface together with said shield ring (26).
9. A plasma process system (1) characterized by comprising:
a chamber (2) in which a predetermined plasma process is performed on a subject to be processed;
a cleaning gas supply port (30) which supplies a cleaning gas containing halogen into said chamber (2); and
an electrode plate (20) provided with gas holes (19) for supplying a process gas into said chamber (2) and so constituted as to contain a material resistive to a halogen radical.
10. The plasma process system (1) according to claim 9, characterized in that said electrode plate (20) is so constituted as to contain a material resistive to a halogen radical rather than to silicon.
11. The plasma process system (1) according to claim 9, characterized in that said cleaning gas is comprised of a material containing fluorine and said halogen radical is comprised of a fluorine radical.
12. The plasma process system (1) according to claim 9, characterized in that said material resistive to said halogen radical is selected from a group of silicon carbide, carbon, aluminum, alumite, alumina and sprayed quartz alumina.
13. The plasma process system (1) according to claim 9, characterized by further comprising:
a mount table (10) which is provided opposite to said electrode plate (20) and on which said subject to be processed is placed; and
a ring-like member (17) formed of a material resistive to said halogen radical.
14. The plasma process system (1) according to claim 9, characterized in that said cleaning gas is turned into a plasma in said chamber (2) to generate said halogen radical.
15. The plasma process system (1) according to claim 9, characterized by further comprising an activator (33) provided outside said chamber (2) and connected to said cleaning gas supply port, and
in that said activator (33) generates said halogen radical by activating said cleaning gas and supplies said generated halogen radical into said chamber (2) 2.
16. The plasma process system (1) according to claim 9, characterized in that said cleaning gas is so formed as to contain an oxygen-containing material.
17. A plasma process method using a plasma process system having a chamber (2) in which a predetermined plasma process is performed on a subject to be processed by generation of a plasma inside, a first electrode plate (10) on one surface of which a subject to be processed is placed, and a second electrode plate (20) connected to a high-frequency power supply and having an opposing surface opposing said one surface in parallel characterized by including the step of:
setting a diameter of said opposing surface to 1.2 to 1.5 tines a diameter of said one surface and supplying high-frequency power to said second electrode.
18. A plasma process method using a plasma process system having a chamber (2) in which a predetermined plasma process is performed on a subject to be processed by generation of a plasma inside, an electrode plate (20) provided with first gas holes (19) for supplying a process gas into said chamber (2) and connected to a high-frequency power supply, and a shield ring (26) which is provided with second gas holes (26b), has an opening (26a) and covers a periphery of said electrode plate (20) in such a way that said electrode plate (20) is exposed to the inside of said opening (26a), characterized by including the step of spraying said gas into said chamber (2) through said first gas holes (19) and said second gas holes (26b).

1. A switch, comprising:
a switching module coupled to a plurality of ports, said switching module receives and forwards a plurality of packets through said ports; and
a management unit comprising a processor and an agent executable by said processor, said agent causes the processor to monitor each packet received by the switching module and determine whether each such packet contains a predetermined fingerprint, and upon determining that a packet contains the predetermined fingerprint, said processor causes additional information to be included in a copy of said fingerprinted packet and forwarded to a predetermined address;
wherein said switching module also forwards said packet containing said predetermined fingerprint, but without said additional information, to an address corresponding to a destination address contained in said packet.
2. The switch of claim 1 wherein said management unit receives a management packet from a network, said management packet requesting said agent to begin monitoring packets for said predetermined fingerprint.
3. The switch of claim 1 wherein said management unit receives a management packet from a network, said management packet comprising said predetermined criterion.
4. The switch of claim 1 wherein said agent determines whether a received packet should be sampled in accordance with periodic sampling and, if a packet should be sampled, said agent causes said processor to append a copy of such packet with additional information and forward such packet to the predetermined address.
5. The switch of claim 4 wherein said agent determines whether a received packet should be sampled after determining that said packet does not contain said fingerprint.
6. The switch of claim 1 wherein said predetermined address is not an address contained in said packet.
7. A method, comprising:
receiving, by a switch, a plurality of packets from a network;
determining, by the switch, whether at least one packet contains a predetermined fingerprint;
generating, by the switch, a copy of said at least one packet that matches said predetermined fingerprint;
appending, by the switch, additional information to said copy to form a datagram;
forwarding, by the switch, said datagram to a predetermined address; and
forwarding, by the switch, said at least one packet that matches said fingerprint, without said additional information, to an address corresponding to a destination address contained in the packet.
8. The method of claim 7 further comprising receiving a management packet that specifies that the switch is begin determining whether received packets contain the predetermined fingerprint.
9. The method of claim 8 further comprising receiving a management packet that specifies the predetermined fingerprint.
10. The method of claim 7 further comprising periodically selecting a received packet, generating a copy of said selected packet, appending additional information to said copy of said selected packet, and forwarding said selected packet with said additional information to said predetermined address.
11. A system, comprising:
a network interface;
a processor coupled to said network interface;
storage containing software executable by said processor and that provides a graphical user interface to a user that permits the user to enable a function whereby a plurality of switches in a network monitor packets for a predetermined fingerprint and, upon detecting such packets, forward a copy of such packets to the network interface of said system in addition to forwarding said packets to an address corresponding to a destination address contained in such packets.
12. The system of claim 11 wherein said network interface receives copies of packets from a plurality of switches in said network, each copy containing a common predetermined fingerprint.
13. The system of claim 11 wherein said software causes said processor to send a management packet to a plurality of switches in said network, said management packet comprising at least one criterion for said switches to use to detect packets that match said at least one criterion.
14. The system of claim 11 wherein said fingerprint comprises a particular bit sequence that does not alter how the packet would be sorted through the network without the fingerprint.
15. The system of claim 11 wherein said predetermined fingerprint comprises a bit sequence that does not alter the behavior of the packet or the way in which the network would route the packet, absent the predetermined fingerprint, from its source location to the destination location.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A compound selected from the following compounds:
2. A composition comprising a compound of claim 1 and a pharmaceutically acceptable carrier, adjuvant, or vehicle.
3. A method of treating a proliferative disorder in a patient comprising the step of administering to said patient a compound of claim 1, wherein the proliferative disorder is colon cancer.