1. A method for separating an input signal, wherein the input signal is a multi-component signal, comprising the steps of:
estimating parameters of the input signal;
separating the input signal, using periodicity-based algebraic separation and energy-based demodulation (PASED), into components according to the parameters and constraints; and
applying a Teager-Kaiser energy detector (TKED) to each component to provide a direct current (DC) signal for each component, and the constraint for each component used by the separating, wherein the steps are performed in a processor.
2. The method of claim 1, wherein the multi-component signal is a mixture of amplitude-frequency modulated signals (AM-FM) and sinusoidal signals.
3. The method of claim 1, wherein frequencies and amplitudes of the multi-component signal vary over time.
4. The method of claim 1, wherein the constraints form exact zero DC constraints.
5. The method of claim 1, wherein the separating and applying are performed iteratively until a termination condition is reached.
6. The method of claim 1, wherein a length of the input signal is not an integer multiple of a fundamental period of the signal.
7. The method of claim 1, wherein the parameters include a number of components and a period of each component.
8. The method of claim 1, wherein the DC signals are proportional to squares of amplitude and frequency of the input signal.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A surface treating method of forming a coating layer on a base material, comprising:
conducting a plasma processing under an atmospheric pressure for the base material so as to form a coating layer on the base material having at least one of a curved surface and an uneven surface.
2. The surface treating method of claim 1, wherein the base material is a lens having an effective optical surface and the lens satisfies the following formulas:
0<D300 0<TD1.0
where D is a diameter (mm) of the effective optical surface and T is a thickness (mm) of the effective optical surface on an optical axis.
3. The surface treating method of claim 2, wherein the lens is a lens for use in an optical pickup apparatus and the lens satisfies the following formulas:
1D10 0.2TD0.5
4. The surface treating method of claim 2, wherein plural ring-shaped step portions are provided on the effective optical surface and satisfy the following formula.
0<Hi0.01 0.001Li0.1
where Hi is a depth (mm) of the plural ring-shaped step portions and Li is an interval (mm) of the plural ring-shaped step portions.
5. The surface treating method of claim 1, wherein the base material is a lens array on which plural lens sections are mounted in a form of an array and satisfies the following formulas:
0<Di300 0<TiDi1.0 0<Li<200
where Di is a diameter (mm) of a lens section, Ti is a thickness (mm) of the lens section and Li is an interval (mm) of the plural lens sections.
6. The surface treating method of claim 5, wherein the lens array is a micro lens array and satisfies the following formulas:
0.01Di2 0.2TiDi0.5 0.01Li5
7. The surface treating method of claim 1, wherein at least one of a concave or a convex is provided on the uneven surface of the base material.
8. The surface treating method of claim 7, wherein plural convexes being shaped in one of a saw tooth and a rectangle are provided on the base material with an arrangement satisfying the following formulas:
0<Li30 0<HiLi3.0 0<Wi<Li
where Hi is a height (mm) of the convex, Wi is a width (mm) of the convex and Li is an interval (mm) of plural convexes.
9. The surface treating method of claim 8, wherein some of the plural convexes are provided on the base material with a different interval Lk (mm) and satisfies the following formula.
0<Wi<Lk
10. The surface treating method of claim 8, wherein the base material is a light introducing plate satisfying the following formulas:
0.05Li2 0.01HiLi0.1
11. The surface treating method of claim 1, wherein the base material is a prism satisfying the following formulas:
0<W30 0<HW3.0
where H is a height (mm) of the prism and W is a width (mm) of the prism.
12. The surface treating method of claim 11, wherein the prism is a micro prism satisfying the following formulas:
0.5W4.0 0.5H4.0
13. The surface treating method of claim 1, wherein the coating layer is one of a half-mirror film, an anti-reflection film, an electric conductive film, a hard coating film and a filtering film.
14. The surface treating method of claim 1, wherein the base material is made of a resin.
15. The surface treating method of claim 14, wherein the resin is one of an acrylic type resin, a polycarbonate type resin, a polyethylene type resin, a polyolefin type resin and a polystyrene type resin.
16. The surface treating method of claim 14, wherein the resin is an amorphous polyolefin type resin.
17. The surface treating method of claim 1, wherein the base material is made of a glass.
18. The surface treating method of claim 1, wherein the coating layer is a dielectric film.
19. The surface treating method of claim 18, wherein the dielectric film has a carbon content of from 0.2 to 5 weight %.
20. The surface treating method of claim 18, wherein in the dielectric film, at least a layer of which a main component is silicon oxide and a layer of which a main component is one of titanium oxide, tantalum oxide, zirconium oxide, silicon nitride, indium oxide and aluminum oxide are superimposed.
21. The surface treating method of claim 1, wherein the plasma processing comprises a process of generating discharging between electrodes by supplying an electric power of 1 Wcm2 or more with a high frequency voltage of 100 kHz or more to the electrodes.
22. The surface treating method of claim 21, wherein the high frequency voltage is a continuous sine wave.
23. The surface treating method of claim 1, wherein the plasma processing comprises:
introducing a reactive gas or a gas mixture of a reactive gas and an inert gas into electrodes which are arranged to be opposite to each other; and
generating discharging between the electrodes under an atmospheric pressure or a pressure around an atmospheric pressure so as to cause a plasma state for the reactive gas or the gas mixture.
24. An optical element, comprising:
at least one of a curved surface and an uneven surface on a base material; and
a coating layer formed on the at least one of a curved surface and an uneven surface by the surface treating method of claim 1.
25. The optical element of claim 24, wherein the base material is a lens having an effective optical surface and the lens satisfies the following formulas:
0<D300 0<TD1.0
where D is a diameter (mm) of the effective optical surface and T is a thickness (mm) of the effective optical surface on an optical axis.
26. The optical element of claim 25, wherein the lens is a lens for use in an optical pickup apparatus and the lens satisfies the following formulas:
1D10 0.2TD0.5
27. The optical element of claim 25, wherein plural ring-shaped step portions are provided on the effective optical surface and satisfy the following formula.
0<Hi0.01 0.001Li0.1
where Hi is a depth (mm) of the plural ring-shaped step portions and Li is an interval (mm) of the plural ring-shaped step portions.
28. The optical element of claim 24, wherein the base material is a lens array on which plural lens sections are mounted in a form of an array and satisfies the following formulas:
0<Di300 0<TiDi1.0 0<Li200
where Di is a diameter (mm) of a lens section, Ti is a thickness (mm) of the lens section and Li is an interval (mm) of the plural lens sections.
29. The optical element of claim 28, wherein the lens array is a micro lens array and satisfies the following formulas:
0.01Di2 0.2TiDi<0.5 0.01Li5
30. The optical element of claim 24, wherein at least one of a concave or a convex is provided on the uneven surface of the base material.
31. The optical element of claim 30, wherein plural convexes being shaped in one of a saw tooth and a rectangle are provided on the base material with an arrangement satisfying the following formulas:
0<Li30 0<HiLi3.0 0<Wi<Li
where Hi is a height (mm) of the convex, Wi is a width (mm) of the convex and Li is an interval (mm) of plural convexes.
32. The optical element of claim 31, wherein some of the plural convexes are provided on the base material with a different interval Lk (mm) and satisfies the following formula.
0<Wi<Lk
33. The optical element of claim 31, wherein the base material is a light introducing plate satisfying the following formulas:
0.05Li2 0.01HiLi0.1
34. The surface treating method of claim 24, wherein the base material is a prism satisfying the following formulas:
0<W30 0<HW3.0
where H is a height (mm) of the prism and W is a width (mm) of the prism.
35. The surface treating method of claim 34, wherein the prism is a micro prism satisfying the following formulas:
0.5W4.0 0.5H4.0
36. The optical element of claim 24, wherein the coating layer is one of a half-mirror film, an anti-reflection film, an electric conductive film, a hard coating film and a filtering film.
37. The optical element of claim 24, wherein the base material is made of a resin.
38. The optical element of claim 37, wherein the resin is one of an acrylic type resin, a polycarbonate type resin, a polyethylene type resin, a polyolefin type resin and a polystyrene type resin.
39. The optical element of claim 38, wherein the resin is an amorphous polyolefin type resin.
40. The optical element of claim 24, wherein the base material is made of a glass.
41. The optical element of claim 24, wherein the coating layer is a dielectric film.
42. The optical element of claim 41, wherein the dielectric film has a carbon content of from 0.2 to 5 weight %.
43. The optical element of claim 41, wherein in the dielectric film, at least a layer of which a main component is silicon oxide and a layer of which a main component is one of titanium oxide, tantalum oxide, zirconium oxide, silicon nitride, indium oxide and aluminum oxide are superimposed.
44. The optical element of claim 24, wherein the plasma processing comprises a process of generating discharging between electrodes by supplying an electric power of 1 Wcm2 or more with a high frequency voltage of 100 kHz or more to the electrodes.
45. The optical element of claim 44, wherein the high frequency voltage is a continuous sine wave.
46. The optical element of claim 24, wherein the plasma processing comprises:
introducing a reactive gas or a gas mixture of a reactive gas and an inert gas into electrodes which are arranged to be opposite to each other; and
generating discharging between the electrodes under an atmospheric pressure or a pressure around an atmospheric pressure so as to cause a plasma state for the reactive gas or the gas mixture.