Author: claimsbot

1. An electric rotary machine equipped with a stator coil including sequentially-connected conductor segments, comprising:
a rotor having P pairs of magnetic poles;
a stator core with a plurality of slots, each slot having a plurality of conductor accommodation positions sequentially aligned in a radial direction;
M-phase windings, where M is an odd number not less than 3, each phase winding being constituted by sequentially connecting a plurality of U-shaped conductor segments;
said conductor segment comprising a pair of in-slot conductor portions separately accommodated into two different slots mutually spaced by a predetermined slot pitch, a U-shaped head portion continuously extending from said in-slot conductor portions and protruding from one end of said stator core so as to constitute a head side coil end, and a pair of tail conductor portions continuously extending from said in-slot conductor portions and protruding from the other end of said stator so as to constitute a tail side coil end; and
said pair of tail conductor portions having distal ends being bonded to distal ends of tail conductor portions of other conductor segment,
wherein K inphase slots arranged successively in a circumferential direction cooperatively constitute an inphase slot group, each inphase slot accommodating the in-slot conductor portions constituting the same phase winding, where K is a natural number not smaller than 2,
said slot comprises S conductor accommodation position sets, each conductor accommodation position set including 1st-layer to 4th-layer conductor accommodation positions being numbered from a radially inner side and sequentially aligned in a radial direction, and
said phase winding comprises C(=ST) parallel coils connected in parallel to each other, each parallel coil including T (T is a natural number including 1) layer coils connected in series and selected from S layer coils accommodated in respective conductor accommodation position sets, said S layer coils being accommodated in respective conductor accommodation position sets and constituted by serially connecting K partial coils accommodated in said inphase slots arranged successively in the circumferential direction and accommodated in the same conductor accommodation position set.
2. The electric rotary machine equipped with a stator coil including sequentially-connected conductor segments in accordance with claim 1, wherein
said partial coil comprises first and second circulation coils and a modified wave winding conductor segment,
said first and second circulation coils are constituted by alternately connecting a wave winding conductor segment inserted into 1 st-layer and 4th-layer conductor accommodation positions and a lap winding conductor segment inserted into 2nd-layer and 3rd-layer conductor accommodation positions, and
said modified wave winding conductor segment connects said first and second circulation coils and constitutes a trailing in-slot conductor portion of said first circulation coil and a leading in-slot conductor portion of said second circulation coil,
said layer coil is constituted by K partial coils accommodated respectively in K inphase slots arranged consecutively in the circumferential direction and serially connected by circumferential joint conductor segments, and
said circumferential joint conductor segment constitutes a leading in-slot conductor portion of one of serially connected partial coils and a trailing in-slot conductor portion of the other of serially connected partial coils.
3. The electric rotary machine equipped with a stator coil including sequentially-connected conductor segments in accordance with claim 1, wherein S is equal to C.
4. The electric rotary machine equipped with a stator coil including sequentially-connected conductor segments in accordance with claim 3, further comprising a radial joint conductor segment having a pair of in-slot conductor portions separately accommodated in two adjacent sets of said conductor accommodation position sets and accommodated in the inphase slot having the same order in the circumferential direction, and said radial joint conductor segment being connected to a leader line of said parallel coil, wherein the pair of in-slot conductor portions of said radial joint conductor segment constitutes a leading or trailing in-slot conductor portion of two layer coils disposed adjacently in the radial direction.
5. The electric rotary machine equipped with a stator coil including sequentially-connected conductor segments in accordance with claim 2, wherein the first and second circulation coils are connected in series.
6. The electric rotary machine equipped with a stator coil including sequentially-connected conductor segments in accordance with claim 2, wherein the first and second circulation coils are connected in parallel.
7. An electric rotary machine equipped with a stator coil including sequentially-connected conductor segments, comprising:
a rotor having P pairs of magnetic poles;
a stator core with a plurality of slots, each slot having a plurality of conductor accommodation positions sequentially aligned in a radial direction;
M-phase windings, where M is an odd number not less than 3, each phase winding being constituted by sequentially connecting a plurality of U-shaped conductor segments;
said conductor segment comprising a pair of in-slot conductor portions separately accommodated into two different slots mutually spaced by a predetermined slot pitch, a U-shaped head portion continuously extending from said in-slot conductor portions and protruding from one end of said stator core so as to constitute a head side coil end, and a pair of tail conductor portions continuously extending from said in-slot conductor portions and protruding from the other end of said stator so as to constitute a tail side coil end; and
said pair of tail conductor portions having distal ends being bonded to distal ends of tail conductor portions of other conductor segment,
wherein K inphase slots arranged successively in a circumferential direction cooperatively constitute an inphase slot group, each inphase slot accommodating the in-slot conductor portions constituting the same phase winding, where K is a natural number not smaller than 2,
said slot comprises S conductor accommodation position sets, each conductor accommodation position set including 1 st-layer to 4th-layer conductor accommodation positions being numbered from a radially inner side and sequentially aligned in a radial direction,
said phase winding comprises C (=ST) parallel coils connected in parallel to each other, each parallel coil including T (T is a natural number including 1) layer coils connected in series and selected from S layer coils accommodated in respective conductor accommodation position sets, said S layer coils being accommodated in respective conductor accommodation position sets and constituted by serially connecting K partial coils accommodated in said inphase slots arranged successively in the circumferential direction and accommodated in the same conductor accommodation position set, and
said partial coils comprise parallel connected first and second circulation coils and a modified wave winding conductor segment.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A detector apparatus comprising:
a detector having a top surface;
a layer of scintillation material disposed on the top surface of the detector;
a layer of spacer material disposed on the layer of scintillation material; and
a spectral purity filter layer disposed on the layer of spacer material.
2. The apparatus of claim 1, wherein the layer of spacer material is less than 100 nm thick.
3. The apparatus of claim 1, the layer of spacer material layer is at least 50 nm thick.
4. The apparatus of claim 1, wherein the layer of spacer material absorbs less than 50% of extreme ultraviolet (EUV) radiation within 50 nm of the layer of spacer material.
5. The apparatus of claim 1, wherein the layer of spacer material absorbs less than 50% of EUV radiation within 100 nm of the layer of spacer material.
6. The apparatus of claim 1, wherein the layer of spacer material is substantially transparent at a wavelength of scintillation emission of the layer of scintillation material.
7. The apparatus of claim 1, wherein the layer of spacer material comprises silicon, silicon nitride, or silicon dioxide.
8. The apparatus of claim 1, wherein the spectral purity filter layer comprises zirconium or chromium.
9. The apparatus of claim 1, wherein the layer of scintillation material comprises Gd2O2S:Tb or YAG:Ce.
10. The apparatus of claim 1, wherein the detector is an imaging detector.
11. The apparatus of claim 10, wherein the imaging detector is a CCD array.
12. A lithographic apparatus comprising:
a substrate table configured to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and
a detector apparatus configured to detect at least a portion of the patterned radiation beam, wherein the detector apparatus comprises:
a detector having a top surface:
a layer of scintillation material disposed on the top surface of the detector;
a layer of spacer material disposed on the layer of scintillation material; and
a spectral purity filter layer disposed on the layer of spacer material.
13. The lithographic apparatus of claim 12, wherein the detector apparatus is provided in the substrate table of the lithographic apparatus.
14. A detection method comprising;
directing extreme ultraviolet (EUV) radiation through a spectral purity filter layer and through a spacer material layer, the spacer material layer being disposed between the spectral purity filter layer and a layer of scintillation material, the layer of scintillation material being disposed on a to surface of a detector; and
detecting scintillation radiation emitted by the layer of scintillation material using the detector.

1. A method of buffering, during at least a predetermined retention time, a digital optical signal having a predetermined digital level, comprising:
inputting the optical signal to an optical input of a semiconductor laser element; and
injecting an injection current to said semiconductor laser element to establish an optical gain process in said semiconductor laser element, the injection current having an amplitude such that said optical gain process and an optical absorption process within said semiconductor laser element outweigh one another longer than said retention time in order to keep said digital optical signal on said predetermined digital level during said retention time.
2. The method according to claim 1, further comprising:
outputting said optical signal to an output line by means of an optical output switch connected between an output of said semiconductor laser element and said output line.
3. The method according to claim 1, further comprising the step of, prior to the inputting step, clearing said semiconductor laser element by turning off said injection current during a predetermined clearing time period.
4. A method of time division multiplexing of a plurality of digital optical signals each having a predetermined digital level, comprising:
inputting each of the optical signals to an optical input of one of a plurality of semiconductor laser elements;
injecting a distinct injection current to each of said semiconductor laser elements to establish an optical gain process in each of said semiconductor laser elements, each injection current having an amplitude such that said optical gain process and an optical absorption process within each of said semiconductor laser elements outweigh one another longer than a predetermined retention time in order to keep each of said digital optical signals on each of said predetermined digital levels during said retention time; and
consecutively outputting each of said optical signals to one output line in consecutive time frames by means of a plurality of optical output switches, each one of said plurality of output switches being connected between an output of one of said semiconductor laser elements and said output line.
5. The method according to claim 4, further comprising the step of, prior to the inputting step, clearing said semiconductor laser element by turning off said injection current during a predetermined clearing time period.
6. An arrangement for buffering, during at least a predetermined retention time, a digital optical signal having a predetermined digital level, comprising:
a semiconductor laser element with an optical input for receiving the optical signal; and
a current source connected to said semiconductor laser element and arranged to inject an injection current to said semiconductor laser element to establish an optical gain process in said semiconductor laser element, the injection current having an amplitude such that said optical gain process and an optical absorption process within said semiconductor laser element outweigh one another longer than said retention time in order to keep said digital optical signal on said predetermined digital level during said retention time.
7. The arrangement according to claim 6, further comprising a controller connected to said current source to provide a current control signal to said current source to control an amplitude of said injection current.
8. The arrangement according to claim 7, further comprising an optical detector arranged to detect optical power content of said semiconductor laser element and to provide a feedback signal to said controller, said controller being arranged to generate said current control signal in dependence on said feedback signal.
9. The arrangement according to claim 8, further comprising an optical output switch connected between an output of said semiconductor laser element and an output line, and connected to said controller to receive an output switch control signal to control outputting said optical signal to said output line.
10. The arrangement according to claim 9, further comprising an optical output directional filter connected between said output of said semiconductor laser element and said optical output switch.
11. The arrangement according to claim 10, further comprising an optical input switch connected to said input of said semiconductor laser element, and connected to said controller to receive an input switch control signal to control inputting said optical signal to said semiconductor laser element.
12. The arrangement according to claim 11, further comprising an optical input directional filter connected between said input of said semiconductor laser element and said optical input switch.
13. The arrangement according to claim 11, wherein said controller is arranged for controlling said current source such that said current source clears said semiconductor laser element by turning off said injection current during a predetermined clearing time period prior to switching said digital optical signal to said semiconductor laser element by said optical input switch.
14. An arrangement for time division multiplexing of a plurality of digital optical signals each having a predetermined digital level, comprising:
a plurality of semiconductor laser elements each having an optical input for receiving one of said optical signals;
a current source connected to said semiconductor laser elements for injecting a distinct injection current to each of said semiconductor laser elements to establish an optical gain process in each of said semiconductor laser elements, each injection current having an amplitude such that said optical gain process and an optical absorption process within each of said semiconductor laser elements outweigh one another longer than a predetermined retention time in order to keep each of said digital optical signals on each of said predetermined digital levels during said retention time;
a plurality of optical output switches, each one of said plurality of output switches being connected between an output of one of said semiconductor laser elements and one output line; and
a controller connected to said plurality of optical output switches to control consecutively outputting each of said optical signals to said output line in consecutive time frames.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

Having thus described my invention, what I claim as new and desire to secure by Letters Patent is as follows:

1. A method for aligning elements of an electron beam projection lithography tool, said method including steps of
centering and rotationally aligning an image of a shaping aperture with an image of a reticle sub-field to form a compound image,
aligning orientation of said compound image with movement of a wafer stage of said electron beam projection lithography tool by lens adjustment, and
correcting orientation and motion of said compound image relative to said movement of said wafer stage by rotational adjustment of a deflector.
2. A method as recited in claim 1, including further steps of
adjusting size of said image of said reticle sub-field,
detecting rotation of said compound image resulting from said step of adjusting size, and
repeating said correcting step when rotation of said compound image resulting from said step of adjusting size is detected.
3. A method as recited in claim 1, including the further steps of
detecting said compound image, and
displaying said compound image.
4. A method as recited in claim 3, including the further step of rastering said compound image over said detector.
5. A method as recited in claim 2, including the further steps of
detecting said compound image, and
displaying said compound image.
6. A method as recited in claim 5, including the further step of rastering said compound image over said detector.
7. A method as recited in claim 1, wherein said step of centering and aligning includes the further steps of
centering a detector on said image of said shaping aperture,
centering said image of a reticle sub-field on said image of said shaping aperture, and
rotationally aligning said image of a reticle sub-field with said image of said shaping aperture.
8. A method as recited in claim 1, wherein said rotational adjustment of said deflector is performed mechanically.
9. A method as recited in claim 1, wherein said rotational adjustment of said deflector is performed electrically.
10. A method as recited in claim 1, including a further steps of
displaying an image of a pattern projected on a target plane of said electron beam projection lithography tool forming a displayed image, and
performing at least one of said centering and rotationally aligning step, said aligning step and said correcting step in real time in accordance with said displayed image.
11. A method as recited in claim 2, including a further steps of
displaying an image of a pattern projected on a target plane of said electron beam projection lithography tool forming a displayed image, and
performing at least one of said centering and rotationally aligning step, said aligning step, said adjusting size step, said detecting rotation step and said correcting step in real time in accordance with said displayed image.