Author: claimsbot

What is claimed is:

1. An apparatus for sputter deposition of a film layer onto a substrate comprising:
a vacuum chamber;
a substrate support disposed within said vacuum chamber,
a target disposed within said chamber; and
a coil disposed within said chamber and extending within a space defined between said target and substrate support, said coil having a sputtering surface and a coolant carrying channel defined within said coil, wherein at least a portion of said sputtering surface is non-circular in a plane orthogonal to a longitudinal tangential axis of the coil.
2. The apparatus of claim 1 wherein said coil sputtering surface is flat in said plane.
3. The apparatus of claim 1, wherein said coil comprises a first ribbon-shaped coil and a second tubular coil thermally coupled to said first coil.
4. The apparatus of claim 3, wherein said first ribbon-shaped coil and second tubular coil are each ring-shaped.
5. The apparatus of claim 4, wherein said first ribbon-shaped coil defines an outer surface and said second tubular coil is coupled to said outer surface of said first ribbon-shaped coil.
6. The apparatus of claim 4, wherein said first ribbon-shaped coil defines an inner surface and said second tubular coil is coupled to said inner surface of said ribbon-shaped coil.
7. The apparatus of claim 1, wherein said coil is comprised of the same material as said target.
8. The apparatus of claim 1, wherein said coil is adapted to radiate RF energy from said coil.
9. An apparatus for sputter deposition of a film layer onto a substrate comprising:
a vacuum chamber;
a substrate support disposed within said vacuum chamber;
a target disposed within said chamber;
a first coil disposed within said chamber and extending through a space defined between said target and substrate support; and
a second coil thermally coupled to said first coil.
10. The apparatus of claim 9, wherein said second coil defines a coolant carrying channel within said second coil.
11. The apparatus of claim 9, wherein both said first coil and said second coil are each ring-shaped.
12. The apparatus of claim 11, wherein said first coil defines an outer surface and second coil is coupled to said outer surface of said first coil.
13. The apparatus of claim 11, wherein said first coil defines an inner surface and second coil is coupled to said inner surface of the said first coil.
14. The apparatus of claim 9, wherein said first coil is adapted to radiate RF energy from said coil.
15. The apparatus of claim 9, wherein said first coil has width at least twice as wide as the width of said second coil.
16. An apparatus for sputter deposition of a film layer onto a substrate comprising:
a vacuum chamber;
a substrate support disposed within said vacuum chamber,
a target disposed within said chamber;
a coil disposed within said chamber and extending within a space defined between said target and substrate support, said coil having a coolant carrying channel within said coil; and
a first flange extending outward from a surface of said coil.
17. The apparatus of claim 16 further comprising a second flange extending outward from a surface of said coil.
18. The apparatus of claim 17 wherein said first and second flanges are separate and said coil is positioned between said first and second flanges.
19. The apparatus of claim 18 wherein said first and second flanges are welded to said coil.
20. An apparatus for energizing a plasma within a semiconductor fabrication system to sputter material onto a workpiece, the apparatus comprising:
a semiconductor fabrication chamber having a plasma generation area within said chamber;
a sputtering target carried within said chamber and made of a first material, said target being positioned to sputter said target material onto said workpiece; and
a first ring-shaped ribbon coil disposed within said chamber and extending through a space defined between said target and substrate support, wherein said first coil is positioned to couple energy into the plasma generation area and to sputter coil material onto said workpiece so that both coil material and target material are deposited on said workpiece to form a layer thereon; and
a second ring-shaped coil thermally coupled to said first coil, said second coil having a coolant carrying channel defined therein.
21. A method of depositing material onto a workpiece in a sputter deposition chamber, comprising:
sputtering target material onto said workpiece from a target positioned in said chamber; and
sputtering material onto said workpiece from a first coil; and
flowing a coolant through a second tubular-shaped coil thermally coupled to said first coil to cool said first coil.
22. The method of claim 21, wherein said sputtering surface is ribbon-shaped.
23. An antennae for a sputter deposition apparatus using RF energy, comprising:
a coil adapted to radiate said RF energy, said coil having a sputtering surface and a coolant carrying channel defined within said coil, wherein at least a portion of said sputtering surface is non-circular is a plane orthogonal to a longitudinal tangential axis of the coil.
24. The antennae of claim 23, wherein said sputtering surface is flat in said plane.
25. The antennae of claim 23, wherein said coil comprises a first ribbon-shaped coil and a second tubular coil thermally coupled to said first coil.
26. The antennae of claim 25, wherein said first ribbon-shaped coil and second tubular coil are each ring-shaped.
27. The antennae of claim 26, wherein said first ribbon-shaped coil defines an outer surface and said second tubular coil is coupled to said outer surface of said first ribbon-shaped coil.
28. The antennae of claim 26, wherein said first ribbon-shaped coil defines an inner surface and said second tubular coil is coupled to said inner surface of said ribbon-shaped coil.
29. The antennae of claim 23, wherein said coil is comprised of a sputter deposition material selected from the group of titanium, tantalum, copper and aluminum.
30. An antennae for an apparatus for sputter deposition of a film layer onto a substrate comprising:
a first coil; and
a second tubular-shaped coil thermally coupled to said first coil.
31. The antennae of claim 30, wherein said second coil defines a coolant carrying channel within said second coil.
32. The antennae of claim 30, wherein both said first coil and said second tubular-shaped coil are each ring-shaped.
33. The antennae of claim 30, wherein said first coil is a ribbon-shaped coil which defines an outer surface and said second tubular coil is coupled to said outer surface of said first ribbon-shaped coil.
34. The antennae of claim 30, wherein said first coil is a ribbon-shaped coil which defines an inner surface and said second tubular coil is coupled to said inner surface of the said ribbon-shaped coil.
35. The antennae of claim 30, wherein said first coil has width at least twice as wide as the width of said second tubular-shaped coil.
36. An antennae for an apparatus for sputter deposition of a film layer onto a substrate comprising:
a tubular-shaped coil; and
a first flange extending outward from a surface of said tubular-shaped coil.
37. The apparatus of claim 36 further comprising a second flange extending outward from a surface of said coil.
38. The apparatus of claim 37 wherein said first and second flanges are separate and said coil is positioned between said first and second flanges.
39. The apparatus of claim 38 wherein said first and second flanges are welded to said coil.
40. The antennae of claim 36, wherein said tubular-shaped coil defines a coolant carrying channel within said coil.
41. An antennae for energizing a plasma within a semiconductor fabrication system to sputter material onto a workpiece, the antennae comprising:
a first ring-shaped ribbon coil adapted to sputter coil material onto said workpiece; and
a second tubular ring-shaped coil thermally coupled to said first coil, said tubular-shaped coil having a coolant carrying channel defined therein.
42. A method of depositing material on a workpiece in a sputter deposition chamber, comprising:
sputtering target material onto said workpiece from a target positioned in said chamber;
sputtering coil material onto said workpiece from a coil disposed within the chamber and extending within a space defined between said target and substrate support, said coil having a sputtering surface and a coolant carrying channel defined within said coil, wherein at least a portion of said sputtering surface is non-circular is a plane orthogonal to a longitudinal tangential axis of the coil; and
flowing a coolant fluid through said coolant carrying channel.
43. The method of claim 40, further comprising passing RF current through said coil to energize a plasma in said chamber.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for reducing titanium dioxide buildup in equipment used for the production of titanium dioxide, comprising the steps of:
calcining a blend of anatase and rutile titanium dioxides to produce a scour medium;
and introducing the scour medium into the equipment used for the production of titanium dioxide.
2. The method of claim 1, wherein the calcining step takes place at a temperature greater than about 1025\xb0 C.
3. The method of claim 1, wherein the blend is calcined to a crush strength between about 15 percent and about 30 percent.
4. The method of claim 1, wherein the blend is calcined to a density of from about 1.55 gcm3 to about 1.71 gcm3.
5. The method of claim 1, wherein the calcined blend is introduced into an oxidation reactor.
6. The method of claim 1, wherein the calcined blend is introduced into a cooling conduit.
7. The method of claim 1, wherein the blend is at least about 10 percent anatase by weight.
8. The method of claim 1, wherein the blend is at least about 50 percent anatase by weight.
9. The method of claim 1, wherein the blend is at least about 75 percent anatase by weight.
10. The method of claim 1, wherein the blend is at least about 90 percent anatase by Case No. weight.
11. The method of claim 1, wherein the proportions of the anatase and rutile titanium dioxides in the blend are selected and calcinations conditions employed to effect at least that degree of conversion of the anatase titanium dioxide in the blend which enables an anatase content of less than about 1 percent by weight of the combined produced titanium dioxide and spent scouring medium, when the scour medium is used to an extent whereby it comprises from about 2 to about 10 percent of the mass flow through the production equipment for producing said titanium dioxide.
12. The method of claim 11, wherein the anatase content of the produced titanium dioxide and spent scouring medium is maintained at less than about 0.5 percent by weight.
13. The method of claim 11, wherein the anatase content of the produced titanium dioxide and spent scouring medium is maintained at less than about 0.2 percent by weight.

1. An apparatus for grinding a substrate, comprising:
a stage part configured to support a substrate thereon;
a grinding part that includes a grinding wheel configured to grind an edge of the substrate;
a camera part configured to take a picture of the grinding wheel, analyze the picture of the grinding wheel and generate information about the grinding wheel;
a replacing part that includes a spare grinding wheel, wherein the replacing part is configured to provide the spare grinding wheel to the grinding part or pick up the grinding wheel from the grinding part; and
a control unit configured to receive the grinding wheel information from the camera part and offset compensate a position of the grinding wheel on the basis of the grinding wheel information or communicate with the replacing part to replace the grinding wheel on the basis of the grinding wheel information.
2. The apparatus of claim 1, wherein the stage part is configured to move along a y-axis direction and the grinding part is configured to move along an x-axis direction and a z-axis direction.
3. The apparatus of claim 1, wherein the grinding part is connected to one x-axis transfer unit.
4. The apparatus of claim 3, wherein each of the grinding wheel and the spare grinding wheel comprises a rough grinding groove and a finish grinding groove.
5. The apparatus of claim 1, wherein the camera part comprises:
a camera that is configured to take the picture of the grinding wheel; and
a backlight disposed facing the camera and configured to provide a light to the camera.
6. The apparatus of claim 5, wherein the camera, the grinding wheel, and the backlight are sequentially disposed in a straight line substantially parallel to the y-axis.
7. The apparatus of claim 1, wherein the replacing part is configured to be operated in a replacement mode or a standby mode on the basis of the grinding wheel information.
8. The apparatus of claim 7, wherein the replacing part comprises:
a replacing plate configured to be rotated with reference to a z-axis as its rotation axis;
a replacing table disposed on the replacing plate and configured to move along a y-axis direction; and
a holder disposed on the replacing table and configured to hold the spare grinding wheel.
9. The apparatus of claim 8, wherein the replacing table is configured such that the replacing table is disposed inside a process space, in which the substrate is ground, during the replacement mode and disposed outside the process space during the standby mode.
10. The apparatus of claim 9, wherein the replacing plate is configured to be rotated about 180 degrees about the z-axis as its rotation axis when the replacement mode is changed to the standby mode.
11. The apparatus of claim 1, wherein the grinding part comprises:
a first grinding part that includes a rough grinding wheel; and
a second grinding part that includes a finish grinding wheel.
12. The apparatus of claim 11, wherein the first grinding part and the second grinding part are connected to a same x-axis transfer unit.
13. The apparatus of claim 12, wherein the first grinding part and the second grinding part are connected to separate z-axis transfer units.
14. A method of grinding a substrate, comprising:
loading a substrate;
taking a picture of a grinding wheel and analyzing the picture of the grinding wheel to generate information about the grinding wheel;
checking whether the grinding wheel is required to be replaced or not on the basis of the grinding wheel information;
offset compensating a position of the substrate and the grinding wheel on the basis of the grinding wheel information; and
grinding an edge of the substrate.
15. The method of claim 14, further comprising replacing the grinding wheel.
16. The method of claim 15, wherein the replacing of the grinding wheel comprises:
discharging the grinding wheel; and
providing a spare grinding wheel.
17. An apparatus for grinding a substrate, comprising:
a stage part which includes a stage configured to support a substrate thereon and a stage body fixed to the stage;
a lower frame supporting the stage part, wherein the stage body is disposed between the stage and the lower frame;
a grinding part that includes a grinding wheel configured to grind an edge of the substrate, a spindle operatively connected to the grinding wheel and configured to pivot the grinding wheel along a z-axis direction, a grinding chuck connecting the spindle and the grinding wheel to each other, and a spindle transfer;
an x-axis transfer unit configured move in an x-axis direction which is perpendicular to the z-axis direction, wherein the x-axis transfer unit includes an x-axis shaft operatively connected to the spindle transfer, an x-axis motor which is configured to rotate the x-axis shaft, and an x-axis guide rail which is configured to guide movement of the spindle transfer along the x-axis direction;
a camera part including a camera configured to take a picture of the grinding wheel, analyze the picture of the grinding wheel and generate information about the grinding wheel, a backlight facing the camera and configured to provide light to the camera, and a camera supporter, wherein the camera and the backlight are spaced apart from each other and are disposed on the camera supporter;
a replacing part that includes a spare grinding wheel, wherein the replacing part is configured to provide the spare grinding wheel to the grinding part or pick up the grinding wheel from the grinding part;
a control unit configured to receive the grinding wheel information from the camera part and offset compensate a position of the grinding wheel on the basis of the grinding wheel information or communicate with the replacing part to replace the grinding wheel on the basis of the grinding wheel information;
an upper frame supporting the grinding part and the replacing part; and
a column frame disposed between the upper frame and the lower frame at a position corresponding to an end portion of the lower frame and the upper frame.
18. The apparatus of claim 17, further comprising a z-axis transfer unit configured to move in the z-axis direction, wherein the z-axis transfer unit includes a z-axis shaft operatively connected to the spindle transfer, a z-axis motor which is configured to rotate the z-axis shaft, and a z-axis guide rail which is configured to guide movement of the spindle transfer along the z-axis direction.
19. The apparatus of claim 18, further comprising a y-axis transfer unit configured to move in a y-axis direction which is perpendicular to the z-axis direction, wherein the y-axis transfer unit includes a y-axis shaft operatively connected to the stage body, a y-axis motor which is configured to rotate the y-axis shaft, and a y-axis guide rail which is configured to guide movement of the stage body along the y-axis direction.
20. The apparatus of claim 18, wherein at least one of the x-axis shaft or the z-axis shaft includes a ball screw having a ball shaped thread which is coupled to the spindle transfer.
21. The apparatus of claim 17, wherein each of the grinding wheel and the spare grinding wheel comprise a rough grinding groove and a finish grinding groove, wherein the rough grinding groove has a depth smaller than a depth of the finish grinding groove.
22. The apparatus of claim 17, wherein an upper portion of the grinding chuck is coupled with a lower portion of the spindle and a lower portion of the grinding chuck is removably coupled with the grinding wheel.
23. The apparatus of claim 17, wherein the camera supporter protrudes from the column frame to support the camera and the backlight.
24. The apparatus of claim 19, wherein the replacing part comprises:
a replacing plate having a substantially flat surface parallel with the x-axis direction and the y-axis direction;
a rotating unit configured to fix the upper frame and the replacing part in the z-axis direction and wherein the rotating unit is configured to rotate with reference to the z-axis direction as its rotating axis and to rotate the replacing plate in a direction substantially parallel to the x-axis direction and the y-axis direction;
a replacing table disposed on the replacing plate and configured to move along the y-axis direction; and
a holder disposed on the replacing table and configured to hold the spare grinding wheel.
25. The apparatus of claim 21, wherein the grinding wheel information comprises a position in the z-axis direction of a center line crossing the rough grinding groove, a degree of slope of the rough grinding groove, the depth of the rough grinding groove, a position in the z-axis direction of a center line crossing the finish grinding groove, a degree of slope of the finish grinding groove, and the depth of the finish grinding groove.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. A bottomless battery container for storing and transporting storage batteries comprising:
side panels with connected end panels, each side panel being connected with an integral cushion assembly, each cushion assembly defining score lines between a top section, an end section and a bottom section;
each said cushion assembly defining cutouts for receiving battery terminals and battery filling caps located at least in part on said bottom section, said bottom section including a fastening panel which is secured to an interior surface of an adjacent side panel.
2. A container as claimed in claim 1 wherein all of said Panels are waterproof.
3. A container as claimed in claim 1 wherein said end panel has handle means.
4. A container as claimed in claim 3 wherein said handle means is a cutout aperture.
5. A container as claimed in claim 2 wherein said panel waterproofing is a chemical treatment.
6. A container as claimed in claim 1 wherein one of said cushion assembly sections is provided with an adhesive allowing it to be fastened to an interior surface of said side panel.
7. A container as claimed in claim 1 wherein said end panels are notched along a portion of its exterior surface.
8. A bottomless battery container for storing and transporting storage batteries comprising:
side panels with connected end panels separated by score lines which permit folding of the panels with respect to each other, each side panel being connected with an integral cushion assembly, each cushion assembly defining score lines between a top section, an end section and a bottom section allowing each section to be folded along said score lines;
said cushion assembly defining cutouts for receiving battery filling caps located at least in part on said bottom section and said end section, said bottom section additionally defining cutouts for receiving battery terminal posts including a fastening panel which is secured to an interior surface of its respective side panel.
9. A bottomless battery container as claimed in claim 8 wherein said end panel has a handle in the form of a cutout aperture.
10. A bottomless battery container as claimed in claim 8 wherein said cushion assembly bottom section has a fastening panel allowing it to be fastened to an interior surface of said side panel.
11. A bottomless battery container as claimed in claim 8 wherein said end sections are notched along a portion of its exterior surface edge to provide a locking mechanism with said end panels.
12. A bottomless battery container as claimed in claim 8 wherein said end panels had a top surface with inclined ends.
13. A bottomless battery container as claimed in claim 8 wherein said end panel has a handle in the form of a cutout aperture.
14. A bottomless battery container as claimed in claim 8 wherein said cushion assembly bottom section cutouts for receiving battery filling caps has a curved area which extends into said bottom section.
15. A bottomless battery container as claimed in claim 8 wherein said end sections are notched along a portion of its exterior surface edge to provide a locking mechanism with said end panels.
16. A bottomless battery container as claimed in claim 8 wherein said end panels have a top surface with inclined ends.
17. A bottomless battery container for storing and transporting storage batteries comprising:
side panels with connected end panels separated by score lines which permit folding of the panels with respect to each other, each side panel being connected with an integral cushion assembly, each cushion assembly defining score lines between a top section, an end section and a bottom section allowing each section to be folded along said score lines; each end section being provided with notch means formed along a portion of its exterior surface to allow locking with said end panels;
said cushion assembly defining cutouts for receiving battery filling caps located at least in part on said bottom section and said end section, said bottom section additionally defining cutouts for receiving battery terminal posts including a fastening panel which is secured to an interior surface of its respective side panel.
18. A bottomless battery container as claimed in claim 17 wherein said notch means is an inclined surface with an end wall perpendicular to an outer edge of said end section wall
19. A bottomless battery container as claimed in claim 17 wherein said end panels have a top surface with angled ends.
20. A bottomless battery container as claimed in claim 17 wherein said end panels had a top surface with inclined ends and a recessed cutout adjacent a pot portion of each side panel.